Plasma-enhanced atomic layer deposition of Co on metal surfaces

Type:
Journal
Info:
Surface & Coatings Technology 264 (2015) 60-65
Date:
0000-00-00

Author Information

Name Institution
Jaehong YoonYonsei University
Jeong-Gyu SongYonsei University
Hyunjun KimYonsei University
Han-Bo-Ram LeeIncheon National University

Films

Plasma Co


Film/Plasma Properties

Characteristic: Magnetic Properties
Analysis: VSM, Vibrating Sample Magnetometer

Characteristic: Microstructure
Analysis: TEM, Transmission Electron Microscope

Characteristic: Interfacial Layer
Analysis: TEM, Transmission Electron Microscope

Characteristic: Resistivity, Sheet Resistance
Analysis: Four-point Probe

Substrates

Si(001)
SiO2
Ru
Ta

Keywords

Notes

1589