Publication Information

Title: High-Quality Cobalt Thin Films by Plasma-Enhanced Atomic Layer Deposition

Type: Journal

Info: Electrochemical and Solid-State Letters, 9 (11) G323-G325 (2006)

Date: 2006-07-17

DOI: http://dx.doi.org/10.1149/1.2338777

Author Information

Name

Institution

Pohang University of Science and Technology (POSTECH)

Pohang University of Science and Technology (POSTECH)

Films

Plasma Co using Custom

Deposition Temperature Range = 250-400C

12078-25-0

7664-41-7

Plasma Co using Custom

Deposition Temperature Range = 250-400C

1277-43-6

7664-41-7

Plasma CoC using Custom

Deposition Temperature Range N/A

12078-25-0

1333-74-0

Plasma CoC using Custom

Deposition Temperature = 300C

1277-43-6

1333-74-0

Film/Plasma Properties

Characteristic

Analysis

Diagnostic

Thickness

Profilometry

Unknown

Thickness

SEM, Scanning Electron Microscopy

Unknown

Resistivity, Sheet Resistance

Four-point Probe

Unknown

Chemical Composition, Impurities

XPS, X-ray Photoelectron Spectroscopy

Unknown

Chemical Composition, Impurities

RBS, Rutherford Backscattering Spectrometry

Unknown

Chemical Composition, Impurities

SIMS, Secondary Ion Mass Spectrometry

Unknown

Crystallinity, Crystal Structure, Grain Size, Atomic Structure

XRD, X-Ray Diffraction

Unknown

Microstructure

TEM, Transmission Electron Microscope

Unknown

Substrates

Si(001)

SiO2

Keywords

Notes

1014



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