|1||Strem Chemicals, Inc.||Cyclopentadienylcobalt dicarbonyl, min. 95%|
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Your search for publications using this chemistry returned 7 record(s). If there are too many results, you may want to use the multi-factor search to narrow the results.
|1||Characteristics of Cobalt Films Deposited by Using a Remote Plasma ALD Method with a CpCo(CO)2 Precursor|
|2||Characteristics of Ti-Capped Co Films Deposited by a Remote Plasma ALD Method Using Cyclopentadienylcobalt Dicarbonyl|
|3||Comparison of Co Films Deposited by Remote Plasma Atomic Layer Deposition Method with Cyclopentadienylcobalt Dicarbonyl [CpCo(CO)2] and Dicobalt Octacarbonyl [Co2(CO)8]|
|4||High-Quality Cobalt Thin Films by Plasma-Enhanced Atomic Layer Deposition|
|5||High-Quality Cobalt Thin Films by Plasma-Enhanced Atomic Layer Deposition|
|6||Atomic layer deposition of Co3O4 on carbon nanotubes/carbon cloth for high-capacitance and ultrastable supercapacitor electrode|
|7||Photocatalytic Properties of Co3O4-Coated TiO2 Powders Prepared by Plasma-Enhanced Atomic Layer Deposition|
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