In vacuo studies on plasma-enhanced atomic layer deposition of cobalt thin films

Type:
Journal
Info:
Journal of Vacuum Science & Technology A 38, 012405 (2020)
Date:
2019-12-12

Author Information

Name Institution
Johanna ReifTechnische Universität Dresden
Martin KnautTechnische Universität Dresden
Sebastian KillgeTechnische Universität Dresden
Kristina WinklerTechnische Universität Dresden
Matthias AlbertTechnische Universität Dresden
Johann W. BarthaTechnische Universität Dresden

Films

Plasma Co


Plasma CoN


Plasma CoN


Plasma CoN


Film/Plasma Properties

Characteristic: Chemical Composition, Impurities
Analysis: XPS, X-ray Photoelectron Spectroscopy

Characteristic: Nucleation
Analysis: XPS, X-ray Photoelectron Spectroscopy

Characteristic: Thickness
Analysis: QCM, Quartz Crystal Microbalance

Characteristic: Morphology, Roughness, Topography
Analysis: AFM, Atomic Force Microscopy

Characteristic: Resistivity, Sheet Resistance
Analysis: Four-point Probe

Characteristic: Thickness
Analysis: SEM, Scanning Electron Microscopy

Characteristic: Morphology, Roughness, Topography
Analysis: SEM, Scanning Electron Microscopy

Substrates

Si with native oxide

Keywords

Nucleation

Notes

1566