In vacuo studies on plasma-enhanced atomic layer deposition of cobalt thin films
Type:
Journal
Info:
Journal of Vacuum Science & Technology A 38, 012405 (2020)
Date:
2019-12-12
Author Information
| Name | Institution |
|---|---|
| Johanna Reif | Technische Universität Dresden |
| Martin Knaut | Technische Universität Dresden |
| Sebastian Killge | Technische Universität Dresden |
| Kristina Winkler | Technische Universität Dresden |
| Matthias Albert | Technische Universität Dresden |
| Johann W. Bartha | Technische Universität Dresden |
Films
Plasma Co
Plasma CoN
Plasma CoN
Plasma CoN
Film/Plasma Properties
Characteristic: Chemical Composition, Impurities
Analysis: XPS, X-ray Photoelectron Spectroscopy
Characteristic: Nucleation
Analysis: XPS, X-ray Photoelectron Spectroscopy
Characteristic: Thickness
Analysis: QCM, Quartz Crystal Microbalance
Characteristic: Morphology, Roughness, Topography
Analysis: AFM, Atomic Force Microscopy
Characteristic: Resistivity, Sheet Resistance
Analysis: Four-point Probe
Characteristic: Thickness
Analysis: SEM, Scanning Electron Microscopy
Characteristic: Morphology, Roughness, Topography
Analysis: SEM, Scanning Electron Microscopy
Substrates
| Si with native oxide |
Notes
| 1566 |