Introducing Plasma ALD, LLC's first in-house product.

An economical, compact inductively coupled plasma source.

Ideal for:
  • Plasma-Enhanced Atomic Layer Deposition
  • Thin Film Etch
  • Surface cleaning
  • Surface modification

Contact us for more information.


FHR-300-ALD Plasma Enhanced Atomic Layer Deposition Film Publications

Your search for plasma enhanced atomic layer deposition publications using FHR-300-ALD hardware returned 2 records. If there are too many results, you may want to use the multi-factor search to narrow the results.

NumberTitle
1In vacuo investigations on the nucleation of TaCN by plasma enhanced atomic layer deposition
2In vacuo studies on plasma-enhanced atomic layer deposition of cobalt thin films