In vacuo investigations on the nucleation of TaCN by plasma enhanced atomic layer deposition

Type:
Journal
Info:
Microelectronic Engineering 211 (2019) 13-17
Date:
2019-03-14

Author Information

Name Institution
Johanna ReifTechnische Universität Dresden
Martin KnautTechnische Universität Dresden
Sebastian KillgeTechnische Universität Dresden
Matthias AlbertTechnische Universität Dresden
Johann W. BarthaTechnische Universität Dresden

Films

Plasma TaCN


Film/Plasma Properties

Characteristic: Chemical Composition, Impurities
Analysis: XPS, X-ray Photoelectron Spectroscopy

Characteristic: Nucleation
Analysis: XPS, X-ray Photoelectron Spectroscopy

Characteristic: Thickness
Analysis: XPS, X-ray Photoelectron Spectroscopy

Substrates

Si with native oxide
SiCOH
SiO2

Notes

1567