PDMAT, (NMe2)5Ta, Pentakis (DiMethylAmido) Tantalum, CAS# 19824-59-0

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NumberVendorLink
1EreztechPentakis(dimethylamino)tantalum(V) (99.99%-Ta)

Plasma Enhanced Atomic Layer Deposition Film Publications

Your search for publications using this chemistry returned 23 record(s). If there are too many results, you may want to use the multi-factor search to narrow the results.

NumberTitle
1Atomic layer deposition of amorphous Ni-Ta-N films for Cu diffusion barrier
2Atomic Layer Deposition of Ruthenium and Ruthenium-oxide Thin Films by Using a Ru(EtCp)2 Precursor and Oxygen Gas
3Atomic layer deposition of Ta-based thin films: Reactions of alkylamide precursor with various reactants
4Comparative Studies of Atomic Layer Deposition and Plasma-Enhanced Atomic Layer Deposition Ta2O5 and the Effects on Electrical Properties of In situ Nitridation
5Ion and Photon Surface Interaction during Remote Plasma ALD of Metal Oxides
6Low Temperature Plasma-Enhanced Atomic Layer Deposition of Metal Oxide Thin Films
7Optical emission spectroscopy as a tool for studying, optimizing, and monitoring plasma-assisted atomic layer deposition processes
8Plasma-assisted atomic layer deposition of Ta2O5 from alkylamide precursor and remote O2 plasma
9Thermal and plasma enhanced atomic layer deposition ruthenium and electrical characterization as a metal electrode
10Thermal and Plasma-Enhanced ALD of Ta and Ti Oxide Thin Films from Alkylamide Precursors
11TaCN growth with PDMAT and H2/Ar plasma by plasma enhanced atomic layer deposition
12Atomic layer deposition of Ta-based thin films: Reactions of alkylamide precursor with various reactants
13Diffusion barrier properties of TaNx films prepared by plasma enhanced atomic layer deposition from PDMAT with N2 or NH3 plasma
14Optical emission spectroscopy as a tool for studying, optimizing, and monitoring plasma-assisted atomic layer deposition processes
15Plasma-enhanced Atomic Layer Deposition of TaN Film and Its Resistance to Copper Diffusion
16Properties of conductive nitride films prepared by plasma enhanced atomic layer deposition using quartz and sapphire plasma sources
17Reaction mechanisms of atomic layer deposition of TaNx from Ta(NMe2)5 precursor and H2-based plasmas
18Robust TaNx diffusion barrier for Cu-interconnect technology with subnanometer thickness by metal-organic plasma-enhanced atomic layer deposition
19Ru thin film grown on TaN by plasma enhanced atomic layer deposition
20Synthesis and in situ characterization of low-resistivity TaNx films by remote plasma atomic layer deposition
21Ta-rich atomic layer deposition TaN adhesion layer for Cu interconnects by means of plasma-enhanced atomic layer deposition
22Thermal and plasma enhanced atomic layer deposition ruthenium and electrical characterization as a metal electrode
23Comparative Studies of Atomic Layer Deposition and Plasma-Enhanced Atomic Layer Deposition Ta2O5 and the Effects on Electrical Properties of In situ Nitridation


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