PDMAT, (NMe2)5Ta, Pentakis (DiMethylAmido) Tantalum, CAS# 19824-59-0

Where to buy

NumberVendorRegionLink
1DOCK/CHEMICALS🇩🇪Pentakis(dimethylamido)tantalum
2Gelest🇺🇸Tantalum Pentakis(Dimethylamide)
3Ereztech🇺🇸PDMAT
4Pegasus Chemicals🇬🇧Pentakis(dimethylamino)tantalum
5Strem Chemicals, Inc.🇺🇸Pentakis(dimethylamino)tantalum(V), 99%

www.plasma-ald.com does not endorse any chemical suppliers. These links are provided for the benefit of our users. If a link goes bad, let us know.

If you would like your company's precursor products listed, or your existing listing changed or removed, send me an email.


Plasma Enhanced Atomic Layer Deposition Film Publications

Your search for publications using this chemistry returned 25 record(s). If there are too many results, you may want to use the multi-factor search to narrow the results.

NumberTitle
1Reaction mechanisms of atomic layer deposition of TaNx from Ta(NMe2)5 precursor and H2-based plasmas
2Optical emission spectroscopy as a tool for studying, optimizing, and monitoring plasma-assisted atomic layer deposition processes
3Plasma-assisted atomic layer deposition of Ta2O5 from alkylamide precursor and remote O2 plasma
4Properties of conductive nitride films prepared by plasma enhanced atomic layer deposition using quartz and sapphire plasma sources
5Atomic Layer Deposition of Ruthenium and Ruthenium-oxide Thin Films by Using a Ru(EtCp)2 Precursor and Oxygen Gas
6Comparative Studies of Atomic Layer Deposition and Plasma-Enhanced Atomic Layer Deposition Ta2O5 and the Effects on Electrical Properties of In situ Nitridation
7Thermal and Plasma-Enhanced ALD of Ta and Ti Oxide Thin Films from Alkylamide Precursors
8Thermal and plasma enhanced atomic layer deposition ruthenium and electrical characterization as a metal electrode
9Low Temperature Plasma-Enhanced Atomic Layer Deposition of Metal Oxide Thin Films
10Plasma-enhanced Atomic Layer Deposition of TaN Film and Its Resistance to Copper Diffusion
11Atomic layer deposition of Ta-based thin films: Reactions of alkylamide precursor with various reactants
12Atomic layer deposition of amorphous Ni-Ta-N films for Cu diffusion barrier
13Comparative Studies of Atomic Layer Deposition and Plasma-Enhanced Atomic Layer Deposition Ta2O5 and the Effects on Electrical Properties of In situ Nitridation
14Ion and Photon Surface Interaction during Remote Plasma ALD of Metal Oxides
15Ta-rich atomic layer deposition TaN adhesion layer for Cu interconnects by means of plasma-enhanced atomic layer deposition
16TaCN growth with PDMAT and H2/Ar plasma by plasma enhanced atomic layer deposition
17Synthesis and in situ characterization of low-resistivity TaNx films by remote plasma atomic layer deposition
18Atomic layer deposition of Ta-based thin films: Reactions of alkylamide precursor with various reactants
19Diffusion barrier properties of TaNx films prepared by plasma enhanced atomic layer deposition from PDMAT with N2 or NH3 plasma
20In vacuo investigations on the nucleation of TaCN by plasma enhanced atomic layer deposition
21Robust TaNx diffusion barrier for Cu-interconnect technology with subnanometer thickness by metal-organic plasma-enhanced atomic layer deposition
22Optical emission spectroscopy as a tool for studying, optimizing, and monitoring plasma-assisted atomic layer deposition processes
23Thermal and plasma enhanced atomic layer deposition ruthenium and electrical characterization as a metal electrode
24Ru thin film grown on TaN by plasma enhanced atomic layer deposition
25Electrical and structural properties of conductive nitride films grown by plasma enhanced atomic layer deposition with significant ion bombardment effect