Ta(NMe₂)₅, Pentakis(DiMethylAmino)Tantalum, PDMAT, CAS# 19824-59-0

Where to buy

Number	Vendor	Link
1	Ereztech	Pentakis(dimethylamino)tantalum(V) (99.99%-Ta)
2	Strem Chemicals, Inc.	Pentakis(dimethylamino)tantalum(V), 99%

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Plasma Enhanced Atomic Layer Deposition Film Publications

Your search for publications using this chemistry returned 14 record(s). If there are too many results, you may want to use the multi-factor search to narrow the results.

Number	Title
1	Atomic layer deposition of amorphous Ni-Ta-N films for Cu diffusion barrier
2	Atomic Layer Deposition of Ruthenium and Ruthenium-oxide Thin Films by Using a Ru(EtCp)2 Precursor and Oxygen Gas
3	Atomic layer deposition of Ta-based thin films: Reactions of alkylamide precursor with various reactants
4	Ion and Photon Surface Interaction during Remote Plasma ALD of Metal Oxides
5	Low Temperature Plasma-Enhanced Atomic Layer Deposition of Metal Oxide Thin Films
6	Optical emission spectroscopy as a tool for studying, optimizing, and monitoring plasma-assisted atomic layer deposition processes
7	Thermal and plasma enhanced atomic layer deposition ruthenium and electrical characterization as a metal electrode
8	Thermal and Plasma-Enhanced ALD of Ta and Ti Oxide Thin Films from Alkylamide Precursors
9	Atomic layer deposition of Ta-based thin films: Reactions of alkylamide precursor with various reactants
10	Optical emission spectroscopy as a tool for studying, optimizing, and monitoring plasma-assisted atomic layer deposition processes
11	Properties of conductive nitride films prepared by plasma enhanced atomic layer deposition using quartz and sapphire plasma sources
12	Reaction mechanisms of atomic layer deposition of TaNx from Ta(NMe2)5 precursor and H2-based plasmas
13	Ru thin film grown on TaN by plasma enhanced atomic layer deposition
14	Thermal and plasma enhanced atomic layer deposition ruthenium and electrical characterization as a metal electrode

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