PDMAT, (NMe2)5Ta, Pentakis (DiMethylAmido) Tantalum, CAS# 19824-59-0

Where to buy

NumberVendorLink
1Strem Chemicals, Inc.Pentakis(dimethylamino)tantalum(V), 99%
2EreztechPentakis(dimethylamino)tantalum(V) (99.99%-Ta)
3GelestTantalum Pentakis(Dimethylamide)

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Plasma Enhanced Atomic Layer Deposition Film Publications

Your search for publications using this chemistry returned 22 record(s). If there are too many results, you may want to use the multi-factor search to narrow the results.

NumberTitle
1Atomic layer deposition of amorphous Ni-Ta-N films for Cu diffusion barrier
2Atomic Layer Deposition of Ruthenium and Ruthenium-oxide Thin Films by Using a Ru(EtCp)2 Precursor and Oxygen Gas
3Atomic layer deposition of Ta-based thin films: Reactions of alkylamide precursor with various reactants
4Comparative Studies of Atomic Layer Deposition and Plasma-Enhanced Atomic Layer Deposition Ta2O5 and the Effects on Electrical Properties of In situ Nitridation
5Ion and Photon Surface Interaction during Remote Plasma ALD of Metal Oxides
6Low Temperature Plasma-Enhanced Atomic Layer Deposition of Metal Oxide Thin Films
7Optical emission spectroscopy as a tool for studying, optimizing, and monitoring plasma-assisted atomic layer deposition processes
8Plasma-assisted atomic layer deposition of Ta2O5 from alkylamide precursor and remote O2 plasma
9Thermal and plasma enhanced atomic layer deposition ruthenium and electrical characterization as a metal electrode
10Thermal and Plasma-Enhanced ALD of Ta and Ti Oxide Thin Films from Alkylamide Precursors
11Atomic layer deposition of Ta-based thin films: Reactions of alkylamide precursor with various reactants
12Diffusion barrier properties of TaNx films prepared by plasma enhanced atomic layer deposition from PDMAT with N2 or NH3 plasma
13Optical emission spectroscopy as a tool for studying, optimizing, and monitoring plasma-assisted atomic layer deposition processes
14Plasma-enhanced Atomic Layer Deposition of TaN Film and Its Resistance to Copper Diffusion
15Properties of conductive nitride films prepared by plasma enhanced atomic layer deposition using quartz and sapphire plasma sources
16Reaction mechanisms of atomic layer deposition of TaNx from Ta(NMe2)5 precursor and H2-based plasmas
17Robust TaNx diffusion barrier for Cu-interconnect technology with subnanometer thickness by metal-organic plasma-enhanced atomic layer deposition
18Ru thin film grown on TaN by plasma enhanced atomic layer deposition
19Synthesis and in situ characterization of low-resistivity TaNx films by remote plasma atomic layer deposition
20Ta-rich atomic layer deposition TaN adhesion layer for Cu interconnects by means of plasma-enhanced atomic layer deposition
21Thermal and plasma enhanced atomic layer deposition ruthenium and electrical characterization as a metal electrode
22Comparative Studies of Atomic Layer Deposition and Plasma-Enhanced Atomic Layer Deposition Ta2O5 and the Effects on Electrical Properties of In situ Nitridation


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