PDMAT, (NMe2)5Ta, Pentakis (DiMethylAmido) Tantalum, CAS# 19824-59-0

Where to buy

NumberVendorRegionLink
1Strem Chemicals, Inc.🇺🇸Pentakis(dimethylamino)tantalum(V), 99%
2Pegasus Chemicals🇬🇧Pentakis(dimethylamino)tantalum
3Ereztech🇺🇸PDMAT
4DOCK/CHEMICALS🇩🇪Pentakis(dimethylamido)tantalum
5Gelest🇺🇸Tantalum Pentakis(Dimethylamide)

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Plasma Enhanced Atomic Layer Deposition Film Publications

Your search for publications using this chemistry returned 25 record(s). If there are too many results, you may want to use the multi-factor search to narrow the results.

NumberTitle
1Atomic layer deposition of Ta-based thin films: Reactions of alkylamide precursor with various reactants
2Comparative Studies of Atomic Layer Deposition and Plasma-Enhanced Atomic Layer Deposition Ta2O5 and the Effects on Electrical Properties of In situ Nitridation
3Diffusion barrier properties of TaNx films prepared by plasma enhanced atomic layer deposition from PDMAT with N2 or NH3 plasma
4Ta-rich atomic layer deposition TaN adhesion layer for Cu interconnects by means of plasma-enhanced atomic layer deposition
5Atomic Layer Deposition of Ruthenium and Ruthenium-oxide Thin Films by Using a Ru(EtCp)2 Precursor and Oxygen Gas
6Optical emission spectroscopy as a tool for studying, optimizing, and monitoring plasma-assisted atomic layer deposition processes
7Reaction mechanisms of atomic layer deposition of TaNx from Ta(NMe2)5 precursor and H2-based plasmas
8Synthesis and in situ characterization of low-resistivity TaNx films by remote plasma atomic layer deposition
9In vacuo investigations on the nucleation of TaCN by plasma enhanced atomic layer deposition
10Optical emission spectroscopy as a tool for studying, optimizing, and monitoring plasma-assisted atomic layer deposition processes
11Thermal and Plasma-Enhanced ALD of Ta and Ti Oxide Thin Films from Alkylamide Precursors
12Properties of conductive nitride films prepared by plasma enhanced atomic layer deposition using quartz and sapphire plasma sources
13Thermal and plasma enhanced atomic layer deposition ruthenium and electrical characterization as a metal electrode
14Robust TaNx diffusion barrier for Cu-interconnect technology with subnanometer thickness by metal-organic plasma-enhanced atomic layer deposition
15Atomic layer deposition of Ta-based thin films: Reactions of alkylamide precursor with various reactants
16Thermal and plasma enhanced atomic layer deposition ruthenium and electrical characterization as a metal electrode
17Ru thin film grown on TaN by plasma enhanced atomic layer deposition
18Electrical and structural properties of conductive nitride films grown by plasma enhanced atomic layer deposition with significant ion bombardment effect
19TaCN growth with PDMAT and H2/Ar plasma by plasma enhanced atomic layer deposition
20Plasma-enhanced Atomic Layer Deposition of TaN Film and Its Resistance to Copper Diffusion
21Plasma-assisted atomic layer deposition of Ta2O5 from alkylamide precursor and remote O2 plasma
22Ion and Photon Surface Interaction during Remote Plasma ALD of Metal Oxides
23Comparative Studies of Atomic Layer Deposition and Plasma-Enhanced Atomic Layer Deposition Ta2O5 and the Effects on Electrical Properties of In situ Nitridation
24Atomic layer deposition of amorphous Ni-Ta-N films for Cu diffusion barrier
25Low Temperature Plasma-Enhanced Atomic Layer Deposition of Metal Oxide Thin Films