PDMAT, (NMe2)5Ta, Pentakis (DiMethylAmido) Tantalum, CAS# 19824-59-0

Where to buy

NumberVendorLink
1GelestTantalum Pentakis(Dimethylamide)
2Strem Chemicals, Inc.Pentakis(dimethylamino)tantalum(V), 99%
3EreztechPentakis(dimethylamino)tantalum(V) (99.99%-Ta)

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Plasma Enhanced Atomic Layer Deposition Film Publications

Your search for publications using this chemistry returned 17 record(s). If there are too many results, you may want to use the multi-factor search to narrow the results.

NumberTitle
1Atomic layer deposition of amorphous Ni-Ta-N films for Cu diffusion barrier
2Atomic Layer Deposition of Ruthenium and Ruthenium-oxide Thin Films by Using a Ru(EtCp)2 Precursor and Oxygen Gas
3Atomic layer deposition of Ta-based thin films: Reactions of alkylamide precursor with various reactants
4Ion and Photon Surface Interaction during Remote Plasma ALD of Metal Oxides
5Low Temperature Plasma-Enhanced Atomic Layer Deposition of Metal Oxide Thin Films
6Optical emission spectroscopy as a tool for studying, optimizing, and monitoring plasma-assisted atomic layer deposition processes
7Thermal and plasma enhanced atomic layer deposition ruthenium and electrical characterization as a metal electrode
8Thermal and Plasma-Enhanced ALD of Ta and Ti Oxide Thin Films from Alkylamide Precursors
9Atomic layer deposition of Ta-based thin films: Reactions of alkylamide precursor with various reactants
10Optical emission spectroscopy as a tool for studying, optimizing, and monitoring plasma-assisted atomic layer deposition processes
11Plasma-enhanced Atomic Layer Deposition of TaN Film and Its Resistance to Copper Diffusion
12Properties of conductive nitride films prepared by plasma enhanced atomic layer deposition using quartz and sapphire plasma sources
13Reaction mechanisms of atomic layer deposition of TaNx from Ta(NMe2)5 precursor and H2-based plasmas
14Robust TaNx diffusion barrier for Cu-interconnect technology with subnanometer thickness by metal-organic plasma-enhanced atomic layer deposition
15Ru thin film grown on TaN by plasma enhanced atomic layer deposition
16Ta-rich atomic layer deposition TaN adhesion layer for Cu interconnects by means of plasma-enhanced atomic layer deposition
17Thermal and plasma enhanced atomic layer deposition ruthenium and electrical characterization as a metal electrode


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