PDMAT, (NMe₂)₅Ta, Pentakis (DiMethylAmido) Tantalum, CAS# 19824-59-0

Where to buy

Number	Vendor	Link
1	Ereztech	Pentakis(dimethylamino)tantalum(V) (99.99%-Ta)

Plasma Enhanced Atomic Layer Deposition Film Publications

Your search for publications using this chemistry returned 23 record(s). If there are too many results, you may want to use the multi-factor search to narrow the results.

Number	Title
1	Atomic layer deposition of amorphous Ni-Ta-N films for Cu diffusion barrier
2	Atomic Layer Deposition of Ruthenium and Ruthenium-oxide Thin Films by Using a Ru(EtCp)2 Precursor and Oxygen Gas
3	Atomic layer deposition of Ta-based thin films: Reactions of alkylamide precursor with various reactants
4	Comparative Studies of Atomic Layer Deposition and Plasma-Enhanced Atomic Layer Deposition Ta2O5 and the Effects on Electrical Properties of In situ Nitridation
5	Ion and Photon Surface Interaction during Remote Plasma ALD of Metal Oxides
6	Low Temperature Plasma-Enhanced Atomic Layer Deposition of Metal Oxide Thin Films
7	Optical emission spectroscopy as a tool for studying, optimizing, and monitoring plasma-assisted atomic layer deposition processes
8	Plasma-assisted atomic layer deposition of Ta2O5 from alkylamide precursor and remote O2 plasma
9	Thermal and plasma enhanced atomic layer deposition ruthenium and electrical characterization as a metal electrode
10	Thermal and Plasma-Enhanced ALD of Ta and Ti Oxide Thin Films from Alkylamide Precursors
11	TaCN growth with PDMAT and H2/Ar plasma by plasma enhanced atomic layer deposition
12	Atomic layer deposition of Ta-based thin films: Reactions of alkylamide precursor with various reactants
13	Diffusion barrier properties of TaNx films prepared by plasma enhanced atomic layer deposition from PDMAT with N2 or NH3 plasma
14	Optical emission spectroscopy as a tool for studying, optimizing, and monitoring plasma-assisted atomic layer deposition processes
15	Plasma-enhanced Atomic Layer Deposition of TaN Film and Its Resistance to Copper Diffusion
16	Properties of conductive nitride films prepared by plasma enhanced atomic layer deposition using quartz and sapphire plasma sources
17	Reaction mechanisms of atomic layer deposition of TaNx from Ta(NMe2)5 precursor and H2-based plasmas
18	Robust TaNx diffusion barrier for Cu-interconnect technology with subnanometer thickness by metal-organic plasma-enhanced atomic layer deposition
19	Ru thin film grown on TaN by plasma enhanced atomic layer deposition
20	Synthesis and in situ characterization of low-resistivity TaNx films by remote plasma atomic layer deposition
21	Ta-rich atomic layer deposition TaN adhesion layer for Cu interconnects by means of plasma-enhanced atomic layer deposition
22	Thermal and plasma enhanced atomic layer deposition ruthenium and electrical characterization as a metal electrode
23	Comparative Studies of Atomic Layer Deposition and Plasma-Enhanced Atomic Layer Deposition Ta2O5 and the Effects on Electrical Properties of In situ Nitridation

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