|1||Strem Chemicals, Inc.||Pentakis(dimethylamino)tantalum(V), 99%|
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Your search for publications using this chemistry returned 17 record(s). If there are too many results, you may want to use the multi-factor search to narrow the results.
|1||Atomic layer deposition of amorphous Ni-Ta-N films for Cu diffusion barrier|
|2||Atomic Layer Deposition of Ruthenium and Ruthenium-oxide Thin Films by Using a Ru(EtCp)2 Precursor and Oxygen Gas|
|3||Atomic layer deposition of Ta-based thin films: Reactions of alkylamide precursor with various reactants|
|4||Ion and Photon Surface Interaction during Remote Plasma ALD of Metal Oxides|
|5||Low Temperature Plasma-Enhanced Atomic Layer Deposition of Metal Oxide Thin Films|
|6||Optical emission spectroscopy as a tool for studying, optimizing, and monitoring plasma-assisted atomic layer deposition processes|
|7||Thermal and plasma enhanced atomic layer deposition ruthenium and electrical characterization as a metal electrode|
|8||Thermal and Plasma-Enhanced ALD of Ta and Ti Oxide Thin Films from Alkylamide Precursors|
|9||Atomic layer deposition of Ta-based thin films: Reactions of alkylamide precursor with various reactants|
|10||Optical emission spectroscopy as a tool for studying, optimizing, and monitoring plasma-assisted atomic layer deposition processes|
|11||Plasma-enhanced Atomic Layer Deposition of TaN Film and Its Resistance to Copper Diffusion|
|12||Properties of conductive nitride films prepared by plasma enhanced atomic layer deposition using quartz and sapphire plasma sources|
|13||Reaction mechanisms of atomic layer deposition of TaNx from Ta(NMe2)5 precursor and H2-based plasmas|
|14||Robust TaNx diffusion barrier for Cu-interconnect technology with subnanometer thickness by metal-organic plasma-enhanced atomic layer deposition|
|15||Ru thin film grown on TaN by plasma enhanced atomic layer deposition|
|16||Ta-rich atomic layer deposition TaN adhesion layer for Cu interconnects by means of plasma-enhanced atomic layer deposition|
|17||Thermal and plasma enhanced atomic layer deposition ruthenium and electrical characterization as a metal electrode|
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