PDMAT, (NMe2)5Ta, Pentakis (DiMethylAmido) Tantalum, CAS# 19824-59-0

Where to buy

NumberVendorRegionLink
1Gelest🇺🇸Tantalum Pentakis(Dimethylamide)
2DOCK/CHEMICALS🇩🇪Pentakis(dimethylamido)tantalum
3Pegasus Chemicals🇬🇧Pentakis(dimethylamino)tantalum
4Ereztech🇺🇸PDMAT
5Strem Chemicals, Inc.🇺🇸Pentakis(dimethylamino)tantalum(V), 99%

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Plasma Enhanced Atomic Layer Deposition Film Publications

Your search for publications using this chemistry returned 25 record(s). If there are too many results, you may want to use the multi-factor search to narrow the results.

NumberTitle
1Reaction mechanisms of atomic layer deposition of TaNx from Ta(NMe2)5 precursor and H2-based plasmas
2Ru thin film grown on TaN by plasma enhanced atomic layer deposition
3Ta-rich atomic layer deposition TaN adhesion layer for Cu interconnects by means of plasma-enhanced atomic layer deposition
4TaCN growth with PDMAT and H2/Ar plasma by plasma enhanced atomic layer deposition
5Low Temperature Plasma-Enhanced Atomic Layer Deposition of Metal Oxide Thin Films
6Optical emission spectroscopy as a tool for studying, optimizing, and monitoring plasma-assisted atomic layer deposition processes
7Diffusion barrier properties of TaNx films prepared by plasma enhanced atomic layer deposition from PDMAT with N2 or NH3 plasma
8Atomic layer deposition of Ta-based thin films: Reactions of alkylamide precursor with various reactants
9Thermal and plasma enhanced atomic layer deposition ruthenium and electrical characterization as a metal electrode
10Plasma-enhanced Atomic Layer Deposition of TaN Film and Its Resistance to Copper Diffusion
11Synthesis and in situ characterization of low-resistivity TaNx films by remote plasma atomic layer deposition
12Plasma-assisted atomic layer deposition of Ta2O5 from alkylamide precursor and remote O2 plasma
13Ion and Photon Surface Interaction during Remote Plasma ALD of Metal Oxides
14Atomic layer deposition of amorphous Ni-Ta-N films for Cu diffusion barrier
15Robust TaNx diffusion barrier for Cu-interconnect technology with subnanometer thickness by metal-organic plasma-enhanced atomic layer deposition
16Atomic layer deposition of Ta-based thin films: Reactions of alkylamide precursor with various reactants
17Comparative Studies of Atomic Layer Deposition and Plasma-Enhanced Atomic Layer Deposition Ta2O5 and the Effects on Electrical Properties of In situ Nitridation
18Thermal and plasma enhanced atomic layer deposition ruthenium and electrical characterization as a metal electrode
19In vacuo investigations on the nucleation of TaCN by plasma enhanced atomic layer deposition
20Atomic Layer Deposition of Ruthenium and Ruthenium-oxide Thin Films by Using a Ru(EtCp)2 Precursor and Oxygen Gas
21Thermal and Plasma-Enhanced ALD of Ta and Ti Oxide Thin Films from Alkylamide Precursors
22Properties of conductive nitride films prepared by plasma enhanced atomic layer deposition using quartz and sapphire plasma sources
23Optical emission spectroscopy as a tool for studying, optimizing, and monitoring plasma-assisted atomic layer deposition processes
24Electrical and structural properties of conductive nitride films grown by plasma enhanced atomic layer deposition with significant ion bombardment effect
25Comparative Studies of Atomic Layer Deposition and Plasma-Enhanced Atomic Layer Deposition Ta2O5 and the Effects on Electrical Properties of In situ Nitridation