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Ion and Photon Surface Interaction during Remote Plasma ALD of Metal Oxides
Type:
Journal
Info:
Journal of The Electrochemical Society, 158 (4) G88-G91 (2011)
Date:
2010-11-30
Author Information
| Name | Institution |
|---|---|
| H. B. Profijt | Eindhoven University of Technology |
| P. Kudlacek | Eindhoven University of Technology |
| Mauritius C. M. (Richard) van de Sanden | Eindhoven University of Technology |
| Erwin (W.M.M.) Kessels | Eindhoven University of Technology |
Films
Plasma Plasma Study
Plasma Plasma Study
Plasma Plasma Study
Plasma Al2O3
Plasma HfO2
Plasma TiO2
Plasma Ta2O5
Film/Plasma Properties
Characteristic: Ion Energy
Analysis: RFEA, Retarding Field Energy Analyzer
Characteristic: Ion Flux
Analysis: Custom
Characteristic: Electron Temperature, Te
Analysis: Langmuir Probe
Characteristic: Electron Density, ne
Analysis: Langmuir Probe
Characteristic: Plasma Species
Analysis: OES, Optical Emission Spectroscopy
Characteristic: Plasma Species
Analysis: OES, Optical Emission Spectroscopy
Characteristic: Minority Carrier Lifetime
Analysis: Photoconductance
Substrates
| Silicon |
Notes
| Paper available as chapter 5 in on-line thesis. |
| 688 |