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Publication Information

Title: Ion and Photon Surface Interaction during Remote Plasma ALD of Metal Oxides

Type: Journal

Info: Journal of The Electrochemical Society, 158 (4) G88-G91 (2011)

Date: 2010-11-30

DOI: http://dx.doi.org/10.1149/1.3552663

Author Information

Name

Institution

Eindhoven University of Technology

Eindhoven University of Technology

Eindhoven University of Technology

Eindhoven University of Technology

Films

Deposition Temperature Range N/A

7782-44-7

Deposition Temperature Range N/A

7782-44-7

Deposition Temperature Range N/A

7782-44-7

Deposition Temperature Range N/A

75-24-1

7782-44-7

Deposition Temperature Range N/A

352535-01-4

7782-44-7

Deposition Temperature Range N/A

546-68-9

7782-44-7

Deposition Temperature Range N/A

19824-59-0

7782-44-7

Film/Plasma Properties

Characteristic

Analysis

Diagnostic

Ion Energy

RFEA, Retarding Field Energy Analyzer

Impedans Semion

Ion Flux

Custom

Custom

Electron Temperature, Te

Langmuir Probe

Custom

Electron Density, ne

Langmuir Probe

Custom

Plasma Species

OES, Optical Emission Spectroscopy

Ocean Optics USB 2000

Plasma Species

OES, Optical Emission Spectroscopy

McPherson 234/302 monochrometer

Minority Carrier Lifetime

Photoconductance

Sinton WCT-100

Substrates

Silicon

Keywords

Solar

Passivation

Notes

Paper available as chapter 5 in on-line thesis.

688


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