Oxford Instruments OpAL Plasma Enhanced Atomic Layer Deposition Film Publications

Your search for plasma enhanced atomic layer deposition publications using Oxford Instruments OpAL hardware returned 55 records. If there are too many results, you may want to use the multi-factor search to narrow the results.

Number	Title
1	'Zero-charge' SiO2/Al2O3 stacks for the simultaneous passivation of n+ and p+ doped silicon surfaces by atomic layer deposition
2	Antireflection Coatings for Strongly Curved Glass Lenses by Atomic Layer Deposition
3	Atomic layer deposition for perovskite solar cells: research status, opportunities and challenges
4	Atomic layer deposition of AlN for thin membranes using trimethylaluminum and H2/N2 plasma
5	Atomic layer deposition of high-mobility hydrogen-doped zinc oxide
6	Atomic Layer Deposition of Niobium Nitride from Different Precursors
7	Atomic layer deposition precursor step repetition and surface plasma pretreatment influence on semiconductor-insulator-semiconductor heterojunction solar cell
8	Background-Free Bottom-Up Plasmonic Arrays with Increased Sensitivity, Specificity and Shelf Life for SERS Detection Schemes
9	Breakdown and Protection of ALD Moisture Barrier Thin Films
10	Comparative study of ALD SiO2 thin films for optical applications
11	Comparison of gate dielectric plasma damage from plasma-enhanced atomic layer deposited and magnetron sputtered TiN metal gates
12	Composite materials and nanoporous thin layers made by atomic layer deposition
13	Development and Evaluation of a Nanometer-Scale Hemocompatible and Antithrombotic Coating Technology Platform for Commercial Intracranial Stents and Flow Diverters
14	Electrically Excited Plasmonic Nanoruler for Biomolecule Detection
15	Electron-selective contacts via ultra-thin organic interface dipoles for silicon organic heterojunction solar cells
16	Encapsulation method for atom probe tomography analysis of nanoparticles
17	Excellent Si surface passivation by low temperature SiO2 using an ultrathin Al2O3 capping film
18	Fabrication and deformation of three-dimensional hollow ceramic nanostructures
19	Film properties of low temperature HfO2 grown with H2O, O3, or remote O2-plasma
20	Firing Stable Al2O3/SiNx Layer Stack Passivation for the Front Side Boron Emitter of n-type Silicon Solar Cells
21	Gadolinium nitride films deposited using a PEALD based process
22	Hafnia and alumina on sulphur passivated germanium
23	High-efficiency embedded transmission grating
24	High-Reflective Coatings For Ground and Space Based Applications
25	Improved Gate Dielectric Deposition and Enhanced Electrical Stability for Single-Layer MoS2 MOSFET with an AlN Interfacial Layer
26	Index matching at the nanoscale: light scattering by core-shell Si/SiOx nanowires
27	Influence of annealing and Al2O3 properties on the hydrogen-induced passivation of the Si/SiO2 interface
28	Influence of the Deposition Temperature on the c-Si Surface Passivation by Al2O3 Films Synthesized by ALD and PECVD
29	Influence of the Oxidant on the Chemical and Field-Effect Passivation of Si by ALD Al2O3
30	Influence of the oxygen plasma parameters on the atomic layer deposition of titanium dioxide
31	Inhibition of Crystal Growth during Plasma Enhanced Atomic Layer Deposition by Applying BIAS
32	Ion and Photon Surface Interaction during Remote Plasma ALD of Metal Oxides
33	Lifetime improvement of micro-fabricated alkali vapor cells by atomic layer deposited wall coatings
34	Low EOT GeO2/Al2O3/HfO2 on Ge substrate using ultrathin Al deposition
35	Low Temperature Plasma-Enhanced Atomic Layer Deposition of Metal Oxide Thin Films
36	Materials Pushing the Application Limits of Wire Grid Polarizers further into the Deep Ultraviolet Spectral Range
37	Mechanical characterization of hollow ceramic nanolattices
38	Mechanical, structural, and optical properties of PEALD metallic oxides for optical applications
39	Metal-oxide-based hole-selective tunneling contacts for crystalline silicon solar cells
40	Method of Fabrication for Encapsulated Polarizing Resonant Gratings
41	Nanoporous SiO2 thin films made by atomic layer deposition and atomic etching
42	On the Control of the Fixed Charge Densities in Al2O3 Based Silicon Surface Passivation Schemes
43	Performance and retention characteristics of nanocrystalline Si floating gate memory with an Al2O3 tunnel layer fabricated by plasma-enhanced atomic layer deposition
44	Plasma-Assisted ALD for the Conformal Deposition of SiO2: Process, Material and Electronic Properties
45	Plasma-Assisted Atomic Layer Deposition of Low Temperature SiO2
46	Plasma-enhanced and thermal atomic layer deposition of Al2O3 using dimethylaluminum isopropoxide, [Al(CH3)2(μ-OiPr)]2, as an alternative aluminum precursor
47	Plasma-enhanced atomic layer deposition and etching of high-k gadolinium oxide
48	Plasma-Enhanced Atomic Layer Deposition of AlN Epitaxial Thin Film for AlN/GaN Heterostructure TFTs
49	Role of field-effect on c-Si surface passivation by ultrathin (2-20 nm) atomic layer deposited Al2O3
50	Silicon surface passivation by ultrathin Al2O3 films synthesized by thermal and plasma atomic layer deposition
51	Stability of Al2O3 and Al2O3/a-Six:H stacks for surface passivation of crystalline silicon
52	Status and prospects of Al2O3-based surface passivation schemes for silicon solar cells
53	Superconducting niobium nitride thin films deposited by metal organic plasma-enhanced atomic layer deposition
54	Trapped charge densities in Al2O3-based silicon surface passivation layers
55	Ultra-Thin Aluminium Oxide Films Deposited by Plasma-Enhanced Atomic Layer Deposition for Corrosion Protection

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