Oxford Instruments OpAL Plasma Enhanced Atomic Layer Deposition Film Publications

Your search for plasma enhanced atomic layer deposition publications using Oxford Instruments OpAL hardware returned 62 records. If there are too many results, you may want to use the multi-factor search to narrow the results.

NumberTitle
1'Zero-charge' SiO2/Al2O3 stacks for the simultaneous passivation of n+ and p+ doped silicon surfaces by atomic layer deposition
2A high speed PE-ALD ZnO Schottky diode rectifier with low interface-state density
3Antireflection Coating on PMMA Substrates by Atomic Layer Deposition
4Antireflection Coatings for Strongly Curved Glass Lenses by Atomic Layer Deposition
5Area-Selective Atomic Layer Deposition of In2O3:H Using a µ-Plasma Printer for Local Area Activation
6Atomic layer deposition for perovskite solar cells: research status, opportunities and challenges
7Atomic layer deposition of AlN for thin membranes using trimethylaluminum and H2/N2 plasma
8Atomic layer deposition of high-mobility hydrogen-doped zinc oxide
9Atomic Layer Deposition of Niobium Nitride from Different Precursors
10Atomic layer deposition precursor step repetition and surface plasma pretreatment influence on semiconductor-insulator-semiconductor heterojunction solar cell
11Background-Free Bottom-Up Plasmonic Arrays with Increased Sensitivity, Specificity and Shelf Life for SERS Detection Schemes
12Breakdown and Protection of ALD Moisture Barrier Thin Films
13Comparative study of ALD SiO2 thin films for optical applications
14Comparison of gate dielectric plasma damage from plasma-enhanced atomic layer deposited and magnetron sputtered TiN metal gates
15Composite materials and nanoporous thin layers made by atomic layer deposition
16Development and Evaluation of a Nanometer-Scale Hemocompatible and Antithrombotic Coating Technology Platform for Commercial Intracranial Stents and Flow Diverters
17Electrically Excited Plasmonic Nanoruler for Biomolecule Detection
18Electron-selective contacts via ultra-thin organic interface dipoles for silicon organic heterojunction solar cells
19Encapsulation method for atom probe tomography analysis of nanoparticles
20Excellent Si surface passivation by low temperature SiO2 using an ultrathin Al2O3 capping film
21Fabrication and deformation of three-dimensional hollow ceramic nanostructures
22Film properties of low temperature HfO2 grown with H2O, O3, or remote O2-plasma
23Firing Stable Al2O3/SiNx Layer Stack Passivation for the Front Side Boron Emitter of n-type Silicon Solar Cells
24Gadolinium nitride films deposited using a PEALD based process
25Hafnia and alumina on sulphur passivated germanium
26High-efficiency embedded transmission grating
27High-Reflective Coatings For Ground and Space Based Applications
28Improved Gate Dielectric Deposition and Enhanced Electrical Stability for Single-Layer MoS2 MOSFET with an AlN Interfacial Layer
29Index matching at the nanoscale: light scattering by core-shell Si/SiOx nanowires
30Influence of annealing and Al2O3 properties on the hydrogen-induced passivation of the Si/SiO2 interface
31Influence of the Deposition Temperature on the c-Si Surface Passivation by Al2O3 Films Synthesized by ALD and PECVD
32Influence of the Oxidant on the Chemical and Field-Effect Passivation of Si by ALD Al2O3
33Influence of the oxygen plasma parameters on the atomic layer deposition of titanium dioxide
34Inhibition of Crystal Growth during Plasma Enhanced Atomic Layer Deposition by Applying BIAS
35Ion and Photon Surface Interaction during Remote Plasma ALD of Metal Oxides
36Lifetime improvement of micro-fabricated alkali vapor cells by atomic layer deposited wall coatings
37Low EOT GeO2/Al2O3/HfO2 on Ge substrate using ultrathin Al deposition
38Low Temperature Plasma-Enhanced Atomic Layer Deposition of Metal Oxide Thin Films
39Low-Temperature Plasma-Assisted Atomic-Layer-Deposited SnO2 as an Electron Transport Layer in Planar Perovskite Solar Cells
40Materials Pushing the Application Limits of Wire Grid Polarizers further into the Deep Ultraviolet Spectral Range
41Mechanical characterization of hollow ceramic nanolattices
42Mechanical, structural, and optical properties of PEALD metallic oxides for optical applications
43Metal-oxide-based hole-selective tunneling contacts for crystalline silicon solar cells
44Method of Fabrication for Encapsulated Polarizing Resonant Gratings
45Nanoporous SiO2 thin films made by atomic layer deposition and atomic etching
46Nanowire single-photon detectors made of atomic layer-deposited niobium nitride
47On the Control of the Fixed Charge Densities in Al2O3 Based Silicon Surface Passivation Schemes
48Performance and retention characteristics of nanocrystalline Si floating gate memory with an Al2O3 tunnel layer fabricated by plasma-enhanced atomic layer deposition
49Plasma-Assisted ALD for the Conformal Deposition of SiO2: Process, Material and Electronic Properties
50Plasma-Assisted Atomic Layer Deposition of Low Temperature SiO2
51Plasma-enhanced and thermal atomic layer deposition of Al2O3 using dimethylaluminum isopropoxide, [Al(CH3)2(μ-OiPr)]2, as an alternative aluminum precursor
52Plasma-enhanced atomic layer deposition and etching of high-k gadolinium oxide
53Plasma-Enhanced Atomic Layer Deposition of AlN Epitaxial Thin Film for AlN/GaN Heterostructure TFTs
54Role of field-effect on c-Si surface passivation by ultrathin (2-20 nm) atomic layer deposited Al2O3
55Schottky Diodes on ZnO Thin Films Grown by Plasma-Enhanced Atomic Layer Deposition
56Silicon surface passivation by ultrathin Al2O3 films synthesized by thermal and plasma atomic layer deposition
57Stability of Al2O3 and Al2O3/a-Six:H stacks for surface passivation of crystalline silicon
58Status and prospects of Al2O3-based surface passivation schemes for silicon solar cells
59Structural and electrical properties of ultrathin niobium nitride films grown by atomic layer deposition
60Superconducting niobium nitride thin films deposited by metal organic plasma-enhanced atomic layer deposition
61Trapped charge densities in Al2O3-based silicon surface passivation layers
62Ultra-Thin Aluminium Oxide Films Deposited by Plasma-Enhanced Atomic Layer Deposition for Corrosion Protection