Oxford Instruments OpAL Plasma Enhanced Atomic Layer Deposition Film Publications

Your search for plasma enhanced atomic layer deposition publications using Oxford Instruments OpAL hardware returned 68 records. If there are too many results, you may want to use the multi-factor search to narrow the results.

1Inhibition of Crystal Growth during Plasma Enhanced Atomic Layer Deposition by Applying BIAS
2Antireflection Coatings for Strongly Curved Glass Lenses by Atomic Layer Deposition
3Plasma-Enhanced Atomic Layer Deposition of AlN Epitaxial Thin Film for AlN/GaN Heterostructure TFTs
4Nanoporous SiO2 thin films made by atomic layer deposition and atomic etching
5Atomic layer deposition for perovskite solar cells: research status, opportunities and challenges
6Metal-oxide-based hole-selective tunneling contacts for crystalline silicon solar cells
7Composite materials and nanoporous thin layers made by atomic layer deposition
8Atomic layer deposition precursor step repetition and surface plasma pretreatment influence on semiconductor-insulator-semiconductor heterojunction solar cell
9Influence of oxygen source on the ferroelectric properties of ALD grown Hf1-xZrxO2 films
10Atomic layer deposition of AlN for thin membranes using trimethylaluminum and H2/N2 plasma
11Redshift and amplitude increase in the dielectric function of corundum-like α-(TixGa1-x)2O3
12Schottky Diodes on ZnO Thin Films Grown by Plasma-Enhanced Atomic Layer Deposition
13A high speed PE-ALD ZnO Schottky diode rectifier with low interface-state density
14Superconducting niobium nitride thin films deposited by metal organic plasma-enhanced atomic layer deposition
15Comparison of gate dielectric plasma damage from plasma-enhanced atomic layer deposited and magnetron sputtered TiN metal gates
16Atomic layer deposition of high-mobility hydrogen-doped zinc oxide
17Influence of the Oxidant on the Chemical and Field-Effect Passivation of Si by ALD Al2O3
18Influence of annealing and Al2O3 properties on the hydrogen-induced passivation of the Si/SiO2 interface
19Plasma-Assisted Atomic Layer Deposition of Low Temperature SiO2
20Influence of the oxygen plasma parameters on the atomic layer deposition of titanium dioxide
21Plasma-enhanced and thermal atomic layer deposition of Al2O3 using dimethylaluminum isopropoxide, [Al(CH3)2(μ-OiPr)]2, as an alternative aluminum precursor
22Atomic Layer Deposition of Niobium Nitride from Different Precursors
23Improved Gate Dielectric Deposition and Enhanced Electrical Stability for Single-Layer MoS2 MOSFET with an AlN Interfacial Layer
24Excellent Si surface passivation by low temperature SiO2 using an ultrathin Al2O3 capping film
25Role of field-effect on c-Si surface passivation by ultrathin (2-20 nm) atomic layer deposited Al2O3
26Electrically Excited Plasmonic Nanoruler for Biomolecule Detection
27Ion and Photon Surface Interaction during Remote Plasma ALD of Metal Oxides
28Electron-selective contacts via ultra-thin organic interface dipoles for silicon organic heterojunction solar cells
29Mechanical, structural, and optical properties of PEALD metallic oxides for optical applications
30Trapped charge densities in Al2O3-based silicon surface passivation layers
31Breakdown and Protection of ALD Moisture Barrier Thin Films
32Area-Selective Atomic Layer Deposition of In2O3:H Using a µ-Plasma Printer for Local Area Activation
33On the Control of the Fixed Charge Densities in Al2O3 Based Silicon Surface Passivation Schemes
34Comparative study of ALD SiO2 thin films for optical applications
35Fabrication and deformation of three-dimensional hollow ceramic nanostructures
36Development and Evaluation of a Nanometer-Scale Hemocompatible and Antithrombotic Coating Technology Platform for Commercial Intracranial Stents and Flow Diverters
37Silicon surface passivation by ultrathin Al2O3 films synthesized by thermal and plasma atomic layer deposition
38Status and prospects of Al2O3-based surface passivation schemes for silicon solar cells
39Antireflection Coating on PMMA Substrates by Atomic Layer Deposition
40Hafnia and alumina on sulphur passivated germanium
41Index matching at the nanoscale: light scattering by core-shell Si/SiOx nanowires
42Method of Fabrication for Encapsulated Polarizing Resonant Gratings
43Nanowire single-photon detectors made of atomic layer-deposited niobium nitride
44Background-Free Bottom-Up Plasmonic Arrays with Increased Sensitivity, Specificity and Shelf Life for SERS Detection Schemes
45Film properties of low temperature HfO2 grown with H2O, O3, or remote O2-plasma
46Ti Alloyed α-Ga2O3: Route towards Wide Band Gap Engineering
47Plasma-enhanced atomic layer deposition and etching of high-k gadolinium oxide
48Stability of Al2O3 and Al2O3/a-Six:H stacks for surface passivation of crystalline silicon
49Mechanical characterization of hollow ceramic nanolattices
50Low Temperature Plasma-Enhanced Atomic Layer Deposition of Metal Oxide Thin Films
51High-efficiency embedded transmission grating
52Ultra-Thin Aluminium Oxide Films Deposited by Plasma-Enhanced Atomic Layer Deposition for Corrosion Protection
53Low-Temperature Plasma-Assisted Atomic-Layer-Deposited SnO2 as an Electron Transport Layer in Planar Perovskite Solar Cells
54Lifetime improvement of micro-fabricated alkali vapor cells by atomic layer deposited wall coatings
55Wafer-level uniformity of atomic-layer-deposited niobium nitride thin films for quantum devices
56'Zero-charge' SiO2/Al2O3 stacks for the simultaneous passivation of n+ and p+ doped silicon surfaces by atomic layer deposition
57Atomic layer deposition of ferroelectric Hf0.5Zr0.5O2 on single-layer, CVD-grown graphene
58High-Reflective Coatings For Ground and Space Based Applications
59Materials Pushing the Application Limits of Wire Grid Polarizers further into the Deep Ultraviolet Spectral Range
60Performance and retention characteristics of nanocrystalline Si floating gate memory with an Al2O3 tunnel layer fabricated by plasma-enhanced atomic layer deposition
61Gadolinium nitride films deposited using a PEALD based process
62Influence of the Deposition Temperature on the c-Si Surface Passivation by Al2O3 Films Synthesized by ALD and PECVD
63α-Ga2O3 grown by low temperature atomic layer deposition on sapphire
64Low EOT GeO2/Al2O3/HfO2 on Ge substrate using ultrathin Al deposition
65Firing Stable Al2O3/SiNx Layer Stack Passivation for the Front Side Boron Emitter of n-type Silicon Solar Cells
66Plasma-Assisted ALD for the Conformal Deposition of SiO2: Process, Material and Electronic Properties
67Encapsulation method for atom probe tomography analysis of nanoparticles
68Structural and electrical properties of ultrathin niobium nitride films grown by atomic layer deposition