Oxford Instruments OpAL Plasma Enhanced Atomic Layer Deposition Film Publications
Your search for plasma enhanced atomic layer deposition publications using Oxford Instruments OpAL hardware returned 70 records. If there are too many results, you may want to use the multi-factor search to narrow the results.
| Number | Title |
|---|
| 1 | Plasma-enhanced atomic layer deposition and etching of high-k gadolinium oxide |
| 2 | Low-Temperature Plasma-Assisted Atomic-Layer-Deposited SnO2 as an Electron Transport Layer in Planar Perovskite Solar Cells |
| 3 | Gadolinium nitride films deposited using a PEALD based process |
| 4 | Antireflection Coating on PMMA Substrates by Atomic Layer Deposition |
| 5 | Index matching at the nanoscale: light scattering by core-shell Si/SiOx nanowires |
| 6 | Electron-selective contacts via ultra-thin organic interface dipoles for silicon organic heterojunction solar cells |
| 7 | Mechanical characterization of hollow ceramic nanolattices |
| 8 | Lifetime improvement of micro-fabricated alkali vapor cells by atomic layer deposited wall coatings |
| 9 | Influence of annealing and Al2O3 properties on the hydrogen-induced passivation of the Si/SiO2 interface |
| 10 | Breakdown and Protection of ALD Moisture Barrier Thin Films |
| 11 | High-Reflective Coatings For Ground and Space Based Applications |
| 12 | Background-Free Bottom-Up Plasmonic Arrays with Increased Sensitivity, Specificity and Shelf Life for SERS Detection Schemes |
| 13 | Superconducting niobium nitride thin films deposited by metal organic plasma-enhanced atomic layer deposition |
| 14 | Low Temperature Plasma-Enhanced Atomic Layer Deposition of Metal Oxide Thin Films |
| 15 | Comparison of gate dielectric plasma damage from plasma-enhanced atomic layer deposited and magnetron sputtered TiN metal gates |
| 16 | Atomic layer deposition of AlN for thin membranes using trimethylaluminum and H2/N2 plasma |
| 17 | Atomic layer deposition of high-mobility hydrogen-doped zinc oxide |
| 18 | Atomic layer deposition precursor step repetition and surface plasma pretreatment influence on semiconductor-insulator-semiconductor heterojunction solar cell |
| 19 | Performance and retention characteristics of nanocrystalline Si floating gate memory with an Al2O3 tunnel layer fabricated by plasma-enhanced atomic layer deposition |
| 20 | Mechanical, structural, and optical properties of PEALD metallic oxides for optical applications |
| 21 | Firing Stable Al2O3/SiNx Layer Stack Passivation for the Front Side Boron Emitter of n-type Silicon Solar Cells |
| 22 | Nanowire single-photon detectors made of atomic layer-deposited niobium nitride |
| 23 | Plasma-Assisted Atomic Layer Deposition of Low Temperature SiO2 |
| 24 | Atomic layer deposition for perovskite solar cells: research status, opportunities and challenges |
| 25 | Hafnia and alumina on sulphur passivated germanium |
| 26 | On the Control of the Fixed Charge Densities in Al2O3 Based Silicon Surface Passivation Schemes |
| 27 | Status and prospects of Al2O3-based surface passivation schemes for silicon solar cells |
| 28 | Plasma-Enhanced Atomic Layer Deposition of AlN Epitaxial Thin Film for AlN/GaN Heterostructure TFTs |
| 29 | Encapsulation method for atom probe tomography analysis of nanoparticles |
| 30 | Ti Alloyed α-Ga2O3: Route towards Wide Band Gap Engineering |
| 31 | Method of Fabrication for Encapsulated Polarizing Resonant Gratings |
| 32 | High-efficiency embedded transmission grating |
| 33 | Silicon surface passivation by ultrathin Al2O3 films synthesized by thermal and plasma atomic layer deposition |
| 34 | Improved Gate Dielectric Deposition and Enhanced Electrical Stability for Single-Layer MoS2 MOSFET with an AlN Interfacial Layer |
| 35 | A high speed PE-ALD ZnO Schottky diode rectifier with low interface-state density |
| 36 | Metal-oxide-based hole-selective tunneling contacts for crystalline silicon solar cells |
| 37 | Temporal and spatial atomic layer deposition of Al-doped zinc oxide as a passivating conductive contact for silicon solar cells |
| 38 | Wafer-level uniformity of atomic-layer-deposited niobium nitride thin films for quantum devices |
| 39 | Schottky Diodes on ZnO Thin Films Grown by Plasma-Enhanced Atomic Layer Deposition |
| 40 | Plasma-Assisted ALD for the Conformal Deposition of SiO2: Process, Material and Electronic Properties |
| 41 | Comparative study of ALD SiO2 thin films for optical applications |
| 42 | Excellent Si surface passivation by low temperature SiO2 using an ultrathin Al2O3 capping film |
| 43 | Inhibition of Crystal Growth during Plasma Enhanced Atomic Layer Deposition by Applying BIAS |
| 44 | Nanoporous SiO2 thin films made by atomic layer deposition and atomic etching |
| 45 | Influence of the Deposition Temperature on the c-Si Surface Passivation by Al2O3 Films Synthesized by ALD and PECVD |
| 46 | Materials Pushing the Application Limits of Wire Grid Polarizers further into the Deep Ultraviolet Spectral Range |
| 47 | Area-Selective Atomic Layer Deposition of In2O3:H Using a µ-Plasma Printer for Local Area Activation |
| 48 | α-Ga2O3 grown by low temperature atomic layer deposition on sapphire |
| 49 | Fabrication and deformation of three-dimensional hollow ceramic nanostructures |
| 50 | Antireflection Coatings for Strongly Curved Glass Lenses by Atomic Layer Deposition |
| 51 | Ion and Photon Surface Interaction during Remote Plasma ALD of Metal Oxides |
| 52 | Redshift and amplitude increase in the dielectric function of corundum-like α-(TixGa1-x)2O3 |
| 53 | Development and Evaluation of a Nanometer-Scale Hemocompatible and Antithrombotic Coating Technology Platform for Commercial Intracranial Stents and Flow Diverters |
| 54 | Ultra-Thin Aluminium Oxide Films Deposited by Plasma-Enhanced Atomic Layer Deposition for Corrosion Protection |
| 55 | Atomic Layer Deposition of Niobium Nitride from Different Precursors |
| 56 | Atomic layer deposition of ferroelectric Hf0.5Zr0.5O2 on single-layer, CVD-grown graphene |
| 57 | Influence of the oxygen plasma parameters on the atomic layer deposition of titanium dioxide |
| 58 | Role of field-effect on c-Si surface passivation by ultrathin (2-20 nm) atomic layer deposited Al2O3 |
| 59 | Trapped charge densities in Al2O3-based silicon surface passivation layers |
| 60 | Influence of oxygen source on the ferroelectric properties of ALD grown Hf1-xZrxO2 films |
| 61 | Influence of the Oxidant on the Chemical and Field-Effect Passivation of Si by ALD Al2O3 |
| 62 | Low temperature growth and optical properties of α-Ga2O3 deposited on sapphire by plasma enhanced atomic layer deposition |
| 63 | Plasma-enhanced and thermal atomic layer deposition of Al2O3 using dimethylaluminum isopropoxide, [Al(CH3)2(μ-OiPr)]2, as an alternative aluminum precursor |
| 64 | 'Zero-charge' SiO2/Al2O3 stacks for the simultaneous passivation of n+ and p+ doped silicon surfaces by atomic layer deposition |
| 65 | Film properties of low temperature HfO2 grown with H2O, O3, or remote O2-plasma |
| 66 | Low EOT GeO2/Al2O3/HfO2 on Ge substrate using ultrathin Al deposition |
| 67 | Electrically Excited Plasmonic Nanoruler for Biomolecule Detection |
| 68 | Composite materials and nanoporous thin layers made by atomic layer deposition |
| 69 | Stability of Al2O3 and Al2O3/a-Six:H stacks for surface passivation of crystalline silicon |
| 70 | Structural and electrical properties of ultrathin niobium nitride films grown by atomic layer deposition |
