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Oxford Instruments OpAL Plasma Enhanced Atomic Layer Deposition Film Publications

Your search for plasma enhanced atomic layer deposition publications using Oxford Instruments OpAL hardware returned 55 records. If there are too many results, you may want to use the multi-factor search to narrow the results.

1'Zero-charge' SiO2/Al2O3 stacks for the simultaneous passivation of n+ and p+ doped silicon surfaces by atomic layer deposition
2Antireflection Coatings for Strongly Curved Glass Lenses by Atomic Layer Deposition
3Atomic layer deposition for perovskite solar cells: research status, opportunities and challenges
4Atomic layer deposition of AlN for thin membranes using trimethylaluminum and H2/N2 plasma
5Atomic layer deposition of high-mobility hydrogen-doped zinc oxide
6Atomic Layer Deposition of Niobium Nitride from Different Precursors
7Atomic layer deposition precursor step repetition and surface plasma pretreatment influence on semiconductor-insulator-semiconductor heterojunction solar cell
8Background-Free Bottom-Up Plasmonic Arrays with Increased Sensitivity, Specificity and Shelf Life for SERS Detection Schemes
9Breakdown and Protection of ALD Moisture Barrier Thin Films
10Comparative study of ALD SiO2 thin films for optical applications
11Comparison of gate dielectric plasma damage from plasma-enhanced atomic layer deposited and magnetron sputtered TiN metal gates
12Composite materials and nanoporous thin layers made by atomic layer deposition
13Development and Evaluation of a Nanometer-Scale Hemocompatible and Antithrombotic Coating Technology Platform for Commercial Intracranial Stents and Flow Diverters
14Electrically Excited Plasmonic Nanoruler for Biomolecule Detection
15Electron-selective contacts via ultra-thin organic interface dipoles for silicon organic heterojunction solar cells
16Encapsulation method for atom probe tomography analysis of nanoparticles
17Excellent Si surface passivation by low temperature SiO2 using an ultrathin Al2O3 capping film
18Fabrication and deformation of three-dimensional hollow ceramic nanostructures
19Film properties of low temperature HfO2 grown with H2O, O3, or remote O2-plasma
20Firing Stable Al2O3/SiNx Layer Stack Passivation for the Front Side Boron Emitter of n-type Silicon Solar Cells
21Gadolinium nitride films deposited using a PEALD based process
22Hafnia and alumina on sulphur passivated germanium
23High-efficiency embedded transmission grating
24High-Reflective Coatings For Ground and Space Based Applications
25Improved Gate Dielectric Deposition and Enhanced Electrical Stability for Single-Layer MoS2 MOSFET with an AlN Interfacial Layer
26Index matching at the nanoscale: light scattering by core-shell Si/SiOx nanowires
27Influence of annealing and Al2O3 properties on the hydrogen-induced passivation of the Si/SiO2 interface
28Influence of the Deposition Temperature on the c-Si Surface Passivation by Al2O3 Films Synthesized by ALD and PECVD
29Influence of the Oxidant on the Chemical and Field-Effect Passivation of Si by ALD Al2O3
30Influence of the oxygen plasma parameters on the atomic layer deposition of titanium dioxide
31Inhibition of Crystal Growth during Plasma Enhanced Atomic Layer Deposition by Applying BIAS
32Ion and Photon Surface Interaction during Remote Plasma ALD of Metal Oxides
33Lifetime improvement of micro-fabricated alkali vapor cells by atomic layer deposited wall coatings
34Low EOT GeO2/Al2O3/HfO2 on Ge substrate using ultrathin Al deposition
35Low Temperature Plasma-Enhanced Atomic Layer Deposition of Metal Oxide Thin Films
36Materials Pushing the Application Limits of Wire Grid Polarizers further into the Deep Ultraviolet Spectral Range
37Mechanical characterization of hollow ceramic nanolattices
38Mechanical, structural, and optical properties of PEALD metallic oxides for optical applications
39Metal-oxide-based hole-selective tunneling contacts for crystalline silicon solar cells
40Method of Fabrication for Encapsulated Polarizing Resonant Gratings
41Nanoporous SiO2 thin films made by atomic layer deposition and atomic etching
42On the Control of the Fixed Charge Densities in Al2O3 Based Silicon Surface Passivation Schemes
43Performance and retention characteristics of nanocrystalline Si floating gate memory with an Al2O3 tunnel layer fabricated by plasma-enhanced atomic layer deposition
44Plasma-Assisted ALD for the Conformal Deposition of SiO2: Process, Material and Electronic Properties
45Plasma-Assisted Atomic Layer Deposition of Low Temperature SiO2
46Plasma-enhanced and thermal atomic layer deposition of Al2O3 using dimethylaluminum isopropoxide, [Al(CH3)2(μ-OiPr)]2, as an alternative aluminum precursor
47Plasma-enhanced atomic layer deposition and etching of high-k gadolinium oxide
48Plasma-Enhanced Atomic Layer Deposition of AlN Epitaxial Thin Film for AlN/GaN Heterostructure TFTs
49Role of field-effect on c-Si surface passivation by ultrathin (2-20 nm) atomic layer deposited Al2O3
50Silicon surface passivation by ultrathin Al2O3 films synthesized by thermal and plasma atomic layer deposition
51Stability of Al2O3 and Al2O3/a-Six:H stacks for surface passivation of crystalline silicon
52Status and prospects of Al2O3-based surface passivation schemes for silicon solar cells
53Superconducting niobium nitride thin films deposited by metal organic plasma-enhanced atomic layer deposition
54Trapped charge densities in Al2O3-based silicon surface passivation layers
55Ultra-Thin Aluminium Oxide Films Deposited by Plasma-Enhanced Atomic Layer Deposition for Corrosion Protection

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