Oxford Instruments OpAL Plasma Enhanced Atomic Layer Deposition Film Publications

Your search for plasma enhanced atomic layer deposition publications using Oxford Instruments OpAL hardware returned 66 records. If there are too many results, you may want to use the multi-factor search to narrow the results.

NumberTitle
1'Zero-charge' SiO2/Al2O3 stacks for the simultaneous passivation of n+ and p+ doped silicon surfaces by atomic layer deposition
2A high speed PE-ALD ZnO Schottky diode rectifier with low interface-state density
3Antireflection Coating on PMMA Substrates by Atomic Layer Deposition
4Antireflection Coatings for Strongly Curved Glass Lenses by Atomic Layer Deposition
5Area-Selective Atomic Layer Deposition of In2O3:H Using a µ-Plasma Printer for Local Area Activation
6Atomic layer deposition for perovskite solar cells: research status, opportunities and challenges
7Atomic layer deposition of AlN for thin membranes using trimethylaluminum and H2/N2 plasma
8Atomic layer deposition of ferroelectric Hf0.5Zr0.5O2 on single-layer, CVD-grown graphene
9Atomic layer deposition of high-mobility hydrogen-doped zinc oxide
10Atomic Layer Deposition of Niobium Nitride from Different Precursors
11Atomic layer deposition precursor step repetition and surface plasma pretreatment influence on semiconductor-insulator-semiconductor heterojunction solar cell
12Background-Free Bottom-Up Plasmonic Arrays with Increased Sensitivity, Specificity and Shelf Life for SERS Detection Schemes
13Breakdown and Protection of ALD Moisture Barrier Thin Films
14Comparative study of ALD SiO2 thin films for optical applications
15Comparison of gate dielectric plasma damage from plasma-enhanced atomic layer deposited and magnetron sputtered TiN metal gates
16Composite materials and nanoporous thin layers made by atomic layer deposition
17Development and Evaluation of a Nanometer-Scale Hemocompatible and Antithrombotic Coating Technology Platform for Commercial Intracranial Stents and Flow Diverters
18Electrically Excited Plasmonic Nanoruler for Biomolecule Detection
19Electron-selective contacts via ultra-thin organic interface dipoles for silicon organic heterojunction solar cells
20Encapsulation method for atom probe tomography analysis of nanoparticles
21Excellent Si surface passivation by low temperature SiO2 using an ultrathin Al2O3 capping film
22Fabrication and deformation of three-dimensional hollow ceramic nanostructures
23Film properties of low temperature HfO2 grown with H2O, O3, or remote O2-plasma
24Firing Stable Al2O3/SiNx Layer Stack Passivation for the Front Side Boron Emitter of n-type Silicon Solar Cells
25Gadolinium nitride films deposited using a PEALD based process
26Hafnia and alumina on sulphur passivated germanium
27High-efficiency embedded transmission grating
28High-Reflective Coatings For Ground and Space Based Applications
29Improved Gate Dielectric Deposition and Enhanced Electrical Stability for Single-Layer MoS2 MOSFET with an AlN Interfacial Layer
30Index matching at the nanoscale: light scattering by core-shell Si/SiOx nanowires
31Influence of annealing and Al2O3 properties on the hydrogen-induced passivation of the Si/SiO2 interface
32Influence of oxygen source on the ferroelectric properties of ALD grown Hf1-xZrxO2 films
33Influence of the Deposition Temperature on the c-Si Surface Passivation by Al2O3 Films Synthesized by ALD and PECVD
34Influence of the Oxidant on the Chemical and Field-Effect Passivation of Si by ALD Al2O3
35Influence of the oxygen plasma parameters on the atomic layer deposition of titanium dioxide
36Inhibition of Crystal Growth during Plasma Enhanced Atomic Layer Deposition by Applying BIAS
37Ion and Photon Surface Interaction during Remote Plasma ALD of Metal Oxides
38Lifetime improvement of micro-fabricated alkali vapor cells by atomic layer deposited wall coatings
39Low EOT GeO2/Al2O3/HfO2 on Ge substrate using ultrathin Al deposition
40Low Temperature Plasma-Enhanced Atomic Layer Deposition of Metal Oxide Thin Films
41Low-Temperature Plasma-Assisted Atomic-Layer-Deposited SnO2 as an Electron Transport Layer in Planar Perovskite Solar Cells
42Materials Pushing the Application Limits of Wire Grid Polarizers further into the Deep Ultraviolet Spectral Range
43Mechanical characterization of hollow ceramic nanolattices
44Mechanical, structural, and optical properties of PEALD metallic oxides for optical applications
45Metal-oxide-based hole-selective tunneling contacts for crystalline silicon solar cells
46Method of Fabrication for Encapsulated Polarizing Resonant Gratings
47Nanoporous SiO2 thin films made by atomic layer deposition and atomic etching
48Nanowire single-photon detectors made of atomic layer-deposited niobium nitride
49On the Control of the Fixed Charge Densities in Al2O3 Based Silicon Surface Passivation Schemes
50Performance and retention characteristics of nanocrystalline Si floating gate memory with an Al2O3 tunnel layer fabricated by plasma-enhanced atomic layer deposition
51Plasma-Assisted ALD for the Conformal Deposition of SiO2: Process, Material and Electronic Properties
52Plasma-Assisted Atomic Layer Deposition of Low Temperature SiO2
53Plasma-enhanced and thermal atomic layer deposition of Al2O3 using dimethylaluminum isopropoxide, [Al(CH3)2(μ-OiPr)]2, as an alternative aluminum precursor
54Plasma-enhanced atomic layer deposition and etching of high-k gadolinium oxide
55Plasma-Enhanced Atomic Layer Deposition of AlN Epitaxial Thin Film for AlN/GaN Heterostructure TFTs
56Role of field-effect on c-Si surface passivation by ultrathin (2-20 nm) atomic layer deposited Al2O3
57Schottky Diodes on ZnO Thin Films Grown by Plasma-Enhanced Atomic Layer Deposition
58Silicon surface passivation by ultrathin Al2O3 films synthesized by thermal and plasma atomic layer deposition
59Stability of Al2O3 and Al2O3/a-Six:H stacks for surface passivation of crystalline silicon
60Status and prospects of Al2O3-based surface passivation schemes for silicon solar cells
61Structural and electrical properties of ultrathin niobium nitride films grown by atomic layer deposition
62Superconducting niobium nitride thin films deposited by metal organic plasma-enhanced atomic layer deposition
63Trapped charge densities in Al2O3-based silicon surface passivation layers
64Ultra-Thin Aluminium Oxide Films Deposited by Plasma-Enhanced Atomic Layer Deposition for Corrosion Protection
65Wafer-level uniformity of atomic-layer-deposited niobium nitride thin films for quantum devices
66α-Ga2O3 grown by low temperature atomic layer deposition on sapphire