Introducing Plasma ALD, LLC's first in-house product.

An economical, compact inductively coupled plasma source.

Ideal for:
  • Plasma-Enhanced Atomic Layer Deposition
  • Thin Film Etch
  • Surface cleaning
  • Surface modification

Contact us for more information.


Influence of the oxygen plasma parameters on the atomic layer deposition of titanium dioxide

Type:
Journal
Info:
Nanotechnology 26 024003
Date:
2014-10-17
DOI:
http://dx.doi.org/10.1088/0957-4484/26/2/024003

Author Information

Name Institution
Stephan RatzschFriedrich-Schiller-Universität Jena

Films

Plasma TiO2

Hardware used: Oxford Instruments OpAL
Deposition Temperature Range N/A

Film/Plasma Properties

Characteristic: Thickness
Analysis: Ellipsometry
Diagnostic: -

Characteristic: Images
Analysis: SEM, Scanning Electron Microscopy
Diagnostic: -

Characteristic: Morphology, Roughness, Topography
Analysis: AFM, Atomic Force Microscopy
Diagnostic: -

Characteristic: Crystallinity, Crystal Structure, Grain Size, Atomic Structure
Analysis: XRD, X-Ray Diffraction
Diagnostic: -

Characteristic: Unknown
Analysis: Raman Spectroscopy
Diagnostic: -

Substrates

Silicon
SiO2

Notes

Oxford Instruments OpAL study of TiO2 morphology as a function of O2 plasma properties.
263