Name

Institution

Stephan Ratzsch

Friedrich-Schiller-Universität Jena

Plasma TiO₂ using Oxford Instruments OpAL

Deposition Temperature Range N/A

Characteristic

Analysis

Diagnostic

Thickness

Ellipsometry

-

Images

SEM, Scanning Electron Microscopy

-

Morphology, Roughness, Topography

AFM, Atomic Force Microscopy

-

Crystallinity, Crystal Structure, Grain Size, Atomic Structure

XRD, X-Ray Diffraction

-

Unknown

Raman Spectroscopy

-

Silicon

SiO₂

PEALD Film Development

Oxford Instruments OpAL study of TiO₂ morphology as a function of O₂ plasma properties.

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