Publication Information

Title:
Influence of the oxygen plasma parameters on the atomic layer deposition of titanium dioxide
Type:
Journal
Info:
Nanotechnology 26 024003
Date:
2014-10-17

Author Information

Name Institution
Stephan RatzschFriedrich-Schiller-Universit├Ąt Jena

Films

Plasma TiO2


Film/Plasma Properties

Characteristic: Thickness
Analysis: Ellipsometry

Characteristic: Images
Analysis: SEM, Scanning Electron Microscopy

Characteristic: Morphology, Roughness, Topography
Analysis: AFM, Atomic Force Microscopy

Characteristic: Crystallinity, Crystal Structure, Grain Size, Atomic Structure
Analysis: XRD, X-Ray Diffraction

Characteristic: Unknown
Analysis: Raman Spectroscopy

Substrates

Silicon
SiO2

Keywords

PEALD Film Development

Notes

Oxford Instruments OpAL study of TiO2 morphology as a function of O2 plasma properties.
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