Influence of the oxygen plasma parameters on the atomic layer deposition of titanium dioxide

Type:
Journal
Info:
Nanotechnology 26 024003
Date:
2014-10-17
DOI:
http://dx.doi.org/10.1088/0957-4484/26/2/024003

Author Information

Name Institution
Stephan RatzschFriedrich-Schiller-Universität Jena

Films

Plasma TiO2

Hardware used: Oxford Instruments OpAL
Deposition Temperature Range N/A

Film/Plasma Properties

Characteristic: Thickness
Analysis: Ellipsometry
Diagnostic: -

Characteristic: Images
Analysis: SEM, Scanning Electron Microscopy
Diagnostic: -

Characteristic: Morphology, Roughness, Topography
Analysis: AFM, Atomic Force Microscopy
Diagnostic: -

Characteristic: Crystallinity, Crystal Structure, Grain Size, Atomic Structure
Analysis: XRD, X-Ray Diffraction
Diagnostic: -

Characteristic: Unknown
Analysis: Raman Spectroscopy
Diagnostic: -

Substrates

Silicon
SiO2

Keywords

PEALD Film Development

Notes

Oxford Instruments OpAL study of TiO2 morphology as a function of O2 plasma properties.
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