Publication Information

Title: Influence of the oxygen plasma parameters on the atomic layer deposition of titanium dioxide

Type: Journal

Info: Nanotechnology 26 024003

Date: 2014-10-17

DOI: http://dx.doi.org/10.1088/0957-4484/26/2/024003

Author Information

Name

Institution

Friedrich-Schiller-Universit├Ąt Jena

Films

Deposition Temperature Range N/A

Film/Plasma Properties

Characteristic

Analysis

Diagnostic

Thickness

Ellipsometry

Unknown

Images

SEM, Scanning Electron Microscopy

Unknown

Morphology, Roughness, Topography

AFM, Atomic Force Microscopy

Unknown

Crystallinity, Crystal Structure, Grain Size, Atomic Structure

XRD, X-Ray Diffraction

Unknown

Unknown

Raman Spectroscopy

Unknown

Substrates

Silicon

SiO2

Keywords

PEALD Film Development

Notes

Oxford Instruments OpAL study of TiO2 morphology as a function of O2 plasma properties.

263



Shortcuts



© 2014-2018 plasma-ald.com