Title: Influence of the oxygen plasma parameters on the atomic layer deposition of titanium dioxide
Type: Journal
Info: Nanotechnology 26 024003
Date: 2014-10-17
DOI: http://dx.doi.org/10.1088/0957-4484/26/2/024003
Name
Institution
Friedrich-Schiller-Universität Jena
Characteristic
Analysis
Diagnostic
Thickness
Ellipsometry
Unknown
Images
SEM, Scanning Electron Microscopy
Unknown
Morphology, Roughness, Topography
AFM, Atomic Force Microscopy
Unknown
Crystallinity, Crystal Structure, Grain Size, Atomic Structure
XRD, X-Ray Diffraction
Unknown
Unknown
Raman Spectroscopy
Unknown
Silicon
SiO2
PEALD Film Development
Oxford Instruments OpAL study of TiO2 morphology as a function of O2 plasma properties.
263
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