Publication Information

Title:
Trapped charge densities in Al2O3-based silicon surface passivation layers
Type:
Journal
Info:
Journal of Applied Physics 119, 215306 (2016)
Date:
2016-05-19

Author Information

Name Institution
Paul Matthias JordanNaMLab gGmbH
Daniel Kai SimonNaMLab gGmbH
Thomas MikolajickNaMLab gGmbH
Ingo DirnstorferNaMLab gGmbH

Films

Thermal Al2O3



Plasma SiO2



CAS#: 7782-44-7

Film/Plasma Properties

Characteristic: Flat Band Voltage
Analysis: C-V, Capacitance-Voltage Measurements

Characteristic: Fixed Charge
Analysis: C-V, Capacitance-Voltage Measurements

Characteristic: Trapped Positive Charge-Density Change
Analysis: C-V, Capacitance-Voltage Measurements

Characteristic: Minority Carrier Lifetime
Analysis: MDP, Microwave Detected Photoconductivity

Substrates

Si(100)

Keywords

Solar
Passivation

Notes

912