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The publication database currently has 1658 entries.
204 Films
274 Precursors
78 Dep Hardware Sets
253 Characteristics
91 Theses
5093 Authors

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Properties and Mechanism of PEALD-In2O3 Thin Films Prepared by Different Precursor Reaction Energy Uniformity of HfO2 Thin Films Prepared on Trench Structures via Plasma-Enhanced Atomic Layer Deposition Optimization of Y2O3 dopant concentration of yttria stabilized zirconia thin film electrolyte prepared by plasma enhanced atomic layer deposition for high performance thin film solid oxide fuel cells Initial and steady-state Ru growth by atomic layer deposition studied by in situ Angle Resolved X-ray Photoelectron Spectroscopy Innovative remote plasma source for atomic layer deposition for GaN devices

Thomas Mikolajick Plasma Enhanced Atomic Layer Deposition Film Publications

Your search for plasma enhanced atomic layer deposition publications authored by Thomas Mikolajick returned 7 record(s). If there are too many results, you may want to use the multi-factor search to narrow the results.

NumberTitle
1Atomic layer deposition of ferroelectric Hf0.5Zr0.5O2 on single-layer, CVD-grown graphene
2Breakdown and Protection of ALD Moisture Barrier Thin Films
3Film properties of low temperature HfO2 grown with H2O, O3, or remote O2-plasma
4Influence of oxygen source on the ferroelectric properties of ALD grown Hf1-xZrxO2 films
5Low-thermal budget flash light annealing for Al2O3 surface passivation
6On the Control of the Fixed Charge Densities in Al2O3 Based Silicon Surface Passivation Schemes
7Trapped charge densities in Al2O3-based silicon surface passivation layers

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