Atomic layer deposition of ferroelectric Hf0.5Zr0.5O2 on single-layer, CVD-grown graphene

Type:
Journal
Info:
Arxiv
Date:
2021-11-19

Author Information

Name Institution
Suzanne LancasterNaMLab gGmbH
Iciar ArnayIMDEA Nanoscience
Ruben GuerreroIMDEA Nanoscience
Adrian Gudí­nIMDEA Nanoscience
Alejandra Guedeja-MarrónCiudad Universitaria
Jose Manuel Diez ToledanoIMDEA Nanoscience
Jan GärtnerNaMLab gGmbH
Alberto AnadónIMDEA Nanoscience
Maria VarelaCiudad Universitaria
Julio CamareroIMDEA Nanoscience
Thomas MikolajickTechnische Universität Dresden
Paolo PernaIMDEA Nanoscience
Stefan SlesazeckNaMLab gGmbH

Films

Thermal Al2O3



Film/Plasma Properties

Characteristic: Morphology, Roughness, Topography
Analysis: AFM, Atomic Force Microscopy

Characteristic: Polarization
Analysis: P-V, Polarization-Voltage Measurements

Characteristic: Leakage Current
Analysis: I-V, Current-Voltage Measurements

Characteristic: Images
Analysis: TEM, Transmission Electron Microscope

Characteristic: Chemical Composition, Impurities
Analysis: ELS, EELS, Electron Energy Loss Spectroscopy

Characteristic: Magnetic Properties
Analysis: -

Characteristic: Crystallinity, Crystal Structure, Grain Size, Atomic Structure
Analysis: GIXRD, Grazing Incidence X-Ray Diffraction

Characteristic: Interfacial Layer
Analysis: XRR, X-Ray Reflectivity

Substrates

Al2O3
Ta2O5

Notes

1636