Atomic layer deposition of ferroelectric Hf0.5Zr0.5O2 on single-layer, CVD-grown graphene
Type:
Journal
Info:
Arxiv
Date:
2021-11-19
Author Information
| Name | Institution |
|---|---|
| Suzanne Lancaster | NaMLab gGmbH |
| Iciar Arnay | IMDEA Nanoscience |
| Ruben Guerrero | IMDEA Nanoscience |
| Adrian Gudín | IMDEA Nanoscience |
| Alejandra Guedeja-Marrón | Ciudad Universitaria |
| Jose Manuel Diez Toledano | IMDEA Nanoscience |
| Jan Gärtner | NaMLab gGmbH |
| Alberto Anadón | IMDEA Nanoscience |
| Maria Varela | Ciudad Universitaria |
| Julio Camarero | IMDEA Nanoscience |
| Thomas Mikolajick | Technische Universität Dresden |
| Paolo Perna | IMDEA Nanoscience |
| Stefan Slesazeck | NaMLab gGmbH |
Films
Thermal Al2O3
Plasma HfZrO2
Film/Plasma Properties
Characteristic: Morphology, Roughness, Topography
Analysis: AFM, Atomic Force Microscopy
Characteristic: Polarization
Analysis: P-V, Polarization-Voltage Measurements
Characteristic: Leakage Current
Analysis: I-V, Current-Voltage Measurements
Characteristic: Images
Analysis: TEM, Transmission Electron Microscope
Characteristic: Chemical Composition, Impurities
Analysis: ELS, EELS, Electron Energy Loss Spectroscopy
Characteristic: Magnetic Properties
Analysis: -
Characteristic: Crystallinity, Crystal Structure, Grain Size, Atomic Structure
Analysis: GIXRD, Grazing Incidence X-Ray Diffraction
Characteristic: Interfacial Layer
Analysis: XRR, X-Ray Reflectivity
Substrates
| Al2O3 |
| Ta2O5 |
Notes
| 1636 |