Tris(dimethylamido)cyclopentadienyl Hafnium, HfCp(NMe2)3, Air Liquide HyALDTM, CAS# 941596-80-1

Where to buy

NumberVendorRegionLink
1DOCK/CHEMICALS🇩🇪Tris(dimethylamido)cyclopentadienylhafnium

www.plasma-ald.com does not endorse any chemical suppliers. These links are provided for the benefit of our users. If a link goes bad, let us know.

If you would like your company's precursor products listed, or your existing listing changed or removed, send me an email.


Plasma Enhanced Atomic Layer Deposition Film Publications

Your search for publications using this chemistry returned 13 record(s). If there are too many results, you may want to use the multi-factor search to narrow the results.

NumberTitle
1Atomic insights into the oxygen incorporation in atomic layer deposited conductive nitrides and its mitigation by energetic ions
2Tuning Material Properties of Oxides and Nitrides by Substrate Biasing during Plasma-Enhanced Atomic Layer Deposition on Planar and 3D Substrate Topographies
3Plasma-assisted atomic layer deposition of HfNx: Tailoring the film properties by the plasma gas composition
4Energetic ions during plasma-enhanced atomic layer deposition and their role in tailoring material properties
5Film Conformality and Extracted Recombination Probabilities of O Atoms during Plasma-Assisted Atomic Layer Deposition of SiO2, TiO2, Al2O3, and HfO2
6Influence of oxygen source on the ferroelectric properties of ALD grown Hf1-xZrxO2 films
7Atomic layer deposition of ferroelectric Hf0.5Zr0.5O2 on single-layer, CVD-grown graphene
8Low resistivity HfNx grown by plasma-assisted ALD with external rf substrate biasing
9Influence of oxygen source on the ferroelectric properties of ALD grown Hf1-xZrxO2 films
10Ion energy control during plasma-enhanced atomic layer deposition: enabling materials control and selective processing in the third dimension
11Plasma-Assisted ALD of Highly Conductive HfNx: On the Effect of Energetic Ions on Film Microstructure
12Tuning Material Properties of Oxides and Nitrides by Substrate Biasing during Plasma-Enhanced Atomic Layer Deposition on Planar and 3D Substrate Topographies
13Atomic layer deposition of HfO2 using HfCp(NMe2)3 and O2 plasma