tris(dimethylamido)cyclopentadienyl hafnium, HfCp(NMe2)3 , Air Liquide HyALDTM, CAS# 0-0-0

Plasma Enhanced Atomic Layer Deposition Film Publications

Your search for publications using this chemistry returned 6 record(s). If there are too many results, you may want to use the multi-factor search to narrow the results.

NumberTitle
1Energetic ions during plasma-enhanced atomic layer deposition and their role in tailoring material properties
2Low resistivity HfNx grown by plasma-assisted ALD with external rf substrate biasing
3Plasma-assisted atomic layer deposition of HfNx: Tailoring the film properties by the plasma gas composition
4Tuning Material Properties of Oxides and Nitrides by Substrate Biasing during Plasma-Enhanced Atomic Layer Deposition on Planar and 3D Substrate Topographies
5Atomic layer deposition of HfO2 using HfCp(NMe2)3 and O2 plasma
6Tuning Material Properties of Oxides and Nitrides by Substrate Biasing during Plasma-Enhanced Atomic Layer Deposition on Planar and 3D Substrate Topographies


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