Ion energy control during plasma-enhanced atomic layer deposition: enabling materials control and selective processing in the third dimension
Type:
Journal
Info:
NEVAC blad 57 | 1 april 2019
Date:
2019-04-01
Author Information
Name | Institution |
---|---|
Tahsin Faraz | Eindhoven University of Technology |
Harm C. M. Knoops | Eindhoven University of Technology |
Erwin (W.M.M.) Kessels | Eindhoven University of Technology |
Films
Plasma TiO2
Plasma HfO2
Plasma SiNx
Film/Plasma Properties
Characteristic: Crystallinity, Crystal Structure, Grain Size, Atomic Structure
Analysis: Electron Diffraction
Characteristic: Refractive Index
Analysis: Ellipsometry
Characteristic: Stress
Analysis: -
Characteristic: Microstructure
Analysis: TEM, Transmission Electron Microscope
Characteristic: Conformality, Step Coverage
Analysis: TEM, Transmission Electron Microscope
Substrates
Silicon |
Notes
1640 |