November 2022 Stats

The publication database currently has 1655 entries.

204 Films

274 Precursors

78 Dep Hardware Sets

253 Characteristics

91 Theses

5090 Authors

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2021 Year in Review

Recent Database Additions

Initial and steady-state Ru growth by atomic layer deposition studied by in situ Angle Resolved X-ray Photoelectron Spectroscopy Innovative remote plasma source for atomic layer deposition for GaN devices Influence of plasma species on the early-stage growth kinetics of epitaxial InN grown by plasma-enhanced atomic layer deposition Optical in situ monitoring of plasma-enhanced atomic layer deposition process The role of active species in the N₂ and N₂-H₂ RF afterglows on selective surface nitriding of ALD-grown TiO₂ films

di(sec-butylamino)silane (DSBAS), ((s-Bu)₂N)SiH₃, CAS# 0-0-0

Plasma Enhanced Atomic Layer Deposition Film Publications

Your search for publications using this chemistry returned 6 record(s). If there are too many results, you may want to use the multi-factor search to narrow the results.

Number	Title
1	Atomic Layer Deposition of Wet-Etch Resistant Silicon Nitride Using Di(sec-butylamino)silane and N₂ Plasma on Planar and 3D Substrate Topographies
2	Energetic ions during plasma-enhanced atomic layer deposition and their role in tailoring material properties
3	Ion energy control during plasma-enhanced atomic layer deposition: enabling materials control and selective processing in the third dimension
4	Surface reactions of aminosilane precursors during N₂ plasma-assisted atomic layer deposition of SiN_x
5	Tuning Material Properties of Oxides and Nitrides by Substrate Biasing during Plasma-Enhanced Atomic Layer Deposition on Planar and 3D Substrate Topographies
6	Designing high performance precursors for atomic layer deposition of silicon oxide