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Your search for publications using this chemistry returned 4 record(s). If there are too many results, you may want to use the multi-factor search to narrow the results.
|1||Atomic Layer Deposition of Wet-Etch Resistant Silicon Nitride Using Di(sec-butylamino)silane and N2 Plasma on Planar and 3D Substrate Topographies|
|2||Energetic ions during plasma-enhanced atomic layer deposition and their role in tailoring material properties|
|3||Tuning Material Properties of Oxides and Nitrides by Substrate Biasing during Plasma-Enhanced Atomic Layer Deposition on Planar and 3D Substrate Topographies|
|4||Designing high performance precursors for atomic layer deposition of silicon oxide|
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