2022 Year in Review

August 2023 Stats

The publication database currently has 1695 entries.

210 Films

283 Precursors

78 Dep Hardware Sets

255 Characteristics

96 Theses

5204 Authors

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2021 Year in Review

Recent Database Additions

Infrared single-photon sensitivity in atomic layer deposited superconducting nanowires Effects of deposition temperature on the wear behavior and material properties of plasma enhanced atomic layer deposition (PEALD) titanium vanadium nitride thin films Gallium nitride thin films by microwave plasma-assisted ALD Ferroelectricity of Hf_xZr_1-xO₂ thin films fabricated by 300°C low temperature process with plasma-enhanced atomic layer deposition Hydrogen-induced abstraction mechanism of surface methyl groups in atomic-layer-epitaxy of germanium

di(sec-butylamino)silane (DSBAS), ((s-Bu)₂N)SiH₃, CAS# 0-0-0

Plasma Enhanced Atomic Layer Deposition Film Publications

Your search for publications using this chemistry returned 6 record(s). If there are too many results, you may want to use the multi-factor search to narrow the results.

Number	Title
1	Energetic ions during plasma-enhanced atomic layer deposition and their role in tailoring material properties
2	Designing high performance precursors for atomic layer deposition of silicon oxide
3	Tuning Material Properties of Oxides and Nitrides by Substrate Biasing during Plasma-Enhanced Atomic Layer Deposition on Planar and 3D Substrate Topographies
4	Surface reactions of aminosilane precursors during N₂ plasma-assisted atomic layer deposition of SiN_x
5	Ion energy control during plasma-enhanced atomic layer deposition: enabling materials control and selective processing in the third dimension
6	Atomic Layer Deposition of Wet-Etch Resistant Silicon Nitride Using Di(sec-butylamino)silane and N₂ Plasma on Planar and 3D Substrate Topographies