Publication Information

Title: Energetic ions during plasma-enhanced atomic layer deposition and their role in tailoring material properties

Type: Journal

Info: Plasma Sources Sci. Technol. 28 (2019) 024002

Date: 2018-11-21

DOI: https://doi.org/10.1088/1361-6595/aaf2c7

Author Information

Name

Institution

Eindhoven University of Technology

Eindhoven University of Technology

Eindhoven University of Technology

Eindhoven University of Technology

Eindhoven University of Technology

Films

Deposition Temperature = 300C

3275-24-9

7782-44-7

Deposition Temperature = 450C

0-0-0

1333-74-0

Deposition Temperature = 500C

0-0-0

7727-37-9

Film/Plasma Properties

Characteristic

Analysis

Diagnostic

Ion Energy

RFEA, Retarding Field Energy Analyzer

Impedans Semion

Ion Flux

Custom

Custom

Thickness

Ellipsometry

J.A. Woollam M-2000D

Refractive Index

Ellipsometry

J.A. Woollam M-2000D

Extinction Coefficient

Ellipsometry

J.A. Woollam M-2000D

Density

XRR, X-Ray Reflectivity

Bruker D8 Advance

Stress

Wafer Curvature

KLA-Tencor FLX 2320

Chemical Composition, Impurities

XPS, X-ray Photoelectron Spectroscopy

Thermo Scientific KA1066 spectrometer

Crystallinity, Crystal Structure, Grain Size, Atomic Structure

XRD, X-Ray Diffraction

PANalytical Xpert PRO MRD X-ray Diffractometer

Resistivity, Sheet Resistance

Four-point Probe

Signatone

Wet Etch Resistance

TEM, Transmission Electron Microscope

JEOL 2010F

Substrates

SiO2

Keywords

Substrate Biasing

Notes

1278



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