HfNx Plasma Enhanced Atomic Layer Deposition Film Publications

Your search for plasma enhanced atomic layer deposition publications discussing HfNx films returned 11 record(s). If there are too many results, you may want to use the multi-factor search to narrow the results.

NumberTitle
1A comparison between remote plasma-enhanced and thermal ALD of Hafnium-nitride thin films
2Characteristics of HfN films deposited by using remote plasma-enhanced atomic layer deposition
3Effective work function modulation of the bilayer metal gate stacks by the Hf-doped thin TiN interlayer prepared by the in-situ atomic layer doping technique
4Energetic ions during plasma-enhanced atomic layer deposition and their role in tailoring material properties
5HfO2/HfOxNy/HfO2 Gate Dielectric Fabricated by In Situ Oxidation of Plasma-Enhanced Atomic Layer Deposition HfN Middle Layer
6Highly Conductive HfNx Films Prepared by Plasma-Assisted Atomic Layer Deposition
7Low resistivity HfNx grown by plasma-assisted ALD with external rf substrate biasing
8Plasma-Assisted ALD of Highly Conductive HfNx: On the Effect of Energetic Ions on Film Microstructure
9Plasma-Assisted Atomic Layer Deposition of Conductive Hafnium Nitride Using Tetrakis(ethylmethylamino)hafnium for CMOS Gate Electrode Applications
10Plasma-assisted atomic layer deposition of HfNx: Tailoring the film properties by the plasma gas composition
11Tuning Material Properties of Oxides and Nitrides by Substrate Biasing during Plasma-Enhanced Atomic Layer Deposition on Planar and 3D Substrate Topographies