HfNx Plasma Enhanced Atomic Layer Deposition Film Publications

Your search for plasma enhanced atomic layer deposition publications discussing HfNx films returned 13 record(s). If there are too many results, you may want to use the multi-factor search to narrow the results.

NumberTitle
1Characteristics of HfN films deposited by using remote plasma-enhanced atomic layer deposition
2Low resistivity HfNx grown by plasma-assisted ALD with external rf substrate biasing
3Plasma-Assisted Atomic Layer Deposition of Conductive Hafnium Nitride Using Tetrakis(ethylmethylamino)hafnium for CMOS Gate Electrode Applications
4Highly Conductive HfNx Films Prepared by Plasma-Assisted Atomic Layer Deposition
5HfO2/HfOxNy/HfO2 Gate Dielectric Fabricated by In Situ Oxidation of Plasma-Enhanced Atomic Layer Deposition HfN Middle Layer
6Plasma-assisted atomic layer deposition of HfNx: Tailoring the film properties by the plasma gas composition
7Tuning Material Properties of Oxides and Nitrides by Substrate Biasing during Plasma-Enhanced Atomic Layer Deposition on Planar and 3D Substrate Topographies
8Plasma-Assisted ALD of Highly Conductive HfNx: On the Effect of Energetic Ions on Film Microstructure
9Electrical and structural properties of conductive nitride films grown by plasma enhanced atomic layer deposition with significant ion bombardment effect
10A comparison between remote plasma-enhanced and thermal ALD of Hafnium-nitride thin films
11Atomic insights into the oxygen incorporation in atomic layer deposited conductive nitrides and its mitigation by energetic ions
12Effective work function modulation of the bilayer metal gate stacks by the Hf-doped thin TiN interlayer prepared by the in-situ atomic layer doping technique
13Energetic ions during plasma-enhanced atomic layer deposition and their role in tailoring material properties