Your search for plasma enhanced atomic layer deposition publications discussing HfNx films returned 6 record(s). If there are too many results, you may want to use the multi-factor search to narrow the results.
|1||A comparison between remote plasma-enhanced and thermal ALD of Hafnium-nitride thin films|
|2||Characteristics of HfN films deposited by using remote plasma-enhanced atomic layer deposition|
|3||Effective work function modulation of the bilayer metal gate stacks by the Hf-doped thin TiN interlayer prepared by the in-situ atomic layer doping technique|
|4||HfO2/HfOxNy/HfO2 Gate Dielectric Fabricated by In Situ Oxidation of Plasma-Enhanced Atomic Layer Deposition HfN Middle Layer|
|5||Plasma-assisted atomic layer deposition of HfNx: Tailoring the film properties by the plasma gas composition|
|6||Tuning Material Properties of Oxides and Nitrides by Substrate Biasing during Plasma-Enhanced Atomic Layer Deposition on Planar and 3D Substrate Topographies|
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