A comparison between remote plasma-enhanced and thermal ALD of Hafnium-nitride thin films

Type:
Poster
Info:
ALD 2010
Date:
2010-06-25
DOI:
No DOI

Author Information

Name Institution
Ziwen FangUniversity of Liverpool
Richard PotterUniversity of Liverpool
Matthew WernerUniversity of Liverpool
Qi FangOxford Instruments
Chris HodsonOxford Instruments

Films



Film/Plasma Properties

Characteristic: Thickness
Analysis: Ellipsometry

Characteristic: Refractive Index
Analysis: Ellipsometry

Characteristic: Compositional Depth Profiling
Analysis: MEIS, Medium Energy Ion Scattering

Characteristic: Density
Analysis: MEIS, Medium Energy Ion Scattering

Characteristic: Chemical Composition, Impurities
Analysis: AES, Auger Electron Spectroscopy

Characteristic: Thermal Stability
Analysis: Anneal

Characteristic: Crystallinity, Crystal Structure, Grain Size, Atomic Structure
Analysis: XRD, X-Ray Diffraction

Substrates

Keywords

PEALD Film Development

Notes

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