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A comparison between remote plasma-enhanced and thermal ALD of Hafnium-nitride thin films
Type:
Poster
Info:
ALD 2010
Date:
2010-06-25
DOI:
No DOI
Author Information
| Name | Institution |
|---|---|
| Ziwen Fang | University of Liverpool |
| Richard Potter | University of Liverpool |
| Matthew Werner | University of Liverpool |
| Qi Fang | Oxford Instruments |
| Chris Hodson | Oxford Instruments |
Films
Plasma HfNx
Thermal HfNx
Film/Plasma Properties
Characteristic: Thickness
Analysis: Ellipsometry
Characteristic: Refractive Index
Analysis: Ellipsometry
Characteristic: Compositional Depth Profiling
Analysis: MEIS, Medium Energy Ion Scattering
Characteristic: Density
Analysis: MEIS, Medium Energy Ion Scattering
Characteristic: Chemical Composition, Impurities
Analysis: AES, Auger Electron Spectroscopy
Characteristic: Thermal Stability
Analysis: Anneal
Characteristic: Crystallinity, Crystal Structure, Grain Size, Atomic Structure
Analysis: XRD, X-Ray Diffraction
Substrates
Notes
| 20 |