Introducing Plasma ALD, LLC's first in-house product.

An economical, compact inductively coupled plasma source.

Ideal for:
  • Plasma-Enhanced Atomic Layer Deposition
  • Thin Film Etch
  • Surface cleaning
  • Surface modification

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Qi Fang Plasma Enhanced Atomic Layer Deposition Film Publications

Your search for plasma enhanced atomic layer deposition publications authored by Qi Fang returned 4 record(s). If there are too many results, you may want to use the multi-factor search to narrow the results.

NumberTitle
1Preliminary investigation of high-k materials - TiO2 doped Ta2O5 films by remote plasma ALD
2Silicon Nitride and Silicon Oxide Thin Films by Plasma ALD
3Electrical Characteristics of Top-Down ZnO Nanowire Transistors Using Remote Plasma ALD
4A comparison between remote plasma-enhanced and thermal ALD of Hafnium-nitride thin films