Publication Information

Title: Silicon Nitride and Silicon Oxide Thin Films by Plasma ALD

Type: Poster

Info: ALD 2008 Poster

Date: 2008-07-02

DOI: No DOI

Author Information

Name

Institution

Oxford Instruments

Oxford Instruments

Films

Deposition Temperature Range N/A

15112-89-7

7727-37-9

1333-74-0

Deposition Temperature Range N/A

186598-40-3

7782-44-7

Deposition Temperature Range N/A

15112-89-7

7782-44-7

Film/Plasma Properties

Characteristic

Analysis

Diagnostic

Thickness

Ellipsometry

Unknown

Refractive Index

Ellipsometry

Unknown

Chemical Composition, Impurities

AES, Auger Electron Spectroscopy

Unknown

Etch Rate

Wet Etch

Unknown

Substrates

Keywords

Notes

120



Shortcuts



© 2014-2018 plasma-ald.com