Introducing Plasma ALD, LLC's first in-house product.

An economical, compact inductively coupled plasma source.

Ideal for:
  • Plasma-Enhanced Atomic Layer Deposition
  • Thin Film Etch
  • Surface cleaning
  • Surface modification

Contact us for more information.


Chris Hodson Plasma Enhanced Atomic Layer Deposition Film Publications

Your search for plasma enhanced atomic layer deposition publications authored by Chris Hodson returned 8 record(s). If there are too many results, you may want to use the multi-factor search to narrow the results.

NumberTitle
1Optimization of Plasma Enhanced Atomic Layer Deposition Processes for Oxides, Nitrides and Metals in the Oxford Instruments FlexAL Reactor
2Plasma and Thermal ALD of Al2O3 in a Commercial 200mm ALD Reactor
3Plasma-enhanced atomic layer deposition and etching of high-k gadolinium oxide
4A comparison between remote plasma-enhanced and thermal ALD of Hafnium-nitride thin films
5Deposition of TiN and HfO2 in a commercial 200 mm remote plasma atomic layer deposition reactor
6Silicon Nitride and Silicon Oxide Thin Films by Plasma ALD
7Preliminary investigation of high-k materials - TiO2 doped Ta2O5 films by remote plasma ALD
8Innovative remote plasma source for atomic layer deposition for GaN devices