Introducing Plasma ALD, LLC's first in-house product.

An economical, compact inductively coupled plasma source.

Ideal for:
  • Plasma-Enhanced Atomic Layer Deposition
  • Thin Film Etch
  • Surface cleaning
  • Surface modification

Contact us for more information.


Where to buy BTBAS, bis(tert-butylamido) silane, (t-BuCNH)2SiH2 CAS# 186598-40-3

BTBAS, bis(tert-butylamido) silane, (t-BuCNH)2SiH2 CAS# 186598-40-3 is available from the following source(s):

NumberVendorRegionLink
1Pegasus Chemicals🇬🇧Bis(tertbutylamino)silane
2Strem Chemicals, Inc.🇺🇸Bis(t-butylamino)silane, BTBAS (99.999%-Si) PURATREM
3Gelest🇺🇸Di(t-Butylamino)Silane
4Strem Chemicals, Inc.🇺🇸Bis(t-butylamino)silane, 97+% BTBAS
5Ereztech🇺🇸Bis(t-butylamino)silane
6DOCK/CHEMICALS🇩🇪Bis(tertiarybutylamino)silane

If you would like your company's precursor products listed, or your existing listing changed or removed, send me an email.