Oxford Instruments FlexAL Plasma Enhanced Atomic Layer Deposition Film Publications

Your search for plasma enhanced atomic layer deposition publications using Oxford Instruments FlexAL hardware returned 165 records. If there are too many results, you may want to use the multi-factor search to narrow the results.

NumberTitle
1Atomic Layer Deposition of Aluminum Phosphate Using AlMe3, PO(OMe)3, and O2 Plasma: Film Growth and Surface Reactions
2Enhancing the Wettability of High Aspect-Ratio Through-Silicon Vias Lined With LPCVD Silicon Nitride or PE-ALD Titanium Nitride for Void-Free Bottom-Up Copper Electroplating
3Plasma-assisted atomic layer deposition of nanolaminates for gate dielectric applications
4Thermal conductivity of ultrathin BaTiO3 films grown by plasma-assisted atomic layer deposition
5Atomic layer deposited silicon dioxide films on nanomechanical silicon nitride resonators
6Dielectric Properties of Thermal and Plasma-Assisted Atomic Layer Deposited Al2O3 Thin Films
7Application of spectral ellipsometry to in situ diagnostics of atomic layer deposition of dielectrics on silicon and AlGaN
8Top-down fabricated ZnO nanowire transistors for application in biosensors
9Micro-Raman Spectroscopy for Monitoring of Deposition Quality of High-k Stack Protective Layer onto Nanowire FET Chips for Highly Sensitive miRNA Detection
10Tuning Material Properties of Oxides and Nitrides by Substrate Biasing during Plasma-Enhanced Atomic Layer Deposition on Planar and 3D Substrate Topographies
11Remote plasma enhanced atomic layer deposition of ZnO for thin film electronic applications
12Plasma-enhanced atomic layer deposition of BaTiO3
13Approaching the limits of dielectric breakdown for SiO2 films deposited by plasma-enhanced atomic layer deposition
14Metal-Insulator-Metal Single Electron Transistors with Tunnel Barriers Prepared by Atomic Layer Deposition
15Optimization of Plasma Enhanced Atomic Layer Deposition Processes for Oxides, Nitrides and Metals in the Oxford Instruments FlexAL Reactor
16Mass Spectrometry Study of Li2CO3 Film Growth by Thermal and Plasma-Assisted Atomic Layer Deposition
17Tri-gate InGaAs-OI junctionless FETs with PE-ALD Al2O3 gate dielectric and H2/Ar anneal
18Evidence for low-energy ions influencing plasma-assisted atomic layer deposition of SiO2: Impact on the growth per cycle and wet etch rate
19The influence of surface preparation on low temperature HfO2 ALD on InGaAs (001) and (110) surfaces
20Forming-free resistive switching of tunable ZnO films grown by atomic layer deposition
21Silicon surface passivation by ultrathin Al2O3 films and Al2O3/SiNx stacks
22Impact of Ions on Film Conformality and Crystallinity during Plasma-Assisted Atomic Layer Deposition of TiO2
23Edge-Site Nanoengineering of WS2 by Low-Temperature Plasma-Enhanced Atomic Layer Deposition for Electrocatalytic Hydrogen Evolution
24Mechanical and electrical properties of plasma and thermal atomic layer deposited Al2O3 films on GaAs and Si
25Low-Temperature Phase-Controlled Synthesis of Titanium Di- and Tri-sulfide by Atomic Layer Deposition
26Plasma-Enhanced Atomic Layer Deposition of Al2O3 on Graphene Using Monolayer hBN as Interfacial Layer
27Plasma-enhanced atomic-layer-deposited MoOx emitters for silicon heterojunction solar cells
28Probing the Origin and Suppression of Vertically Oriented Nanostructures of 2D WS2 Layers
29Realistic efficiency potential of next-generation industrial Czochralski-grown silicon solar cells after deactivation of the boron-oxygen-related defect center
30Topographical selective deposition: A comparison between plasma-enhanced atomic layer deposition/sputtering and plasma-enhanced atomic layer deposition/quasi-atomic layer etching approaches
31Surface passivation of phosphorus-diffused n+-type emitters by plasma-assisted atomic-layer deposited Al2O3
32Control of ion energy during plasma enhanced atomic layer deposition: A new strategy for the modulation of TiN growth delay on SiO2
331D versus 3D quantum confinement in 1-5 nm ZnO nanoparticle agglomerations for application in charge-trapping memory devices
34Opportunities of Atomic Layer Deposition for Perovskite Solar Cells
35Unexpectedly High Minority-Carrier Lifetimes Exceeding 20 ms Measured on 1.4-Ohm cm n-Type Silicon Wafers
36Low Temperature Plasma-Enhanced Atomic Layer Deposition of Metal Oxide Thin Films
37Crystallization Study by Transmission Electron Microscopy of SrTiO3 Thin Films Prepared by Plasma-Assisted ALD
38Atomic layer deposition of HfO2 using HfCp(NMe2)3 and O2 plasma
39Redeposition in plasma-assisted atomic layer deposition: Silicon nitride film quality ruled by the gas residence time
40A comparison between remote plasma-enhanced and thermal ALD of Hafnium-nitride thin films
41Very High Refractive Index Transition Metal Dichalcogenide Photonic Conformal Coatings by Conversion of ALD Metal Oxides
42Plasma-enhanced atomic layer deposition of tungsten oxide thin films using (tBuN)2(Me2N)2W and O2 plasma
43Atomic layer deposition of LiF using LiN(SiMe3)2 and SF6 plasma
44Comparative study of ALD SiO2 thin films for optical applications
45Electrical properties of MOS capacitors formed by PEALD grown Al2O3 on silicon
46A multifunctional biphasic water splitting catalyst tailored for integration with high-performance semiconductor photoanodes
47Atomic layer deposition for spacer defined double patterning of sub-10 nm titanium dioxide features
48Atomic insights into the oxygen incorporation in atomic layer deposited conductive nitrides and its mitigation by energetic ions
49Fabrication of nanoporous membranes for tuning microbial interactions and biochemical reactions
50Film Conformality and Extracted Recombination Probabilities of O Atoms during Plasma-Assisted Atomic Layer Deposition of SiO2, TiO2, Al2O3, and HfO2
51Understanding the Oxygen Evolution Reaction Mechanism on CoOx using Operando Ambient-Pressure X-ray Photoelectron Spectroscopy
52Thickness and Morphology Dependent Electrical Properties of ALD-Synthesized MoS2 FETs
53NiCO2O4@TiN Core-shell Electrodes through Conformal Atomic Layer Deposition for All-solid-state Supercapacitors
54Uniform Atomic Layer Deposition of Al2O3 on Graphene by Reversible Hydrogen Plasma Functionalization
55Order of Dry and Wet Mixed-Length Self-Assembled Monolayers
56Energy-enhanced atomic layer deposition for more process and precursor versatility
57Low-temperature plasma-enhanced atomic layer deposition of 2-D MoS2: large area, thickness control and tuneable morphology
58Corrosion barriers for silver-based telescope mirrors: comparative study of plasma-enhanced atomic layer deposition and reactive evaporation of aluminum oxide
59Energy dissipation during pulsed switching of strontium-titanate based resistive switching memory devices
60Plasma-assisted and thermal atomic layer deposition of electrochemically active Li2CO3
61Injection dependence of the effective lifetime of n-type Si passivated by Al2O3: An edge effect?
62Reaction Mechanisms during Atomic Layer Deposition of AlF3 Using Al(CH3)3 and SF6 Plasma
63Comparison of thermal and plasma-enhanced atomic layer deposition of niobium oxide thin films
64Stability of Al2O3 and Al2O3/a-Six:H stacks for surface passivation of crystalline silicon
65Toward an integrated device for spatiotemporal superposition of free-electron lasers and laser pulses
66Analysis of NbN thin film deposition by plasma-enhanced ALD for gate electrode application
67Impact of composition and crystallization behavior of atomic layer deposited strontium titanate films on the resistive switching of Pt/STO/TiN devices
68Ion energy control during plasma-enhanced atomic layer deposition: enabling materials control and selective processing in the third dimension
69The effect of atomic layer deposition temperature on switching properties of HfOx resistive RAM devices
70Large area, patterned growth of 2D MoS2 and lateral MoS2-WS2 heterostructures for nano- and opto-electronic applications
71The Influence of Ions and Photons during Plasma-Assisted ALD of Metal Oxides
72Ultrasensitive Detection of 2,4-Dinitrophenol Using Nanowire Biosensor
73Charge Transport through Organic Molecular Wires Embedded in Ultrathin Insulating Inorganic Layer
74Low temperature Topographically Selective Deposition by Plasma Enhanced Atomic Layer Deposition with ion bombardment assistance
75Energetic ions during plasma-enhanced atomic layer deposition and their role in tailoring material properties
76High Dielectric Constant ZrO2 Films by Atomic Layer Deposition Technique on Germanium Substrates
77Electrical Characteristics of Top-Down ZnO Nanowire Transistors Using Remote Plasma ALD
78Oxygen Recombination Probability Data for Plasma-Assisted Atomic Layer Deposition of SiO2 and TiO2
79Plasma-Assisted Atomic Layer Deposition of SrTiO3: Stoichiometry and Crystallinity Studied by Spectroscopic Ellipsometry
80Influence of the Deposition Temperature on the c-Si Surface Passivation by Al2O3 Films Synthesized by ALD and PECVD
81Low-Temperature Plasma-Assisted Atomic Layer Deposition of Silicon Nitride Moisture Permeation Barrier Layers
82Propagation Effects in Carbon Nanoelectronics
83Liquid-Phase Crystallized Silicon Solar Cells on Glass: Increasing the Open-Circuit Voltage by Optimized Interlayers for n- and p-Type Absorbers
84Impact of hydrogen on the permanent deactivation of the boron-oxygen-related recombination center in crystalline silicon
85Plasma and Thermal ALD of Al2O3 in a Commercial 200mm ALD Reactor
86Atomic Layer Deposition of Wet-Etch Resistant Silicon Nitride Using Di(sec-butylamino)silane and N2 Plasma on Planar and 3D Substrate Topographies
87Plasma-Assisted ALD of Highly Conductive HfNx: On the Effect of Energetic Ions on Film Microstructure
88Silicon nanowire lithium-ion battery anodes with ALD deposited TiN coatings demonstrate a major improvement in cycling performance
89Titanium Oxynitride Interlayer to Influence Oxygen Reduction Reaction Activity and Corrosion Stability of Pt and Pt-Ni Alloy
90Al2O3/SiNx-Stacks at Increased Temperatures: Avoiding Blistering During Contact Firing
91Nitrogen-Doping of Bulk and Nanotubular TiO2 Photocatalysts by Plasma-Assisted Atomic Layer Deposition
92Plasma Processing for Crystallization and Densification of Atomic Layer Deposition BaTiO3 Thin Films
93Industrially relevant Al2O3 deposition techniques for the surface passivation of Si solar cells
94Silicon Nitride and Silicon Oxide Thin Films by Plasma ALD
95Hot Carrier Filtering in Solution Processed Heterostructures: A Paradigm for Improving Thermoelectric Efficiency
96Atomic layer deposition of TiN for the fabrication of nanomechanical resonators
97Flexible Perovskite Photovoltaic Modules and Solar Cells Based on Atomic Layer Deposited Compact Layers and UV-Irradiated TiO2 Scaffolds on Plastic Substrates
98Microstructure and electrical properties of thin HfO2 deposited by plasma-enhanced atomic layer deposition
99Dielectric properties investigation of a compound based on atomic layer deposited multi-layer structure
100Controlling transition metal atomic ordering in two-dimensional Mo1-xWxS2 alloys
101Enhanced surface passivation of epitaxially grown emitters for high-efficiency ultrathin crystalline Si solar cells
102Simple plasma assisted atomic layer deposition technique for high substitutional nitrogen doping of TiO2
103Area-Selective Atomic Layer Deposition of SiO2 Using Acetylacetone as a Chemoselective Inhibitor in an ABC-Type Cycle
104Possible Candidates for Impurities in mc-Si Wafers Responsible for Light-Induced Lifetime Degradation and Regeneration
105High-κ insulating materials for AlGaN/GaN metal insulator semiconductor heterojunction field effect transistors
106Atomic layer deposition of aluminum fluoride using Al(CH3)3 and SF6 plasma
107On the role of nanoporosity in controlling the performance of moisture permeation barrier layers
108Low resistivity HfNx grown by plasma-assisted ALD with external rf substrate biasing
109Enhanced Barrier Performance of Engineered Paper by Atomic Layer Deposited Al2O3 Thin Films
110Atomic layer deposition of Ru from CpRu(CO)2Et using O2 gas and O2 plasma
111Biosensor properties of SOI nanowire transistors with a PEALD Al2O3 dielectric protective layer
112Interfaces Formed by ALD Metal Oxide Growth on Metal Layers
113Influence of plasma-based in-situ surface cleaning procedures on HfO2/In0.53Ga0.47As gate stack properties
114Atomic layer deposition for perovskite solar cells: research status, opportunities and challenges
115Thermal and plasma enhanced atomic layer deposition of ultrathin TiO2 on silicon from amide and alkoxide precursors: growth chemistry and photoelectrochemical performance
116Single-electron transistors featuring silicon nitride tunnel barriers prepared by atomic layer deposition
117Influence of stoichiometry on the performance of MIM capacitors from plasma-assisted ALD SrxTiyOz films
118Advanced surface passivation of epitaxial boron emitters for high-efficiency ultrathin crystalline silicon solar cells
119Plasma-Assisted ALD of LiPO(N) for Solid State Batteries
120Densification of Thin Aluminum Oxide Films by Thermal Treatments
121On the Contact Optimization of ALD-Based MoS2 FETs: Correlation of Processing Conditions and Interface Chemistry with Device Electrical Performance
122Atomic Layer Deposition of Silicon Nitride from Bis(tert-butylamino)silane and N2 Plasma
123Multistep atomic layer deposition process for ultrathin superconducting NbN films with high critical current density on amorphous substrate
124Plasma-assisted atomic layer deposition of HfNx: Tailoring the film properties by the plasma gas composition
125Topographically selective deposition
126Reaction mechanisms during plasma-assisted atomic layer deposition of metal oxides: A case study for Al2O3
127Atomic layer deposition TiO2-Al2O3 stack: An improved gate dielectric on Ga-polar GaN metal oxide semiconductor capacitors
128Role of Surface Termination in Atomic Layer Deposition of Silicon Nitride
129The important role of water in growth of monolayer transition metal dichalcogenides
130Electrical Measurement Under Atmospheric Conditons of PbSe Nanocrystal Thin Films Passivated by Remote Plasma Atomic Layer Deposition of Al2O3
131Thermal and Plasma Enhanced Atomic Layer Deposition of Al2O3 on GaAs Substrates
132Deposition of TiN and HfO2 in a commercial 200 mm remote plasma atomic layer deposition reactor
133Plasma Enhanced Atomic Layer Deposition of Ruthenium Films Using Ru(EtCp)2 Precursor
134Area-Selective Atomic Layer Deposition of Two-Dimensional WS2 Nanolayers
135Synergy Between Plasma-Assisted ALD and Roll-to-Roll Atmospheric Pressure PE-CVD Processing of Moisture Barrier Films on Polymers
136Photoluminescence blue shift of indium phosphide nanowire networks with aluminum oxide coating
137Atomic Layer Deposition of Cobalt Phosphide for Efficient Water Splitting
138Cathode encapsulation of organic light emitting diodes by atomic layer deposited Al2O3 films and Al2O3/a-SiNx:H stacks
139Optical emission spectroscopy as a tool for studying, optimizing, and monitoring plasma-assisted atomic layer deposition processes
140Fermi Level Tuning of ZnO Films Through Supercycled Atomic Layer Deposition
141Controlling mechanical, structural, and optical properties of Al2O3 thin films deposited by plasma-enhanced atomic layer deposition with substrate biasing
142Strongly Disordered TiN and NbTiN s-Wave Superconductors Probed by Microwave Electrodynamics
143Insulator-protected mechanically controlled break junctions for measuring single-molecule conductance in aqueous environments
144Preliminary investigation of high-k materials - TiO2 doped Ta2O5 films by remote plasma ALD
145Spectroscopic and electrical calculation of band alignment between atomic layer deposited SiO2 and β-Ga2O3 (2̅01)
146Room-Temperature ALD of Metal Oxide Thin Films by Energy-Enhanced ALD
147Microwave properties of superconducting atomic-layer deposited TiN films
148Correlation of film density and wet etch rate in hydrofluoric acid of plasma enhanced atomic layer deposited silicon nitride
149Experimental demonstration of single electron transistors featuring SiO2 plasma-enhanced atomic layer deposition in Ni-SiO2-Ni tunnel junctions
150Ion and Photon Surface Interaction during Remote Plasma ALD of Metal Oxides
151Effective Surface Passivation of InP Nanowires by Atomic-Layer-Deposited Al2O3 with POx Interlayer
152Tunable conduction type of solution-processed germanium nanoparticle based field effect transistors and their inverter integration
153Plasma-assisted atomic layer deposition of TiN/Al2O3 stacks for metal-oxide-semiconductor capacitor applications
154Sub-10-nm ferroelectric Gd-doped HfO2 layers
155Efficient and Sustained Photoelectrochemical Water Oxidation by Cobalt Oxide/Silicon Photoanodes with Nanotextured Interfaces
156Comparative study of thermal and plasma enhanced atomic layer deposition of aluminum oxide on graphene
157A Study of Ultrathin Superconducting Films of Niobium Nitride Obtained by Atomic Layer Deposition
158PEALD grown high-k ZrO2 thin films on SiC group IV compound semiconductor
159Hysteresis behaviour of top-down fabricated ZnO nanowire transistors
160Interfacial and electrical properties of Al2O3/HfO2 bilayer deposited by atomic layer deposition on GeON passivated germanium surface
161Atomic Layer Deposition of the Conductive Delafossite PtCoO2
162In situ spectroscopic ellipsometry during atomic layer deposition of Pt, Ru and Pd
163Role of Metal Contacts in Designing High-Performance Monolayer n-Type WSe2 Field Effect Transistors
164Influence of Atomic Layer Deposition Temperatures on TiO2/n-Si MOS Capacitor