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In vacuo investigations on the nucleation of TaCN by plasma enhanced atomic layer deposition In vacuo studies on plasma-enhanced atomic layer deposition of cobalt thin films Influence of oxygen source on the ferroelectric properties of ALD grown Hf_1-xZr_xO₂ films

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Oxford Instruments FlexAL Plasma Enhanced Atomic Layer Deposition Film Publications

Your search for plasma enhanced atomic layer deposition publications using Oxford Instruments FlexAL hardware returned 141 records. If there are too many results, you may want to use the multi-factor search to narrow the results.

Number	Title
1	1D versus 3D quantum confinement in 1-5 nm ZnO nanoparticle agglomerations for application in charge-trapping memory devices
2	A comparison between remote plasma-enhanced and thermal ALD of Hafnium-nitride thin films
3	A multifunctional biphasic water splitting catalyst tailored for integration with high-performance semiconductor photoanodes
4	Advanced surface passivation of epitaxial boron emitters for high-efficiency ultrathin crystalline silicon solar cells
5	Al₂O₃/SiN_x-Stacks at Increased Temperatures: Avoiding Blistering During Contact Firing
6	Analysis of NbN thin film deposition by plasma-enhanced ALD for gate electrode application
7	Application of spectral ellipsometry to in situ diagnostics of atomic layer deposition of dielectrics on silicon and AlGaN
8	Approaching the limits of dielectric breakdown for SiO₂ films deposited by plasma-enhanced atomic layer deposition
9	Area-Selective Atomic Layer Deposition of SiO₂ Using Acetylacetone as a Chemoselective Inhibitor in an ABC-Type Cycle
10	Area-Selective Atomic Layer Deposition of Two-Dimensional WS₂ Nanolayers
11	Atomic layer deposited silicon dioxide films on nanomechanical silicon nitride resonators
12	Atomic layer deposition for perovskite solar cells: research status, opportunities and challenges
13	Atomic layer deposition of aluminum fluoride using Al(CH₃)₃ and SF₆ plasma
14	Atomic Layer Deposition of Aluminum Phosphate Using AlMe₃, PO(OMe)₃, and O₂ Plasma: Film Growth and Surface Reactions
15	Atomic Layer Deposition of Cobalt Phosphide for Efficient Water Splitting
16	Atomic layer deposition of HfO₂ using HfCp(NMe₂)₃ and O₂ plasma
17	Atomic layer deposition of LiF using LiN(SiMe₃)₂ and SF₆ plasma
18	Atomic layer deposition of Ru from CpRu(CO)₂Et using O₂ gas and O₂ plasma
19	Atomic Layer Deposition of Silicon Nitride from Bis(tert-butylamino)silane and N₂ Plasma
20	Atomic layer deposition of TiN for the fabrication of nanomechanical resonators
21	Atomic Layer Deposition of Wet-Etch Resistant Silicon Nitride Using Di(sec-butylamino)silane and N₂ Plasma on Planar and 3D Substrate Topographies
22	Atomic layer deposition TiO₂-Al₂O₃ stack: An improved gate dielectric on Ga-polar GaN metal oxide semiconductor capacitors
23	Biosensor properties of SOI nanowire transistors with a PEALD Al₂O₃ dielectric protective layer
24	Cathode encapsulation of organic light emitting diodes by atomic layer deposited Al₂O₃ films and Al₂O₃/a-SiN_x:H stacks
25	Charge Transport through Organic Molecular Wires Embedded in Ultrathin Insulating Inorganic Layer
26	Comparative study of ALD SiO₂ thin films for optical applications
27	Comparative study of thermal and plasma enhanced atomic layer deposition of aluminum oxide on graphene
28	Comparison of thermal and plasma-enhanced atomic layer deposition of niobium oxide thin films
29	Controlling mechanical, structural, and optical properties of Al₂O₃ thin films deposited by plasma-enhanced atomic layer deposition with substrate biasing
30	Correlation of film density and wet etch rate in hydrofluoric acid of plasma enhanced atomic layer deposited silicon nitride
31	Corrosion barriers for silver-based telescope mirrors: comparative study of plasma-enhanced atomic layer deposition and reactive evaporation of aluminum oxide
32	Crystallization Study by Transmission Electron Microscopy of SrTiO₃ Thin Films Prepared by Plasma-Assisted ALD
33	Densification of Thin Aluminum Oxide Films by Thermal Treatments
34	Deposition of TiN and HfO₂ in a commercial 200 mm remote plasma atomic layer deposition reactor
35	Dielectric Properties of Thermal and Plasma-Assisted Atomic Layer Deposited Al₂O₃ Thin Films
36	Edge-Site Nanoengineering of WS₂ by Low-Temperature Plasma-Enhanced Atomic Layer Deposition for Electrocatalytic Hydrogen Evolution
37	Effective Surface Passivation of InP Nanowires by Atomic-Layer-Deposited Al₂O₃ with PO_x Interlayer
38	Efficient and Sustained Photoelectrochemical Water Oxidation by Cobalt Oxide/Silicon Photoanodes with Nanotextured Interfaces
39	Electrical Characteristics of Top-Down ZnO Nanowire Transistors Using Remote Plasma ALD
40	Electrical Measurement Under Atmospheric Conditons of PbSe Nanocrystal Thin Films Passivated by Remote Plasma Atomic Layer Deposition of Al₂O₃
41	Electrical properties of MOS capacitors formed by PEALD grown Al₂O₃ on silicon
42	Energetic ions during plasma-enhanced atomic layer deposition and their role in tailoring material properties
43	Energy dissipation during pulsed switching of strontium-titanate based resistive switching memory devices
44	Energy-enhanced atomic layer deposition for more process and precursor versatility
45	Enhanced Barrier Performance of Engineered Paper by Atomic Layer Deposited Al₂O₃ Thin Films
46	Enhanced surface passivation of epitaxially grown emitters for high-efficiency ultrathin crystalline Si solar cells
47	Enhancing the Wettability of High Aspect-Ratio Through-Silicon Vias Lined With LPCVD Silicon Nitride or PE-ALD Titanium Nitride for Void-Free Bottom-Up Copper Electroplating
48	Experimental demonstration of single electron transistors featuring SiO₂ plasma-enhanced atomic layer deposition in Ni-SiO₂-Ni tunnel junctions
49	Fabrication of nanoporous membranes for tuning microbial interactions and biochemical reactions
50	Fermi Level Tuning of ZnO Films Through Supercycled Atomic Layer Deposition
51	Film Conformality and Extracted Recombination Probabilities of O Atoms during Plasma-Assisted Atomic Layer Deposition of SiO₂, TiO₂, Al₂O₃, and HfO₂
52	Flexible Perovskite Photovoltaic Modules and Solar Cells Based on Atomic Layer Deposited Compact Layers and UV-Irradiated TiO₂ Scaffolds on Plastic Substrates
53	Forming-free resistive switching of tunable ZnO films grown by atomic layer deposition
54	High Dielectric Constant ZrO₂ Films by Atomic Layer Deposition Technique on Germanium Substrates
55	High-κ insulating materials for AlGaN/GaN metal insulator semiconductor heterojunction field effect transistors
56	Hot Carrier Filtering in Solution Processed Heterostructures: A Paradigm for Improving Thermoelectric Efficiency
57	Hysteresis behaviour of top-down fabricated ZnO nanowire transistors
58	Impact of composition and crystallization behavior of atomic layer deposited strontium titanate films on the resistive switching of Pt/STO/TiN devices
59	Impact of hydrogen on the permanent deactivation of the boron-oxygen-related recombination center in crystalline silicon
60	In situ spectroscopic ellipsometry during atomic layer deposition of Pt, Ru and Pd
61	Industrially relevant Al₂O₃ deposition techniques for the surface passivation of Si solar cells
62	Influence of Atomic Layer Deposition Temperatures on TiO₂/n-Si MOS Capacitor
63	Influence of plasma-based in-situ surface cleaning procedures on HfO₂/In_0.53Ga_0.47As gate stack properties
64	Influence of stoichiometry on the performance of MIM capacitors from plasma-assisted ALD Sr_xTi_yO_z films
65	Influence of the Deposition Temperature on the c-Si Surface Passivation by Al₂O₃ Films Synthesized by ALD and PECVD
66	Injection dependence of the effective lifetime of n-type Si passivated by Al₂O₃: An edge effect?
67	Insulator-protected mechanically controlled break junctions for measuring single-molecule conductance in aqueous environments
68	Interfaces Formed by ALD Metal Oxide Growth on Metal Layers
69	Interfacial and electrical properties of Al₂O₃/HfO₂ bilayer deposited by atomic layer deposition on GeON passivated germanium surface
70	Ion and Photon Surface Interaction during Remote Plasma ALD of Metal Oxides
71	Liquid-Phase Crystallized Silicon Solar Cells on Glass: Increasing the Open-Circuit Voltage by Optimized Interlayers for n- and p-Type Absorbers
72	Low resistivity HfN_x grown by plasma-assisted ALD with external rf substrate biasing
73	Low Temperature Plasma-Enhanced Atomic Layer Deposition of Metal Oxide Thin Films
74	Low-Temperature Plasma-Assisted Atomic Layer Deposition of Silicon Nitride Moisture Permeation Barrier Layers
75	Mass Spectrometry Study of Li₂CO₃ Film Growth by Thermal and Plasma-Assisted Atomic Layer Deposition
76	Mechanical and electrical properties of plasma and thermal atomic layer deposited Al₂O₃ films on GaAs and Si
77	Metal-Insulator-Metal Single Electron Transistors with Tunnel Barriers Prepared by Atomic Layer Deposition
78	Micro-Raman Spectroscopy for Monitoring of Deposition Quality of High-k Stack Protective Layer onto Nanowire FET Chips for Highly Sensitive miRNA Detection
79	Microstructure and electrical properties of thin HfO₂ deposited by plasma-enhanced atomic layer deposition
80	Microwave properties of superconducting atomic-layer deposited TiN films
81	NiCO₂O₄@TiN Core-shell Electrodes through Conformal Atomic Layer Deposition for All-solid-state Supercapacitors
82	Nitrogen-Doping of Bulk and Nanotubular TiO₂ Photocatalysts by Plasma-Assisted Atomic Layer Deposition
83	On the role of nanoporosity in controlling the performance of moisture permeation barrier layers
84	Opportunities of Atomic Layer Deposition for Perovskite Solar Cells
85	Optical emission spectroscopy as a tool for studying, optimizing, and monitoring plasma-assisted atomic layer deposition processes
86	Optimization of Plasma Enhanced Atomic Layer Deposition Processes for Oxides, Nitrides and Metals in the Oxford Instruments FlexAL Reactor
87	Order of Dry and Wet Mixed-Length Self-Assembled Monolayers
88	PEALD grown high-k ZrO₂ thin films on SiC group IV compound semiconductor
89	Photoluminescence blue shift of indium phosphide nanowire networks with aluminum oxide coating
90	Plasma Processing for Crystallization and Densification of Atomic Layer Deposition BaTiO₃ Thin Films
91	Plasma-Assisted ALD of Highly Conductive HfN_x: On the Effect of Energetic Ions on Film Microstructure
92	Plasma-Assisted ALD of LiPO(N) for Solid State Batteries
93	Plasma-assisted and thermal atomic layer deposition of electrochemically active Li₂CO₃
94	Plasma-assisted atomic layer deposition of HfN_x: Tailoring the film properties by the plasma gas composition
95	Plasma-assisted atomic layer deposition of nanolaminates for gate dielectric applications
96	Plasma-Assisted Atomic Layer Deposition of SrTiO₃: Stoichiometry and Crystallinity Studied by Spectroscopic Ellipsometry
97	Plasma-assisted atomic layer deposition of TiN/Al₂O₃ stacks for metal-oxide-semiconductor capacitor applications
98	Plasma-enhanced atomic layer deposition of BaTiO₃
99	Plasma-enhanced atomic layer deposition of tungsten oxide thin films using (tBuN)₂(Me₂N)₂W and O₂ plasma
100	Plasma-enhanced atomic-layer-deposited MoO_x emitters for silicon heterojunction solar cells
101	Possible Candidates for Impurities in mc-Si Wafers Responsible for Light-Induced Lifetime Degradation and Regeneration
102	Preliminary investigation of high-k materials - TiO₂ doped Ta₂O₅ films by remote plasma ALD
103	Probing the Origin and Suppression of Vertically Oriented Nanostructures of 2D WS₂ Layers
104	Propagation Effects in Carbon Nanoelectronics
105	Reaction mechanisms during plasma-assisted atomic layer deposition of metal oxides: A case study for Al₂O₃
106	Realistic efficiency potential of next-generation industrial Czochralski-grown silicon solar cells after deactivation of the boron-oxygen-related defect center
107	Redeposition in plasma-assisted atomic layer deposition: Silicon nitride film quality ruled by the gas residence time
108	Remote plasma enhanced atomic layer deposition of ZnO for thin film electronic applications
109	Role of Metal Contacts in Designing High-Performance Monolayer n-Type WSe₂ Field Effect Transistors
110	Role of Surface Termination in Atomic Layer Deposition of Silicon Nitride
111	Room-Temperature ALD of Metal Oxide Thin Films by Energy-Enhanced ALD
112	Silicon nanowire lithium-ion battery anodes with ALD deposited TiN coatings demonstrate a major improvement in cycling performance
113	Silicon Nitride and Silicon Oxide Thin Films by Plasma ALD
114	Silicon surface passivation by ultrathin Al₂O₃ films and Al₂O₃/SiN_x stacks
115	Simple plasma assisted atomic layer deposition technique for high substitutional nitrogen doping of TiO₂
116	Single-electron transistors featuring silicon nitride tunnel barriers prepared by atomic layer deposition
117	Spectroscopic and electrical calculation of band alignment between atomic layer deposited SiO₂ and β-Ga₂O₃ (2̅01)
118	Stability of Al₂O₃ and Al₂O₃/a-Si_x:H stacks for surface passivation of crystalline silicon
119	Strongly Disordered TiN and NbTiN s-Wave Superconductors Probed by Microwave Electrodynamics
120	Surface passivation of phosphorus-diffused n+-type emitters by plasma-assisted atomic-layer deposited Al₂O₃
121	Synergy Between Plasma-Assisted ALD and Roll-to-Roll Atmospheric Pressure PE-CVD Processing of Moisture Barrier Films on Polymers
122	The effect of atomic layer deposition temperature on switching properties of HfO_x resistive RAM devices
123	The important role of water in growth of monolayer transition metal dichalcogenides
124	The Influence of Ions and Photons during Plasma-Assisted ALD of Metal Oxides
125	The influence of surface preparation on low temperature HfO₂ ALD on InGaAs (001) and (110) surfaces
126	Thermal and Plasma Enhanced Atomic Layer Deposition of Al₂O₃ on GaAs Substrates
127	Thermal conductivity of ultrathin BaTiO₃ films grown by plasma-assisted atomic layer deposition
128	Titanium Oxynitride Interlayer to Influence Oxygen Reduction Reaction Activity and Corrosion Stability of Pt and Pt-Ni Alloy
129	Top-down fabricated ZnO nanowire transistors for application in biosensors
130	Topographical selective deposition: A comparison between plasma-enhanced atomic layer deposition/sputtering and plasma-enhanced atomic layer deposition/quasi-atomic layer etching approaches
131	Topographically selective deposition
132	Toward an integrated device for spatiotemporal superposition of free-electron lasers and laser pulses
133	Tri-gate InGaAs-OI junctionless FETs with PE-ALD Al₂O₃ gate dielectric and H₂/Ar anneal
134	Tunable conduction type of solution-processed germanium nanoparticle based field effect transistors and their inverter integration
135	Tuning Material Properties of Oxides and Nitrides by Substrate Biasing during Plasma-Enhanced Atomic Layer Deposition on Planar and 3D Substrate Topographies
136	Ultrasensitive Detection of 2,4-Dinitrophenol Using Nanowire Biosensor
137	Understanding the Oxygen Evolution Reaction Mechanism on CoO_x using Operando Ambient-Pressure X-ray Photoelectron Spectroscopy
138	Unexpectedly High Minority-Carrier Lifetimes Exceeding 20 ms Measured on 1.4-Ohm cm n-Type Silicon Wafers
139	Uniform Atomic Layer Deposition of Al₂O₃ on Graphene by Reversible Hydrogen Plasma Functionalization
140	Very High Refractive Index Transition Metal Dichalcogenide Photonic Conformal Coatings by Conversion of ALD Metal Oxides