Oxford Instruments FlexAL Plasma Enhanced Atomic Layer Deposition Film Publications

Your search for plasma enhanced atomic layer deposition publications using Oxford Instruments FlexAL hardware returned 122 records. If there are too many results, you may want to use the multi-factor search to narrow the results.

NumberTitle
11D versus 3D quantum confinement in 1-5 nm ZnO nanoparticle agglomerations for application in charge-trapping memory devices
2A comparison between remote plasma-enhanced and thermal ALD of Hafnium-nitride thin films
3A multifunctional biphasic water splitting catalyst tailored for integration with high-performance semiconductor photoanodes
4Advanced surface passivation of epitaxial boron emitters for high-efficiency ultrathin crystalline silicon solar cells
5Al2O3/SiNx-Stacks at Increased Temperatures: Avoiding Blistering During Contact Firing
6Analysis of NbN thin film deposition by plasma-enhanced ALD for gate electrode application
7Application of spectral ellipsometry to in situ diagnostics of atomic layer deposition of dielectrics on silicon and AlGaN
8Approaching the limits of dielectric breakdown for SiO2 films deposited by plasma-enhanced atomic layer deposition
9Area-Selective Atomic Layer Deposition of SiO2 Using Acetylacetone as a Chemoselective Inhibitor in an ABC-Type Cycle
10Atomic layer deposition for perovskite solar cells: research status, opportunities and challenges
11Atomic layer deposition of aluminum fluoride using Al(CH3)3 and SF6 plasma
12Atomic layer deposition of HfO2 using HfCp(NMe2)3 and O2 plasma
13Atomic layer deposition of Ru from CpRu(CO)2Et using O2 gas and O2 plasma
14Atomic Layer Deposition of Silicon Nitride from Bis(tert-butylamino)silane and N2 Plasma
15Atomic layer deposition of TiN for the fabrication of nanomechanical resonators
16Atomic Layer Deposition of Wet-Etch Resistant Silicon Nitride Using Di(sec-butylamino)silane and N2 Plasma on Planar and 3D Substrate Topographies
17Atomic layer deposition TiO2-Al2O3 stack: An improved gate dielectric on Ga-polar GaN metal oxide semiconductor capacitors
18Biosensor properties of SOI nanowire transistors with a PEALD Al2O3 dielectric protective layer
19Cathode encapsulation of organic light emitting diodes by atomic layer deposited Al2O3 films and Al2O3/a-SiNx:H stacks
20Charge Transport through Organic Molecular Wires Embedded in Ultrathin Insulating Inorganic Layer
21Comparative study of ALD SiO2 thin films for optical applications
22Comparative study of thermal and plasma enhanced atomic layer deposition of aluminum oxide on graphene
23Comparison of thermal and plasma-enhanced atomic layer deposition of niobium oxide thin films
24Controlling mechanical, structural, and optical properties of Al2O3 thin films deposited by plasma-enhanced atomic layer deposition with substrate biasing
25Correlation of film density and wet etch rate in hydrofluoric acid of plasma enhanced atomic layer deposited silicon nitride
26Corrosion barriers for silver-based telescope mirrors: comparative study of plasma-enhanced atomic layer deposition and reactive evaporation of aluminum oxide
27Crystallization Study by Transmission Electron Microscopy of SrTiO3 Thin Films Prepared by Plasma-Assisted ALD
28Densification of Thin Aluminum Oxide Films by Thermal Treatments
29Deposition of TiN and HfO2 in a commercial 200 mm remote plasma atomic layer deposition reactor
30Dielectric Properties of Thermal and Plasma-Assisted Atomic Layer Deposited Al2O3 Thin Films
31Effective Surface Passivation of InP Nanowires by Atomic-Layer-Deposited Al2O3 with POx Interlayer
32Efficient and Sustained Photoelectrochemical Water Oxidation by Cobalt Oxide/Silicon Photoanodes with Nanotextured Interfaces
33Electrical Characteristics of Top-Down ZnO Nanowire Transistors Using Remote Plasma ALD
34Electrical Measurement Under Atmospheric Conditons of PbSe Nanocrystal Thin Films Passivated by Remote Plasma Atomic Layer Deposition of Al2O3
35Electrical properties of MOS capacitors formed by PEALD grown Al2O3 on silicon
36Energetic ions during plasma-enhanced atomic layer deposition and their role in tailoring material properties
37Energy dissipation during pulsed switching of strontium-titanate based resistive switching memory devices
38Energy-enhanced atomic layer deposition for more process and precursor versatility
39Enhanced Barrier Performance of Engineered Paper by Atomic Layer Deposited Al2O3 Thin Films
40Enhanced surface passivation of epitaxially grown emitters for high-efficiency ultrathin crystalline Si solar cells
41Experimental demonstration of single electron transistors featuring SiO2 plasma-enhanced atomic layer deposition in Ni-SiO2-Ni tunnel junctions
42Fabrication of nanoporous membranes for tuning microbial interactions and biochemical reactions
43Fermi Level Tuning of ZnO Films Through Supercycled Atomic Layer Deposition
44Flexible Perovskite Photovoltaic Modules and Solar Cells Based on Atomic Layer Deposited Compact Layers and UV-Irradiated TiO2 Scaffolds on Plastic Substrates
45Forming-free resistive switching of tunable ZnO films grown by atomic layer deposition
46High Dielectric Constant ZrO2 Films by Atomic Layer Deposition Technique on Germanium Substrates
47High-κ insulating materials for AlGaN/GaN metal insulator semiconductor heterojunction field effect transistors
48Hot Carrier Filtering in Solution Processed Heterostructures: A Paradigm for Improving Thermoelectric Efficiency
49Hysteresis behaviour of top-down fabricated ZnO nanowire transistors
50Impact of composition and crystallization behavior of atomic layer deposited strontium titanate films on the resistive switching of Pt/STO/TiN devices
51Impact of hydrogen on the permanent deactivation of the boron-oxygen-related recombination center in crystalline silicon
52In situ spectroscopic ellipsometry during atomic layer deposition of Pt, Ru and Pd
53Industrially relevant Al2O3 deposition techniques for the surface passivation of Si solar cells
54Influence of Atomic Layer Deposition Temperatures on TiO2/n-Si MOS Capacitor
55Influence of plasma-based in-situ surface cleaning procedures on HfO2/In0.53Ga0.47As gate stack properties
56Influence of stoichiometry on the performance of MIM capacitors from plasma-assisted ALD SrxTiyOz films
57Influence of the Deposition Temperature on the c-Si Surface Passivation by Al2O3 Films Synthesized by ALD and PECVD
58Injection dependence of the effective lifetime of n-type Si passivated by Al2O3: An edge effect?
59Insulator-protected mechanically controlled break junctions for measuring single-molecule conductance in aqueous environments
60Interfacial and electrical properties of Al2O3/HfO2 bilayer deposited by atomic layer deposition on GeON passivated germanium surface
61Ion and Photon Surface Interaction during Remote Plasma ALD of Metal Oxides
62Liquid-Phase Crystallized Silicon Solar Cells on Glass: Increasing the Open-Circuit Voltage by Optimized Interlayers for n- and p-Type Absorbers
63Low resistivity HfNx grown by plasma-assisted ALD with external rf substrate biasing
64Low Temperature Plasma-Enhanced Atomic Layer Deposition of Metal Oxide Thin Films
65Low-Temperature Plasma-Assisted Atomic Layer Deposition of Silicon Nitride Moisture Permeation Barrier Layers
66Mass Spectrometry Study of Li2CO3 Film Growth by Thermal and Plasma-Assisted Atomic Layer Deposition
67Mechanical and electrical properties of plasma and thermal atomic layer deposited Al2O3 films on GaAs and Si
68Metal-Insulator-Metal Single Electron Transistors with Tunnel Barriers Prepared by Atomic Layer Deposition
69Microstructure and electrical properties of thin HfO2 deposited by plasma-enhanced atomic layer deposition
70Microwave properties of superconducting atomic-layer deposited TiN films
71NiCO2O4@TiN Core-shell Electrodes through Conformal Atomic Layer Deposition for All-solid-state Supercapacitors
72Nitrogen-Doping of Bulk and Nanotubular TiO2 Photocatalysts by Plasma-Assisted Atomic Layer Deposition
73On the role of nanoporosity in controlling the performance of moisture permeation barrier layers
74Opportunities of Atomic Layer Deposition for Perovskite Solar Cells
75Optical emission spectroscopy as a tool for studying, optimizing, and monitoring plasma-assisted atomic layer deposition processes
76Optimization of Plasma Enhanced Atomic Layer Deposition Processes for Oxides, Nitrides and Metals in the Oxford Instruments FlexAL Reactor
77Order of Dry and Wet Mixed-Length Self-Assembled Monolayers
78PEALD grown high-k ZrO2 thin films on SiC group IV compound semiconductor
79Plasma Processing for Crystallization and Densification of Atomic Layer Deposition BaTiO3 Thin Films
80Plasma-assisted and thermal atomic layer deposition of electrochemically active Li2CO3
81Plasma-assisted atomic layer deposition of HfNx: Tailoring the film properties by the plasma gas composition
82Plasma-assisted atomic layer deposition of nanolaminates for gate dielectric applications
83Plasma-Assisted Atomic Layer Deposition of SrTiO3: Stoichiometry and Crystallinity Studied by Spectroscopic Ellipsometry
84Plasma-assisted atomic layer deposition of TiN/Al2O3 stacks for metal-oxide-semiconductor capacitor applications
85Plasma-enhanced atomic layer deposition of BaTiO3
86Plasma-enhanced atomic layer deposition of tungsten oxide thin films using (tBuN)2(Me2N)2W and O2 plasma
87Plasma-enhanced atomic-layer-deposited MoOx emitters for silicon heterojunction solar cells
88Possible Candidates for Impurities in mc-Si Wafers Responsible for Light-Induced Lifetime Degradation and Regeneration
89Preliminary investigation of high-k materials - TiO2 doped Ta2O5 films by remote plasma ALD
90Propagation Effects in Carbon Nanoelectronics
91Realistic efficiency potential of next-generation industrial Czochralski-grown silicon solar cells after deactivation of the boron-oxygen-related defect center
92Redeposition in plasma-assisted atomic layer deposition: Silicon nitride film quality ruled by the gas residence time
93Remote plasma enhanced atomic layer deposition of ZnO for thin film electronic applications
94Role of Metal Contacts in Designing High-Performance Monolayer n-Type WSe2 Field Effect Transistors
95Role of Surface Termination in Atomic Layer Deposition of Silicon Nitride
96Room-Temperature ALD of Metal Oxide Thin Films by Energy-Enhanced ALD
97Silicon nanowire lithium-ion battery anodes with ALD deposited TiN coatings demonstrate a major improvement in cycling performance
98Silicon Nitride and Silicon Oxide Thin Films by Plasma ALD
99Silicon surface passivation by ultrathin Al2O3 films and Al2O3/SiNx stacks
100Single-electron transistors featuring silicon nitride tunnel barriers prepared by atomic layer deposition
101Spectroscopic and electrical calculation of band alignment between atomic layer deposited SiO2 and β-Ga2O3 (2̅01)
102Stability of Al2O3 and Al2O3/a-Six:H stacks for surface passivation of crystalline silicon
103Strongly Disordered TiN and NbTiN s-Wave Superconductors Probed by Microwave Electrodynamics
104Surface passivation of phosphorus-diffused n+-type emitters by plasma-assisted atomic-layer deposited Al2O3
105Synergy Between Plasma-Assisted ALD and Roll-to-Roll Atmospheric Pressure PE-CVD Processing of Moisture Barrier Films on Polymers
106The effect of atomic layer deposition temperature on switching properties of HfOx resistive RAM devices
107The important role of water in growth of monolayer transition metal dichalcogenides
108The Influence of Ions and Photons during Plasma-Assisted ALD of Metal Oxides
109The influence of surface preparation on low temperature HfO2 ALD on InGaAs (001) and (110) surfaces
110Thermal and Plasma Enhanced Atomic Layer Deposition of Al2O3 on GaAs Substrates
111Titanium Oxynitride Interlayer to Influence Oxygen Reduction Reaction Activity and Corrosion Stability of Pt and Pt-Ni Alloy
112Top-down fabricated ZnO nanowire transistors for application in biosensors
113Toward an integrated device for spatiotemporal superposition of free-electron lasers and laser pulses
114Tri-gate InGaAs-OI junctionless FETs with PE-ALD Al2O3 gate dielectric and H2/Ar anneal
115Tunable conduction type of solution-processed germanium nanoparticle based field effect transistors and their inverter integration
116Tuning Material Properties of Oxides and Nitrides by Substrate Biasing during Plasma-Enhanced Atomic Layer Deposition on Planar and 3D Substrate Topographies
117Ultrasensitive Detection of 2,4-Dinitrophenol Using Nanowire Biosensor
118Understanding the Oxygen Evolution Reaction Mechanism on CoOx using Operando Ambient-Pressure X-ray Photoelectron Spectroscopy
119Unexpectedly High Minority-Carrier Lifetimes Exceeding 20 ms Measured on 1.4-Ohm cm n-Type Silicon Wafers
120Uniform Atomic Layer Deposition of Al2O3 on Graphene by Reversible Hydrogen Plasma Functionalization
121Very High Refractive Index Transition Metal Dichalcogenide Photonic Conformal Coatings by Conversion of ALD Metal Oxides


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