2021 Year in Review

The publication database currently has 1616 entries.

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Tailoring angular selectivity in SiO₂ slanted columnar thin films using atomic layer deposition of titanium nitride Characterization of Molybdenum Oxide Thin Films Grown by Atomic Layer Deposition Thermal Interface Enhancement via Inclusion of an Adhesive Layer Using Plasma-Enhanced Atomic Layer Deposition

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202 Films Compositions

272 Precursors and Plasma Gases

77 Deposition Hardwares

250 Film and Plasma Characteristics

Oxford Instruments FlexAL Plasma Enhanced Atomic Layer Deposition Film Publications

Your search for plasma enhanced atomic layer deposition publications using Oxford Instruments FlexAL hardware returned 149 records. If there are too many results, you may want to use the multi-factor search to narrow the results.

Number	Title
1	1D versus 3D quantum confinement in 1-5 nm ZnO nanoparticle agglomerations for application in charge-trapping memory devices
2	A comparison between remote plasma-enhanced and thermal ALD of Hafnium-nitride thin films
3	A multifunctional biphasic water splitting catalyst tailored for integration with high-performance semiconductor photoanodes
4	Advanced surface passivation of epitaxial boron emitters for high-efficiency ultrathin crystalline silicon solar cells
5	Al₂O₃/SiN_x-Stacks at Increased Temperatures: Avoiding Blistering During Contact Firing
6	Analysis of NbN thin film deposition by plasma-enhanced ALD for gate electrode application
7	Application of spectral ellipsometry to in situ diagnostics of atomic layer deposition of dielectrics on silicon and AlGaN
8	Approaching the limits of dielectric breakdown for SiO₂ films deposited by plasma-enhanced atomic layer deposition
9	Area-Selective Atomic Layer Deposition of SiO₂ Using Acetylacetone as a Chemoselective Inhibitor in an ABC-Type Cycle
10	Area-Selective Atomic Layer Deposition of Two-Dimensional WS₂ Nanolayers
11	Atomic insights into the oxygen incorporation in atomic layer deposited conductive nitrides and its mitigation by energetic ions
12	Atomic layer deposited silicon dioxide films on nanomechanical silicon nitride resonators
13	Atomic layer deposition for perovskite solar cells: research status, opportunities and challenges
14	Atomic layer deposition for spacer defined double patterning of sub-10 nm titanium dioxide features
15	Atomic layer deposition of aluminum fluoride using Al(CH₃)₃ and SF₆ plasma
16	Atomic Layer Deposition of Aluminum Phosphate Using AlMe₃, PO(OMe)₃, and O₂ Plasma: Film Growth and Surface Reactions
17	Atomic Layer Deposition of Cobalt Phosphide for Efficient Water Splitting
18	Atomic layer deposition of HfO₂ using HfCp(NMe₂)₃ and O₂ plasma
19	Atomic layer deposition of LiF using LiN(SiMe₃)₂ and SF₆ plasma
20	Atomic layer deposition of Ru from CpRu(CO)₂Et using O₂ gas and O₂ plasma
21	Atomic Layer Deposition of Silicon Nitride from Bis(tert-butylamino)silane and N₂ Plasma
22	Atomic layer deposition of TiN for the fabrication of nanomechanical resonators
23	Atomic Layer Deposition of Wet-Etch Resistant Silicon Nitride Using Di(sec-butylamino)silane and N₂ Plasma on Planar and 3D Substrate Topographies
24	Atomic layer deposition TiO₂-Al₂O₃ stack: An improved gate dielectric on Ga-polar GaN metal oxide semiconductor capacitors
25	Biosensor properties of SOI nanowire transistors with a PEALD Al₂O₃ dielectric protective layer
26	Cathode encapsulation of organic light emitting diodes by atomic layer deposited Al₂O₃ films and Al₂O₃/a-SiN_x:H stacks
27	Charge Transport through Organic Molecular Wires Embedded in Ultrathin Insulating Inorganic Layer
28	Comparative study of ALD SiO₂ thin films for optical applications
29	Comparative study of thermal and plasma enhanced atomic layer deposition of aluminum oxide on graphene
30	Comparison of thermal and plasma-enhanced atomic layer deposition of niobium oxide thin films
31	Controlling mechanical, structural, and optical properties of Al₂O₃ thin films deposited by plasma-enhanced atomic layer deposition with substrate biasing
32	Correlation of film density and wet etch rate in hydrofluoric acid of plasma enhanced atomic layer deposited silicon nitride
33	Corrosion barriers for silver-based telescope mirrors: comparative study of plasma-enhanced atomic layer deposition and reactive evaporation of aluminum oxide
34	Crystallization Study by Transmission Electron Microscopy of SrTiO₃ Thin Films Prepared by Plasma-Assisted ALD
35	Densification of Thin Aluminum Oxide Films by Thermal Treatments
36	Deposition of TiN and HfO₂ in a commercial 200 mm remote plasma atomic layer deposition reactor
37	Dielectric properties investigation of a compound based on atomic layer deposited multi-layer structure
38	Dielectric Properties of Thermal and Plasma-Assisted Atomic Layer Deposited Al₂O₃ Thin Films
39	Edge-Site Nanoengineering of WS₂ by Low-Temperature Plasma-Enhanced Atomic Layer Deposition for Electrocatalytic Hydrogen Evolution
40	Effective Surface Passivation of InP Nanowires by Atomic-Layer-Deposited Al₂O₃ with PO_x Interlayer
41	Efficient and Sustained Photoelectrochemical Water Oxidation by Cobalt Oxide/Silicon Photoanodes with Nanotextured Interfaces
42	Electrical Characteristics of Top-Down ZnO Nanowire Transistors Using Remote Plasma ALD
43	Electrical Measurement Under Atmospheric Conditons of PbSe Nanocrystal Thin Films Passivated by Remote Plasma Atomic Layer Deposition of Al₂O₃
44	Electrical properties of MOS capacitors formed by PEALD grown Al₂O₃ on silicon
45	Energetic ions during plasma-enhanced atomic layer deposition and their role in tailoring material properties
46	Energy dissipation during pulsed switching of strontium-titanate based resistive switching memory devices
47	Energy-enhanced atomic layer deposition for more process and precursor versatility
48	Enhanced Barrier Performance of Engineered Paper by Atomic Layer Deposited Al₂O₃ Thin Films
49	Enhanced surface passivation of epitaxially grown emitters for high-efficiency ultrathin crystalline Si solar cells
50	Enhancing the Wettability of High Aspect-Ratio Through-Silicon Vias Lined With LPCVD Silicon Nitride or PE-ALD Titanium Nitride for Void-Free Bottom-Up Copper Electroplating
51	Experimental demonstration of single electron transistors featuring SiO₂ plasma-enhanced atomic layer deposition in Ni-SiO₂-Ni tunnel junctions
52	Fabrication of nanoporous membranes for tuning microbial interactions and biochemical reactions
53	Fermi Level Tuning of ZnO Films Through Supercycled Atomic Layer Deposition
54	Film Conformality and Extracted Recombination Probabilities of O Atoms during Plasma-Assisted Atomic Layer Deposition of SiO₂, TiO₂, Al₂O₃, and HfO₂
55	Flexible Perovskite Photovoltaic Modules and Solar Cells Based on Atomic Layer Deposited Compact Layers and UV-Irradiated TiO₂ Scaffolds on Plastic Substrates
56	Forming-free resistive switching of tunable ZnO films grown by atomic layer deposition
57	High Dielectric Constant ZrO₂ Films by Atomic Layer Deposition Technique on Germanium Substrates
58	High-κ insulating materials for AlGaN/GaN metal insulator semiconductor heterojunction field effect transistors
59	Hot Carrier Filtering in Solution Processed Heterostructures: A Paradigm for Improving Thermoelectric Efficiency
60	Hysteresis behaviour of top-down fabricated ZnO nanowire transistors
61	Impact of composition and crystallization behavior of atomic layer deposited strontium titanate films on the resistive switching of Pt/STO/TiN devices
62	Impact of hydrogen on the permanent deactivation of the boron-oxygen-related recombination center in crystalline silicon
63	Impact of Ions on Film Conformality and Crystallinity during Plasma-Assisted Atomic Layer Deposition of TiO₂
64	In situ spectroscopic ellipsometry during atomic layer deposition of Pt, Ru and Pd
65	Industrially relevant Al₂O₃ deposition techniques for the surface passivation of Si solar cells
66	Influence of Atomic Layer Deposition Temperatures on TiO₂/n-Si MOS Capacitor
67	Influence of plasma-based in-situ surface cleaning procedures on HfO₂/In_0.53Ga_0.47As gate stack properties
68	Influence of stoichiometry on the performance of MIM capacitors from plasma-assisted ALD Sr_xTi_yO_z films
69	Influence of the Deposition Temperature on the c-Si Surface Passivation by Al₂O₃ Films Synthesized by ALD and PECVD
70	Injection dependence of the effective lifetime of n-type Si passivated by Al₂O₃: An edge effect?
71	Insulator-protected mechanically controlled break junctions for measuring single-molecule conductance in aqueous environments
72	Interfaces Formed by ALD Metal Oxide Growth on Metal Layers
73	Interfacial and electrical properties of Al₂O₃/HfO₂ bilayer deposited by atomic layer deposition on GeON passivated germanium surface
74	Ion and Photon Surface Interaction during Remote Plasma ALD of Metal Oxides
75	Liquid-Phase Crystallized Silicon Solar Cells on Glass: Increasing the Open-Circuit Voltage by Optimized Interlayers for n- and p-Type Absorbers
76	Low resistivity HfN_x grown by plasma-assisted ALD with external rf substrate biasing
77	Low Temperature Plasma-Enhanced Atomic Layer Deposition of Metal Oxide Thin Films
78	Low-Temperature Plasma-Assisted Atomic Layer Deposition of Silicon Nitride Moisture Permeation Barrier Layers
79	Low-temperature plasma-enhanced atomic layer deposition of 2-D MoS₂: large area, thickness control and tuneable morphology
80	Mass Spectrometry Study of Li₂CO₃ Film Growth by Thermal and Plasma-Assisted Atomic Layer Deposition
81	Mechanical and electrical properties of plasma and thermal atomic layer deposited Al₂O₃ films on GaAs and Si
82	Metal-Insulator-Metal Single Electron Transistors with Tunnel Barriers Prepared by Atomic Layer Deposition
83	Micro-Raman Spectroscopy for Monitoring of Deposition Quality of High-k Stack Protective Layer onto Nanowire FET Chips for Highly Sensitive miRNA Detection
84	Microstructure and electrical properties of thin HfO₂ deposited by plasma-enhanced atomic layer deposition
85	Microwave properties of superconducting atomic-layer deposited TiN films
86	Multistep atomic layer deposition process for ultrathin superconducting NbN films with high critical current density on amorphous substrate
87	NiCO₂O₄@TiN Core-shell Electrodes through Conformal Atomic Layer Deposition for All-solid-state Supercapacitors
88	Nitrogen-Doping of Bulk and Nanotubular TiO₂ Photocatalysts by Plasma-Assisted Atomic Layer Deposition
89	On the Contact Optimization of ALD-Based MoS₂ FETs: Correlation of Processing Conditions and Interface Chemistry with Device Electrical Performance
90	On the role of nanoporosity in controlling the performance of moisture permeation barrier layers
91	Opportunities of Atomic Layer Deposition for Perovskite Solar Cells
92	Optical emission spectroscopy as a tool for studying, optimizing, and monitoring plasma-assisted atomic layer deposition processes
93	Optimization of Plasma Enhanced Atomic Layer Deposition Processes for Oxides, Nitrides and Metals in the Oxford Instruments FlexAL Reactor
94	Order of Dry and Wet Mixed-Length Self-Assembled Monolayers
95	PEALD grown high-k ZrO₂ thin films on SiC group IV compound semiconductor
96	Photoluminescence blue shift of indium phosphide nanowire networks with aluminum oxide coating
97	Plasma Processing for Crystallization and Densification of Atomic Layer Deposition BaTiO₃ Thin Films
98	Plasma-Assisted ALD of Highly Conductive HfN_x: On the Effect of Energetic Ions on Film Microstructure
99	Plasma-Assisted ALD of LiPO(N) for Solid State Batteries
100	Plasma-assisted and thermal atomic layer deposition of electrochemically active Li₂CO₃
101	Plasma-assisted atomic layer deposition of HfN_x: Tailoring the film properties by the plasma gas composition
102	Plasma-assisted atomic layer deposition of nanolaminates for gate dielectric applications
103	Plasma-Assisted Atomic Layer Deposition of SrTiO₃: Stoichiometry and Crystallinity Studied by Spectroscopic Ellipsometry
104	Plasma-assisted atomic layer deposition of TiN/Al₂O₃ stacks for metal-oxide-semiconductor capacitor applications
105	Plasma-enhanced atomic layer deposition of BaTiO₃
106	Plasma-enhanced atomic layer deposition of tungsten oxide thin films using (tBuN)₂(Me₂N)₂W and O₂ plasma
107	Plasma-enhanced atomic-layer-deposited MoO_x emitters for silicon heterojunction solar cells
108	Possible Candidates for Impurities in mc-Si Wafers Responsible for Light-Induced Lifetime Degradation and Regeneration
109	Preliminary investigation of high-k materials - TiO₂ doped Ta₂O₅ films by remote plasma ALD
110	Probing the Origin and Suppression of Vertically Oriented Nanostructures of 2D WS₂ Layers
111	Propagation Effects in Carbon Nanoelectronics
112	Reaction Mechanisms during Atomic Layer Deposition of AlF₃ Using Al(CH₃)₃ and SF₆ Plasma
113	Reaction mechanisms during plasma-assisted atomic layer deposition of metal oxides: A case study for Al₂O₃
114	Realistic efficiency potential of next-generation industrial Czochralski-grown silicon solar cells after deactivation of the boron-oxygen-related defect center
115	Redeposition in plasma-assisted atomic layer deposition: Silicon nitride film quality ruled by the gas residence time
116	Remote plasma enhanced atomic layer deposition of ZnO for thin film electronic applications
117	Role of Metal Contacts in Designing High-Performance Monolayer n-Type WSe₂ Field Effect Transistors
118	Role of Surface Termination in Atomic Layer Deposition of Silicon Nitride
119	Room-Temperature ALD of Metal Oxide Thin Films by Energy-Enhanced ALD
120	Silicon nanowire lithium-ion battery anodes with ALD deposited TiN coatings demonstrate a major improvement in cycling performance
121	Silicon Nitride and Silicon Oxide Thin Films by Plasma ALD
122	Silicon surface passivation by ultrathin Al₂O₃ films and Al₂O₃/SiN_x stacks
123	Simple plasma assisted atomic layer deposition technique for high substitutional nitrogen doping of TiO₂
124	Single-electron transistors featuring silicon nitride tunnel barriers prepared by atomic layer deposition
125	Spectroscopic and electrical calculation of band alignment between atomic layer deposited SiO₂ and β-Ga₂O₃ (2̅01)
126	Stability of Al₂O₃ and Al₂O₃/a-Si_x:H stacks for surface passivation of crystalline silicon
127	Strongly Disordered TiN and NbTiN s-Wave Superconductors Probed by Microwave Electrodynamics
128	Surface passivation of phosphorus-diffused n+-type emitters by plasma-assisted atomic-layer deposited Al₂O₃
129	Synergy Between Plasma-Assisted ALD and Roll-to-Roll Atmospheric Pressure PE-CVD Processing of Moisture Barrier Films on Polymers
130	The effect of atomic layer deposition temperature on switching properties of HfO_x resistive RAM devices
131	The important role of water in growth of monolayer transition metal dichalcogenides
132	The Influence of Ions and Photons during Plasma-Assisted ALD of Metal Oxides
133	The influence of surface preparation on low temperature HfO₂ ALD on InGaAs (001) and (110) surfaces
134	Thermal and Plasma Enhanced Atomic Layer Deposition of Al₂O₃ on GaAs Substrates
135	Thermal conductivity of ultrathin BaTiO₃ films grown by plasma-assisted atomic layer deposition
136	Titanium Oxynitride Interlayer to Influence Oxygen Reduction Reaction Activity and Corrosion Stability of Pt and Pt-Ni Alloy
137	Top-down fabricated ZnO nanowire transistors for application in biosensors
138	Topographical selective deposition: A comparison between plasma-enhanced atomic layer deposition/sputtering and plasma-enhanced atomic layer deposition/quasi-atomic layer etching approaches
139	Topographically selective deposition
140	Toward an integrated device for spatiotemporal superposition of free-electron lasers and laser pulses
141	Tri-gate InGaAs-OI junctionless FETs with PE-ALD Al₂O₃ gate dielectric and H₂/Ar anneal
142	Tunable conduction type of solution-processed germanium nanoparticle based field effect transistors and their inverter integration
143	Tuning Material Properties of Oxides and Nitrides by Substrate Biasing during Plasma-Enhanced Atomic Layer Deposition on Planar and 3D Substrate Topographies
144	Ultrasensitive Detection of 2,4-Dinitrophenol Using Nanowire Biosensor
145	Understanding the Oxygen Evolution Reaction Mechanism on CoO_x using Operando Ambient-Pressure X-ray Photoelectron Spectroscopy
146	Unexpectedly High Minority-Carrier Lifetimes Exceeding 20 ms Measured on 1.4-Ohm cm n-Type Silicon Wafers
147	Uniform Atomic Layer Deposition of Al₂O₃ on Graphene by Reversible Hydrogen Plasma Functionalization
148	Very High Refractive Index Transition Metal Dichalcogenide Photonic Conformal Coatings by Conversion of ALD Metal Oxides