Oxford Instruments FlexAL Plasma Enhanced Atomic Layer Deposition Film Publications

Your search for plasma enhanced atomic layer deposition publications using Oxford Instruments FlexAL hardware returned 111 records. If there are too many results, you may want to use the multi-factor search to narrow the results.

NumberTitle
11D versus 3D quantum confinement in 1-5 nm ZnO nanoparticle agglomerations for application in charge-trapping memory devices
2A comparison between remote plasma-enhanced and thermal ALD of Hafnium-nitride thin films
3A multifunctional biphasic water splitting catalyst tailored for integration with high-performance semiconductor photoanodes
4Advanced surface passivation of epitaxial boron emitters for high-efficiency ultrathin crystalline silicon solar cells
5Al2O3/SiNx-Stacks at Increased Temperatures: Avoiding Blistering During Contact Firing
6Analysis of NbN thin film deposition by plasma-enhanced ALD for gate electrode application
7Application of spectral ellipsometry to in situ diagnostics of atomic layer deposition of dielectrics on silicon and AlGaN
8Approaching the limits of dielectric breakdown for SiO2 films deposited by plasma-enhanced atomic layer deposition
9Area-Selective Atomic Layer Deposition of SiO2 Using Acetylacetone as a Chemoselective Inhibitor in an ABC-Type Cycle
10Atomic layer deposition for perovskite solar cells: research status, opportunities and challenges
11Atomic layer deposition of aluminum fluoride using Al(CH3)3 and SF6 plasma
12Atomic layer deposition of HfO2 using HfCp(NMe2)3 and O2 plasma
13Atomic layer deposition of Ru from CpRu(CO)2Et using O2 gas and O2 plasma
14Atomic Layer Deposition of Silicon Nitride from Bis(tert-butylamino)silane and N2 Plasma
15Atomic layer deposition of TiN for the fabrication of nanomechanical resonators
16Atomic Layer Deposition of Wet-Etch Resistant Silicon Nitride Using Di(sec-butylamino)silane and N2 Plasma on Planar and 3D Substrate Topographies
17Atomic layer deposition TiO2-Al2O3 stack: An improved gate dielectric on Ga-polar GaN metal oxide semiconductor capacitors
18Biosensor properties of SOI nanowire transistors with a PEALD Al2O3 dielectric protective layer
19Cathode encapsulation of organic light emitting diodes by atomic layer deposited Al2O3 films and Al2O3/a-SiNx:H stacks
20Charge Transport through Organic Molecular Wires Embedded in Ultrathin Insulating Inorganic Layer
21Comparative study of ALD SiO2 thin films for optical applications
22Comparative study of thermal and plasma enhanced atomic layer deposition of aluminum oxide on graphene
23Correlation of film density and wet etch rate in hydrofluoric acid of plasma enhanced atomic layer deposited silicon nitride
24Corrosion barriers for silver-based telescope mirrors: comparative study of plasma-enhanced atomic layer deposition and reactive evaporation of aluminum oxide
25Crystallization Study by Transmission Electron Microscopy of SrTiO3 Thin Films Prepared by Plasma-Assisted ALD
26Densification of Thin Aluminum Oxide Films by Thermal Treatments
27Deposition of TiN and HfO2 in a commercial 200 mm remote plasma atomic layer deposition reactor
28Dielectric Properties of Thermal and Plasma-Assisted Atomic Layer Deposited Al2O3 Thin Films
29Effective Surface Passivation of InP Nanowires by Atomic-Layer-Deposited Al2O3 with POx Interlayer
30Efficient and Sustained Photoelectrochemical Water Oxidation by Cobalt Oxide/Silicon Photoanodes with Nanotextured Interfaces
31Electrical Characteristics of Top-Down ZnO Nanowire Transistors Using Remote Plasma ALD
32Electrical Measurement Under Atmospheric Conditons of PbSe Nanocrystal Thin Films Passivated by Remote Plasma Atomic Layer Deposition of Al2O3
33Electrical properties of MOS capacitors formed by PEALD grown Al2O3 on silicon
34Energy dissipation during pulsed switching of strontium-titanate based resistive switching memory devices
35Energy-enhanced atomic layer deposition for more process and precursor versatility
36Enhanced Barrier Performance of Engineered Paper by Atomic Layer Deposited Al2O3 Thin Films
37Enhanced non-volatile memory characteristics with quattro-layer graphene nanoplatelets vs. 2.85-nm Si nanoparticles with asymmetric Al2O3/HfO2 tunnel oxide
38Enhanced surface passivation of epitaxially grown emitters for high-efficiency ultrathin crystalline Si solar cells
39Experimental demonstration of single electron transistors featuring SiO2 plasma-enhanced atomic layer deposition in Ni-SiO2-Ni tunnel junctions
40Fermi Level Tuning of ZnO Films Through Supercycled Atomic Layer Deposition
41Flexible Perovskite Photovoltaic Modules and Solar Cells Based on Atomic Layer Deposited Compact Layers and UV-Irradiated TiO2 Scaffolds on Plastic Substrates
42Forming-free resistive switching of tunable ZnO films grown by atomic layer deposition
43High Dielectric Constant ZrO2 Films by Atomic Layer Deposition Technique on Germanium Substrates
44High-κ insulating materials for AlGaN/GaN metal insulator semiconductor heterojunction field effect transistors
45Hot Carrier Filtering in Solution Processed Heterostructures: A Paradigm for Improving Thermoelectric Efficiency
46Hysteresis behaviour of top-down fabricated ZnO nanowire transistors
47Impact of composition and crystallization behavior of atomic layer deposited strontium titanate films on the resistive switching of Pt/STO/TiN devices
48Impact of hydrogen on the permanent deactivation of the boron-oxygen-related recombination center in crystalline silicon
49In situ spectroscopic ellipsometry during atomic layer deposition of Pt, Ru and Pd
50Industrially relevant Al2O3 deposition techniques for the surface passivation of Si solar cells
51Influence of Atomic Layer Deposition Temperatures on TiO2/n-Si MOS Capacitor
52Influence of stoichiometry on the performance of MIM capacitors from plasma-assisted ALD SrxTiyOz films
53Influence of the Deposition Temperature on the c-Si Surface Passivation by Al2O3 Films Synthesized by ALD and PECVD
54Injection dependence of the effective lifetime of n-type Si passivated by Al2O3: An edge effect?
55Insulator-protected mechanically controlled break junctions for measuring single-molecule conductance in aqueous environments
56Interfacial and electrical properties of Al2O3/HfO2 bilayer deposited by atomic layer deposition on GeON passivated germanium surface
57Ion and Photon Surface Interaction during Remote Plasma ALD of Metal Oxides
58Liquid-Phase Crystallized Silicon Solar Cells on Glass: Increasing the Open-Circuit Voltage by Optimized Interlayers for n- and p-Type Absorbers
59Low Temperature Plasma-Enhanced Atomic Layer Deposition of Metal Oxide Thin Films
60Low-Temperature Plasma-Assisted Atomic Layer Deposition of Silicon Nitride Moisture Permeation Barrier Layers
61Mechanical and electrical properties of plasma and thermal atomic layer deposited Al2O3 films on GaAs and Si
62Metal-Insulator-Metal Single Electron Transistors with Tunnel Barriers Prepared by Atomic Layer Deposition
63Microwave properties of superconducting atomic-layer deposited TiN films
64NiCO2O4@TiN Core-shell Electrodes through Conformal Atomic Layer Deposition for All-solid-state Supercapacitors
65Nitrogen-Doping of Bulk and Nanotubular TiO2 Photocatalysts by Plasma-Assisted Atomic Layer Deposition
66On the role of nanoporosity in controlling the performance of moisture permeation barrier layers
67Opportunities of Atomic Layer Deposition for Perovskite Solar Cells
68Optical emission spectroscopy as a tool for studying, optimizing, and monitoring plasma-assisted atomic layer deposition processes
69Order of Dry and Wet Mixed-Length Self-Assembled Monolayers
70PEALD grown high-k ZrO2 thin films on SiC group IV compound semiconductor
71Plasma Processing for Crystallization and Densification of Atomic Layer Deposition BaTiO3 Thin Films
72Plasma-assisted and thermal atomic layer deposition of electrochemically active Li2CO3
73Plasma-assisted atomic layer deposition of HfNx: Tailoring the film properties by the plasma gas composition
74Plasma-assisted atomic layer deposition of nanolaminates for gate dielectric applications
75Plasma-Assisted Atomic Layer Deposition of SrTiO3: Stoichiometry and Crystallinity Studied by Spectroscopic Ellipsometry
76Plasma-assisted atomic layer deposition of TiN/Al2O3 stacks for metal-oxide-semiconductor capacitor applications
77Plasma-enhanced atomic layer deposition of BaTiO3
78Plasma-enhanced atomic layer deposition of tungsten oxide thin films using (tBuN)2(Me2N)2W and O2 plasma
79Plasma-enhanced atomic-layer-deposited MoOx emitters for silicon heterojunction solar cells
80Possible Candidates for Impurities in mc-Si Wafers Responsible for Light-Induced Lifetime Degradation and Regeneration
81Preliminary investigation of high-k materials - TiO2 doped Ta2O5 films by remote plasma ALD
82Propagation Effects in Carbon Nanoelectronics
83Realistic efficiency potential of next-generation industrial Czochralski-grown silicon solar cells after deactivation of the boron-oxygen-related defect center
84Redeposition in plasma-assisted atomic layer deposition: Silicon nitride film quality ruled by the gas residence time
85Remote plasma enhanced atomic layer deposition of ZnO for thin film electronic applications
86Role of Metal Contacts in Designing High-Performance Monolayer n-Type WSe2 Field Effect Transistors
87Role of Surface Termination in Atomic Layer Deposition of Silicon Nitride
88Room-Temperature ALD of Metal Oxide Thin Films by Energy-Enhanced ALD
89Silicon nanowire lithium-ion battery anodes with ALD deposited TiN coatings demonstrate a major improvement in cycling performance
90Silicon Nitride and Silicon Oxide Thin Films by Plasma ALD
91Silicon surface passivation by ultrathin Al2O3 films and Al2O3/SiNx stacks
92Single-electron transistors featuring silicon nitride tunnel barriers prepared by atomic layer deposition
93Spectroscopic and electrical calculation of band alignment between atomic layer deposited SiO2 and β-Ga2O3 (2̅01)
94Stability of Al2O3 and Al2O3/a-Six:H stacks for surface passivation of crystalline silicon
95Strongly Disordered TiN and NbTiN s-Wave Superconductors Probed by Microwave Electrodynamics
96Surface passivation of phosphorus-diffused n+-type emitters by plasma-assisted atomic-layer deposited Al2O3
97Synergy Between Plasma-Assisted ALD and Roll-to-Roll Atmospheric Pressure PE-CVD Processing of Moisture Barrier Films on Polymers
98The effect of atomic layer deposition temperature on switching properties of HfOx resistive RAM devices
99The important role of water in growth of monolayer transition metal dichalcogenides
100The Influence of Ions and Photons during Plasma-Assisted ALD of Metal Oxides
101The influence of surface preparation on low temperature HfO2 ALD on InGaAs (001) and (110) surfaces
102Thermal and Plasma Enhanced Atomic Layer Deposition of Al2O3 on GaAs Substrates
103Titanium Oxynitride Interlayer to Influence Oxygen Reduction Reaction Activity and Corrosion Stability of Pt and Pt-Ni Alloy
104Top-down fabricated ZnO nanowire transistors for application in biosensors
105Toward an integrated device for spatiotemporal superposition of free-electron lasers and laser pulses
106Tri-gate InGaAs-OI junctionless FETs with PE-ALD Al2O3 gate dielectric and H2/Ar anneal
107Tunable conduction type of solution-processed germanium nanoparticle based field effect transistors and their inverter integration
108Tuning Material Properties of Oxides and Nitrides by Substrate Biasing during Plasma-Enhanced Atomic Layer Deposition on Planar and 3D Substrate Topographies
109Understanding the Oxygen Evolution Reaction Mechanism on CoOx using Operando Ambient-Pressure X-ray Photoelectron Spectroscopy
110Unexpectedly High Minority-Carrier Lifetimes Exceeding 20 ms Measured on 1.4-Ohm cm n-Type Silicon Wafers
111Uniform Atomic Layer Deposition of Al2O3 on Graphene by Reversible Hydrogen Plasma Functionalization


Shortcuts



© 2014-2018 plasma-ald.com