Oxford Instruments FlexAL Plasma Enhanced Atomic Layer Deposition Film Publications

Your search for plasma enhanced atomic layer deposition publications using Oxford Instruments FlexAL hardware returned 120 records. If there are too many results, you may want to use the multi-factor search to narrow the results.

Number	Title
1	1D versus 3D quantum confinement in 1-5 nm ZnO nanoparticle agglomerations for application in charge-trapping memory devices
2	A comparison between remote plasma-enhanced and thermal ALD of Hafnium-nitride thin films
3	A multifunctional biphasic water splitting catalyst tailored for integration with high-performance semiconductor photoanodes
4	Advanced surface passivation of epitaxial boron emitters for high-efficiency ultrathin crystalline silicon solar cells
5	Al2O3/SiNx-Stacks at Increased Temperatures: Avoiding Blistering During Contact Firing
6	Analysis of NbN thin film deposition by plasma-enhanced ALD for gate electrode application
7	Application of spectral ellipsometry to in situ diagnostics of atomic layer deposition of dielectrics on silicon and AlGaN
8	Approaching the limits of dielectric breakdown for SiO2 films deposited by plasma-enhanced atomic layer deposition
9	Area-Selective Atomic Layer Deposition of SiO2 Using Acetylacetone as a Chemoselective Inhibitor in an ABC-Type Cycle
10	Atomic layer deposition for perovskite solar cells: research status, opportunities and challenges
11	Atomic layer deposition of aluminum fluoride using Al(CH3)3 and SF6 plasma
12	Atomic layer deposition of HfO2 using HfCp(NMe2)3 and O2 plasma
13	Atomic layer deposition of Ru from CpRu(CO)2Et using O2 gas and O2 plasma
14	Atomic Layer Deposition of Silicon Nitride from Bis(tert-butylamino)silane and N2 Plasma
15	Atomic layer deposition of TiN for the fabrication of nanomechanical resonators
16	Atomic Layer Deposition of Wet-Etch Resistant Silicon Nitride Using Di(sec-butylamino)silane and N2 Plasma on Planar and 3D Substrate Topographies
17	Atomic layer deposition TiO2-Al2O3 stack: An improved gate dielectric on Ga-polar GaN metal oxide semiconductor capacitors
18	Biosensor properties of SOI nanowire transistors with a PEALD Al2O3 dielectric protective layer
19	Cathode encapsulation of organic light emitting diodes by atomic layer deposited Al2O3 films and Al2O3/a-SiNx:H stacks
20	Charge Transport through Organic Molecular Wires Embedded in Ultrathin Insulating Inorganic Layer
21	Comparative study of ALD SiO2 thin films for optical applications
22	Comparative study of thermal and plasma enhanced atomic layer deposition of aluminum oxide on graphene
23	Comparison of thermal and plasma-enhanced atomic layer deposition of niobium oxide thin films
24	Controlling mechanical, structural, and optical properties of Al2O3 thin films deposited by plasma-enhanced atomic layer deposition with substrate biasing
25	Correlation of film density and wet etch rate in hydrofluoric acid of plasma enhanced atomic layer deposited silicon nitride
26	Corrosion barriers for silver-based telescope mirrors: comparative study of plasma-enhanced atomic layer deposition and reactive evaporation of aluminum oxide
27	Crystallization Study by Transmission Electron Microscopy of SrTiO3 Thin Films Prepared by Plasma-Assisted ALD
28	Densification of Thin Aluminum Oxide Films by Thermal Treatments
29	Deposition of TiN and HfO2 in a commercial 200 mm remote plasma atomic layer deposition reactor
30	Dielectric Properties of Thermal and Plasma-Assisted Atomic Layer Deposited Al2O3 Thin Films
31	Effective Surface Passivation of InP Nanowires by Atomic-Layer-Deposited Al2O3 with POx Interlayer
32	Efficient and Sustained Photoelectrochemical Water Oxidation by Cobalt Oxide/Silicon Photoanodes with Nanotextured Interfaces
33	Electrical Characteristics of Top-Down ZnO Nanowire Transistors Using Remote Plasma ALD
34	Electrical Measurement Under Atmospheric Conditons of PbSe Nanocrystal Thin Films Passivated by Remote Plasma Atomic Layer Deposition of Al2O3
35	Electrical properties of MOS capacitors formed by PEALD grown Al2O3 on silicon
36	Energetic ions during plasma-enhanced atomic layer deposition and their role in tailoring material properties
37	Energy dissipation during pulsed switching of strontium-titanate based resistive switching memory devices
38	Energy-enhanced atomic layer deposition for more process and precursor versatility
39	Enhanced Barrier Performance of Engineered Paper by Atomic Layer Deposited Al2O3 Thin Films
40	Enhanced non-volatile memory characteristics with quattro-layer graphene nanoplatelets vs. 2.85-nm Si nanoparticles with asymmetric Al2O3/HfO2 tunnel oxide
41	Enhanced surface passivation of epitaxially grown emitters for high-efficiency ultrathin crystalline Si solar cells
42	Experimental demonstration of single electron transistors featuring SiO2 plasma-enhanced atomic layer deposition in Ni-SiO2-Ni tunnel junctions
43	Fermi Level Tuning of ZnO Films Through Supercycled Atomic Layer Deposition
44	Flexible Perovskite Photovoltaic Modules and Solar Cells Based on Atomic Layer Deposited Compact Layers and UV-Irradiated TiO2 Scaffolds on Plastic Substrates
45	Forming-free resistive switching of tunable ZnO films grown by atomic layer deposition
46	High Dielectric Constant ZrO2 Films by Atomic Layer Deposition Technique on Germanium Substrates
47	High-κ insulating materials for AlGaN/GaN metal insulator semiconductor heterojunction field effect transistors
48	Hot Carrier Filtering in Solution Processed Heterostructures: A Paradigm for Improving Thermoelectric Efficiency
49	Hysteresis behaviour of top-down fabricated ZnO nanowire transistors
50	Impact of composition and crystallization behavior of atomic layer deposited strontium titanate films on the resistive switching of Pt/STO/TiN devices
51	Impact of hydrogen on the permanent deactivation of the boron-oxygen-related recombination center in crystalline silicon
52	In situ spectroscopic ellipsometry during atomic layer deposition of Pt, Ru and Pd
53	Industrially relevant Al2O3 deposition techniques for the surface passivation of Si solar cells
54	Influence of Atomic Layer Deposition Temperatures on TiO2/n-Si MOS Capacitor
55	Influence of stoichiometry on the performance of MIM capacitors from plasma-assisted ALD SrxTiyOz films
56	Influence of the Deposition Temperature on the c-Si Surface Passivation by Al2O3 Films Synthesized by ALD and PECVD
57	Injection dependence of the effective lifetime of n-type Si passivated by Al2O3: An edge effect?
58	Insulator-protected mechanically controlled break junctions for measuring single-molecule conductance in aqueous environments
59	Interfacial and electrical properties of Al2O3/HfO2 bilayer deposited by atomic layer deposition on GeON passivated germanium surface
60	Ion and Photon Surface Interaction during Remote Plasma ALD of Metal Oxides
61	Liquid-Phase Crystallized Silicon Solar Cells on Glass: Increasing the Open-Circuit Voltage by Optimized Interlayers for n- and p-Type Absorbers
62	Low resistivity HfNx grown by plasma-assisted ALD with external rf substrate biasing
63	Low Temperature Plasma-Enhanced Atomic Layer Deposition of Metal Oxide Thin Films
64	Low-Temperature Plasma-Assisted Atomic Layer Deposition of Silicon Nitride Moisture Permeation Barrier Layers
65	Mass Spectrometry Study of Li2CO3 Film Growth by Thermal and Plasma-Assisted Atomic Layer Deposition
66	Mechanical and electrical properties of plasma and thermal atomic layer deposited Al2O3 films on GaAs and Si
67	Metal-Insulator-Metal Single Electron Transistors with Tunnel Barriers Prepared by Atomic Layer Deposition
68	Microstructure and electrical properties of thin HfO2 deposited by plasma-enhanced atomic layer deposition
69	Microwave properties of superconducting atomic-layer deposited TiN films
70	NiCO2O4@TiN Core-shell Electrodes through Conformal Atomic Layer Deposition for All-solid-state Supercapacitors
71	Nitrogen-Doping of Bulk and Nanotubular TiO2 Photocatalysts by Plasma-Assisted Atomic Layer Deposition
72	On the role of nanoporosity in controlling the performance of moisture permeation barrier layers
73	Opportunities of Atomic Layer Deposition for Perovskite Solar Cells
74	Optical emission spectroscopy as a tool for studying, optimizing, and monitoring plasma-assisted atomic layer deposition processes
75	Optimization of Plasma Enhanced Atomic Layer Deposition Processes for Oxides, Nitrides and Metals in the Oxford Instruments FlexAL Reactor
76	Order of Dry and Wet Mixed-Length Self-Assembled Monolayers
77	PEALD grown high-k ZrO2 thin films on SiC group IV compound semiconductor
78	Plasma Processing for Crystallization and Densification of Atomic Layer Deposition BaTiO3 Thin Films
79	Plasma-assisted and thermal atomic layer deposition of electrochemically active Li2CO3
80	Plasma-assisted atomic layer deposition of HfNx: Tailoring the film properties by the plasma gas composition
81	Plasma-assisted atomic layer deposition of nanolaminates for gate dielectric applications
82	Plasma-Assisted Atomic Layer Deposition of SrTiO3: Stoichiometry and Crystallinity Studied by Spectroscopic Ellipsometry
83	Plasma-assisted atomic layer deposition of TiN/Al2O3 stacks for metal-oxide-semiconductor capacitor applications
84	Plasma-enhanced atomic layer deposition of BaTiO3
85	Plasma-enhanced atomic layer deposition of tungsten oxide thin films using (tBuN)2(Me2N)2W and O2 plasma
86	Plasma-enhanced atomic-layer-deposited MoOx emitters for silicon heterojunction solar cells
87	Possible Candidates for Impurities in mc-Si Wafers Responsible for Light-Induced Lifetime Degradation and Regeneration
88	Preliminary investigation of high-k materials - TiO2 doped Ta2O5 films by remote plasma ALD
89	Propagation Effects in Carbon Nanoelectronics
90	Realistic efficiency potential of next-generation industrial Czochralski-grown silicon solar cells after deactivation of the boron-oxygen-related defect center
91	Redeposition in plasma-assisted atomic layer deposition: Silicon nitride film quality ruled by the gas residence time
92	Remote plasma enhanced atomic layer deposition of ZnO for thin film electronic applications
93	Role of Metal Contacts in Designing High-Performance Monolayer n-Type WSe2 Field Effect Transistors
94	Role of Surface Termination in Atomic Layer Deposition of Silicon Nitride
95	Room-Temperature ALD of Metal Oxide Thin Films by Energy-Enhanced ALD
96	Silicon nanowire lithium-ion battery anodes with ALD deposited TiN coatings demonstrate a major improvement in cycling performance
97	Silicon Nitride and Silicon Oxide Thin Films by Plasma ALD
98	Silicon surface passivation by ultrathin Al2O3 films and Al2O3/SiNx stacks
99	Single-electron transistors featuring silicon nitride tunnel barriers prepared by atomic layer deposition
100	Spectroscopic and electrical calculation of band alignment between atomic layer deposited SiO2 and β-Ga2O3 (2̅01)
101	Stability of Al2O3 and Al2O3/a-Six:H stacks for surface passivation of crystalline silicon
102	Strongly Disordered TiN and NbTiN s-Wave Superconductors Probed by Microwave Electrodynamics
103	Surface passivation of phosphorus-diffused n+-type emitters by plasma-assisted atomic-layer deposited Al2O3
104	Synergy Between Plasma-Assisted ALD and Roll-to-Roll Atmospheric Pressure PE-CVD Processing of Moisture Barrier Films on Polymers
105	The effect of atomic layer deposition temperature on switching properties of HfOx resistive RAM devices
106	The important role of water in growth of monolayer transition metal dichalcogenides
107	The Influence of Ions and Photons during Plasma-Assisted ALD of Metal Oxides
108	The influence of surface preparation on low temperature HfO2 ALD on InGaAs (001) and (110) surfaces
109	Thermal and Plasma Enhanced Atomic Layer Deposition of Al2O3 on GaAs Substrates
110	Titanium Oxynitride Interlayer to Influence Oxygen Reduction Reaction Activity and Corrosion Stability of Pt and Pt-Ni Alloy
111	Top-down fabricated ZnO nanowire transistors for application in biosensors
112	Toward an integrated device for spatiotemporal superposition of free-electron lasers and laser pulses
113	Tri-gate InGaAs-OI junctionless FETs with PE-ALD Al2O3 gate dielectric and H2/Ar anneal
114	Tunable conduction type of solution-processed germanium nanoparticle based field effect transistors and their inverter integration
115	Tuning Material Properties of Oxides and Nitrides by Substrate Biasing during Plasma-Enhanced Atomic Layer Deposition on Planar and 3D Substrate Topographies
116	Ultrasensitive Detection of 2,4-Dinitrophenol Using Nanowire Biosensor
117	Understanding the Oxygen Evolution Reaction Mechanism on CoOx using Operando Ambient-Pressure X-ray Photoelectron Spectroscopy
118	Unexpectedly High Minority-Carrier Lifetimes Exceeding 20 ms Measured on 1.4-Ohm cm n-Type Silicon Wafers
119	Uniform Atomic Layer Deposition of Al2O3 on Graphene by Reversible Hydrogen Plasma Functionalization
120	Very High Refractive Index Transition Metal Dichalcogenide Photonic Conformal Coatings by Conversion of ALD Metal Oxides

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