Oxford Instruments FlexAL Plasma Enhanced Atomic Layer Deposition Film Publications

Your search for plasma enhanced atomic layer deposition publications using Oxford Instruments FlexAL hardware returned 132 records. If there are too many results, you may want to use the multi-factor search to narrow the results.

NumberTitle
11D versus 3D quantum confinement in 1-5 nm ZnO nanoparticle agglomerations for application in charge-trapping memory devices
2A comparison between remote plasma-enhanced and thermal ALD of Hafnium-nitride thin films
3A multifunctional biphasic water splitting catalyst tailored for integration with high-performance semiconductor photoanodes
4Advanced surface passivation of epitaxial boron emitters for high-efficiency ultrathin crystalline silicon solar cells
5Al2O3/SiNx-Stacks at Increased Temperatures: Avoiding Blistering During Contact Firing
6Analysis of NbN thin film deposition by plasma-enhanced ALD for gate electrode application
7Application of spectral ellipsometry to in situ diagnostics of atomic layer deposition of dielectrics on silicon and AlGaN
8Approaching the limits of dielectric breakdown for SiO2 films deposited by plasma-enhanced atomic layer deposition
9Area-Selective Atomic Layer Deposition of SiO2 Using Acetylacetone as a Chemoselective Inhibitor in an ABC-Type Cycle
10Atomic layer deposited silicon dioxide films on nanomechanical silicon nitride resonators
11Atomic layer deposition for perovskite solar cells: research status, opportunities and challenges
12Atomic layer deposition of aluminum fluoride using Al(CH3)3 and SF6 plasma
13Atomic Layer Deposition of Aluminum Phosphate Using AlMe3, PO(OMe)3, and O2 Plasma: Film Growth and Surface Reactions
14Atomic layer deposition of HfO2 using HfCp(NMe2)3 and O2 plasma
15Atomic layer deposition of Ru from CpRu(CO)2Et using O2 gas and O2 plasma
16Atomic Layer Deposition of Silicon Nitride from Bis(tert-butylamino)silane and N2 Plasma
17Atomic layer deposition of TiN for the fabrication of nanomechanical resonators
18Atomic Layer Deposition of Wet-Etch Resistant Silicon Nitride Using Di(sec-butylamino)silane and N2 Plasma on Planar and 3D Substrate Topographies
19Atomic layer deposition TiO2-Al2O3 stack: An improved gate dielectric on Ga-polar GaN metal oxide semiconductor capacitors
20Biosensor properties of SOI nanowire transistors with a PEALD Al2O3 dielectric protective layer
21Cathode encapsulation of organic light emitting diodes by atomic layer deposited Al2O3 films and Al2O3/a-SiNx:H stacks
22Charge Transport through Organic Molecular Wires Embedded in Ultrathin Insulating Inorganic Layer
23Comparative study of ALD SiO2 thin films for optical applications
24Comparative study of thermal and plasma enhanced atomic layer deposition of aluminum oxide on graphene
25Comparison of thermal and plasma-enhanced atomic layer deposition of niobium oxide thin films
26Controlling mechanical, structural, and optical properties of Al2O3 thin films deposited by plasma-enhanced atomic layer deposition with substrate biasing
27Correlation of film density and wet etch rate in hydrofluoric acid of plasma enhanced atomic layer deposited silicon nitride
28Corrosion barriers for silver-based telescope mirrors: comparative study of plasma-enhanced atomic layer deposition and reactive evaporation of aluminum oxide
29Crystallization Study by Transmission Electron Microscopy of SrTiO3 Thin Films Prepared by Plasma-Assisted ALD
30Densification of Thin Aluminum Oxide Films by Thermal Treatments
31Deposition of TiN and HfO2 in a commercial 200 mm remote plasma atomic layer deposition reactor
32Dielectric Properties of Thermal and Plasma-Assisted Atomic Layer Deposited Al2O3 Thin Films
33Effective Surface Passivation of InP Nanowires by Atomic-Layer-Deposited Al2O3 with POx Interlayer
34Efficient and Sustained Photoelectrochemical Water Oxidation by Cobalt Oxide/Silicon Photoanodes with Nanotextured Interfaces
35Electrical Characteristics of Top-Down ZnO Nanowire Transistors Using Remote Plasma ALD
36Electrical Measurement Under Atmospheric Conditons of PbSe Nanocrystal Thin Films Passivated by Remote Plasma Atomic Layer Deposition of Al2O3
37Electrical properties of MOS capacitors formed by PEALD grown Al2O3 on silicon
38Energetic ions during plasma-enhanced atomic layer deposition and their role in tailoring material properties
39Energy dissipation during pulsed switching of strontium-titanate based resistive switching memory devices
40Energy-enhanced atomic layer deposition for more process and precursor versatility
41Enhanced Barrier Performance of Engineered Paper by Atomic Layer Deposited Al2O3 Thin Films
42Enhanced surface passivation of epitaxially grown emitters for high-efficiency ultrathin crystalline Si solar cells
43Enhancing the Wettability of High Aspect-Ratio Through-Silicon Vias Lined With LPCVD Silicon Nitride or PE-ALD Titanium Nitride for Void-Free Bottom-Up Copper Electroplating
44Experimental demonstration of single electron transistors featuring SiO2 plasma-enhanced atomic layer deposition in Ni-SiO2-Ni tunnel junctions
45Fabrication of nanoporous membranes for tuning microbial interactions and biochemical reactions
46Fermi Level Tuning of ZnO Films Through Supercycled Atomic Layer Deposition
47Film Conformality and Extracted Recombination Probabilities of O Atoms during Plasma-Assisted Atomic Layer Deposition of SiO2, TiO2, Al2O3, and HfO2
48Flexible Perovskite Photovoltaic Modules and Solar Cells Based on Atomic Layer Deposited Compact Layers and UV-Irradiated TiO2 Scaffolds on Plastic Substrates
49Forming-free resistive switching of tunable ZnO films grown by atomic layer deposition
50High Dielectric Constant ZrO2 Films by Atomic Layer Deposition Technique on Germanium Substrates
51High-κ insulating materials for AlGaN/GaN metal insulator semiconductor heterojunction field effect transistors
52Hot Carrier Filtering in Solution Processed Heterostructures: A Paradigm for Improving Thermoelectric Efficiency
53Hysteresis behaviour of top-down fabricated ZnO nanowire transistors
54Impact of composition and crystallization behavior of atomic layer deposited strontium titanate films on the resistive switching of Pt/STO/TiN devices
55Impact of hydrogen on the permanent deactivation of the boron-oxygen-related recombination center in crystalline silicon
56In situ spectroscopic ellipsometry during atomic layer deposition of Pt, Ru and Pd
57Industrially relevant Al2O3 deposition techniques for the surface passivation of Si solar cells
58Influence of Atomic Layer Deposition Temperatures on TiO2/n-Si MOS Capacitor
59Influence of plasma-based in-situ surface cleaning procedures on HfO2/In0.53Ga0.47As gate stack properties
60Influence of stoichiometry on the performance of MIM capacitors from plasma-assisted ALD SrxTiyOz films
61Influence of the Deposition Temperature on the c-Si Surface Passivation by Al2O3 Films Synthesized by ALD and PECVD
62Injection dependence of the effective lifetime of n-type Si passivated by Al2O3: An edge effect?
63Insulator-protected mechanically controlled break junctions for measuring single-molecule conductance in aqueous environments
64Interfaces Formed by ALD Metal Oxide Growth on Metal Layers
65Interfacial and electrical properties of Al2O3/HfO2 bilayer deposited by atomic layer deposition on GeON passivated germanium surface
66Ion and Photon Surface Interaction during Remote Plasma ALD of Metal Oxides
67Liquid-Phase Crystallized Silicon Solar Cells on Glass: Increasing the Open-Circuit Voltage by Optimized Interlayers for n- and p-Type Absorbers
68Low resistivity HfNx grown by plasma-assisted ALD with external rf substrate biasing
69Low Temperature Plasma-Enhanced Atomic Layer Deposition of Metal Oxide Thin Films
70Low-Temperature Plasma-Assisted Atomic Layer Deposition of Silicon Nitride Moisture Permeation Barrier Layers
71Mass Spectrometry Study of Li2CO3 Film Growth by Thermal and Plasma-Assisted Atomic Layer Deposition
72Mechanical and electrical properties of plasma and thermal atomic layer deposited Al2O3 films on GaAs and Si
73Metal-Insulator-Metal Single Electron Transistors with Tunnel Barriers Prepared by Atomic Layer Deposition
74Microstructure and electrical properties of thin HfO2 deposited by plasma-enhanced atomic layer deposition
75Microwave properties of superconducting atomic-layer deposited TiN films
76NiCO2O4@TiN Core-shell Electrodes through Conformal Atomic Layer Deposition for All-solid-state Supercapacitors
77Nitrogen-Doping of Bulk and Nanotubular TiO2 Photocatalysts by Plasma-Assisted Atomic Layer Deposition
78On the role of nanoporosity in controlling the performance of moisture permeation barrier layers
79Opportunities of Atomic Layer Deposition for Perovskite Solar Cells
80Optical emission spectroscopy as a tool for studying, optimizing, and monitoring plasma-assisted atomic layer deposition processes
81Optimization of Plasma Enhanced Atomic Layer Deposition Processes for Oxides, Nitrides and Metals in the Oxford Instruments FlexAL Reactor
82Order of Dry and Wet Mixed-Length Self-Assembled Monolayers
83PEALD grown high-k ZrO2 thin films on SiC group IV compound semiconductor
84Photoluminescence blue shift of indium phosphide nanowire networks with aluminum oxide coating
85Plasma Processing for Crystallization and Densification of Atomic Layer Deposition BaTiO3 Thin Films
86Plasma-Assisted ALD of Highly Conductive HfNx: On the Effect of Energetic Ions on Film Microstructure
87Plasma-Assisted ALD of LiPO(N) for Solid State Batteries
88Plasma-assisted and thermal atomic layer deposition of electrochemically active Li2CO3
89Plasma-assisted atomic layer deposition of HfNx: Tailoring the film properties by the plasma gas composition
90Plasma-assisted atomic layer deposition of nanolaminates for gate dielectric applications
91Plasma-Assisted Atomic Layer Deposition of SrTiO3: Stoichiometry and Crystallinity Studied by Spectroscopic Ellipsometry
92Plasma-assisted atomic layer deposition of TiN/Al2O3 stacks for metal-oxide-semiconductor capacitor applications
93Plasma-enhanced atomic layer deposition of BaTiO3
94Plasma-enhanced atomic layer deposition of tungsten oxide thin films using (tBuN)2(Me2N)2W and O2 plasma
95Plasma-enhanced atomic-layer-deposited MoOx emitters for silicon heterojunction solar cells
96Possible Candidates for Impurities in mc-Si Wafers Responsible for Light-Induced Lifetime Degradation and Regeneration
97Preliminary investigation of high-k materials - TiO2 doped Ta2O5 films by remote plasma ALD
98Propagation Effects in Carbon Nanoelectronics
99Reaction mechanisms during plasma-assisted atomic layer deposition of metal oxides: A case study for Al2O3
100Realistic efficiency potential of next-generation industrial Czochralski-grown silicon solar cells after deactivation of the boron-oxygen-related defect center
101Redeposition in plasma-assisted atomic layer deposition: Silicon nitride film quality ruled by the gas residence time
102Remote plasma enhanced atomic layer deposition of ZnO for thin film electronic applications
103Role of Metal Contacts in Designing High-Performance Monolayer n-Type WSe2 Field Effect Transistors
104Role of Surface Termination in Atomic Layer Deposition of Silicon Nitride
105Room-Temperature ALD of Metal Oxide Thin Films by Energy-Enhanced ALD
106Silicon nanowire lithium-ion battery anodes with ALD deposited TiN coatings demonstrate a major improvement in cycling performance
107Silicon Nitride and Silicon Oxide Thin Films by Plasma ALD
108Silicon surface passivation by ultrathin Al2O3 films and Al2O3/SiNx stacks
109Single-electron transistors featuring silicon nitride tunnel barriers prepared by atomic layer deposition
110Spectroscopic and electrical calculation of band alignment between atomic layer deposited SiO2 and β-Ga2O3 (2̅01)
111Stability of Al2O3 and Al2O3/a-Six:H stacks for surface passivation of crystalline silicon
112Strongly Disordered TiN and NbTiN s-Wave Superconductors Probed by Microwave Electrodynamics
113Surface passivation of phosphorus-diffused n+-type emitters by plasma-assisted atomic-layer deposited Al2O3
114Synergy Between Plasma-Assisted ALD and Roll-to-Roll Atmospheric Pressure PE-CVD Processing of Moisture Barrier Films on Polymers
115The effect of atomic layer deposition temperature on switching properties of HfOx resistive RAM devices
116The important role of water in growth of monolayer transition metal dichalcogenides
117The Influence of Ions and Photons during Plasma-Assisted ALD of Metal Oxides
118The influence of surface preparation on low temperature HfO2 ALD on InGaAs (001) and (110) surfaces
119Thermal and Plasma Enhanced Atomic Layer Deposition of Al2O3 on GaAs Substrates
120Titanium Oxynitride Interlayer to Influence Oxygen Reduction Reaction Activity and Corrosion Stability of Pt and Pt-Ni Alloy
121Top-down fabricated ZnO nanowire transistors for application in biosensors
122Topographically selective deposition
123Toward an integrated device for spatiotemporal superposition of free-electron lasers and laser pulses
124Tri-gate InGaAs-OI junctionless FETs with PE-ALD Al2O3 gate dielectric and H2/Ar anneal
125Tunable conduction type of solution-processed germanium nanoparticle based field effect transistors and their inverter integration
126Tuning Material Properties of Oxides and Nitrides by Substrate Biasing during Plasma-Enhanced Atomic Layer Deposition on Planar and 3D Substrate Topographies
127Ultrasensitive Detection of 2,4-Dinitrophenol Using Nanowire Biosensor
128Understanding the Oxygen Evolution Reaction Mechanism on CoOx using Operando Ambient-Pressure X-ray Photoelectron Spectroscopy
129Unexpectedly High Minority-Carrier Lifetimes Exceeding 20 ms Measured on 1.4-Ohm cm n-Type Silicon Wafers
130Uniform Atomic Layer Deposition of Al2O3 on Graphene by Reversible Hydrogen Plasma Functionalization
131Very High Refractive Index Transition Metal Dichalcogenide Photonic Conformal Coatings by Conversion of ALD Metal Oxides