Oxford Instruments FlexAL Plasma Enhanced Atomic Layer Deposition Film Publications

Your search for plasma enhanced atomic layer deposition publications using Oxford Instruments FlexAL hardware returned 169 records. If there are too many results, you may want to use the multi-factor search to narrow the results.

NumberTitle
1Plasma-assisted atomic layer deposition of nanolaminates for gate dielectric applications
2Very High Refractive Index Transition Metal Dichalcogenide Photonic Conformal Coatings by Conversion of ALD Metal Oxides
3Role of Metal Contacts in Designing High-Performance Monolayer n-Type WSe2 Field Effect Transistors
4Liquid-Phase Crystallized Silicon Solar Cells on Glass: Increasing the Open-Circuit Voltage by Optimized Interlayers for n- and p-Type Absorbers
5Atomic Layer Deposition of the Conductive Delafossite PtCoO2
6Thickness and Morphology Dependent Electrical Properties of ALD-Synthesized MoS2 FETs
7Atomic Layer Deposition of Large-Area Polycrystalline Transition Metal Dichalcogenides from 100°C through Control of Plasma Chemistry
8Flexible Perovskite Photovoltaic Modules and Solar Cells Based on Atomic Layer Deposited Compact Layers and UV-Irradiated TiO2 Scaffolds on Plastic Substrates
9Injection dependence of the effective lifetime of n-type Si passivated by Al2O3: An edge effect?
10Silicon Nitride and Silicon Oxide Thin Films by Plasma ALD
11Simple plasma assisted atomic layer deposition technique for high substitutional nitrogen doping of TiO2
12Electrical Characteristics of Top-Down ZnO Nanowire Transistors Using Remote Plasma ALD
13Photoluminescence blue shift of indium phosphide nanowire networks with aluminum oxide coating
14Stability of Al2O3 and Al2O3/a-Six:H stacks for surface passivation of crystalline silicon
15Plasma-Enhanced Atomic Layer Deposition of Al2O3 on Graphene Using Monolayer hBN as Interfacial Layer
16Industrially relevant Al2O3 deposition techniques for the surface passivation of Si solar cells
17Single-electron transistors featuring silicon nitride tunnel barriers prepared by atomic layer deposition
18Multistep atomic layer deposition process for ultrathin superconducting NbN films with high critical current density on amorphous substrate
19The important role of water in growth of monolayer transition metal dichalcogenides
20Controlling mechanical, structural, and optical properties of Al2O3 thin films deposited by plasma-enhanced atomic layer deposition with substrate biasing
21Atomic Layer Deposition of Wet-Etch Resistant Silicon Nitride Using Di(sec-butylamino)silane and N2 Plasma on Planar and 3D Substrate Topographies
22Comparative study of ALD SiO2 thin films for optical applications
23Influence of Atomic Layer Deposition Temperatures on TiO2/n-Si MOS Capacitor
24Metal-Insulator-Metal Single Electron Transistors with Tunnel Barriers Prepared by Atomic Layer Deposition
25Forming-free resistive switching of tunable ZnO films grown by atomic layer deposition
26Interfacial and electrical properties of Al2O3/HfO2 bilayer deposited by atomic layer deposition on GeON passivated germanium surface
27Plasma-Assisted ALD of LiPO(N) for Solid State Batteries
28Micro-Raman Spectroscopy for Monitoring of Deposition Quality of High-k Stack Protective Layer onto Nanowire FET Chips for Highly Sensitive miRNA Detection
29Microwave properties of superconducting atomic-layer deposited TiN films
30Cathode encapsulation of organic light emitting diodes by atomic layer deposited Al2O3 films and Al2O3/a-SiNx:H stacks
31Propagation Effects in Carbon Nanoelectronics
32Efficient and Sustained Photoelectrochemical Water Oxidation by Cobalt Oxide/Silicon Photoanodes with Nanotextured Interfaces
33PEALD grown high-k ZrO2 thin films on SiC group IV compound semiconductor
34Atomic Layer Deposition of Silicon Nitride from Bis(tert-butylamino)silane and N2 Plasma
35Interfaces Formed by ALD Metal Oxide Growth on Metal Layers
36Plasma-enhanced atomic layer deposition of tungsten oxide thin films using (tBuN)2(Me2N)2W and O2 plasma
37High Dielectric Constant ZrO2 Films by Atomic Layer Deposition Technique on Germanium Substrates
38Ultrasensitive Detection of 2,4-Dinitrophenol Using Nanowire Biosensor
39Experimental demonstration of single electron transistors featuring SiO2 plasma-enhanced atomic layer deposition in Ni-SiO2-Ni tunnel junctions
40Low-Temperature Phase-Controlled Synthesis of Titanium Di- and Tri-sulfide by Atomic Layer Deposition
41Low-temperature plasma-enhanced atomic layer deposition of 2-D MoS2: large area, thickness control and tuneable morphology
42Redeposition in plasma-assisted atomic layer deposition: Silicon nitride film quality ruled by the gas residence time
43On the role of nanoporosity in controlling the performance of moisture permeation barrier layers
44Plasma-Assisted Atomic Layer Deposition of SrTiO3: Stoichiometry and Crystallinity Studied by Spectroscopic Ellipsometry
45Ferroelectricity in hafnia controlled via surface electrochemical state
46Topographically selective deposition
47Atomic Layer Deposition of Aluminum Phosphate Using AlMe3, PO(OMe)3, and O2 Plasma: Film Growth and Surface Reactions
48Hot Carrier Filtering in Solution Processed Heterostructures: A Paradigm for Improving Thermoelectric Efficiency
49Comparative study of thermal and plasma enhanced atomic layer deposition of aluminum oxide on graphene
50Area-Selective Atomic Layer Deposition of Two-Dimensional WS2 Nanolayers
51Densification of Thin Aluminum Oxide Films by Thermal Treatments
52Ion energy control during plasma-enhanced atomic layer deposition: enabling materials control and selective processing in the third dimension
53Remote plasma enhanced atomic layer deposition of ZnO for thin film electronic applications
54Atomic Layer Deposition of Cobalt Phosphide for Efficient Water Splitting
55Atomic layer deposition of HfO2 using HfCp(NMe2)3 and O2 plasma
56Sub-10-nm ferroelectric Gd-doped HfO2 layers
57Deposition of TiN and HfO2 in a commercial 200 mm remote plasma atomic layer deposition reactor
58Nitrogen-Doping of Bulk and Nanotubular TiO2 Photocatalysts by Plasma-Assisted Atomic Layer Deposition
59Plasma and Thermal ALD of Al2O3 in a Commercial 200mm ALD Reactor
60Fabrication of nanoporous membranes for tuning microbial interactions and biochemical reactions
61Low temperature Topographically Selective Deposition by Plasma Enhanced Atomic Layer Deposition with ion bombardment assistance
62Role of Surface Termination in Atomic Layer Deposition of Silicon Nitride
63Plasma-enhanced atomic-layer-deposited MoOx emitters for silicon heterojunction solar cells
64Properties of plasma enhanced atomic layer deposited ruthenium thin films from Ru(EtCp)2
65Microstructure and electrical properties of thin HfO2 deposited by plasma-enhanced atomic layer deposition
66Approaching the limits of dielectric breakdown for SiO2 films deposited by plasma-enhanced atomic layer deposition
67Enhancing the Wettability of High Aspect-Ratio Through-Silicon Vias Lined With LPCVD Silicon Nitride or PE-ALD Titanium Nitride for Void-Free Bottom-Up Copper Electroplating
68Possible Candidates for Impurities in mc-Si Wafers Responsible for Light-Induced Lifetime Degradation and Regeneration
69Edge-Site Nanoengineering of WS2 by Low-Temperature Plasma-Enhanced Atomic Layer Deposition for Electrocatalytic Hydrogen Evolution
70A comparison between remote plasma-enhanced and thermal ALD of Hafnium-nitride thin films
71The influence of surface preparation on low temperature HfO2 ALD on InGaAs (001) and (110) surfaces
72Atomic insights into the oxygen incorporation in atomic layer deposited conductive nitrides and its mitigation by energetic ions
73Electrical properties of MOS capacitors formed by PEALD grown Al2O3 on silicon
74Atomic layer deposition of aluminum fluoride using Al(CH3)3 and SF6 plasma
75The effect of atomic layer deposition temperature on switching properties of HfOx resistive RAM devices
76Charge Transport through Organic Molecular Wires Embedded in Ultrathin Insulating Inorganic Layer
77Tunable conduction type of solution-processed germanium nanoparticle based field effect transistors and their inverter integration
78Understanding the Oxygen Evolution Reaction Mechanism on CoOx using Operando Ambient-Pressure X-ray Photoelectron Spectroscopy
79Enhanced Barrier Performance of Engineered Paper by Atomic Layer Deposited Al2O3 Thin Films
80Thermal and plasma enhanced atomic layer deposition of ultrathin TiO2 on silicon from amide and alkoxide precursors: growth chemistry and photoelectrochemical performance
81Energy-enhanced atomic layer deposition for more process and precursor versatility
82Crystallization Study by Transmission Electron Microscopy of SrTiO3 Thin Films Prepared by Plasma-Assisted ALD
83Ion and Photon Surface Interaction during Remote Plasma ALD of Metal Oxides
84Atomic layer deposited silicon dioxide films on nanomechanical silicon nitride resonators
85Plasma-Assisted ALD of Highly Conductive HfNx: On the Effect of Energetic Ions on Film Microstructure
86Analysis of NbN thin film deposition by plasma-enhanced ALD for gate electrode application
87Order of Dry and Wet Mixed-Length Self-Assembled Monolayers
88Toward an integrated device for spatiotemporal superposition of free-electron lasers and laser pulses
89Corrosion barriers for silver-based telescope mirrors: comparative study of plasma-enhanced atomic layer deposition and reactive evaporation of aluminum oxide
90Impact of hydrogen on the permanent deactivation of the boron-oxygen-related recombination center in crystalline silicon
91Plasma Enhanced Atomic Layer Deposition of Ruthenium Films Using Ru(EtCp)2 Precursor
92Plasma-assisted and thermal atomic layer deposition of electrochemically active Li2CO3
93Energetic ions during plasma-enhanced atomic layer deposition and their role in tailoring material properties
94Optimization of Plasma Enhanced Atomic Layer Deposition Processes for Oxides, Nitrides and Metals in the Oxford Instruments FlexAL Reactor
95Atomic layer deposition of LiF using LiN(SiMe3)2 and SF6 plasma
96Hysteresis behaviour of top-down fabricated ZnO nanowire transistors
97Biosensor properties of SOI nanowire transistors with a PEALD Al2O3 dielectric protective layer
98Reaction mechanisms during plasma-assisted atomic layer deposition of metal oxides: A case study for Al2O3
99Top-down fabricated ZnO nanowire transistors for application in biosensors
100Thermal conductivity of ultrathin BaTiO3 films grown by plasma-assisted atomic layer deposition
101Origin of Ferroelectric Phase Stabilization via the Clamping Effect in Ferroelectric Hafnium Zirconium Oxide Thin Films
102Low Temperature Plasma-Enhanced Atomic Layer Deposition of Metal Oxide Thin Films
103Control of ion energy during plasma enhanced atomic layer deposition: A new strategy for the modulation of TiN growth delay on SiO2
104Atomic layer deposition for spacer defined double patterning of sub-10 nm titanium dioxide features
105Tuning Material Properties of Oxides and Nitrides by Substrate Biasing during Plasma-Enhanced Atomic Layer Deposition on Planar and 3D Substrate Topographies
106Atomic layer deposition TiO2-Al2O3 stack: An improved gate dielectric on Ga-polar GaN metal oxide semiconductor capacitors
107Synergy Between Plasma-Assisted ALD and Roll-to-Roll Atmospheric Pressure PE-CVD Processing of Moisture Barrier Films on Polymers
108Probing the Origin and Suppression of Vertically Oriented Nanostructures of 2D WS2 Layers
109Area-Selective Atomic Layer Deposition of SiO2 Using Acetylacetone as a Chemoselective Inhibitor in an ABC-Type Cycle
110Uniform Atomic Layer Deposition of Al2O3 on Graphene by Reversible Hydrogen Plasma Functionalization
111Titanium Oxynitride Interlayer to Influence Oxygen Reduction Reaction Activity and Corrosion Stability of Pt and Pt-Ni Alloy
112Comparison of thermal and plasma-enhanced atomic layer deposition of niobium oxide thin films
113Application of spectral ellipsometry to in situ diagnostics of atomic layer deposition of dielectrics on silicon and AlGaN
114Low-Temperature Plasma-Assisted Atomic Layer Deposition of Silicon Nitride Moisture Permeation Barrier Layers
115Evidence for low-energy ions influencing plasma-assisted atomic layer deposition of SiO2: Impact on the growth per cycle and wet etch rate
116Correlation of film density and wet etch rate in hydrofluoric acid of plasma enhanced atomic layer deposited silicon nitride
117Tri-gate InGaAs-OI junctionless FETs with PE-ALD Al2O3 gate dielectric and H2/Ar anneal
118Insulator-protected mechanically controlled break junctions for measuring single-molecule conductance in aqueous environments
119Optical emission spectroscopy as a tool for studying, optimizing, and monitoring plasma-assisted atomic layer deposition processes
120Silicon surface passivation by ultrathin Al2O3 films and Al2O3/SiNx stacks
121Electrical Measurement Under Atmospheric Conditons of PbSe Nanocrystal Thin Films Passivated by Remote Plasma Atomic Layer Deposition of Al2O3
122Topographical selective deposition: A comparison between plasma-enhanced atomic layer deposition/sputtering and plasma-enhanced atomic layer deposition/quasi-atomic layer etching approaches
123Strongly Disordered TiN and NbTiN s-Wave Superconductors Probed by Microwave Electrodynamics
124Influence of stoichiometry on the performance of MIM capacitors from plasma-assisted ALD SrxTiyOz films
125Dielectric Properties of Thermal and Plasma-Assisted Atomic Layer Deposited Al2O3 Thin Films
126Atomic layer deposition for perovskite solar cells: research status, opportunities and challenges
127Dielectric properties investigation of a compound based on atomic layer deposited multi-layer structure
128On the Contact Optimization of ALD-Based MoS2 FETs: Correlation of Processing Conditions and Interface Chemistry with Device Electrical Performance
129Realistic efficiency potential of next-generation industrial Czochralski-grown silicon solar cells after deactivation of the boron-oxygen-related defect center
130Impact of composition and crystallization behavior of atomic layer deposited strontium titanate films on the resistive switching of Pt/STO/TiN devices
131Plasma-assisted atomic layer deposition of HfNx: Tailoring the film properties by the plasma gas composition
132Energy dissipation during pulsed switching of strontium-titanate based resistive switching memory devices
133Advanced surface passivation of epitaxial boron emitters for high-efficiency ultrathin crystalline silicon solar cells
134NiCO2O4@TiN Core-shell Electrodes through Conformal Atomic Layer Deposition for All-solid-state Supercapacitors
135Atomic layer deposition of Ru from CpRu(CO)2Et using O2 gas and O2 plasma
136Plasma Processing for Crystallization and Densification of Atomic Layer Deposition BaTiO3 Thin Films
137The Influence of Ions and Photons during Plasma-Assisted ALD of Metal Oxides
138In situ spectroscopic ellipsometry during atomic layer deposition of Pt, Ru and Pd
139Oxygen Recombination Probability Data for Plasma-Assisted Atomic Layer Deposition of SiO2 and TiO2
140A multifunctional biphasic water splitting catalyst tailored for integration with high-performance semiconductor photoanodes
141Mechanical and electrical properties of plasma and thermal atomic layer deposited Al2O3 films on GaAs and Si
142Opportunities of Atomic Layer Deposition for Perovskite Solar Cells
143Impact of Ions on Film Conformality and Crystallinity during Plasma-Assisted Atomic Layer Deposition of TiO2
144Spectroscopic and electrical calculation of band alignment between atomic layer deposited SiO2 and β-Ga2O3 (2̅01)
145Effective Surface Passivation of InP Nanowires by Atomic-Layer-Deposited Al2O3 with POx Interlayer
146Reaction Mechanisms during Atomic Layer Deposition of AlF3 Using Al(CH3)3 and SF6 Plasma
147Preliminary investigation of high-k materials - TiO2 doped Ta2O5 films by remote plasma ALD
148Large area, patterned growth of 2D MoS2 and lateral MoS2-WS2 heterostructures for nano- and opto-electronic applications
149Plasma-enhanced atomic layer deposition of BaTiO3
1501D versus 3D quantum confinement in 1-5 nm ZnO nanoparticle agglomerations for application in charge-trapping memory devices
151Enhanced surface passivation of epitaxially grown emitters for high-efficiency ultrathin crystalline Si solar cells
152Mass Spectrometry Study of Li2CO3 Film Growth by Thermal and Plasma-Assisted Atomic Layer Deposition
153Film Conformality and Extracted Recombination Probabilities of O Atoms during Plasma-Assisted Atomic Layer Deposition of SiO2, TiO2, Al2O3, and HfO2
154Controlling transition metal atomic ordering in two-dimensional Mo1-xWxS2 alloys
155Plasma-assisted atomic layer deposition of TiN/Al2O3 stacks for metal-oxide-semiconductor capacitor applications
156Influence of the Deposition Temperature on the c-Si Surface Passivation by Al2O3 Films Synthesized by ALD and PECVD
157Silicon nanowire lithium-ion battery anodes with ALD deposited TiN coatings demonstrate a major improvement in cycling performance
158Unexpectedly High Minority-Carrier Lifetimes Exceeding 20 ms Measured on 1.4-Ohm cm n-Type Silicon Wafers
159Surface passivation of phosphorus-diffused n+-type emitters by plasma-assisted atomic-layer deposited Al2O3
160Thermal and Plasma Enhanced Atomic Layer Deposition of Al2O3 on GaAs Substrates
161Low resistivity HfNx grown by plasma-assisted ALD with external rf substrate biasing
162Influence of plasma-based in-situ surface cleaning procedures on HfO2/In0.53Ga0.47As gate stack properties
163High-κ insulating materials for AlGaN/GaN metal insulator semiconductor heterojunction field effect transistors
164A Study of Ultrathin Superconducting Films of Niobium Nitride Obtained by Atomic Layer Deposition
165Al2O3/SiNx-Stacks at Increased Temperatures: Avoiding Blistering During Contact Firing
166Room-Temperature ALD of Metal Oxide Thin Films by Energy-Enhanced ALD
167Fermi Level Tuning of ZnO Films Through Supercycled Atomic Layer Deposition
168Atomic layer deposition of TiN for the fabrication of nanomechanical resonators