Oxford Instruments FlexAL Plasma Enhanced Atomic Layer Deposition Film Publications

Your search for plasma enhanced atomic layer deposition publications using Oxford Instruments FlexAL hardware returned 127 records. If there are too many results, you may want to use the multi-factor search to narrow the results.

Number	Title
1	1D versus 3D quantum confinement in 1-5 nm ZnO nanoparticle agglomerations for application in charge-trapping memory devices
2	A comparison between remote plasma-enhanced and thermal ALD of Hafnium-nitride thin films
3	A multifunctional biphasic water splitting catalyst tailored for integration with high-performance semiconductor photoanodes
4	Advanced surface passivation of epitaxial boron emitters for high-efficiency ultrathin crystalline silicon solar cells
5	Al2O3/SiNx-Stacks at Increased Temperatures: Avoiding Blistering During Contact Firing
6	Analysis of NbN thin film deposition by plasma-enhanced ALD for gate electrode application
7	Application of spectral ellipsometry to in situ diagnostics of atomic layer deposition of dielectrics on silicon and AlGaN
8	Approaching the limits of dielectric breakdown for SiO2 films deposited by plasma-enhanced atomic layer deposition
9	Area-Selective Atomic Layer Deposition of SiO2 Using Acetylacetone as a Chemoselective Inhibitor in an ABC-Type Cycle
10	Atomic layer deposition for perovskite solar cells: research status, opportunities and challenges
11	Atomic layer deposition of aluminum fluoride using Al(CH3)3 and SF6 plasma
12	Atomic layer deposition of HfO2 using HfCp(NMe2)3 and O2 plasma
13	Atomic layer deposition of Ru from CpRu(CO)2Et using O2 gas and O2 plasma
14	Atomic Layer Deposition of Silicon Nitride from Bis(tert-butylamino)silane and N2 Plasma
15	Atomic layer deposition of TiN for the fabrication of nanomechanical resonators
16	Atomic Layer Deposition of Wet-Etch Resistant Silicon Nitride Using Di(sec-butylamino)silane and N2 Plasma on Planar and 3D Substrate Topographies
17	Atomic layer deposition TiO2-Al2O3 stack: An improved gate dielectric on Ga-polar GaN metal oxide semiconductor capacitors
18	Biosensor properties of SOI nanowire transistors with a PEALD Al2O3 dielectric protective layer
19	Cathode encapsulation of organic light emitting diodes by atomic layer deposited Al2O3 films and Al2O3/a-SiNx:H stacks
20	Charge Transport through Organic Molecular Wires Embedded in Ultrathin Insulating Inorganic Layer
21	Comparative study of ALD SiO2 thin films for optical applications
22	Comparative study of thermal and plasma enhanced atomic layer deposition of aluminum oxide on graphene
23	Comparison of thermal and plasma-enhanced atomic layer deposition of niobium oxide thin films
24	Controlling mechanical, structural, and optical properties of Al2O3 thin films deposited by plasma-enhanced atomic layer deposition with substrate biasing
25	Correlation of film density and wet etch rate in hydrofluoric acid of plasma enhanced atomic layer deposited silicon nitride
26	Corrosion barriers for silver-based telescope mirrors: comparative study of plasma-enhanced atomic layer deposition and reactive evaporation of aluminum oxide
27	Crystallization Study by Transmission Electron Microscopy of SrTiO3 Thin Films Prepared by Plasma-Assisted ALD
28	Densification of Thin Aluminum Oxide Films by Thermal Treatments
29	Deposition of TiN and HfO2 in a commercial 200 mm remote plasma atomic layer deposition reactor
30	Dielectric Properties of Thermal and Plasma-Assisted Atomic Layer Deposited Al2O3 Thin Films
31	Effective Surface Passivation of InP Nanowires by Atomic-Layer-Deposited Al2O3 with POx Interlayer
32	Efficient and Sustained Photoelectrochemical Water Oxidation by Cobalt Oxide/Silicon Photoanodes with Nanotextured Interfaces
33	Electrical Characteristics of Top-Down ZnO Nanowire Transistors Using Remote Plasma ALD
34	Electrical Measurement Under Atmospheric Conditons of PbSe Nanocrystal Thin Films Passivated by Remote Plasma Atomic Layer Deposition of Al2O3
35	Electrical properties of MOS capacitors formed by PEALD grown Al2O3 on silicon
36	Energetic ions during plasma-enhanced atomic layer deposition and their role in tailoring material properties
37	Energy dissipation during pulsed switching of strontium-titanate based resistive switching memory devices
38	Energy-enhanced atomic layer deposition for more process and precursor versatility
39	Enhanced Barrier Performance of Engineered Paper by Atomic Layer Deposited Al2O3 Thin Films
40	Enhanced surface passivation of epitaxially grown emitters for high-efficiency ultrathin crystalline Si solar cells
41	Enhancing the Wettability of High Aspect-Ratio Through-Silicon Vias Lined With LPCVD Silicon Nitride or PE-ALD Titanium Nitride for Void-Free Bottom-Up Copper Electroplating
42	Experimental demonstration of single electron transistors featuring SiO2 plasma-enhanced atomic layer deposition in Ni-SiO2-Ni tunnel junctions
43	Fabrication of nanoporous membranes for tuning microbial interactions and biochemical reactions
44	Fermi Level Tuning of ZnO Films Through Supercycled Atomic Layer Deposition
45	Flexible Perovskite Photovoltaic Modules and Solar Cells Based on Atomic Layer Deposited Compact Layers and UV-Irradiated TiO2 Scaffolds on Plastic Substrates
46	Forming-free resistive switching of tunable ZnO films grown by atomic layer deposition
47	High Dielectric Constant ZrO2 Films by Atomic Layer Deposition Technique on Germanium Substrates
48	High-κ insulating materials for AlGaN/GaN metal insulator semiconductor heterojunction field effect transistors
49	Hot Carrier Filtering in Solution Processed Heterostructures: A Paradigm for Improving Thermoelectric Efficiency
50	Hysteresis behaviour of top-down fabricated ZnO nanowire transistors
51	Impact of composition and crystallization behavior of atomic layer deposited strontium titanate films on the resistive switching of Pt/STO/TiN devices
52	Impact of hydrogen on the permanent deactivation of the boron-oxygen-related recombination center in crystalline silicon
53	In situ spectroscopic ellipsometry during atomic layer deposition of Pt, Ru and Pd
54	Industrially relevant Al2O3 deposition techniques for the surface passivation of Si solar cells
55	Influence of Atomic Layer Deposition Temperatures on TiO2/n-Si MOS Capacitor
56	Influence of plasma-based in-situ surface cleaning procedures on HfO2/In0.53Ga0.47As gate stack properties
57	Influence of stoichiometry on the performance of MIM capacitors from plasma-assisted ALD SrxTiyOz films
58	Influence of the Deposition Temperature on the c-Si Surface Passivation by Al2O3 Films Synthesized by ALD and PECVD
59	Injection dependence of the effective lifetime of n-type Si passivated by Al2O3: An edge effect?
60	Insulator-protected mechanically controlled break junctions for measuring single-molecule conductance in aqueous environments
61	Interfaces Formed by ALD Metal Oxide Growth on Metal Layers
62	Interfacial and electrical properties of Al2O3/HfO2 bilayer deposited by atomic layer deposition on GeON passivated germanium surface
63	Ion and Photon Surface Interaction during Remote Plasma ALD of Metal Oxides
64	Liquid-Phase Crystallized Silicon Solar Cells on Glass: Increasing the Open-Circuit Voltage by Optimized Interlayers for n- and p-Type Absorbers
65	Low resistivity HfNx grown by plasma-assisted ALD with external rf substrate biasing
66	Low Temperature Plasma-Enhanced Atomic Layer Deposition of Metal Oxide Thin Films
67	Low-Temperature Plasma-Assisted Atomic Layer Deposition of Silicon Nitride Moisture Permeation Barrier Layers
68	Mass Spectrometry Study of Li2CO3 Film Growth by Thermal and Plasma-Assisted Atomic Layer Deposition
69	Mechanical and electrical properties of plasma and thermal atomic layer deposited Al2O3 films on GaAs and Si
70	Metal-Insulator-Metal Single Electron Transistors with Tunnel Barriers Prepared by Atomic Layer Deposition
71	Microstructure and electrical properties of thin HfO2 deposited by plasma-enhanced atomic layer deposition
72	Microwave properties of superconducting atomic-layer deposited TiN films
73	NiCO2O4@TiN Core-shell Electrodes through Conformal Atomic Layer Deposition for All-solid-state Supercapacitors
74	Nitrogen-Doping of Bulk and Nanotubular TiO2 Photocatalysts by Plasma-Assisted Atomic Layer Deposition
75	On the role of nanoporosity in controlling the performance of moisture permeation barrier layers
76	Opportunities of Atomic Layer Deposition for Perovskite Solar Cells
77	Optical emission spectroscopy as a tool for studying, optimizing, and monitoring plasma-assisted atomic layer deposition processes
78	Optimization of Plasma Enhanced Atomic Layer Deposition Processes for Oxides, Nitrides and Metals in the Oxford Instruments FlexAL Reactor
79	Order of Dry and Wet Mixed-Length Self-Assembled Monolayers
80	PEALD grown high-k ZrO2 thin films on SiC group IV compound semiconductor
81	Photoluminescence blue shift of indium phosphide nanowire networks with aluminum oxide coating
82	Plasma Processing for Crystallization and Densification of Atomic Layer Deposition BaTiO3 Thin Films
83	Plasma-Assisted ALD of LiPO(N) for Solid State Batteries
84	Plasma-assisted and thermal atomic layer deposition of electrochemically active Li2CO3
85	Plasma-assisted atomic layer deposition of HfNx: Tailoring the film properties by the plasma gas composition
86	Plasma-assisted atomic layer deposition of nanolaminates for gate dielectric applications
87	Plasma-Assisted Atomic Layer Deposition of SrTiO3: Stoichiometry and Crystallinity Studied by Spectroscopic Ellipsometry
88	Plasma-assisted atomic layer deposition of TiN/Al2O3 stacks for metal-oxide-semiconductor capacitor applications
89	Plasma-enhanced atomic layer deposition of BaTiO3
90	Plasma-enhanced atomic layer deposition of tungsten oxide thin films using (tBuN)2(Me2N)2W and O2 plasma
91	Plasma-enhanced atomic-layer-deposited MoOx emitters for silicon heterojunction solar cells
92	Possible Candidates for Impurities in mc-Si Wafers Responsible for Light-Induced Lifetime Degradation and Regeneration
93	Preliminary investigation of high-k materials - TiO2 doped Ta2O5 films by remote plasma ALD
94	Propagation Effects in Carbon Nanoelectronics
95	Reaction mechanisms during plasma-assisted atomic layer deposition of metal oxides: A case study for Al2O3
96	Realistic efficiency potential of next-generation industrial Czochralski-grown silicon solar cells after deactivation of the boron-oxygen-related defect center
97	Redeposition in plasma-assisted atomic layer deposition: Silicon nitride film quality ruled by the gas residence time
98	Remote plasma enhanced atomic layer deposition of ZnO for thin film electronic applications
99	Role of Metal Contacts in Designing High-Performance Monolayer n-Type WSe2 Field Effect Transistors
100	Role of Surface Termination in Atomic Layer Deposition of Silicon Nitride
101	Room-Temperature ALD of Metal Oxide Thin Films by Energy-Enhanced ALD
102	Silicon nanowire lithium-ion battery anodes with ALD deposited TiN coatings demonstrate a major improvement in cycling performance
103	Silicon Nitride and Silicon Oxide Thin Films by Plasma ALD
104	Silicon surface passivation by ultrathin Al2O3 films and Al2O3/SiNx stacks
105	Single-electron transistors featuring silicon nitride tunnel barriers prepared by atomic layer deposition
106	Spectroscopic and electrical calculation of band alignment between atomic layer deposited SiO2 and β-Ga2O3 (2̅01)
107	Stability of Al2O3 and Al2O3/a-Six:H stacks for surface passivation of crystalline silicon
108	Strongly Disordered TiN and NbTiN s-Wave Superconductors Probed by Microwave Electrodynamics
109	Surface passivation of phosphorus-diffused n+-type emitters by plasma-assisted atomic-layer deposited Al2O3
110	Synergy Between Plasma-Assisted ALD and Roll-to-Roll Atmospheric Pressure PE-CVD Processing of Moisture Barrier Films on Polymers
111	The effect of atomic layer deposition temperature on switching properties of HfOx resistive RAM devices
112	The important role of water in growth of monolayer transition metal dichalcogenides
113	The Influence of Ions and Photons during Plasma-Assisted ALD of Metal Oxides
114	The influence of surface preparation on low temperature HfO2 ALD on InGaAs (001) and (110) surfaces
115	Thermal and Plasma Enhanced Atomic Layer Deposition of Al2O3 on GaAs Substrates
116	Titanium Oxynitride Interlayer to Influence Oxygen Reduction Reaction Activity and Corrosion Stability of Pt and Pt-Ni Alloy
117	Top-down fabricated ZnO nanowire transistors for application in biosensors
118	Toward an integrated device for spatiotemporal superposition of free-electron lasers and laser pulses
119	Tri-gate InGaAs-OI junctionless FETs with PE-ALD Al2O3 gate dielectric and H2/Ar anneal
120	Tunable conduction type of solution-processed germanium nanoparticle based field effect transistors and their inverter integration
121	Tuning Material Properties of Oxides and Nitrides by Substrate Biasing during Plasma-Enhanced Atomic Layer Deposition on Planar and 3D Substrate Topographies
122	Ultrasensitive Detection of 2,4-Dinitrophenol Using Nanowire Biosensor
123	Understanding the Oxygen Evolution Reaction Mechanism on CoOx using Operando Ambient-Pressure X-ray Photoelectron Spectroscopy
124	Unexpectedly High Minority-Carrier Lifetimes Exceeding 20 ms Measured on 1.4-Ohm cm n-Type Silicon Wafers
125	Uniform Atomic Layer Deposition of Al2O3 on Graphene by Reversible Hydrogen Plasma Functionalization
126	Very High Refractive Index Transition Metal Dichalcogenide Photonic Conformal Coatings by Conversion of ALD Metal Oxides

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