| 1 | Comparative study of ALD SiO2 thin films for optical applications |
| 2 | Controlling transition metal atomic ordering in two-dimensional Mo1-xWxS2 alloys |
| 3 | The important role of water in growth of monolayer transition metal dichalcogenides |
| 4 | Crystallization Study by Transmission Electron Microscopy of SrTiO3 Thin Films Prepared by Plasma-Assisted ALD |
| 5 | Plasma-enhanced atomic layer deposition of BaTiO3 |
| 6 | Unexpectedly High Minority-Carrier Lifetimes Exceeding 20 ms Measured on 1.4-Ohm cm n-Type Silicon Wafers |
| 7 | Plasma Processing for Crystallization and Densification of Atomic Layer Deposition BaTiO3 Thin Films |
| 8 | Multistep atomic layer deposition process for ultrathin superconducting NbN films with high critical current density on amorphous substrate |
| 9 | Influence of the Deposition Temperature on the c-Si Surface Passivation by Al2O3 Films Synthesized by ALD and PECVD |
| 10 | Silicon Nitride and Silicon Oxide Thin Films by Plasma ALD |
| 11 | Corrosion barriers for silver-based telescope mirrors: comparative study of plasma-enhanced atomic layer deposition and reactive evaporation of aluminum oxide |
| 12 | Electrical Characteristics of Top-Down ZnO Nanowire Transistors Using Remote Plasma ALD |
| 13 | Stability of Al2O3 and Al2O3/a-Six:H stacks for surface passivation of crystalline silicon |
| 14 | Advanced surface passivation of epitaxial boron emitters for high-efficiency ultrathin crystalline silicon solar cells |
| 15 | Topographically selective deposition |
| 16 | Area-Selective Atomic Layer Deposition of SiO2 Using Acetylacetone as a Chemoselective Inhibitor in an ABC-Type Cycle |
| 17 | Enhancing the Wettability of High Aspect-Ratio Through-Silicon Vias Lined With LPCVD Silicon Nitride or PE-ALD Titanium Nitride for Void-Free Bottom-Up Copper Electroplating |
| 18 | Single-electron transistors featuring silicon nitride tunnel barriers prepared by atomic layer deposition |
| 19 | Atomic Layer Deposition of Cobalt Phosphide for Efficient Water Splitting |
| 20 | Sub-10-nm ferroelectric Gd-doped HfO2 layers |
| 21 | Plasma-assisted atomic layer deposition of HfNx: Tailoring the film properties by the plasma gas composition |
| 22 | Atomic Layer Deposition of the Conductive Delafossite PtCoO2 |
| 23 | Charge Transport through Organic Molecular Wires Embedded in Ultrathin Insulating Inorganic Layer |
| 24 | Toward an integrated device for spatiotemporal superposition of free-electron lasers and laser pulses |
| 25 | Atomic layer deposition of HfO2 using HfCp(NMe2)3 and O2 plasma |
| 26 | Silicon nanowire lithium-ion battery anodes with ALD deposited TiN coatings demonstrate a major improvement in cycling performance |
| 27 | Effective Surface Passivation of InP Nanowires by Atomic-Layer-Deposited Al2O3 with POx Interlayer |
| 28 | Cathode encapsulation of organic light emitting diodes by atomic layer deposited Al2O3 films and Al2O3/a-SiNx:H stacks |
| 29 | Flexible Perovskite Photovoltaic Modules and Solar Cells Based on Atomic Layer Deposited Compact Layers and UV-Irradiated TiO2 Scaffolds on Plastic Substrates |
| 30 | Atomic layer deposition for spacer defined double patterning of sub-10 nm titanium dioxide features |
| 31 | Propagation Effects in Carbon Nanoelectronics |
| 32 | Atomic layer deposition TiO2-Al2O3 stack: An improved gate dielectric on Ga-polar GaN metal oxide semiconductor capacitors |
| 33 | Spectroscopic and electrical calculation of band alignment between atomic layer deposited SiO2 and β-Ga2O3 (2̅01) |
| 34 | Atomic layer deposited silicon dioxide films on nanomechanical silicon nitride resonators |
| 35 | Comparison of thermal and plasma-enhanced atomic layer deposition of niobium oxide thin films |
| 36 | Probing the Origin and Suppression of Vertically Oriented Nanostructures of 2D WS2 Layers |
| 37 | Enhanced Barrier Performance of Engineered Paper by Atomic Layer Deposited Al2O3 Thin Films |
| 38 | Surface passivation of phosphorus-diffused n+-type emitters by plasma-assisted atomic-layer deposited Al2O3 |
| 39 | Dielectric properties investigation of a compound based on atomic layer deposited multi-layer structure |
| 40 | On the role of nanoporosity in controlling the performance of moisture permeation barrier layers |
| 41 | Forming-free resistive switching of tunable ZnO films grown by atomic layer deposition |
| 42 | Liquid-Phase Crystallized Silicon Solar Cells on Glass: Increasing the Open-Circuit Voltage by Optimized Interlayers for n- and p-Type Absorbers |
| 43 | NiCO2O4@TiN Core-shell Electrodes through Conformal Atomic Layer Deposition for All-solid-state Supercapacitors |
| 44 | Very High Refractive Index Transition Metal Dichalcogenide Photonic Conformal Coatings by Conversion of ALD Metal Oxides |
| 45 | Micro-Raman Spectroscopy for Monitoring of Deposition Quality of High-k Stack Protective Layer onto Nanowire FET Chips for Highly Sensitive miRNA Detection |
| 46 | Preliminary investigation of high-k materials - TiO2 doped Ta2O5 films by remote plasma ALD |
| 47 | Top-down fabricated ZnO nanowire transistors for application in biosensors |
| 48 | Low resistivity HfNx grown by plasma-assisted ALD with external rf substrate biasing |
| 49 | Impact of hydrogen on the permanent deactivation of the boron-oxygen-related recombination center in crystalline silicon |
| 50 | Atomic layer deposition of Ru from CpRu(CO)2Et using O2 gas and O2 plasma |
| 51 | Thickness and Morphology Dependent Electrical Properties of ALD-Synthesized MoS2 FETs |
| 52 | 1D versus 3D quantum confinement in 1-5 nm ZnO nanoparticle agglomerations for application in charge-trapping memory devices |
| 53 | Energy dissipation during pulsed switching of strontium-titanate based resistive switching memory devices |
| 54 | Large area, patterned growth of 2D MoS2 and lateral MoS2-WS2 heterostructures for nano- and opto-electronic applications |
| 55 | Correlation of film density and wet etch rate in hydrofluoric acid of plasma enhanced atomic layer deposited silicon nitride |
| 56 | Silicon surface passivation by ultrathin Al2O3 films and Al2O3/SiNx stacks |
| 57 | Plasma-enhanced atomic-layer-deposited MoOx emitters for silicon heterojunction solar cells |
| 58 | Atomic layer deposition of aluminum fluoride using Al(CH3)3 and SF6 plasma |
| 59 | On the Contact Optimization of ALD-Based MoS2 FETs: Correlation of Processing Conditions and Interface Chemistry with Device Electrical Performance |
| 60 | Energy-enhanced atomic layer deposition for more process and precursor versatility |
| 61 | Tunable conduction type of solution-processed germanium nanoparticle based field effect transistors and their inverter integration |
| 62 | Remote plasma enhanced atomic layer deposition of ZnO for thin film electronic applications |
| 63 | Titanium Oxynitride Interlayer to Influence Oxygen Reduction Reaction Activity and Corrosion Stability of Pt and Pt-Ni Alloy |
| 64 | Realistic efficiency potential of next-generation industrial Czochralski-grown silicon solar cells after deactivation of the boron-oxygen-related defect center |
| 65 | Experimental demonstration of single electron transistors featuring SiO2 plasma-enhanced atomic layer deposition in Ni-SiO2-Ni tunnel junctions |
| 66 | Area-Selective Atomic Layer Deposition of Two-Dimensional WS2 Nanolayers |
| 67 | Interfaces Formed by ALD Metal Oxide Growth on Metal Layers |
| 68 | Tri-gate InGaAs-OI junctionless FETs with PE-ALD Al2O3 gate dielectric and H2/Ar anneal |
| 69 | Possible Candidates for Impurities in mc-Si Wafers Responsible for Light-Induced Lifetime Degradation and Regeneration |
| 70 | Mass Spectrometry Study of Li2CO3 Film Growth by Thermal and Plasma-Assisted Atomic Layer Deposition |
| 71 | Understanding the Oxygen Evolution Reaction Mechanism on CoOx using Operando Ambient-Pressure X-ray Photoelectron Spectroscopy |
| 72 | Nitrogen-Doping of Bulk and Nanotubular TiO2 Photocatalysts by Plasma-Assisted Atomic Layer Deposition |
| 73 | Role of Surface Termination in Atomic Layer Deposition of Silicon Nitride |
| 74 | Interfacial and electrical properties of Al2O3/HfO2 bilayer deposited by atomic layer deposition on GeON passivated germanium surface |
| 75 | Influence of Atomic Layer Deposition Temperatures on TiO2/n-Si MOS Capacitor |
| 76 | Dielectric Properties of Thermal and Plasma-Assisted Atomic Layer Deposited Al2O3 Thin Films |
| 77 | Industrially relevant Al2O3 deposition techniques for the surface passivation of Si solar cells |
| 78 | Analysis of NbN thin film deposition by plasma-enhanced ALD for gate electrode application |
| 79 | Hysteresis behaviour of top-down fabricated ZnO nanowire transistors |
| 80 | Plasma-assisted atomic layer deposition of TiN/Al2O3 stacks for metal-oxide-semiconductor capacitor applications |
| 81 | Optimization of Plasma Enhanced Atomic Layer Deposition Processes for Oxides, Nitrides and Metals in the Oxford Instruments FlexAL Reactor |
| 82 | Optical emission spectroscopy as a tool for studying, optimizing, and monitoring plasma-assisted atomic layer deposition processes |
| 83 | Thermal conductivity of ultrathin BaTiO3 films grown by plasma-assisted atomic layer deposition |
| 84 | Atomic layer deposition for perovskite solar cells: research status, opportunities and challenges |
| 85 | Controlling mechanical, structural, and optical properties of Al2O3 thin films deposited by plasma-enhanced atomic layer deposition with substrate biasing |
| 86 | Microwave properties of superconducting atomic-layer deposited TiN films |
| 87 | Order of Dry and Wet Mixed-Length Self-Assembled Monolayers |
| 88 | Plasma-assisted and thermal atomic layer deposition of electrochemically active Li2CO3 |
| 89 | The Influence of Ions and Photons during Plasma-Assisted ALD of Metal Oxides |
| 90 | Fabrication of nanoporous membranes for tuning microbial interactions and biochemical reactions |
| 91 | The effect of atomic layer deposition temperature on switching properties of HfOx resistive RAM devices |
| 92 | Synergy Between Plasma-Assisted ALD and Roll-to-Roll Atmospheric Pressure PE-CVD Processing of Moisture Barrier Films on Polymers |
| 93 | Edge-Site Nanoengineering of WS2 by Low-Temperature Plasma-Enhanced Atomic Layer Deposition for Electrocatalytic Hydrogen Evolution |
| 94 | Plasma-assisted atomic layer deposition of nanolaminates for gate dielectric applications |
| 95 | Electrical properties of MOS capacitors formed by PEALD grown Al2O3 on silicon |
| 96 | Al2O3/SiNx-Stacks at Increased Temperatures: Avoiding Blistering During Contact Firing |
| 97 | Injection dependence of the effective lifetime of n-type Si passivated by Al2O3: An edge effect? |
| 98 | A Study of Ultrathin Superconducting Films of Niobium Nitride Obtained by Atomic Layer Deposition |
| 99 | Biosensor properties of SOI nanowire transistors with a PEALD Al2O3 dielectric protective layer |
| 100 | Microstructure and electrical properties of thin HfO2 deposited by plasma-enhanced atomic layer deposition |
| 101 | Photoluminescence blue shift of indium phosphide nanowire networks with aluminum oxide coating |
| 102 | Impact of composition and crystallization behavior of atomic layer deposited strontium titanate films on the resistive switching of Pt/STO/TiN devices |
| 103 | Comparative study of thermal and plasma enhanced atomic layer deposition of aluminum oxide on graphene |
| 104 | Control of ion energy during plasma enhanced atomic layer deposition: A new strategy for the modulation of TiN growth delay on SiO2 |
| 105 | Atomic insights into the oxygen incorporation in atomic layer deposited conductive nitrides and its mitigation by energetic ions |
| 106 | High-κ insulating materials for AlGaN/GaN metal insulator semiconductor heterojunction field effect transistors |
| 107 | Evidence for low-energy ions influencing plasma-assisted atomic layer deposition of SiO2: Impact on the growth per cycle and wet etch rate |
| 108 | Strongly Disordered TiN and NbTiN s-Wave Superconductors Probed by Microwave Electrodynamics |
| 109 | Mechanical and electrical properties of plasma and thermal atomic layer deposited Al2O3 films on GaAs and Si |
| 110 | Plasma-Assisted ALD of Highly Conductive HfNx: On the Effect of Energetic Ions on Film Microstructure |
| 111 | Atomic Layer Deposition of Silicon Nitride from Bis(tert-butylamino)silane and N2 Plasma |
| 112 | Tuning Material Properties of Oxides and Nitrides by Substrate Biasing during Plasma-Enhanced Atomic Layer Deposition on Planar and 3D Substrate Topographies |
| 113 | Hot Carrier Filtering in Solution Processed Heterostructures: A Paradigm for Improving Thermoelectric Efficiency |
| 114 | Ion energy control during plasma-enhanced atomic layer deposition: enabling materials control and selective processing in the third dimension |
| 115 | Influence of stoichiometry on the performance of MIM capacitors from plasma-assisted ALD SrxTiyOz films |
| 116 | Redeposition in plasma-assisted atomic layer deposition: Silicon nitride film quality ruled by the gas residence time |
| 117 | Plasma-Assisted Atomic Layer Deposition of SrTiO3: Stoichiometry and Crystallinity Studied by Spectroscopic Ellipsometry |
| 118 | Room-Temperature ALD of Metal Oxide Thin Films by Energy-Enhanced ALD |
| 119 | Atomic Layer Deposition of Wet-Etch Resistant Silicon Nitride Using Di(sec-butylamino)silane and N2 Plasma on Planar and 3D Substrate Topographies |
| 120 | Influence of plasma-based in-situ surface cleaning procedures on HfO2/In0.53Ga0.47As gate stack properties |
| 121 | A multifunctional biphasic water splitting catalyst tailored for integration with high-performance semiconductor photoanodes |
| 122 | Efficient and Sustained Photoelectrochemical Water Oxidation by Cobalt Oxide/Silicon Photoanodes with Nanotextured Interfaces |
| 123 | A comparison between remote plasma-enhanced and thermal ALD of Hafnium-nitride thin films |
| 124 | Plasma-Assisted ALD of LiPO(N) for Solid State Batteries |
| 125 | Electrical Measurement Under Atmospheric Conditons of PbSe Nanocrystal Thin Films Passivated by Remote Plasma Atomic Layer Deposition of Al2O3 |
| 126 | Atomic layer deposition of TiN for the fabrication of nanomechanical resonators |
| 127 | Impact of Ions on Film Conformality and Crystallinity during Plasma-Assisted Atomic Layer Deposition of TiO2 |
| 128 | Simple plasma assisted atomic layer deposition technique for high substitutional nitrogen doping of TiO2 |
| 129 | Ultrasensitive Detection of 2,4-Dinitrophenol Using Nanowire Biosensor |
| 130 | Film Conformality and Extracted Recombination Probabilities of O Atoms during Plasma-Assisted Atomic Layer Deposition of SiO2, TiO2, Al2O3, and HfO2 |
| 131 | In situ spectroscopic ellipsometry during atomic layer deposition of Pt, Ru and Pd |
| 132 | Reaction Mechanisms during Atomic Layer Deposition of AlF3 Using Al(CH3)3 and SF6 Plasma |
| 133 | Deposition of TiN and HfO2 in a commercial 200 mm remote plasma atomic layer deposition reactor |
| 134 | Opportunities of Atomic Layer Deposition for Perovskite Solar Cells |
| 135 | Low-temperature plasma-enhanced atomic layer deposition of 2-D MoS2: large area, thickness control and tuneable morphology |
| 136 | Approaching the limits of dielectric breakdown for SiO2 films deposited by plasma-enhanced atomic layer deposition |
| 137 | Enhanced surface passivation of epitaxially grown emitters for high-efficiency ultrathin crystalline Si solar cells |
| 138 | Plasma-enhanced atomic layer deposition of tungsten oxide thin films using (tBuN)2(Me2N)2W and O2 plasma |
| 139 | Thermal and plasma enhanced atomic layer deposition of ultrathin TiO2 on silicon from amide and alkoxide precursors: growth chemistry and photoelectrochemical performance |
| 140 | Densification of Thin Aluminum Oxide Films by Thermal Treatments |
| 141 | Uniform Atomic Layer Deposition of Al2O3 on Graphene by Reversible Hydrogen Plasma Functionalization |
| 142 | High Dielectric Constant ZrO2 Films by Atomic Layer Deposition Technique on Germanium Substrates |
| 143 | Role of Metal Contacts in Designing High-Performance Monolayer n-Type WSe2 Field Effect Transistors |
| 144 | Application of spectral ellipsometry to in situ diagnostics of atomic layer deposition of dielectrics on silicon and AlGaN |
| 145 | Topographical selective deposition: A comparison between plasma-enhanced atomic layer deposition/sputtering and plasma-enhanced atomic layer deposition/quasi-atomic layer etching approaches |
| 146 | Ion and Photon Surface Interaction during Remote Plasma ALD of Metal Oxides |
| 147 | Atomic layer deposition of LiF using LiN(SiMe3)2 and SF6 plasma |
| 148 | Reaction mechanisms during plasma-assisted atomic layer deposition of metal oxides: A case study for Al2O3 |
| 149 | Low Temperature Plasma-Enhanced Atomic Layer Deposition of Metal Oxide Thin Films |
| 150 | Plasma-Enhanced Atomic Layer Deposition of Al2O3 on Graphene Using Monolayer hBN as Interfacial Layer |
| 151 | Fermi Level Tuning of ZnO Films Through Supercycled Atomic Layer Deposition |
| 152 | The influence of surface preparation on low temperature HfO2 ALD on InGaAs (001) and (110) surfaces |
| 153 | Low-Temperature Plasma-Assisted Atomic Layer Deposition of Silicon Nitride Moisture Permeation Barrier Layers |
| 154 | PEALD grown high-k ZrO2 thin films on SiC group IV compound semiconductor |
| 155 | Thermal and Plasma Enhanced Atomic Layer Deposition of Al2O3 on GaAs Substrates |
| 156 | Metal-Insulator-Metal Single Electron Transistors with Tunnel Barriers Prepared by Atomic Layer Deposition |
| 157 | Energetic ions during plasma-enhanced atomic layer deposition and their role in tailoring material properties |
| 158 | Insulator-protected mechanically controlled break junctions for measuring single-molecule conductance in aqueous environments |
| 159 | Atomic Layer Deposition of Aluminum Phosphate Using AlMe3, PO(OMe)3, and O2 Plasma: Film Growth and Surface Reactions |
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