Oxford Instruments FlexAL Plasma Enhanced Atomic Layer Deposition Film Publications

Your search for plasma enhanced atomic layer deposition publications using Oxford Instruments FlexAL hardware returned 160 records. If there are too many results, you may want to use the multi-factor search to narrow the results.

NumberTitle
1Microstructure and electrical properties of thin HfO2 deposited by plasma-enhanced atomic layer deposition
2Mechanical and electrical properties of plasma and thermal atomic layer deposited Al2O3 films on GaAs and Si
3Energetic ions during plasma-enhanced atomic layer deposition and their role in tailoring material properties
4Efficient and Sustained Photoelectrochemical Water Oxidation by Cobalt Oxide/Silicon Photoanodes with Nanotextured Interfaces
5A Study of Ultrathin Superconducting Films of Niobium Nitride Obtained by Atomic Layer Deposition
6Comparative study of ALD SiO2 thin films for optical applications
7Plasma-enhanced atomic layer deposition of tungsten oxide thin films using (tBuN)2(Me2N)2W and O2 plasma
8Atomic layer deposition for spacer defined double patterning of sub-10 nm titanium dioxide features
9Plasma-assisted and thermal atomic layer deposition of electrochemically active Li2CO3
10Thermal and Plasma Enhanced Atomic Layer Deposition of Al2O3 on GaAs Substrates
11Enhancing the Wettability of High Aspect-Ratio Through-Silicon Vias Lined With LPCVD Silicon Nitride or PE-ALD Titanium Nitride for Void-Free Bottom-Up Copper Electroplating
12Tri-gate InGaAs-OI junctionless FETs with PE-ALD Al2O3 gate dielectric and H2/Ar anneal
13Correlation of film density and wet etch rate in hydrofluoric acid of plasma enhanced atomic layer deposited silicon nitride
14Atomic Layer Deposition of the Conductive Delafossite PtCoO2
15Redeposition in plasma-assisted atomic layer deposition: Silicon nitride film quality ruled by the gas residence time
16Reaction mechanisms during plasma-assisted atomic layer deposition of metal oxides: A case study for Al2O3
17Impact of hydrogen on the permanent deactivation of the boron-oxygen-related recombination center in crystalline silicon
18Plasma-assisted atomic layer deposition of HfNx: Tailoring the film properties by the plasma gas composition
19Influence of stoichiometry on the performance of MIM capacitors from plasma-assisted ALD SrxTiyOz films
20Controlling mechanical, structural, and optical properties of Al2O3 thin films deposited by plasma-enhanced atomic layer deposition with substrate biasing
21Role of Metal Contacts in Designing High-Performance Monolayer n-Type WSe2 Field Effect Transistors
22Industrially relevant Al2O3 deposition techniques for the surface passivation of Si solar cells
23Plasma-enhanced atomic-layer-deposited MoOx emitters for silicon heterojunction solar cells
24Large area, patterned growth of 2D MoS2 and lateral MoS2-WS2 heterostructures for nano- and opto-electronic applications
25Order of Dry and Wet Mixed-Length Self-Assembled Monolayers
26Flexible Perovskite Photovoltaic Modules and Solar Cells Based on Atomic Layer Deposited Compact Layers and UV-Irradiated TiO2 Scaffolds on Plastic Substrates
27Nitrogen-Doping of Bulk and Nanotubular TiO2 Photocatalysts by Plasma-Assisted Atomic Layer Deposition
28Atomic Layer Deposition of Cobalt Phosphide for Efficient Water Splitting
29Topographical selective deposition: A comparison between plasma-enhanced atomic layer deposition/sputtering and plasma-enhanced atomic layer deposition/quasi-atomic layer etching approaches
30Crystallization Study by Transmission Electron Microscopy of SrTiO3 Thin Films Prepared by Plasma-Assisted ALD
31Atomic layer deposition of Ru from CpRu(CO)2Et using O2 gas and O2 plasma
32Simple plasma assisted atomic layer deposition technique for high substitutional nitrogen doping of TiO2
33Plasma-assisted atomic layer deposition of TiN/Al2O3 stacks for metal-oxide-semiconductor capacitor applications
34Film Conformality and Extracted Recombination Probabilities of O Atoms during Plasma-Assisted Atomic Layer Deposition of SiO2, TiO2, Al2O3, and HfO2
35Area-Selective Atomic Layer Deposition of SiO2 Using Acetylacetone as a Chemoselective Inhibitor in an ABC-Type Cycle
36Very High Refractive Index Transition Metal Dichalcogenide Photonic Conformal Coatings by Conversion of ALD Metal Oxides
37Strongly Disordered TiN and NbTiN s-Wave Superconductors Probed by Microwave Electrodynamics
38Atomic layer deposition of HfO2 using HfCp(NMe2)3 and O2 plasma
39Influence of Atomic Layer Deposition Temperatures on TiO2/n-Si MOS Capacitor
40Low Temperature Plasma-Enhanced Atomic Layer Deposition of Metal Oxide Thin Films
41Deposition of TiN and HfO2 in a commercial 200 mm remote plasma atomic layer deposition reactor
42Silicon surface passivation by ultrathin Al2O3 films and Al2O3/SiNx stacks
43Ion energy control during plasma-enhanced atomic layer deposition: enabling materials control and selective processing in the third dimension
44High-κ insulating materials for AlGaN/GaN metal insulator semiconductor heterojunction field effect transistors
45Biosensor properties of SOI nanowire transistors with a PEALD Al2O3 dielectric protective layer
46Atomic layer deposition of TiN for the fabrication of nanomechanical resonators
47Plasma-enhanced atomic layer deposition of BaTiO3
48Stability of Al2O3 and Al2O3/a-Six:H stacks for surface passivation of crystalline silicon
49Evidence for low-energy ions influencing plasma-assisted atomic layer deposition of SiO2: Impact on the growth per cycle and wet etch rate
50The important role of water in growth of monolayer transition metal dichalcogenides
51Micro-Raman Spectroscopy for Monitoring of Deposition Quality of High-k Stack Protective Layer onto Nanowire FET Chips for Highly Sensitive miRNA Detection
52Preliminary investigation of high-k materials - TiO2 doped Ta2O5 films by remote plasma ALD
53A comparison between remote plasma-enhanced and thermal ALD of Hafnium-nitride thin films
54Fabrication of nanoporous membranes for tuning microbial interactions and biochemical reactions
55Atomic insights into the oxygen incorporation in atomic layer deposited conductive nitrides and its mitigation by energetic ions
56Multistep atomic layer deposition process for ultrathin superconducting NbN films with high critical current density on amorphous substrate
57A multifunctional biphasic water splitting catalyst tailored for integration with high-performance semiconductor photoanodes
58Controlling transition metal atomic ordering in two-dimensional Mo1-xWxS2 alloys
59Tunable conduction type of solution-processed germanium nanoparticle based field effect transistors and their inverter integration
60Opportunities of Atomic Layer Deposition for Perovskite Solar Cells
61Realistic efficiency potential of next-generation industrial Czochralski-grown silicon solar cells after deactivation of the boron-oxygen-related defect center
62Ion and Photon Surface Interaction during Remote Plasma ALD of Metal Oxides
63Room-Temperature ALD of Metal Oxide Thin Films by Energy-Enhanced ALD
64The influence of surface preparation on low temperature HfO2 ALD on InGaAs (001) and (110) surfaces
65Plasma-assisted atomic layer deposition of nanolaminates for gate dielectric applications
66Uniform Atomic Layer Deposition of Al2O3 on Graphene by Reversible Hydrogen Plasma Functionalization
67Role of Surface Termination in Atomic Layer Deposition of Silicon Nitride
68PEALD grown high-k ZrO2 thin films on SiC group IV compound semiconductor
69Electrical Characteristics of Top-Down ZnO Nanowire Transistors Using Remote Plasma ALD
70Low-temperature plasma-enhanced atomic layer deposition of 2-D MoS2: large area, thickness control and tuneable morphology
71Comparison of thermal and plasma-enhanced atomic layer deposition of niobium oxide thin films
72Remote plasma enhanced atomic layer deposition of ZnO for thin film electronic applications
73In situ spectroscopic ellipsometry during atomic layer deposition of Pt, Ru and Pd
74Injection dependence of the effective lifetime of n-type Si passivated by Al2O3: An edge effect?
75Impact of Ions on Film Conformality and Crystallinity during Plasma-Assisted Atomic Layer Deposition of TiO2
76The Influence of Ions and Photons during Plasma-Assisted ALD of Metal Oxides
77Thermal and plasma enhanced atomic layer deposition of ultrathin TiO2 on silicon from amide and alkoxide precursors: growth chemistry and photoelectrochemical performance
78Al2O3/SiNx-Stacks at Increased Temperatures: Avoiding Blistering During Contact Firing
79Optimization of Plasma Enhanced Atomic Layer Deposition Processes for Oxides, Nitrides and Metals in the Oxford Instruments FlexAL Reactor
80Densification of Thin Aluminum Oxide Films by Thermal Treatments
81Titanium Oxynitride Interlayer to Influence Oxygen Reduction Reaction Activity and Corrosion Stability of Pt and Pt-Ni Alloy
82Analysis of NbN thin film deposition by plasma-enhanced ALD for gate electrode application
83Corrosion barriers for silver-based telescope mirrors: comparative study of plasma-enhanced atomic layer deposition and reactive evaporation of aluminum oxide
84Topographically selective deposition
85Electrical Measurement Under Atmospheric Conditons of PbSe Nanocrystal Thin Films Passivated by Remote Plasma Atomic Layer Deposition of Al2O3
86Silicon Nitride and Silicon Oxide Thin Films by Plasma ALD
87Hysteresis behaviour of top-down fabricated ZnO nanowire transistors
88Energy-enhanced atomic layer deposition for more process and precursor versatility
89Dielectric Properties of Thermal and Plasma-Assisted Atomic Layer Deposited Al2O3 Thin Films
90Comparative study of thermal and plasma enhanced atomic layer deposition of aluminum oxide on graphene
91Impact of composition and crystallization behavior of atomic layer deposited strontium titanate films on the resistive switching of Pt/STO/TiN devices
92Plasma-Assisted Atomic Layer Deposition of SrTiO3: Stoichiometry and Crystallinity Studied by Spectroscopic Ellipsometry
93Forming-free resistive switching of tunable ZnO films grown by atomic layer deposition
94Fermi Level Tuning of ZnO Films Through Supercycled Atomic Layer Deposition
95Enhanced surface passivation of epitaxially grown emitters for high-efficiency ultrathin crystalline Si solar cells
96Atomic Layer Deposition of Aluminum Phosphate Using AlMe3, PO(OMe)3, and O2 Plasma: Film Growth and Surface Reactions
97Liquid-Phase Crystallized Silicon Solar Cells on Glass: Increasing the Open-Circuit Voltage by Optimized Interlayers for n- and p-Type Absorbers
98On the Contact Optimization of ALD-Based MoS2 FETs: Correlation of Processing Conditions and Interface Chemistry with Device Electrical Performance
99Synergy Between Plasma-Assisted ALD and Roll-to-Roll Atmospheric Pressure PE-CVD Processing of Moisture Barrier Films on Polymers
100Probing the Origin and Suppression of Vertically Oriented Nanostructures of 2D WS2 Layers
101Interfaces Formed by ALD Metal Oxide Growth on Metal Layers
102Metal-Insulator-Metal Single Electron Transistors with Tunnel Barriers Prepared by Atomic Layer Deposition
1031D versus 3D quantum confinement in 1-5 nm ZnO nanoparticle agglomerations for application in charge-trapping memory devices
104Atomic layer deposition TiO2-Al2O3 stack: An improved gate dielectric on Ga-polar GaN metal oxide semiconductor capacitors
105Dielectric properties investigation of a compound based on atomic layer deposited multi-layer structure
106Advanced surface passivation of epitaxial boron emitters for high-efficiency ultrathin crystalline silicon solar cells
107Application of spectral ellipsometry to in situ diagnostics of atomic layer deposition of dielectrics on silicon and AlGaN
108Effective Surface Passivation of InP Nanowires by Atomic-Layer-Deposited Al2O3 with POx Interlayer
109Top-down fabricated ZnO nanowire transistors for application in biosensors
110Atomic Layer Deposition of Silicon Nitride from Bis(tert-butylamino)silane and N2 Plasma
111Influence of plasma-based in-situ surface cleaning procedures on HfO2/In0.53Ga0.47As gate stack properties
112Unexpectedly High Minority-Carrier Lifetimes Exceeding 20 ms Measured on 1.4-Ohm cm n-Type Silicon Wafers
113Atomic Layer Deposition of Wet-Etch Resistant Silicon Nitride Using Di(sec-butylamino)silane and N2 Plasma on Planar and 3D Substrate Topographies
114Low-Temperature Plasma-Assisted Atomic Layer Deposition of Silicon Nitride Moisture Permeation Barrier Layers
115Microwave properties of superconducting atomic-layer deposited TiN films
116Thermal conductivity of ultrathin BaTiO3 films grown by plasma-assisted atomic layer deposition
117Energy dissipation during pulsed switching of strontium-titanate based resistive switching memory devices
118Atomic layer deposition of LiF using LiN(SiMe3)2 and SF6 plasma
119Plasma-Enhanced Atomic Layer Deposition of Al2O3 on Graphene Using Monolayer hBN as Interfacial Layer
120Area-Selective Atomic Layer Deposition of Two-Dimensional WS2 Nanolayers
121Cathode encapsulation of organic light emitting diodes by atomic layer deposited Al2O3 films and Al2O3/a-SiNx:H stacks
122Plasma Processing for Crystallization and Densification of Atomic Layer Deposition BaTiO3 Thin Films
123Edge-Site Nanoengineering of WS2 by Low-Temperature Plasma-Enhanced Atomic Layer Deposition for Electrocatalytic Hydrogen Evolution
124Plasma-Assisted ALD of Highly Conductive HfNx: On the Effect of Energetic Ions on Film Microstructure
125Atomic layer deposition of aluminum fluoride using Al(CH3)3 and SF6 plasma
126Surface passivation of phosphorus-diffused n+-type emitters by plasma-assisted atomic-layer deposited Al2O3
127Possible Candidates for Impurities in mc-Si Wafers Responsible for Light-Induced Lifetime Degradation and Regeneration
128NiCO2O4@TiN Core-shell Electrodes through Conformal Atomic Layer Deposition for All-solid-state Supercapacitors
129Electrical properties of MOS capacitors formed by PEALD grown Al2O3 on silicon
130Understanding the Oxygen Evolution Reaction Mechanism on CoOx using Operando Ambient-Pressure X-ray Photoelectron Spectroscopy
131The effect of atomic layer deposition temperature on switching properties of HfOx resistive RAM devices
132Single-electron transistors featuring silicon nitride tunnel barriers prepared by atomic layer deposition
133Plasma-Assisted ALD of LiPO(N) for Solid State Batteries
134On the role of nanoporosity in controlling the performance of moisture permeation barrier layers
135Approaching the limits of dielectric breakdown for SiO2 films deposited by plasma-enhanced atomic layer deposition
136Control of ion energy during plasma enhanced atomic layer deposition: A new strategy for the modulation of TiN growth delay on SiO2
137Sub-10-nm ferroelectric Gd-doped HfO2 layers
138Mass Spectrometry Study of Li2CO3 Film Growth by Thermal and Plasma-Assisted Atomic Layer Deposition
139Influence of the Deposition Temperature on the c-Si Surface Passivation by Al2O3 Films Synthesized by ALD and PECVD
140Insulator-protected mechanically controlled break junctions for measuring single-molecule conductance in aqueous environments
141Tuning Material Properties of Oxides and Nitrides by Substrate Biasing during Plasma-Enhanced Atomic Layer Deposition on Planar and 3D Substrate Topographies
142Interfacial and electrical properties of Al2O3/HfO2 bilayer deposited by atomic layer deposition on GeON passivated germanium surface
143Atomic layer deposited silicon dioxide films on nanomechanical silicon nitride resonators
144Charge Transport through Organic Molecular Wires Embedded in Ultrathin Insulating Inorganic Layer
145Experimental demonstration of single electron transistors featuring SiO2 plasma-enhanced atomic layer deposition in Ni-SiO2-Ni tunnel junctions
146Toward an integrated device for spatiotemporal superposition of free-electron lasers and laser pulses
147Reaction Mechanisms during Atomic Layer Deposition of AlF3 Using Al(CH3)3 and SF6 Plasma
148Silicon nanowire lithium-ion battery anodes with ALD deposited TiN coatings demonstrate a major improvement in cycling performance
149Ultrasensitive Detection of 2,4-Dinitrophenol Using Nanowire Biosensor
150Thickness and Morphology Dependent Electrical Properties of ALD-Synthesized MoS2 FETs
151Photoluminescence blue shift of indium phosphide nanowire networks with aluminum oxide coating
152Low resistivity HfNx grown by plasma-assisted ALD with external rf substrate biasing
153Spectroscopic and electrical calculation of band alignment between atomic layer deposited SiO2 and β-Ga2O3 (2̅01)
154Enhanced Barrier Performance of Engineered Paper by Atomic Layer Deposited Al2O3 Thin Films
155Optical emission spectroscopy as a tool for studying, optimizing, and monitoring plasma-assisted atomic layer deposition processes
156High Dielectric Constant ZrO2 Films by Atomic Layer Deposition Technique on Germanium Substrates
157Hot Carrier Filtering in Solution Processed Heterostructures: A Paradigm for Improving Thermoelectric Efficiency
158Propagation Effects in Carbon Nanoelectronics
159Atomic layer deposition for perovskite solar cells: research status, opportunities and challenges