Oxford Instruments FlexAL Plasma Enhanced Atomic Layer Deposition Film Publications

Your search for plasma enhanced atomic layer deposition publications using Oxford Instruments FlexAL hardware returned 169 records. If there are too many results, you may want to use the multi-factor search to narrow the results.

NumberTitle
1Very High Refractive Index Transition Metal Dichalcogenide Photonic Conformal Coatings by Conversion of ALD Metal Oxides
2Reaction Mechanisms during Atomic Layer Deposition of AlF3 Using Al(CH3)3 and SF6 Plasma
3Densification of Thin Aluminum Oxide Films by Thermal Treatments
4Ion energy control during plasma-enhanced atomic layer deposition: enabling materials control and selective processing in the third dimension
5High-κ insulating materials for AlGaN/GaN metal insulator semiconductor heterojunction field effect transistors
6Synergy Between Plasma-Assisted ALD and Roll-to-Roll Atmospheric Pressure PE-CVD Processing of Moisture Barrier Films on Polymers
7Control of ion energy during plasma enhanced atomic layer deposition: A new strategy for the modulation of TiN growth delay on SiO2
8Tri-gate InGaAs-OI junctionless FETs with PE-ALD Al2O3 gate dielectric and H2/Ar anneal
9In situ spectroscopic ellipsometry during atomic layer deposition of Pt, Ru and Pd
10Fabrication of nanoporous membranes for tuning microbial interactions and biochemical reactions
11Plasma-assisted atomic layer deposition of HfNx: Tailoring the film properties by the plasma gas composition
12Plasma-assisted atomic layer deposition of TiN/Al2O3 stacks for metal-oxide-semiconductor capacitor applications
13Simple plasma assisted atomic layer deposition technique for high substitutional nitrogen doping of TiO2
14Tunable conduction type of solution-processed germanium nanoparticle based field effect transistors and their inverter integration
15Enhanced surface passivation of epitaxially grown emitters for high-efficiency ultrathin crystalline Si solar cells
16A multifunctional biphasic water splitting catalyst tailored for integration with high-performance semiconductor photoanodes
17Effective Surface Passivation of InP Nanowires by Atomic-Layer-Deposited Al2O3 with POx Interlayer
18Plasma and Thermal ALD of Al2O3 in a Commercial 200mm ALD Reactor
19Redeposition in plasma-assisted atomic layer deposition: Silicon nitride film quality ruled by the gas residence time
20Approaching the limits of dielectric breakdown for SiO2 films deposited by plasma-enhanced atomic layer deposition
21Hysteresis behaviour of top-down fabricated ZnO nanowire transistors
22Influence of Atomic Layer Deposition Temperatures on TiO2/n-Si MOS Capacitor
23Role of Metal Contacts in Designing High-Performance Monolayer n-Type WSe2 Field Effect Transistors
24Optical emission spectroscopy as a tool for studying, optimizing, and monitoring plasma-assisted atomic layer deposition processes
25Ultrasensitive Detection of 2,4-Dinitrophenol Using Nanowire Biosensor
26Insulator-protected mechanically controlled break junctions for measuring single-molecule conductance in aqueous environments
27Electrical properties of MOS capacitors formed by PEALD grown Al2O3 on silicon
28Energy dissipation during pulsed switching of strontium-titanate based resistive switching memory devices
29Dielectric properties investigation of a compound based on atomic layer deposited multi-layer structure
30Charge Transport through Organic Molecular Wires Embedded in Ultrathin Insulating Inorganic Layer
31Low-temperature plasma-enhanced atomic layer deposition of 2-D MoS2: large area, thickness control and tuneable morphology
32Reaction mechanisms during plasma-assisted atomic layer deposition of metal oxides: A case study for Al2O3
33Plasma Processing for Crystallization and Densification of Atomic Layer Deposition BaTiO3 Thin Films
34The important role of water in growth of monolayer transition metal dichalcogenides
35Comparative study of thermal and plasma enhanced atomic layer deposition of aluminum oxide on graphene
36Influence of the Deposition Temperature on the c-Si Surface Passivation by Al2O3 Films Synthesized by ALD and PECVD
37Deposition of TiN and HfO2 in a commercial 200 mm remote plasma atomic layer deposition reactor
38Opportunities of Atomic Layer Deposition for Perovskite Solar Cells
39Remote plasma enhanced atomic layer deposition of ZnO for thin film electronic applications
40Low-Temperature Plasma-Assisted Atomic Layer Deposition of Silicon Nitride Moisture Permeation Barrier Layers
41Impact of hydrogen on the permanent deactivation of the boron-oxygen-related recombination center in crystalline silicon
42Ferroelectricity in hafnia controlled via surface electrochemical state
43Corrosion barriers for silver-based telescope mirrors: comparative study of plasma-enhanced atomic layer deposition and reactive evaporation of aluminum oxide
44Comparison of thermal and plasma-enhanced atomic layer deposition of niobium oxide thin films
45Uniform Atomic Layer Deposition of Al2O3 on Graphene by Reversible Hydrogen Plasma Functionalization
46Preliminary investigation of high-k materials - TiO2 doped Ta2O5 films by remote plasma ALD
47Film Conformality and Extracted Recombination Probabilities of O Atoms during Plasma-Assisted Atomic Layer Deposition of SiO2, TiO2, Al2O3, and HfO2
48Enhancing the Wettability of High Aspect-Ratio Through-Silicon Vias Lined With LPCVD Silicon Nitride or PE-ALD Titanium Nitride for Void-Free Bottom-Up Copper Electroplating
49Silicon nanowire lithium-ion battery anodes with ALD deposited TiN coatings demonstrate a major improvement in cycling performance
50Impact of Ions on Film Conformality and Crystallinity during Plasma-Assisted Atomic Layer Deposition of TiO2
51Dielectric Properties of Thermal and Plasma-Assisted Atomic Layer Deposited Al2O3 Thin Films
52Plasma-Assisted ALD of LiPO(N) for Solid State Batteries
53Injection dependence of the effective lifetime of n-type Si passivated by Al2O3: An edge effect?
54A Study of Ultrathin Superconducting Films of Niobium Nitride Obtained by Atomic Layer Deposition
55Metal-Insulator-Metal Single Electron Transistors with Tunnel Barriers Prepared by Atomic Layer Deposition
56Crystallization Study by Transmission Electron Microscopy of SrTiO3 Thin Films Prepared by Plasma-Assisted ALD
57NiCO2O4@TiN Core-shell Electrodes through Conformal Atomic Layer Deposition for All-solid-state Supercapacitors
58Tuning Material Properties of Oxides and Nitrides by Substrate Biasing during Plasma-Enhanced Atomic Layer Deposition on Planar and 3D Substrate Topographies
59Ion and Photon Surface Interaction during Remote Plasma ALD of Metal Oxides
60Controlling mechanical, structural, and optical properties of Al2O3 thin films deposited by plasma-enhanced atomic layer deposition with substrate biasing
61Topographical selective deposition: A comparison between plasma-enhanced atomic layer deposition/sputtering and plasma-enhanced atomic layer deposition/quasi-atomic layer etching approaches
62Surface passivation of phosphorus-diffused n+-type emitters by plasma-assisted atomic-layer deposited Al2O3
63Biosensor properties of SOI nanowire transistors with a PEALD Al2O3 dielectric protective layer
64Atomic layer deposition of HfO2 using HfCp(NMe2)3 and O2 plasma
65Low-Temperature Phase-Controlled Synthesis of Titanium Di- and Tri-sulfide by Atomic Layer Deposition
66Atomic layer deposition of aluminum fluoride using Al(CH3)3 and SF6 plasma
67Optimization of Plasma Enhanced Atomic Layer Deposition Processes for Oxides, Nitrides and Metals in the Oxford Instruments FlexAL Reactor
68Influence of stoichiometry on the performance of MIM capacitors from plasma-assisted ALD SrxTiyOz films
69Microstructure and electrical properties of thin HfO2 deposited by plasma-enhanced atomic layer deposition
70Efficient and Sustained Photoelectrochemical Water Oxidation by Cobalt Oxide/Silicon Photoanodes with Nanotextured Interfaces
71Top-down fabricated ZnO nanowire transistors for application in biosensors
72Liquid-Phase Crystallized Silicon Solar Cells on Glass: Increasing the Open-Circuit Voltage by Optimized Interlayers for n- and p-Type Absorbers
73Influence of plasma-based in-situ surface cleaning procedures on HfO2/In0.53Ga0.47As gate stack properties
74Low Temperature Plasma-Enhanced Atomic Layer Deposition of Metal Oxide Thin Films
75Mass Spectrometry Study of Li2CO3 Film Growth by Thermal and Plasma-Assisted Atomic Layer Deposition
76Plasma-enhanced atomic layer deposition of BaTiO3
77Flexible Perovskite Photovoltaic Modules and Solar Cells Based on Atomic Layer Deposited Compact Layers and UV-Irradiated TiO2 Scaffolds on Plastic Substrates
78Interfaces Formed by ALD Metal Oxide Growth on Metal Layers
79Energetic ions during plasma-enhanced atomic layer deposition and their role in tailoring material properties
80Thermal and Plasma Enhanced Atomic Layer Deposition of Al2O3 on GaAs Substrates
81Propagation Effects in Carbon Nanoelectronics
82The effect of atomic layer deposition temperature on switching properties of HfOx resistive RAM devices
83Correlation of film density and wet etch rate in hydrofluoric acid of plasma enhanced atomic layer deposited silicon nitride
84Plasma-enhanced atomic layer deposition of tungsten oxide thin films using (tBuN)2(Me2N)2W and O2 plasma
85Atomic Layer Deposition of Large-Area Polycrystalline Transition Metal Dichalcogenides from 100°C through Control of Plasma Chemistry
86Thermal and plasma enhanced atomic layer deposition of ultrathin TiO2 on silicon from amide and alkoxide precursors: growth chemistry and photoelectrochemical performance
87Realistic efficiency potential of next-generation industrial Czochralski-grown silicon solar cells after deactivation of the boron-oxygen-related defect center
88Plasma-enhanced atomic-layer-deposited MoOx emitters for silicon heterojunction solar cells
89Industrially relevant Al2O3 deposition techniques for the surface passivation of Si solar cells
90Low temperature Topographically Selective Deposition by Plasma Enhanced Atomic Layer Deposition with ion bombardment assistance
91Thermal conductivity of ultrathin BaTiO3 films grown by plasma-assisted atomic layer deposition
92Area-Selective Atomic Layer Deposition of Two-Dimensional WS2 Nanolayers
93Atomic layer deposition of TiN for the fabrication of nanomechanical resonators
94Evidence for low-energy ions influencing plasma-assisted atomic layer deposition of SiO2: Impact on the growth per cycle and wet etch rate
95Topographically selective deposition
96Nitrogen-Doping of Bulk and Nanotubular TiO2 Photocatalysts by Plasma-Assisted Atomic Layer Deposition
97A comparison between remote plasma-enhanced and thermal ALD of Hafnium-nitride thin films
98Single-electron transistors featuring silicon nitride tunnel barriers prepared by atomic layer deposition
99Plasma-assisted and thermal atomic layer deposition of electrochemically active Li2CO3
100Possible Candidates for Impurities in mc-Si Wafers Responsible for Light-Induced Lifetime Degradation and Regeneration
101PEALD grown high-k ZrO2 thin films on SiC group IV compound semiconductor
102Comparative study of ALD SiO2 thin films for optical applications
103Low resistivity HfNx grown by plasma-assisted ALD with external rf substrate biasing
104Atomic Layer Deposition of Cobalt Phosphide for Efficient Water Splitting
105Stability of Al2O3 and Al2O3/a-Six:H stacks for surface passivation of crystalline silicon
106Fermi Level Tuning of ZnO Films Through Supercycled Atomic Layer Deposition
107Spectroscopic and electrical calculation of band alignment between atomic layer deposited SiO2 and β-Ga2O3 (2̅01)
108Enhanced Barrier Performance of Engineered Paper by Atomic Layer Deposited Al2O3 Thin Films
109Origin of Ferroelectric Phase Stabilization via the Clamping Effect in Ferroelectric Hafnium Zirconium Oxide Thin Films
110Atomic layer deposition TiO2-Al2O3 stack: An improved gate dielectric on Ga-polar GaN metal oxide semiconductor capacitors
111Sub-10-nm ferroelectric Gd-doped HfO2 layers
112Edge-Site Nanoengineering of WS2 by Low-Temperature Plasma-Enhanced Atomic Layer Deposition for Electrocatalytic Hydrogen Evolution
113Atomic layer deposited silicon dioxide films on nanomechanical silicon nitride resonators
114High Dielectric Constant ZrO2 Films by Atomic Layer Deposition Technique on Germanium Substrates
115Probing the Origin and Suppression of Vertically Oriented Nanostructures of 2D WS2 Layers
116Understanding the Oxygen Evolution Reaction Mechanism on CoOx using Operando Ambient-Pressure X-ray Photoelectron Spectroscopy
117Atomic Layer Deposition of Silicon Nitride from Bis(tert-butylamino)silane and N2 Plasma
118Area-Selective Atomic Layer Deposition of SiO2 Using Acetylacetone as a Chemoselective Inhibitor in an ABC-Type Cycle
119Thickness and Morphology Dependent Electrical Properties of ALD-Synthesized MoS2 FETs
120Mechanical and electrical properties of plasma and thermal atomic layer deposited Al2O3 films on GaAs and Si
121Plasma-Assisted ALD of Highly Conductive HfNx: On the Effect of Energetic Ions on Film Microstructure
122Atomic layer deposition of Ru from CpRu(CO)2Et using O2 gas and O2 plasma
123On the Contact Optimization of ALD-Based MoS2 FETs: Correlation of Processing Conditions and Interface Chemistry with Device Electrical Performance
124Plasma-Enhanced Atomic Layer Deposition of Al2O3 on Graphene Using Monolayer hBN as Interfacial Layer
125Advanced surface passivation of epitaxial boron emitters for high-efficiency ultrathin crystalline silicon solar cells
126Micro-Raman Spectroscopy for Monitoring of Deposition Quality of High-k Stack Protective Layer onto Nanowire FET Chips for Highly Sensitive miRNA Detection
127Microwave properties of superconducting atomic-layer deposited TiN films
128Atomic Layer Deposition of Wet-Etch Resistant Silicon Nitride Using Di(sec-butylamino)silane and N2 Plasma on Planar and 3D Substrate Topographies
129Atomic layer deposition of LiF using LiN(SiMe3)2 and SF6 plasma
130Energy-enhanced atomic layer deposition for more process and precursor versatility
131Photoluminescence blue shift of indium phosphide nanowire networks with aluminum oxide coating
132Hot Carrier Filtering in Solution Processed Heterostructures: A Paradigm for Improving Thermoelectric Efficiency
133Al2O3/SiNx-Stacks at Increased Temperatures: Avoiding Blistering During Contact Firing
134Atomic insights into the oxygen incorporation in atomic layer deposited conductive nitrides and its mitigation by energetic ions
135Plasma Enhanced Atomic Layer Deposition of Ruthenium Films Using Ru(EtCp)2 Precursor
136Unexpectedly High Minority-Carrier Lifetimes Exceeding 20 ms Measured on 1.4-Ohm cm n-Type Silicon Wafers
137The Influence of Ions and Photons during Plasma-Assisted ALD of Metal Oxides
138Role of Surface Termination in Atomic Layer Deposition of Silicon Nitride
139Atomic Layer Deposition of the Conductive Delafossite PtCoO2
1401D versus 3D quantum confinement in 1-5 nm ZnO nanoparticle agglomerations for application in charge-trapping memory devices
141Atomic layer deposition for perovskite solar cells: research status, opportunities and challenges
142Cathode encapsulation of organic light emitting diodes by atomic layer deposited Al2O3 films and Al2O3/a-SiNx:H stacks
143The influence of surface preparation on low temperature HfO2 ALD on InGaAs (001) and (110) surfaces
144Room-Temperature ALD of Metal Oxide Thin Films by Energy-Enhanced ALD
145Forming-free resistive switching of tunable ZnO films grown by atomic layer deposition
146Properties of plasma enhanced atomic layer deposited ruthenium thin films from Ru(EtCp)2
147Multistep atomic layer deposition process for ultrathin superconducting NbN films with high critical current density on amorphous substrate
148Impact of composition and crystallization behavior of atomic layer deposited strontium titanate films on the resistive switching of Pt/STO/TiN devices
149Electrical Characteristics of Top-Down ZnO Nanowire Transistors Using Remote Plasma ALD
150Application of spectral ellipsometry to in situ diagnostics of atomic layer deposition of dielectrics on silicon and AlGaN
151Oxygen Recombination Probability Data for Plasma-Assisted Atomic Layer Deposition of SiO2 and TiO2
152Order of Dry and Wet Mixed-Length Self-Assembled Monolayers
153Large area, patterned growth of 2D MoS2 and lateral MoS2-WS2 heterostructures for nano- and opto-electronic applications
154Toward an integrated device for spatiotemporal superposition of free-electron lasers and laser pulses
155Controlling transition metal atomic ordering in two-dimensional Mo1-xWxS2 alloys
156On the role of nanoporosity in controlling the performance of moisture permeation barrier layers
157Titanium Oxynitride Interlayer to Influence Oxygen Reduction Reaction Activity and Corrosion Stability of Pt and Pt-Ni Alloy
158Analysis of NbN thin film deposition by plasma-enhanced ALD for gate electrode application
159Electrical Measurement Under Atmospheric Conditons of PbSe Nanocrystal Thin Films Passivated by Remote Plasma Atomic Layer Deposition of Al2O3
160Experimental demonstration of single electron transistors featuring SiO2 plasma-enhanced atomic layer deposition in Ni-SiO2-Ni tunnel junctions
161Atomic Layer Deposition of Aluminum Phosphate Using AlMe3, PO(OMe)3, and O2 Plasma: Film Growth and Surface Reactions
162Plasma-assisted atomic layer deposition of nanolaminates for gate dielectric applications
163Interfacial and electrical properties of Al2O3/HfO2 bilayer deposited by atomic layer deposition on GeON passivated germanium surface
164Silicon Nitride and Silicon Oxide Thin Films by Plasma ALD
165Silicon surface passivation by ultrathin Al2O3 films and Al2O3/SiNx stacks
166Strongly Disordered TiN and NbTiN s-Wave Superconductors Probed by Microwave Electrodynamics
167Atomic layer deposition for spacer defined double patterning of sub-10 nm titanium dioxide features
168Plasma-Assisted Atomic Layer Deposition of SrTiO3: Stoichiometry and Crystallinity Studied by Spectroscopic Ellipsometry