Oxford Instruments FlexAL Plasma Enhanced Atomic Layer Deposition Film Publications

Your search for plasma enhanced atomic layer deposition publications using Oxford Instruments FlexAL hardware returned 169 records. If there are too many results, you may want to use the multi-factor search to narrow the results.

NumberTitle
1Cathode encapsulation of organic light emitting diodes by atomic layer deposited Al2O3 films and Al2O3/a-SiNx:H stacks
2Area-Selective Atomic Layer Deposition of SiO2 Using Acetylacetone as a Chemoselective Inhibitor in an ABC-Type Cycle
3PEALD grown high-k ZrO2 thin films on SiC group IV compound semiconductor
4Influence of Atomic Layer Deposition Temperatures on TiO2/n-Si MOS Capacitor
5Crystallization Study by Transmission Electron Microscopy of SrTiO3 Thin Films Prepared by Plasma-Assisted ALD
6Influence of plasma-based in-situ surface cleaning procedures on HfO2/In0.53Ga0.47As gate stack properties
7On the role of nanoporosity in controlling the performance of moisture permeation barrier layers
8Comparative study of ALD SiO2 thin films for optical applications
9Atomic layer deposition of HfO2 using HfCp(NMe2)3 and O2 plasma
10High Dielectric Constant ZrO2 Films by Atomic Layer Deposition Technique on Germanium Substrates
11Role of Metal Contacts in Designing High-Performance Monolayer n-Type WSe2 Field Effect Transistors
12Energy-enhanced atomic layer deposition for more process and precursor versatility
13Control of ion energy during plasma enhanced atomic layer deposition: A new strategy for the modulation of TiN growth delay on SiO2
14Experimental demonstration of single electron transistors featuring SiO2 plasma-enhanced atomic layer deposition in Ni-SiO2-Ni tunnel junctions
15Tri-gate InGaAs-OI junctionless FETs with PE-ALD Al2O3 gate dielectric and H2/Ar anneal
16Atomic Layer Deposition of Silicon Nitride from Bis(tert-butylamino)silane and N2 Plasma
17Energy dissipation during pulsed switching of strontium-titanate based resistive switching memory devices
18Thickness and Morphology Dependent Electrical Properties of ALD-Synthesized MoS2 FETs
19Properties of plasma enhanced atomic layer deposited ruthenium thin films from Ru(EtCp)2
20Plasma and Thermal ALD of Al2O3 in a Commercial 200mm ALD Reactor
21Ferroelectricity in hafnia controlled via surface electrochemical state
22A Study of Ultrathin Superconducting Films of Niobium Nitride Obtained by Atomic Layer Deposition
23Understanding the Oxygen Evolution Reaction Mechanism on CoOx using Operando Ambient-Pressure X-ray Photoelectron Spectroscopy
24Evidence for low-energy ions influencing plasma-assisted atomic layer deposition of SiO2: Impact on the growth per cycle and wet etch rate
25Atomic Layer Deposition of Wet-Etch Resistant Silicon Nitride Using Di(sec-butylamino)silane and N2 Plasma on Planar and 3D Substrate Topographies
26Microstructure and electrical properties of thin HfO2 deposited by plasma-enhanced atomic layer deposition
27Comparative study of thermal and plasma enhanced atomic layer deposition of aluminum oxide on graphene
28Remote plasma enhanced atomic layer deposition of ZnO for thin film electronic applications
29Atomic layer deposition for spacer defined double patterning of sub-10 nm titanium dioxide features
30Electrical Measurement Under Atmospheric Conditons of PbSe Nanocrystal Thin Films Passivated by Remote Plasma Atomic Layer Deposition of Al2O3
31Topographically selective deposition
32Plasma-Assisted ALD of LiPO(N) for Solid State Batteries
33Correlation of film density and wet etch rate in hydrofluoric acid of plasma enhanced atomic layer deposited silicon nitride
34Ultrasensitive Detection of 2,4-Dinitrophenol Using Nanowire Biosensor
35The effect of atomic layer deposition temperature on switching properties of HfOx resistive RAM devices
36Photoluminescence blue shift of indium phosphide nanowire networks with aluminum oxide coating
37Room-Temperature ALD of Metal Oxide Thin Films by Energy-Enhanced ALD
38Impact of Ions on Film Conformality and Crystallinity during Plasma-Assisted Atomic Layer Deposition of TiO2
39Controlling transition metal atomic ordering in two-dimensional Mo1-xWxS2 alloys
40Charge Transport through Organic Molecular Wires Embedded in Ultrathin Insulating Inorganic Layer
41On the Contact Optimization of ALD-Based MoS2 FETs: Correlation of Processing Conditions and Interface Chemistry with Device Electrical Performance
42Origin of Ferroelectric Phase Stabilization via the Clamping Effect in Ferroelectric Hafnium Zirconium Oxide Thin Films
43Atomic insights into the oxygen incorporation in atomic layer deposited conductive nitrides and its mitigation by energetic ions
44Plasma Enhanced Atomic Layer Deposition of Ruthenium Films Using Ru(EtCp)2 Precursor
45Comparison of thermal and plasma-enhanced atomic layer deposition of niobium oxide thin films
46Role of Surface Termination in Atomic Layer Deposition of Silicon Nitride
47Efficient and Sustained Photoelectrochemical Water Oxidation by Cobalt Oxide/Silicon Photoanodes with Nanotextured Interfaces
48Plasma-enhanced atomic layer deposition of tungsten oxide thin films using (tBuN)2(Me2N)2W and O2 plasma
49Deposition of TiN and HfO2 in a commercial 200 mm remote plasma atomic layer deposition reactor
50Energetic ions during plasma-enhanced atomic layer deposition and their role in tailoring material properties
51Plasma-assisted atomic layer deposition of nanolaminates for gate dielectric applications
52Ion and Photon Surface Interaction during Remote Plasma ALD of Metal Oxides
53Mass Spectrometry Study of Li2CO3 Film Growth by Thermal and Plasma-Assisted Atomic Layer Deposition
54Plasma-assisted and thermal atomic layer deposition of electrochemically active Li2CO3
55Probing the Origin and Suppression of Vertically Oriented Nanostructures of 2D WS2 Layers
56Impact of composition and crystallization behavior of atomic layer deposited strontium titanate films on the resistive switching of Pt/STO/TiN devices
57Atomic layer deposition of aluminum fluoride using Al(CH3)3 and SF6 plasma
58Plasma-Assisted Atomic Layer Deposition of SrTiO3: Stoichiometry and Crystallinity Studied by Spectroscopic Ellipsometry
59In situ spectroscopic ellipsometry during atomic layer deposition of Pt, Ru and Pd
60Silicon surface passivation by ultrathin Al2O3 films and Al2O3/SiNx stacks
61Injection dependence of the effective lifetime of n-type Si passivated by Al2O3: An edge effect?
62Optical emission spectroscopy as a tool for studying, optimizing, and monitoring plasma-assisted atomic layer deposition processes
63Approaching the limits of dielectric breakdown for SiO2 films deposited by plasma-enhanced atomic layer deposition
64Fermi Level Tuning of ZnO Films Through Supercycled Atomic Layer Deposition
65Propagation Effects in Carbon Nanoelectronics
66Low-Temperature Plasma-Assisted Atomic Layer Deposition of Silicon Nitride Moisture Permeation Barrier Layers
67Al2O3/SiNx-Stacks at Increased Temperatures: Avoiding Blistering During Contact Firing
68Atomic layer deposition of LiF using LiN(SiMe3)2 and SF6 plasma
69Area-Selective Atomic Layer Deposition of Two-Dimensional WS2 Nanolayers
70Titanium Oxynitride Interlayer to Influence Oxygen Reduction Reaction Activity and Corrosion Stability of Pt and Pt-Ni Alloy
71Low resistivity HfNx grown by plasma-assisted ALD with external rf substrate biasing
72Single-electron transistors featuring silicon nitride tunnel barriers prepared by atomic layer deposition
73Plasma-enhanced atomic-layer-deposited MoOx emitters for silicon heterojunction solar cells
74Flexible Perovskite Photovoltaic Modules and Solar Cells Based on Atomic Layer Deposited Compact Layers and UV-Irradiated TiO2 Scaffolds on Plastic Substrates
75Mechanical and electrical properties of plasma and thermal atomic layer deposited Al2O3 films on GaAs and Si
76The influence of surface preparation on low temperature HfO2 ALD on InGaAs (001) and (110) surfaces
77Very High Refractive Index Transition Metal Dichalcogenide Photonic Conformal Coatings by Conversion of ALD Metal Oxides
78Micro-Raman Spectroscopy for Monitoring of Deposition Quality of High-k Stack Protective Layer onto Nanowire FET Chips for Highly Sensitive miRNA Detection
79Topographical selective deposition: A comparison between plasma-enhanced atomic layer deposition/sputtering and plasma-enhanced atomic layer deposition/quasi-atomic layer etching approaches
80Dielectric properties investigation of a compound based on atomic layer deposited multi-layer structure
81Simple plasma assisted atomic layer deposition technique for high substitutional nitrogen doping of TiO2
82Atomic layer deposition TiO2-Al2O3 stack: An improved gate dielectric on Ga-polar GaN metal oxide semiconductor capacitors
83Silicon nanowire lithium-ion battery anodes with ALD deposited TiN coatings demonstrate a major improvement in cycling performance
84Atomic layer deposition of TiN for the fabrication of nanomechanical resonators
85Preliminary investigation of high-k materials - TiO2 doped Ta2O5 films by remote plasma ALD
86Dielectric Properties of Thermal and Plasma-Assisted Atomic Layer Deposited Al2O3 Thin Films
87Uniform Atomic Layer Deposition of Al2O3 on Graphene by Reversible Hydrogen Plasma Functionalization
88Corrosion barriers for silver-based telescope mirrors: comparative study of plasma-enhanced atomic layer deposition and reactive evaporation of aluminum oxide
89Analysis of NbN thin film deposition by plasma-enhanced ALD for gate electrode application
90Application of spectral ellipsometry to in situ diagnostics of atomic layer deposition of dielectrics on silicon and AlGaN
91Edge-Site Nanoengineering of WS2 by Low-Temperature Plasma-Enhanced Atomic Layer Deposition for Electrocatalytic Hydrogen Evolution
92Large area, patterned growth of 2D MoS2 and lateral MoS2-WS2 heterostructures for nano- and opto-electronic applications
93A multifunctional biphasic water splitting catalyst tailored for integration with high-performance semiconductor photoanodes
94Plasma-assisted atomic layer deposition of TiN/Al2O3 stacks for metal-oxide-semiconductor capacitor applications
95Film Conformality and Extracted Recombination Probabilities of O Atoms during Plasma-Assisted Atomic Layer Deposition of SiO2, TiO2, Al2O3, and HfO2
96Plasma-enhanced atomic layer deposition of BaTiO3
97Low temperature Topographically Selective Deposition by Plasma Enhanced Atomic Layer Deposition with ion bombardment assistance
98Densification of Thin Aluminum Oxide Films by Thermal Treatments
99Forming-free resistive switching of tunable ZnO films grown by atomic layer deposition
100Low-temperature plasma-enhanced atomic layer deposition of 2-D MoS2: large area, thickness control and tuneable morphology
101Realistic efficiency potential of next-generation industrial Czochralski-grown silicon solar cells after deactivation of the boron-oxygen-related defect center
102Stability of Al2O3 and Al2O3/a-Six:H stacks for surface passivation of crystalline silicon
103Reaction Mechanisms during Atomic Layer Deposition of AlF3 Using Al(CH3)3 and SF6 Plasma
104Optimization of Plasma Enhanced Atomic Layer Deposition Processes for Oxides, Nitrides and Metals in the Oxford Instruments FlexAL Reactor
105The important role of water in growth of monolayer transition metal dichalcogenides
106Insulator-protected mechanically controlled break junctions for measuring single-molecule conductance in aqueous environments
107A comparison between remote plasma-enhanced and thermal ALD of Hafnium-nitride thin films
108Plasma-Assisted ALD of Highly Conductive HfNx: On the Effect of Energetic Ions on Film Microstructure
109Top-down fabricated ZnO nanowire transistors for application in biosensors
110Spectroscopic and electrical calculation of band alignment between atomic layer deposited SiO2 and β-Ga2O3 (2̅01)
111Low-Temperature Phase-Controlled Synthesis of Titanium Di- and Tri-sulfide by Atomic Layer Deposition
112Thermal and plasma enhanced atomic layer deposition of ultrathin TiO2 on silicon from amide and alkoxide precursors: growth chemistry and photoelectrochemical performance
113Advanced surface passivation of epitaxial boron emitters for high-efficiency ultrathin crystalline silicon solar cells
114Silicon Nitride and Silicon Oxide Thin Films by Plasma ALD
115Hot Carrier Filtering in Solution Processed Heterostructures: A Paradigm for Improving Thermoelectric Efficiency
116Atomic Layer Deposition of Aluminum Phosphate Using AlMe3, PO(OMe)3, and O2 Plasma: Film Growth and Surface Reactions
117Atomic layer deposition of Ru from CpRu(CO)2Et using O2 gas and O2 plasma
118Interfacial and electrical properties of Al2O3/HfO2 bilayer deposited by atomic layer deposition on GeON passivated germanium surface
119Thermal conductivity of ultrathin BaTiO3 films grown by plasma-assisted atomic layer deposition
120Possible Candidates for Impurities in mc-Si Wafers Responsible for Light-Induced Lifetime Degradation and Regeneration
121Atomic layer deposited silicon dioxide films on nanomechanical silicon nitride resonators
122Industrially relevant Al2O3 deposition techniques for the surface passivation of Si solar cells
123Metal-Insulator-Metal Single Electron Transistors with Tunnel Barriers Prepared by Atomic Layer Deposition
124Impact of hydrogen on the permanent deactivation of the boron-oxygen-related recombination center in crystalline silicon
125Multistep atomic layer deposition process for ultrathin superconducting NbN films with high critical current density on amorphous substrate
126Enhancing the Wettability of High Aspect-Ratio Through-Silicon Vias Lined With LPCVD Silicon Nitride or PE-ALD Titanium Nitride for Void-Free Bottom-Up Copper Electroplating
127Thermal and Plasma Enhanced Atomic Layer Deposition of Al2O3 on GaAs Substrates
128The Influence of Ions and Photons during Plasma-Assisted ALD of Metal Oxides
129Fabrication of nanoporous membranes for tuning microbial interactions and biochemical reactions
130Atomic layer deposition for perovskite solar cells: research status, opportunities and challenges
131Enhanced Barrier Performance of Engineered Paper by Atomic Layer Deposited Al2O3 Thin Films
132Oxygen Recombination Probability Data for Plasma-Assisted Atomic Layer Deposition of SiO2 and TiO2
133Nitrogen-Doping of Bulk and Nanotubular TiO2 Photocatalysts by Plasma-Assisted Atomic Layer Deposition
1341D versus 3D quantum confinement in 1-5 nm ZnO nanoparticle agglomerations for application in charge-trapping memory devices
135Atomic Layer Deposition of Cobalt Phosphide for Efficient Water Splitting
136Enhanced surface passivation of epitaxially grown emitters for high-efficiency ultrathin crystalline Si solar cells
137Tuning Material Properties of Oxides and Nitrides by Substrate Biasing during Plasma-Enhanced Atomic Layer Deposition on Planar and 3D Substrate Topographies
138Synergy Between Plasma-Assisted ALD and Roll-to-Roll Atmospheric Pressure PE-CVD Processing of Moisture Barrier Films on Polymers
139Strongly Disordered TiN and NbTiN s-Wave Superconductors Probed by Microwave Electrodynamics
140Electrical Characteristics of Top-Down ZnO Nanowire Transistors Using Remote Plasma ALD
141Sub-10-nm ferroelectric Gd-doped HfO2 layers
142Influence of stoichiometry on the performance of MIM capacitors from plasma-assisted ALD SrxTiyOz films
143Plasma-assisted atomic layer deposition of HfNx: Tailoring the film properties by the plasma gas composition
144Plasma-Enhanced Atomic Layer Deposition of Al2O3 on Graphene Using Monolayer hBN as Interfacial Layer
145Microwave properties of superconducting atomic-layer deposited TiN films
146Plasma Processing for Crystallization and Densification of Atomic Layer Deposition BaTiO3 Thin Films
147Reaction mechanisms during plasma-assisted atomic layer deposition of metal oxides: A case study for Al2O3
148Liquid-Phase Crystallized Silicon Solar Cells on Glass: Increasing the Open-Circuit Voltage by Optimized Interlayers for n- and p-Type Absorbers
149Toward an integrated device for spatiotemporal superposition of free-electron lasers and laser pulses
150Opportunities of Atomic Layer Deposition for Perovskite Solar Cells
151Low Temperature Plasma-Enhanced Atomic Layer Deposition of Metal Oxide Thin Films
152Ion energy control during plasma-enhanced atomic layer deposition: enabling materials control and selective processing in the third dimension
153Electrical properties of MOS capacitors formed by PEALD grown Al2O3 on silicon
154Tunable conduction type of solution-processed germanium nanoparticle based field effect transistors and their inverter integration
155Hysteresis behaviour of top-down fabricated ZnO nanowire transistors
156Order of Dry and Wet Mixed-Length Self-Assembled Monolayers
157Atomic Layer Deposition of the Conductive Delafossite PtCoO2
158Controlling mechanical, structural, and optical properties of Al2O3 thin films deposited by plasma-enhanced atomic layer deposition with substrate biasing
159Atomic Layer Deposition of Large-Area Polycrystalline Transition Metal Dichalcogenides from 100°C through Control of Plasma Chemistry
160Redeposition in plasma-assisted atomic layer deposition: Silicon nitride film quality ruled by the gas residence time
161Surface passivation of phosphorus-diffused n+-type emitters by plasma-assisted atomic-layer deposited Al2O3
162Unexpectedly High Minority-Carrier Lifetimes Exceeding 20 ms Measured on 1.4-Ohm cm n-Type Silicon Wafers
163Influence of the Deposition Temperature on the c-Si Surface Passivation by Al2O3 Films Synthesized by ALD and PECVD
164Effective Surface Passivation of InP Nanowires by Atomic-Layer-Deposited Al2O3 with POx Interlayer
165Biosensor properties of SOI nanowire transistors with a PEALD Al2O3 dielectric protective layer
166NiCO2O4@TiN Core-shell Electrodes through Conformal Atomic Layer Deposition for All-solid-state Supercapacitors
167Interfaces Formed by ALD Metal Oxide Growth on Metal Layers
168High-κ insulating materials for AlGaN/GaN metal insulator semiconductor heterojunction field effect transistors