Oxford Instruments FlexAL Plasma Enhanced Atomic Layer Deposition Film Publications

Your search for plasma enhanced atomic layer deposition publications using Oxford Instruments FlexAL hardware returned 169 records. If there are too many results, you may want to use the multi-factor search to narrow the results.

NumberTitle
1Plasma-Assisted Atomic Layer Deposition of SrTiO3: Stoichiometry and Crystallinity Studied by Spectroscopic Ellipsometry
2Multistep atomic layer deposition process for ultrathin superconducting NbN films with high critical current density on amorphous substrate
3Influence of plasma-based in-situ surface cleaning procedures on HfO2/In0.53Ga0.47As gate stack properties
4Atomic Layer Deposition of Silicon Nitride from Bis(tert-butylamino)silane and N2 Plasma
5Room-Temperature ALD of Metal Oxide Thin Films by Energy-Enhanced ALD
6Cathode encapsulation of organic light emitting diodes by atomic layer deposited Al2O3 films and Al2O3/a-SiNx:H stacks
7Atomic insights into the oxygen incorporation in atomic layer deposited conductive nitrides and its mitigation by energetic ions
8Reaction Mechanisms during Atomic Layer Deposition of AlF3 Using Al(CH3)3 and SF6 Plasma
9Strongly Disordered TiN and NbTiN s-Wave Superconductors Probed by Microwave Electrodynamics
10Low-Temperature Plasma-Assisted Atomic Layer Deposition of Silicon Nitride Moisture Permeation Barrier Layers
11Atomic layer deposition of TiN for the fabrication of nanomechanical resonators
12Topographical selective deposition: A comparison between plasma-enhanced atomic layer deposition/sputtering and plasma-enhanced atomic layer deposition/quasi-atomic layer etching approaches
13NiCO2O4@TiN Core-shell Electrodes through Conformal Atomic Layer Deposition for All-solid-state Supercapacitors
14Deposition of TiN and HfO2 in a commercial 200 mm remote plasma atomic layer deposition reactor
15Atomic Layer Deposition of Wet-Etch Resistant Silicon Nitride Using Di(sec-butylamino)silane and N2 Plasma on Planar and 3D Substrate Topographies
16Crystallization Study by Transmission Electron Microscopy of SrTiO3 Thin Films Prepared by Plasma-Assisted ALD
17On the role of nanoporosity in controlling the performance of moisture permeation barrier layers
18Sub-10-nm ferroelectric Gd-doped HfO2 layers
19Interfaces Formed by ALD Metal Oxide Growth on Metal Layers
20Electrical Characteristics of Top-Down ZnO Nanowire Transistors Using Remote Plasma ALD
21Corrosion barriers for silver-based telescope mirrors: comparative study of plasma-enhanced atomic layer deposition and reactive evaporation of aluminum oxide
22Microwave properties of superconducting atomic-layer deposited TiN films
23Comparative study of ALD SiO2 thin films for optical applications
24Very High Refractive Index Transition Metal Dichalcogenide Photonic Conformal Coatings by Conversion of ALD Metal Oxides
25Plasma-Assisted ALD of Highly Conductive HfNx: On the Effect of Energetic Ions on Film Microstructure
26Role of Metal Contacts in Designing High-Performance Monolayer n-Type WSe2 Field Effect Transistors
27Redeposition in plasma-assisted atomic layer deposition: Silicon nitride film quality ruled by the gas residence time
28Atomic layer deposition of aluminum fluoride using Al(CH3)3 and SF6 plasma
29Hot Carrier Filtering in Solution Processed Heterostructures: A Paradigm for Improving Thermoelectric Efficiency
30Enhanced Barrier Performance of Engineered Paper by Atomic Layer Deposited Al2O3 Thin Films
31Control of ion energy during plasma enhanced atomic layer deposition: A new strategy for the modulation of TiN growth delay on SiO2
32Silicon Nitride and Silicon Oxide Thin Films by Plasma ALD
33Atomic Layer Deposition of Aluminum Phosphate Using AlMe3, PO(OMe)3, and O2 Plasma: Film Growth and Surface Reactions
34Optical emission spectroscopy as a tool for studying, optimizing, and monitoring plasma-assisted atomic layer deposition processes
35Realistic efficiency potential of next-generation industrial Czochralski-grown silicon solar cells after deactivation of the boron-oxygen-related defect center
36Enhancing the Wettability of High Aspect-Ratio Through-Silicon Vias Lined With LPCVD Silicon Nitride or PE-ALD Titanium Nitride for Void-Free Bottom-Up Copper Electroplating
37Liquid-Phase Crystallized Silicon Solar Cells on Glass: Increasing the Open-Circuit Voltage by Optimized Interlayers for n- and p-Type Absorbers
38Approaching the limits of dielectric breakdown for SiO2 films deposited by plasma-enhanced atomic layer deposition
39Energy-enhanced atomic layer deposition for more process and precursor versatility
40Thickness and Morphology Dependent Electrical Properties of ALD-Synthesized MoS2 FETs
41Evidence for low-energy ions influencing plasma-assisted atomic layer deposition of SiO2: Impact on the growth per cycle and wet etch rate
42Area-Selective Atomic Layer Deposition of Two-Dimensional WS2 Nanolayers
43Analysis of NbN thin film deposition by plasma-enhanced ALD for gate electrode application
44Plasma and Thermal ALD of Al2O3 in a Commercial 200mm ALD Reactor
45Experimental demonstration of single electron transistors featuring SiO2 plasma-enhanced atomic layer deposition in Ni-SiO2-Ni tunnel junctions
46Industrially relevant Al2O3 deposition techniques for the surface passivation of Si solar cells
47Ion and Photon Surface Interaction during Remote Plasma ALD of Metal Oxides
48High Dielectric Constant ZrO2 Films by Atomic Layer Deposition Technique on Germanium Substrates
49Microstructure and electrical properties of thin HfO2 deposited by plasma-enhanced atomic layer deposition
50Unexpectedly High Minority-Carrier Lifetimes Exceeding 20 ms Measured on 1.4-Ohm cm n-Type Silicon Wafers
51Low temperature Topographically Selective Deposition by Plasma Enhanced Atomic Layer Deposition with ion bombardment assistance
52Al2O3/SiNx-Stacks at Increased Temperatures: Avoiding Blistering During Contact Firing
53Correlation of film density and wet etch rate in hydrofluoric acid of plasma enhanced atomic layer deposited silicon nitride
54Tri-gate InGaAs-OI junctionless FETs with PE-ALD Al2O3 gate dielectric and H2/Ar anneal
55Top-down fabricated ZnO nanowire transistors for application in biosensors
56Advanced surface passivation of epitaxial boron emitters for high-efficiency ultrathin crystalline silicon solar cells
57Probing the Origin and Suppression of Vertically Oriented Nanostructures of 2D WS2 Layers
58Influence of the Deposition Temperature on the c-Si Surface Passivation by Al2O3 Films Synthesized by ALD and PECVD
59Origin of Ferroelectric Phase Stabilization via the Clamping Effect in Ferroelectric Hafnium Zirconium Oxide Thin Films
60Comparative study of thermal and plasma enhanced atomic layer deposition of aluminum oxide on graphene
61Thermal conductivity of ultrathin BaTiO3 films grown by plasma-assisted atomic layer deposition
62Application of spectral ellipsometry to in situ diagnostics of atomic layer deposition of dielectrics on silicon and AlGaN
63Atomic Layer Deposition of Cobalt Phosphide for Efficient Water Splitting
64Stability of Al2O3 and Al2O3/a-Six:H stacks for surface passivation of crystalline silicon
65Charge Transport through Organic Molecular Wires Embedded in Ultrathin Insulating Inorganic Layer
66Impact of composition and crystallization behavior of atomic layer deposited strontium titanate films on the resistive switching of Pt/STO/TiN devices
67A comparison between remote plasma-enhanced and thermal ALD of Hafnium-nitride thin films
68High-κ insulating materials for AlGaN/GaN metal insulator semiconductor heterojunction field effect transistors
69Plasma-assisted atomic layer deposition of HfNx: Tailoring the film properties by the plasma gas composition
70Electrical Measurement Under Atmospheric Conditons of PbSe Nanocrystal Thin Films Passivated by Remote Plasma Atomic Layer Deposition of Al2O3
71A Study of Ultrathin Superconducting Films of Niobium Nitride Obtained by Atomic Layer Deposition
72Dielectric properties investigation of a compound based on atomic layer deposited multi-layer structure
73Plasma-assisted atomic layer deposition of nanolaminates for gate dielectric applications
74Tuning Material Properties of Oxides and Nitrides by Substrate Biasing during Plasma-Enhanced Atomic Layer Deposition on Planar and 3D Substrate Topographies
75Plasma-assisted atomic layer deposition of TiN/Al2O3 stacks for metal-oxide-semiconductor capacitor applications
76Properties of plasma enhanced atomic layer deposited ruthenium thin films from Ru(EtCp)2
77Fermi Level Tuning of ZnO Films Through Supercycled Atomic Layer Deposition
78Plasma-assisted and thermal atomic layer deposition of electrochemically active Li2CO3
79Low-Temperature Phase-Controlled Synthesis of Titanium Di- and Tri-sulfide by Atomic Layer Deposition
80Preliminary investigation of high-k materials - TiO2 doped Ta2O5 films by remote plasma ALD
81Thermal and Plasma Enhanced Atomic Layer Deposition of Al2O3 on GaAs Substrates
82Low-temperature plasma-enhanced atomic layer deposition of 2-D MoS2: large area, thickness control and tuneable morphology
83Plasma-enhanced atomic layer deposition of BaTiO3
84A multifunctional biphasic water splitting catalyst tailored for integration with high-performance semiconductor photoanodes
85Forming-free resistive switching of tunable ZnO films grown by atomic layer deposition
86Enhanced surface passivation of epitaxially grown emitters for high-efficiency ultrathin crystalline Si solar cells
87Controlling transition metal atomic ordering in two-dimensional Mo1-xWxS2 alloys
88Ultrasensitive Detection of 2,4-Dinitrophenol Using Nanowire Biosensor
89Plasma Processing for Crystallization and Densification of Atomic Layer Deposition BaTiO3 Thin Films
90Spectroscopic and electrical calculation of band alignment between atomic layer deposited SiO2 and β-Ga2O3 (2̅01)
91Energy dissipation during pulsed switching of strontium-titanate based resistive switching memory devices
92Biosensor properties of SOI nanowire transistors with a PEALD Al2O3 dielectric protective layer
93The Influence of Ions and Photons during Plasma-Assisted ALD of Metal Oxides
94Effective Surface Passivation of InP Nanowires by Atomic-Layer-Deposited Al2O3 with POx Interlayer
95On the Contact Optimization of ALD-Based MoS2 FETs: Correlation of Processing Conditions and Interface Chemistry with Device Electrical Performance
96Low resistivity HfNx grown by plasma-assisted ALD with external rf substrate biasing
97Impact of hydrogen on the permanent deactivation of the boron-oxygen-related recombination center in crystalline silicon
98Uniform Atomic Layer Deposition of Al2O3 on Graphene by Reversible Hydrogen Plasma Functionalization
99Ion energy control during plasma-enhanced atomic layer deposition: enabling materials control and selective processing in the third dimension
100Remote plasma enhanced atomic layer deposition of ZnO for thin film electronic applications
101Metal-Insulator-Metal Single Electron Transistors with Tunnel Barriers Prepared by Atomic Layer Deposition
102Toward an integrated device for spatiotemporal superposition of free-electron lasers and laser pulses
103Insulator-protected mechanically controlled break junctions for measuring single-molecule conductance in aqueous environments
104Single-electron transistors featuring silicon nitride tunnel barriers prepared by atomic layer deposition
105In situ spectroscopic ellipsometry during atomic layer deposition of Pt, Ru and Pd
106Synergy Between Plasma-Assisted ALD and Roll-to-Roll Atmospheric Pressure PE-CVD Processing of Moisture Barrier Films on Polymers
107Oxygen Recombination Probability Data for Plasma-Assisted Atomic Layer Deposition of SiO2 and TiO2
108Opportunities of Atomic Layer Deposition for Perovskite Solar Cells
109Plasma-enhanced atomic-layer-deposited MoOx emitters for silicon heterojunction solar cells
110Nitrogen-Doping of Bulk and Nanotubular TiO2 Photocatalysts by Plasma-Assisted Atomic Layer Deposition
111Possible Candidates for Impurities in mc-Si Wafers Responsible for Light-Induced Lifetime Degradation and Regeneration
112Atomic layer deposition TiO2-Al2O3 stack: An improved gate dielectric on Ga-polar GaN metal oxide semiconductor capacitors
113Atomic layer deposition of Ru from CpRu(CO)2Et using O2 gas and O2 plasma
114Influence of Atomic Layer Deposition Temperatures on TiO2/n-Si MOS Capacitor
115Understanding the Oxygen Evolution Reaction Mechanism on CoOx using Operando Ambient-Pressure X-ray Photoelectron Spectroscopy
116Energetic ions during plasma-enhanced atomic layer deposition and their role in tailoring material properties
117The influence of surface preparation on low temperature HfO2 ALD on InGaAs (001) and (110) surfaces
118Densification of Thin Aluminum Oxide Films by Thermal Treatments
119Mass Spectrometry Study of Li2CO3 Film Growth by Thermal and Plasma-Assisted Atomic Layer Deposition
120Area-Selective Atomic Layer Deposition of SiO2 Using Acetylacetone as a Chemoselective Inhibitor in an ABC-Type Cycle
121The important role of water in growth of monolayer transition metal dichalcogenides
122Atomic layer deposition of HfO2 using HfCp(NMe2)3 and O2 plasma
123Dielectric Properties of Thermal and Plasma-Assisted Atomic Layer Deposited Al2O3 Thin Films
124Impact of Ions on Film Conformality and Crystallinity during Plasma-Assisted Atomic Layer Deposition of TiO2
125Fabrication of nanoporous membranes for tuning microbial interactions and biochemical reactions
126Low Temperature Plasma-Enhanced Atomic Layer Deposition of Metal Oxide Thin Films
127Mechanical and electrical properties of plasma and thermal atomic layer deposited Al2O3 films on GaAs and Si
128Order of Dry and Wet Mixed-Length Self-Assembled Monolayers
129Role of Surface Termination in Atomic Layer Deposition of Silicon Nitride
1301D versus 3D quantum confinement in 1-5 nm ZnO nanoparticle agglomerations for application in charge-trapping memory devices
131Photoluminescence blue shift of indium phosphide nanowire networks with aluminum oxide coating
132Tunable conduction type of solution-processed germanium nanoparticle based field effect transistors and their inverter integration
133Hysteresis behaviour of top-down fabricated ZnO nanowire transistors
134Reaction mechanisms during plasma-assisted atomic layer deposition of metal oxides: A case study for Al2O3
135Electrical properties of MOS capacitors formed by PEALD grown Al2O3 on silicon
136Topographically selective deposition
137Silicon nanowire lithium-ion battery anodes with ALD deposited TiN coatings demonstrate a major improvement in cycling performance
138Atomic layer deposition for spacer defined double patterning of sub-10 nm titanium dioxide features
139Controlling mechanical, structural, and optical properties of Al2O3 thin films deposited by plasma-enhanced atomic layer deposition with substrate biasing
140Atomic layer deposited silicon dioxide films on nanomechanical silicon nitride resonators
141PEALD grown high-k ZrO2 thin films on SiC group IV compound semiconductor
142The effect of atomic layer deposition temperature on switching properties of HfOx resistive RAM devices
143Micro-Raman Spectroscopy for Monitoring of Deposition Quality of High-k Stack Protective Layer onto Nanowire FET Chips for Highly Sensitive miRNA Detection
144Atomic layer deposition of LiF using LiN(SiMe3)2 and SF6 plasma
145Plasma Enhanced Atomic Layer Deposition of Ruthenium Films Using Ru(EtCp)2 Precursor
146Influence of stoichiometry on the performance of MIM capacitors from plasma-assisted ALD SrxTiyOz films
147Film Conformality and Extracted Recombination Probabilities of O Atoms during Plasma-Assisted Atomic Layer Deposition of SiO2, TiO2, Al2O3, and HfO2
148Simple plasma assisted atomic layer deposition technique for high substitutional nitrogen doping of TiO2
149Titanium Oxynitride Interlayer to Influence Oxygen Reduction Reaction Activity and Corrosion Stability of Pt and Pt-Ni Alloy
150Propagation Effects in Carbon Nanoelectronics
151Injection dependence of the effective lifetime of n-type Si passivated by Al2O3: An edge effect?
152Large area, patterned growth of 2D MoS2 and lateral MoS2-WS2 heterostructures for nano- and opto-electronic applications
153Ferroelectricity in hafnia controlled via surface electrochemical state
154Atomic layer deposition for perovskite solar cells: research status, opportunities and challenges
155Interfacial and electrical properties of Al2O3/HfO2 bilayer deposited by atomic layer deposition on GeON passivated germanium surface
156Atomic Layer Deposition of the Conductive Delafossite PtCoO2
157Thermal and plasma enhanced atomic layer deposition of ultrathin TiO2 on silicon from amide and alkoxide precursors: growth chemistry and photoelectrochemical performance
158Surface passivation of phosphorus-diffused n+-type emitters by plasma-assisted atomic-layer deposited Al2O3
159Optimization of Plasma Enhanced Atomic Layer Deposition Processes for Oxides, Nitrides and Metals in the Oxford Instruments FlexAL Reactor
160Plasma-Assisted ALD of LiPO(N) for Solid State Batteries
161Atomic Layer Deposition of Large-Area Polycrystalline Transition Metal Dichalcogenides from 100°C through Control of Plasma Chemistry
162Plasma-Enhanced Atomic Layer Deposition of Al2O3 on Graphene Using Monolayer hBN as Interfacial Layer
163Flexible Perovskite Photovoltaic Modules and Solar Cells Based on Atomic Layer Deposited Compact Layers and UV-Irradiated TiO2 Scaffolds on Plastic Substrates
164Efficient and Sustained Photoelectrochemical Water Oxidation by Cobalt Oxide/Silicon Photoanodes with Nanotextured Interfaces
165Edge-Site Nanoengineering of WS2 by Low-Temperature Plasma-Enhanced Atomic Layer Deposition for Electrocatalytic Hydrogen Evolution
166Comparison of thermal and plasma-enhanced atomic layer deposition of niobium oxide thin films
167Plasma-enhanced atomic layer deposition of tungsten oxide thin films using (tBuN)2(Me2N)2W and O2 plasma
168Silicon surface passivation by ultrathin Al2O3 films and Al2O3/SiNx stacks