Oxford Instruments FlexAL Plasma Enhanced Atomic Layer Deposition Film Publications

Your search for plasma enhanced atomic layer deposition publications using Oxford Instruments FlexAL hardware returned 113 records. If there are too many results, you may want to use the multi-factor search to narrow the results.

Number	Title
1	1D versus 3D quantum confinement in 1-5 nm ZnO nanoparticle agglomerations for application in charge-trapping memory devices
2	A comparison between remote plasma-enhanced and thermal ALD of Hafnium-nitride thin films
3	A multifunctional biphasic water splitting catalyst tailored for integration with high-performance semiconductor photoanodes
4	Advanced surface passivation of epitaxial boron emitters for high-efficiency ultrathin crystalline silicon solar cells
5	Al2O3/SiNx-Stacks at Increased Temperatures: Avoiding Blistering During Contact Firing
6	Analysis of NbN thin film deposition by plasma-enhanced ALD for gate electrode application
7	Application of spectral ellipsometry to in situ diagnostics of atomic layer deposition of dielectrics on silicon and AlGaN
8	Approaching the limits of dielectric breakdown for SiO2 films deposited by plasma-enhanced atomic layer deposition
9	Area-Selective Atomic Layer Deposition of SiO2 Using Acetylacetone as a Chemoselective Inhibitor in an ABC-Type Cycle
10	Atomic layer deposition for perovskite solar cells: research status, opportunities and challenges
11	Atomic layer deposition of aluminum fluoride using Al(CH3)3 and SF6 plasma
12	Atomic layer deposition of HfO2 using HfCp(NMe2)3 and O2 plasma
13	Atomic layer deposition of Ru from CpRu(CO)2Et using O2 gas and O2 plasma
14	Atomic Layer Deposition of Silicon Nitride from Bis(tert-butylamino)silane and N2 Plasma
15	Atomic layer deposition of TiN for the fabrication of nanomechanical resonators
16	Atomic Layer Deposition of Wet-Etch Resistant Silicon Nitride Using Di(sec-butylamino)silane and N2 Plasma on Planar and 3D Substrate Topographies
17	Atomic layer deposition TiO2-Al2O3 stack: An improved gate dielectric on Ga-polar GaN metal oxide semiconductor capacitors
18	Biosensor properties of SOI nanowire transistors with a PEALD Al2O3 dielectric protective layer
19	Cathode encapsulation of organic light emitting diodes by atomic layer deposited Al2O3 films and Al2O3/a-SiNx:H stacks
20	Charge Transport through Organic Molecular Wires Embedded in Ultrathin Insulating Inorganic Layer
21	Comparative study of ALD SiO2 thin films for optical applications
22	Comparative study of thermal and plasma enhanced atomic layer deposition of aluminum oxide on graphene
23	Comparison of thermal and plasma-enhanced atomic layer deposition of niobium oxide thin films
24	Correlation of film density and wet etch rate in hydrofluoric acid of plasma enhanced atomic layer deposited silicon nitride
25	Corrosion barriers for silver-based telescope mirrors: comparative study of plasma-enhanced atomic layer deposition and reactive evaporation of aluminum oxide
26	Crystallization Study by Transmission Electron Microscopy of SrTiO3 Thin Films Prepared by Plasma-Assisted ALD
27	Densification of Thin Aluminum Oxide Films by Thermal Treatments
28	Deposition of TiN and HfO2 in a commercial 200 mm remote plasma atomic layer deposition reactor
29	Dielectric Properties of Thermal and Plasma-Assisted Atomic Layer Deposited Al2O3 Thin Films
30	Effective Surface Passivation of InP Nanowires by Atomic-Layer-Deposited Al2O3 with POx Interlayer
31	Efficient and Sustained Photoelectrochemical Water Oxidation by Cobalt Oxide/Silicon Photoanodes with Nanotextured Interfaces
32	Electrical Characteristics of Top-Down ZnO Nanowire Transistors Using Remote Plasma ALD
33	Electrical Measurement Under Atmospheric Conditons of PbSe Nanocrystal Thin Films Passivated by Remote Plasma Atomic Layer Deposition of Al2O3
34	Electrical properties of MOS capacitors formed by PEALD grown Al2O3 on silicon
35	Energy dissipation during pulsed switching of strontium-titanate based resistive switching memory devices
36	Energy-enhanced atomic layer deposition for more process and precursor versatility
37	Enhanced Barrier Performance of Engineered Paper by Atomic Layer Deposited Al2O3 Thin Films
38	Enhanced non-volatile memory characteristics with quattro-layer graphene nanoplatelets vs. 2.85-nm Si nanoparticles with asymmetric Al2O3/HfO2 tunnel oxide
39	Enhanced surface passivation of epitaxially grown emitters for high-efficiency ultrathin crystalline Si solar cells
40	Experimental demonstration of single electron transistors featuring SiO2 plasma-enhanced atomic layer deposition in Ni-SiO2-Ni tunnel junctions
41	Fermi Level Tuning of ZnO Films Through Supercycled Atomic Layer Deposition
42	Flexible Perovskite Photovoltaic Modules and Solar Cells Based on Atomic Layer Deposited Compact Layers and UV-Irradiated TiO2 Scaffolds on Plastic Substrates
43	Forming-free resistive switching of tunable ZnO films grown by atomic layer deposition
44	High Dielectric Constant ZrO2 Films by Atomic Layer Deposition Technique on Germanium Substrates
45	High-κ insulating materials for AlGaN/GaN metal insulator semiconductor heterojunction field effect transistors
46	Hot Carrier Filtering in Solution Processed Heterostructures: A Paradigm for Improving Thermoelectric Efficiency
47	Hysteresis behaviour of top-down fabricated ZnO nanowire transistors
48	Impact of composition and crystallization behavior of atomic layer deposited strontium titanate films on the resistive switching of Pt/STO/TiN devices
49	Impact of hydrogen on the permanent deactivation of the boron-oxygen-related recombination center in crystalline silicon
50	In situ spectroscopic ellipsometry during atomic layer deposition of Pt, Ru and Pd
51	Industrially relevant Al2O3 deposition techniques for the surface passivation of Si solar cells
52	Influence of Atomic Layer Deposition Temperatures on TiO2/n-Si MOS Capacitor
53	Influence of stoichiometry on the performance of MIM capacitors from plasma-assisted ALD SrxTiyOz films
54	Influence of the Deposition Temperature on the c-Si Surface Passivation by Al2O3 Films Synthesized by ALD and PECVD
55	Injection dependence of the effective lifetime of n-type Si passivated by Al2O3: An edge effect?
56	Insulator-protected mechanically controlled break junctions for measuring single-molecule conductance in aqueous environments
57	Interfacial and electrical properties of Al2O3/HfO2 bilayer deposited by atomic layer deposition on GeON passivated germanium surface
58	Ion and Photon Surface Interaction during Remote Plasma ALD of Metal Oxides
59	Liquid-Phase Crystallized Silicon Solar Cells on Glass: Increasing the Open-Circuit Voltage by Optimized Interlayers for n- and p-Type Absorbers
60	Low Temperature Plasma-Enhanced Atomic Layer Deposition of Metal Oxide Thin Films
61	Low-Temperature Plasma-Assisted Atomic Layer Deposition of Silicon Nitride Moisture Permeation Barrier Layers
62	Mechanical and electrical properties of plasma and thermal atomic layer deposited Al2O3 films on GaAs and Si
63	Metal-Insulator-Metal Single Electron Transistors with Tunnel Barriers Prepared by Atomic Layer Deposition
64	Microwave properties of superconducting atomic-layer deposited TiN films
65	NiCO2O4@TiN Core-shell Electrodes through Conformal Atomic Layer Deposition for All-solid-state Supercapacitors
66	Nitrogen-Doping of Bulk and Nanotubular TiO2 Photocatalysts by Plasma-Assisted Atomic Layer Deposition
67	On the role of nanoporosity in controlling the performance of moisture permeation barrier layers
68	Opportunities of Atomic Layer Deposition for Perovskite Solar Cells
69	Optical emission spectroscopy as a tool for studying, optimizing, and monitoring plasma-assisted atomic layer deposition processes
70	Order of Dry and Wet Mixed-Length Self-Assembled Monolayers
71	PEALD grown high-k ZrO2 thin films on SiC group IV compound semiconductor
72	Plasma Processing for Crystallization and Densification of Atomic Layer Deposition BaTiO3 Thin Films
73	Plasma-assisted and thermal atomic layer deposition of electrochemically active Li2CO3
74	Plasma-assisted atomic layer deposition of HfNx: Tailoring the film properties by the plasma gas composition
75	Plasma-assisted atomic layer deposition of nanolaminates for gate dielectric applications
76	Plasma-Assisted Atomic Layer Deposition of SrTiO3: Stoichiometry and Crystallinity Studied by Spectroscopic Ellipsometry
77	Plasma-assisted atomic layer deposition of TiN/Al2O3 stacks for metal-oxide-semiconductor capacitor applications
78	Plasma-enhanced atomic layer deposition of BaTiO3
79	Plasma-enhanced atomic layer deposition of tungsten oxide thin films using (tBuN)2(Me2N)2W and O2 plasma
80	Plasma-enhanced atomic-layer-deposited MoOx emitters for silicon heterojunction solar cells
81	Possible Candidates for Impurities in mc-Si Wafers Responsible for Light-Induced Lifetime Degradation and Regeneration
82	Preliminary investigation of high-k materials - TiO2 doped Ta2O5 films by remote plasma ALD
83	Propagation Effects in Carbon Nanoelectronics
84	Realistic efficiency potential of next-generation industrial Czochralski-grown silicon solar cells after deactivation of the boron-oxygen-related defect center
85	Redeposition in plasma-assisted atomic layer deposition: Silicon nitride film quality ruled by the gas residence time
86	Remote plasma enhanced atomic layer deposition of ZnO for thin film electronic applications
87	Role of Metal Contacts in Designing High-Performance Monolayer n-Type WSe2 Field Effect Transistors
88	Role of Surface Termination in Atomic Layer Deposition of Silicon Nitride
89	Room-Temperature ALD of Metal Oxide Thin Films by Energy-Enhanced ALD
90	Silicon nanowire lithium-ion battery anodes with ALD deposited TiN coatings demonstrate a major improvement in cycling performance
91	Silicon Nitride and Silicon Oxide Thin Films by Plasma ALD
92	Silicon surface passivation by ultrathin Al2O3 films and Al2O3/SiNx stacks
93	Single-electron transistors featuring silicon nitride tunnel barriers prepared by atomic layer deposition
94	Spectroscopic and electrical calculation of band alignment between atomic layer deposited SiO2 and β-Ga2O3 (2̅01)
95	Stability of Al2O3 and Al2O3/a-Six:H stacks for surface passivation of crystalline silicon
96	Strongly Disordered TiN and NbTiN s-Wave Superconductors Probed by Microwave Electrodynamics
97	Surface passivation of phosphorus-diffused n+-type emitters by plasma-assisted atomic-layer deposited Al2O3
98	Synergy Between Plasma-Assisted ALD and Roll-to-Roll Atmospheric Pressure PE-CVD Processing of Moisture Barrier Films on Polymers
99	The effect of atomic layer deposition temperature on switching properties of HfOx resistive RAM devices
100	The important role of water in growth of monolayer transition metal dichalcogenides
101	The Influence of Ions and Photons during Plasma-Assisted ALD of Metal Oxides
102	The influence of surface preparation on low temperature HfO2 ALD on InGaAs (001) and (110) surfaces
103	Thermal and Plasma Enhanced Atomic Layer Deposition of Al2O3 on GaAs Substrates
104	Titanium Oxynitride Interlayer to Influence Oxygen Reduction Reaction Activity and Corrosion Stability of Pt and Pt-Ni Alloy
105	Top-down fabricated ZnO nanowire transistors for application in biosensors
106	Toward an integrated device for spatiotemporal superposition of free-electron lasers and laser pulses
107	Tri-gate InGaAs-OI junctionless FETs with PE-ALD Al2O3 gate dielectric and H2/Ar anneal
108	Tunable conduction type of solution-processed germanium nanoparticle based field effect transistors and their inverter integration
109	Tuning Material Properties of Oxides and Nitrides by Substrate Biasing during Plasma-Enhanced Atomic Layer Deposition on Planar and 3D Substrate Topographies
110	Ultrasensitive Detection of 2,4-Dinitrophenol Using Nanowire Biosensor
111	Understanding the Oxygen Evolution Reaction Mechanism on CoOx using Operando Ambient-Pressure X-ray Photoelectron Spectroscopy
112	Unexpectedly High Minority-Carrier Lifetimes Exceeding 20 ms Measured on 1.4-Ohm cm n-Type Silicon Wafers
113	Uniform Atomic Layer Deposition of Al2O3 on Graphene by Reversible Hydrogen Plasma Functionalization

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