Oxford Instruments FlexAL Plasma Enhanced Atomic Layer Deposition Film Publications

Your search for plasma enhanced atomic layer deposition publications using Oxford Instruments FlexAL hardware returned 169 records. If there are too many results, you may want to use the multi-factor search to narrow the results.

NumberTitle
1Experimental demonstration of single electron transistors featuring SiO2 plasma-enhanced atomic layer deposition in Ni-SiO2-Ni tunnel junctions
2Charge Transport through Organic Molecular Wires Embedded in Ultrathin Insulating Inorganic Layer
3Atomic insights into the oxygen incorporation in atomic layer deposited conductive nitrides and its mitigation by energetic ions
4High Dielectric Constant ZrO2 Films by Atomic Layer Deposition Technique on Germanium Substrates
5The important role of water in growth of monolayer transition metal dichalcogenides
6A Study of Ultrathin Superconducting Films of Niobium Nitride Obtained by Atomic Layer Deposition
7Mass Spectrometry Study of Li2CO3 Film Growth by Thermal and Plasma-Assisted Atomic Layer Deposition
8Micro-Raman Spectroscopy for Monitoring of Deposition Quality of High-k Stack Protective Layer onto Nanowire FET Chips for Highly Sensitive miRNA Detection
9Preliminary investigation of high-k materials - TiO2 doped Ta2O5 films by remote plasma ALD
10Atomic layer deposition of LiF using LiN(SiMe3)2 and SF6 plasma
11Topographically selective deposition
12Sub-10-nm ferroelectric Gd-doped HfO2 layers
13Comparative study of ALD SiO2 thin films for optical applications
14Correlation of film density and wet etch rate in hydrofluoric acid of plasma enhanced atomic layer deposited silicon nitride
15Origin of Ferroelectric Phase Stabilization via the Clamping Effect in Ferroelectric Hafnium Zirconium Oxide Thin Films
16Atomic Layer Deposition of Aluminum Phosphate Using AlMe3, PO(OMe)3, and O2 Plasma: Film Growth and Surface Reactions
17Plasma-enhanced atomic layer deposition of tungsten oxide thin films using (tBuN)2(Me2N)2W and O2 plasma
18Evidence for low-energy ions influencing plasma-assisted atomic layer deposition of SiO2: Impact on the growth per cycle and wet etch rate
19Optical emission spectroscopy as a tool for studying, optimizing, and monitoring plasma-assisted atomic layer deposition processes
20Optimization of Plasma Enhanced Atomic Layer Deposition Processes for Oxides, Nitrides and Metals in the Oxford Instruments FlexAL Reactor
21Deposition of TiN and HfO2 in a commercial 200 mm remote plasma atomic layer deposition reactor
22Film Conformality and Extracted Recombination Probabilities of O Atoms during Plasma-Assisted Atomic Layer Deposition of SiO2, TiO2, Al2O3, and HfO2
23Uniform Atomic Layer Deposition of Al2O3 on Graphene by Reversible Hydrogen Plasma Functionalization
24Influence of Atomic Layer Deposition Temperatures on TiO2/n-Si MOS Capacitor
25Energy-enhanced atomic layer deposition for more process and precursor versatility
26Thermal conductivity of ultrathin BaTiO3 films grown by plasma-assisted atomic layer deposition
27Dielectric properties investigation of a compound based on atomic layer deposited multi-layer structure
281D versus 3D quantum confinement in 1-5 nm ZnO nanoparticle agglomerations for application in charge-trapping memory devices
29Electrical properties of MOS capacitors formed by PEALD grown Al2O3 on silicon
30Tri-gate InGaAs-OI junctionless FETs with PE-ALD Al2O3 gate dielectric and H2/Ar anneal
31Area-Selective Atomic Layer Deposition of Two-Dimensional WS2 Nanolayers
32Atomic layer deposition of HfO2 using HfCp(NMe2)3 and O2 plasma
33Large area, patterned growth of 2D MoS2 and lateral MoS2-WS2 heterostructures for nano- and opto-electronic applications
34Flexible Perovskite Photovoltaic Modules and Solar Cells Based on Atomic Layer Deposited Compact Layers and UV-Irradiated TiO2 Scaffolds on Plastic Substrates
35Hysteresis behaviour of top-down fabricated ZnO nanowire transistors
36Comparison of thermal and plasma-enhanced atomic layer deposition of niobium oxide thin films
37Ultrasensitive Detection of 2,4-Dinitrophenol Using Nanowire Biosensor
38Thickness and Morphology Dependent Electrical Properties of ALD-Synthesized MoS2 FETs
39Metal-Insulator-Metal Single Electron Transistors with Tunnel Barriers Prepared by Atomic Layer Deposition
40Possible Candidates for Impurities in mc-Si Wafers Responsible for Light-Induced Lifetime Degradation and Regeneration
41Energy dissipation during pulsed switching of strontium-titanate based resistive switching memory devices
42Low-Temperature Phase-Controlled Synthesis of Titanium Di- and Tri-sulfide by Atomic Layer Deposition
43Densification of Thin Aluminum Oxide Films by Thermal Treatments
44Low resistivity HfNx grown by plasma-assisted ALD with external rf substrate biasing
45Tunable conduction type of solution-processed germanium nanoparticle based field effect transistors and their inverter integration
46Single-electron transistors featuring silicon nitride tunnel barriers prepared by atomic layer deposition
47Low temperature Topographically Selective Deposition by Plasma Enhanced Atomic Layer Deposition with ion bombardment assistance
48Energetic ions during plasma-enhanced atomic layer deposition and their role in tailoring material properties
49The Influence of Ions and Photons during Plasma-Assisted ALD of Metal Oxides
50Top-down fabricated ZnO nanowire transistors for application in biosensors
51Reaction Mechanisms during Atomic Layer Deposition of AlF3 Using Al(CH3)3 and SF6 Plasma
52A comparison between remote plasma-enhanced and thermal ALD of Hafnium-nitride thin films
53Analysis of NbN thin film deposition by plasma-enhanced ALD for gate electrode application
54Silicon nanowire lithium-ion battery anodes with ALD deposited TiN coatings demonstrate a major improvement in cycling performance
55Ion energy control during plasma-enhanced atomic layer deposition: enabling materials control and selective processing in the third dimension
56Atomic layer deposited silicon dioxide films on nanomechanical silicon nitride resonators
57Photoluminescence blue shift of indium phosphide nanowire networks with aluminum oxide coating
58Atomic layer deposition of Ru from CpRu(CO)2Et using O2 gas and O2 plasma
59Surface passivation of phosphorus-diffused n+-type emitters by plasma-assisted atomic-layer deposited Al2O3
60Propagation Effects in Carbon Nanoelectronics
61Plasma-Assisted ALD of LiPO(N) for Solid State Batteries
62Opportunities of Atomic Layer Deposition for Perovskite Solar Cells
63Spectroscopic and electrical calculation of band alignment between atomic layer deposited SiO2 and β-Ga2O3 (2̅01)
64Influence of stoichiometry on the performance of MIM capacitors from plasma-assisted ALD SrxTiyOz films
65Atomic Layer Deposition of the Conductive Delafossite PtCoO2
66Nitrogen-Doping of Bulk and Nanotubular TiO2 Photocatalysts by Plasma-Assisted Atomic Layer Deposition
67Plasma-enhanced atomic layer deposition of BaTiO3
68Reaction mechanisms during plasma-assisted atomic layer deposition of metal oxides: A case study for Al2O3
69Area-Selective Atomic Layer Deposition of SiO2 Using Acetylacetone as a Chemoselective Inhibitor in an ABC-Type Cycle
70Strongly Disordered TiN and NbTiN s-Wave Superconductors Probed by Microwave Electrodynamics
71Silicon Nitride and Silicon Oxide Thin Films by Plasma ALD
72Ferroelectricity in hafnia controlled via surface electrochemical state
73Advanced surface passivation of epitaxial boron emitters for high-efficiency ultrathin crystalline silicon solar cells
74Plasma-assisted atomic layer deposition of nanolaminates for gate dielectric applications
75The influence of surface preparation on low temperature HfO2 ALD on InGaAs (001) and (110) surfaces
76Atomic layer deposition for perovskite solar cells: research status, opportunities and challenges
77Enhanced Barrier Performance of Engineered Paper by Atomic Layer Deposited Al2O3 Thin Films
78Order of Dry and Wet Mixed-Length Self-Assembled Monolayers
79Dielectric Properties of Thermal and Plasma-Assisted Atomic Layer Deposited Al2O3 Thin Films
80Hot Carrier Filtering in Solution Processed Heterostructures: A Paradigm for Improving Thermoelectric Efficiency
81Control of ion energy during plasma enhanced atomic layer deposition: A new strategy for the modulation of TiN growth delay on SiO2
82Edge-Site Nanoengineering of WS2 by Low-Temperature Plasma-Enhanced Atomic Layer Deposition for Electrocatalytic Hydrogen Evolution
83Plasma-enhanced atomic-layer-deposited MoOx emitters for silicon heterojunction solar cells
84Atomic Layer Deposition of Silicon Nitride from Bis(tert-butylamino)silane and N2 Plasma
85Enhanced surface passivation of epitaxially grown emitters for high-efficiency ultrathin crystalline Si solar cells
86Influence of the Deposition Temperature on the c-Si Surface Passivation by Al2O3 Films Synthesized by ALD and PECVD
87Plasma-Enhanced Atomic Layer Deposition of Al2O3 on Graphene Using Monolayer hBN as Interfacial Layer
88Liquid-Phase Crystallized Silicon Solar Cells on Glass: Increasing the Open-Circuit Voltage by Optimized Interlayers for n- and p-Type Absorbers
89Crystallization Study by Transmission Electron Microscopy of SrTiO3 Thin Films Prepared by Plasma-Assisted ALD
90Role of Surface Termination in Atomic Layer Deposition of Silicon Nitride
91Biosensor properties of SOI nanowire transistors with a PEALD Al2O3 dielectric protective layer
92Industrially relevant Al2O3 deposition techniques for the surface passivation of Si solar cells
93Probing the Origin and Suppression of Vertically Oriented Nanostructures of 2D WS2 Layers
94Very High Refractive Index Transition Metal Dichalcogenide Photonic Conformal Coatings by Conversion of ALD Metal Oxides
95Insulator-protected mechanically controlled break junctions for measuring single-molecule conductance in aqueous environments
96Atomic layer deposition of TiN for the fabrication of nanomechanical resonators
97Synergy Between Plasma-Assisted ALD and Roll-to-Roll Atmospheric Pressure PE-CVD Processing of Moisture Barrier Films on Polymers
98PEALD grown high-k ZrO2 thin films on SiC group IV compound semiconductor
99Atomic layer deposition TiO2-Al2O3 stack: An improved gate dielectric on Ga-polar GaN metal oxide semiconductor capacitors
100Tuning Material Properties of Oxides and Nitrides by Substrate Biasing during Plasma-Enhanced Atomic Layer Deposition on Planar and 3D Substrate Topographies
101Low Temperature Plasma-Enhanced Atomic Layer Deposition of Metal Oxide Thin Films
102Interfaces Formed by ALD Metal Oxide Growth on Metal Layers
103Controlling mechanical, structural, and optical properties of Al2O3 thin films deposited by plasma-enhanced atomic layer deposition with substrate biasing
104Plasma Processing for Crystallization and Densification of Atomic Layer Deposition BaTiO3 Thin Films
105High-κ insulating materials for AlGaN/GaN metal insulator semiconductor heterojunction field effect transistors
106Electrical Characteristics of Top-Down ZnO Nanowire Transistors Using Remote Plasma ALD
107Application of spectral ellipsometry to in situ diagnostics of atomic layer deposition of dielectrics on silicon and AlGaN
108Impact of hydrogen on the permanent deactivation of the boron-oxygen-related recombination center in crystalline silicon
109Oxygen Recombination Probability Data for Plasma-Assisted Atomic Layer Deposition of SiO2 and TiO2
110Atomic layer deposition for spacer defined double patterning of sub-10 nm titanium dioxide features
111Al2O3/SiNx-Stacks at Increased Temperatures: Avoiding Blistering During Contact Firing
112Simple plasma assisted atomic layer deposition technique for high substitutional nitrogen doping of TiO2
113Plasma-Assisted ALD of Highly Conductive HfNx: On the Effect of Energetic Ions on Film Microstructure
114Impact of composition and crystallization behavior of atomic layer deposited strontium titanate films on the resistive switching of Pt/STO/TiN devices
115Interfacial and electrical properties of Al2O3/HfO2 bilayer deposited by atomic layer deposition on GeON passivated germanium surface
116Realistic efficiency potential of next-generation industrial Czochralski-grown silicon solar cells after deactivation of the boron-oxygen-related defect center
117Plasma and Thermal ALD of Al2O3 in a Commercial 200mm ALD Reactor
118Cathode encapsulation of organic light emitting diodes by atomic layer deposited Al2O3 films and Al2O3/a-SiNx:H stacks
119Role of Metal Contacts in Designing High-Performance Monolayer n-Type WSe2 Field Effect Transistors
120Forming-free resistive switching of tunable ZnO films grown by atomic layer deposition
121Plasma-Assisted Atomic Layer Deposition of SrTiO3: Stoichiometry and Crystallinity Studied by Spectroscopic Ellipsometry
122Microwave properties of superconducting atomic-layer deposited TiN films
123Impact of Ions on Film Conformality and Crystallinity during Plasma-Assisted Atomic Layer Deposition of TiO2
124Plasma-assisted atomic layer deposition of TiN/Al2O3 stacks for metal-oxide-semiconductor capacitor applications
125Effective Surface Passivation of InP Nanowires by Atomic-Layer-Deposited Al2O3 with POx Interlayer
126Titanium Oxynitride Interlayer to Influence Oxygen Reduction Reaction Activity and Corrosion Stability of Pt and Pt-Ni Alloy
127Ion and Photon Surface Interaction during Remote Plasma ALD of Metal Oxides
128Comparative study of thermal and plasma enhanced atomic layer deposition of aluminum oxide on graphene
129Topographical selective deposition: A comparison between plasma-enhanced atomic layer deposition/sputtering and plasma-enhanced atomic layer deposition/quasi-atomic layer etching approaches
130Atomic Layer Deposition of Cobalt Phosphide for Efficient Water Splitting
131On the Contact Optimization of ALD-Based MoS2 FETs: Correlation of Processing Conditions and Interface Chemistry with Device Electrical Performance
132Unexpectedly High Minority-Carrier Lifetimes Exceeding 20 ms Measured on 1.4-Ohm cm n-Type Silicon Wafers
133Influence of plasma-based in-situ surface cleaning procedures on HfO2/In0.53Ga0.47As gate stack properties
134Corrosion barriers for silver-based telescope mirrors: comparative study of plasma-enhanced atomic layer deposition and reactive evaporation of aluminum oxide
135Silicon surface passivation by ultrathin Al2O3 films and Al2O3/SiNx stacks
136Redeposition in plasma-assisted atomic layer deposition: Silicon nitride film quality ruled by the gas residence time
137Efficient and Sustained Photoelectrochemical Water Oxidation by Cobalt Oxide/Silicon Photoanodes with Nanotextured Interfaces
138Stability of Al2O3 and Al2O3/a-Six:H stacks for surface passivation of crystalline silicon
139Approaching the limits of dielectric breakdown for SiO2 films deposited by plasma-enhanced atomic layer deposition
140Atomic Layer Deposition of Large-Area Polycrystalline Transition Metal Dichalcogenides from 100°C through Control of Plasma Chemistry
141Properties of plasma enhanced atomic layer deposited ruthenium thin films from Ru(EtCp)2
142Thermal and plasma enhanced atomic layer deposition of ultrathin TiO2 on silicon from amide and alkoxide precursors: growth chemistry and photoelectrochemical performance
143Plasma-assisted and thermal atomic layer deposition of electrochemically active Li2CO3
144Multistep atomic layer deposition process for ultrathin superconducting NbN films with high critical current density on amorphous substrate
145Thermal and Plasma Enhanced Atomic Layer Deposition of Al2O3 on GaAs Substrates
146Room-Temperature ALD of Metal Oxide Thin Films by Energy-Enhanced ALD
147Microstructure and electrical properties of thin HfO2 deposited by plasma-enhanced atomic layer deposition
148NiCO2O4@TiN Core-shell Electrodes through Conformal Atomic Layer Deposition for All-solid-state Supercapacitors
149Plasma-assisted atomic layer deposition of HfNx: Tailoring the film properties by the plasma gas composition
150Mechanical and electrical properties of plasma and thermal atomic layer deposited Al2O3 films on GaAs and Si
151In situ spectroscopic ellipsometry during atomic layer deposition of Pt, Ru and Pd
152The effect of atomic layer deposition temperature on switching properties of HfOx resistive RAM devices
153Toward an integrated device for spatiotemporal superposition of free-electron lasers and laser pulses
154Fermi Level Tuning of ZnO Films Through Supercycled Atomic Layer Deposition
155Controlling transition metal atomic ordering in two-dimensional Mo1-xWxS2 alloys
156Fabrication of nanoporous membranes for tuning microbial interactions and biochemical reactions
157Electrical Measurement Under Atmospheric Conditons of PbSe Nanocrystal Thin Films Passivated by Remote Plasma Atomic Layer Deposition of Al2O3
158Enhancing the Wettability of High Aspect-Ratio Through-Silicon Vias Lined With LPCVD Silicon Nitride or PE-ALD Titanium Nitride for Void-Free Bottom-Up Copper Electroplating
159Remote plasma enhanced atomic layer deposition of ZnO for thin film electronic applications
160Injection dependence of the effective lifetime of n-type Si passivated by Al2O3: An edge effect?
161Understanding the Oxygen Evolution Reaction Mechanism on CoOx using Operando Ambient-Pressure X-ray Photoelectron Spectroscopy
162Low-Temperature Plasma-Assisted Atomic Layer Deposition of Silicon Nitride Moisture Permeation Barrier Layers
163Atomic Layer Deposition of Wet-Etch Resistant Silicon Nitride Using Di(sec-butylamino)silane and N2 Plasma on Planar and 3D Substrate Topographies
164A multifunctional biphasic water splitting catalyst tailored for integration with high-performance semiconductor photoanodes
165On the role of nanoporosity in controlling the performance of moisture permeation barrier layers
166Atomic layer deposition of aluminum fluoride using Al(CH3)3 and SF6 plasma
167Low-temperature plasma-enhanced atomic layer deposition of 2-D MoS2: large area, thickness control and tuneable morphology
168Plasma Enhanced Atomic Layer Deposition of Ruthenium Films Using Ru(EtCp)2 Precursor