Publication Information

Title:
Topographically selective deposition
Type:
Journal
Info:
Applied Physics Letters 114, 043101 (2019)
Date:
2019-01-12

Author Information

Name Institution
A. ChakerGrenoble Alps University (UGA)
Christophe ValléeGrenoble Alps University (UGA)
V. PesceGrenoble Alps University (UGA)
S. BelahcenGrenoble Alps University (UGA)
Rémi VallatGrenoble Alps University (UGA)
Rémy GassilloudCEA - LETI MINATEC
N. PossemeCEA - LETI MINATEC
M. BonvalotGrenoble Alps University (UGA)
Ahmad BsiesyGrenoble Alps University (UGA)

Films


Film/Plasma Properties

Characteristic: Thickness
Analysis: Ellipsometry

Characteristic: Sputter Rate
Analysis: Ellipsometry

Characteristic: Conformality, Step Coverage
Analysis: SEM, Scanning Electron Microscopy

Characteristic: Selectivity
Analysis: SEM, Scanning Electron Microscopy

Substrates

Silicon

Keywords

Substrate Biasing
High Aspect Ratio
Area Selective

Notes

1485