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Publication Information
Title:
Topographically selective deposition
Type:
Journal
Info:
Applied Physics Letters 114, 043101 (2019)
Date:
2019-01-12
Author Information
Name | Institution |
---|---|
A. Chaker | Grenoble Alps University (UGA) |
Christophe Vallée | Grenoble Alps University (UGA) |
V. Pesce | Grenoble Alps University (UGA) |
S. Belahcen | Grenoble Alps University (UGA) |
Rémi Vallat | Grenoble Alps University (UGA) |
Rémy Gassilloud | CEA - LETI MINATEC |
N. Posseme | CEA - LETI MINATEC |
M. Bonvalot | Grenoble Alps University (UGA) |
Ahmad Bsiesy | Grenoble Alps University (UGA) |
Films
Plasma Ta2O5
Film/Plasma Properties
Characteristic: Thickness
Analysis: Ellipsometry
Characteristic: Sputter Rate
Analysis: Ellipsometry
Characteristic: Conformality, Step Coverage
Analysis: SEM, Scanning Electron Microscopy
Characteristic: Selectivity
Analysis: SEM, Scanning Electron Microscopy
Substrates
Silicon |
Keywords
Substrate Biasing |
High Aspect Ratio |
Area Selective |
Notes
1485 |
Popular Precursors
Top Authors
Erwin (W.M.M.) Kessels |
Hyeongtag Jeon |
Hyungjun Kim |
Mauritius C. M. (Richard) van de Sanden |
Christophe Detavernier |