Tert-Butylimido,Tris(diMEthylamino)Tantalum, Ta[N(CH3)2]3[=NC(CH3)3], TBTMET, TBTDMT, CAS# 69039-11-8

Where to buy

NumberVendorRegionLink
1Strem Chemicals, Inc.🇺🇸t-Butylimidotris(dimethylamino)tantalum(V), min. 98%
2Strem Chemicals, Inc.🇺🇸t-Butylimidotris(dimethylamido)tantalum(V), min. 98%, contained in 50 ml cylinder for CVD/ALD
3Ereztech🇺🇸tert-Butyl imidotris(dimethylamido) tantalum(V)

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Plasma Enhanced Atomic Layer Deposition Film Publications

Your search for publications using this chemistry returned 7 record(s). If there are too many results, you may want to use the multi-factor search to narrow the results.

NumberTitle
1Topographically selective deposition
2Preliminary investigation of high-k materials - TiO2 doped Ta2O5 films by remote plasma ALD
3Trilayer Tunnel Selectors for Memristor Memory Cells
4Topographical selective deposition: A comparison between plasma-enhanced atomic layer deposition/sputtering and plasma-enhanced atomic layer deposition/quasi-atomic layer etching approaches
5Trilayer Tunnel Selectors for Memristor Memory Cells
6Low temperature Topographically Selective Deposition by Plasma Enhanced Atomic Layer Deposition with ion bombardment assistance
7Dielectric properties investigation of a compound based on atomic layer deposited multi-layer structure