Introducing Plasma ALD, LLC's first in-house product.

An economical, compact inductively coupled plasma source.

Ideal for:
  • Plasma-Enhanced Atomic Layer Deposition
  • Thin Film Etch
  • Surface cleaning
  • Surface modification

Contact us for more information.


Tert-Butylimido,Tris(diMEthylamino)Tantalum, Ta[N(CH3)2]3[=NC(CH3)3], TBTMET, TBTDMT, CAS# 69039-11-8

Where to buy

NumberVendorRegionLink
1Strem Chemicals, Inc.🇺🇸t-Butylimidotris(dimethylamido)tantalum(V), min. 98%, contained in 50 ml cylinder for CVD/ALD
2Strem Chemicals, Inc.🇺🇸t-Butylimidotris(dimethylamino)tantalum(V), min. 98%
3Ereztech🇺🇸tert-Butyl imidotris(dimethylamido) tantalum(V)

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Plasma Enhanced Atomic Layer Deposition Film Publications

Your search for publications using this chemistry returned 7 record(s). If there are too many results, you may want to use the multi-factor search to narrow the results.

NumberTitle
1Dielectric properties investigation of a compound based on atomic layer deposited multi-layer structure
2Topographical selective deposition: A comparison between plasma-enhanced atomic layer deposition/sputtering and plasma-enhanced atomic layer deposition/quasi-atomic layer etching approaches
3Trilayer Tunnel Selectors for Memristor Memory Cells
4Topographically selective deposition
5Low temperature Topographically Selective Deposition by Plasma Enhanced Atomic Layer Deposition with ion bombardment assistance
6Trilayer Tunnel Selectors for Memristor Memory Cells
7Preliminary investigation of high-k materials - TiO2 doped Ta2O5 films by remote plasma ALD