Publication Information

Title: Trilayer Tunnel Selectors for Memristor Memory Cells

Type: Journal

Info: Adv. Mater. 2016 28(2) 356--362

Date: 2015-11-19

DOI: http://dx.doi.org/10.1002/adma.201503604

Author Information

Name

Institution

Seoul National University of Science and Technology

Hewlett-Packard

Hewlett-Packard

Hewlett-Packard

Hewlett-Packard

Hewlett-Packard

Hewlett-Packard

Hewlett-Packard

University of Massachusetts, Amherst

Hewlett-Packard

Films

Plasma TaNx using Unknown

Deposition Temperature Range = 300-400C

69039-11-8

7727-37-9

1333-74-0

Plasma TaNx using Unknown

Deposition Temperature Range = 300-400C

69039-11-8

7664-41-7

Plasma Ta2O5 using Unknown

Deposition Temperature Range = 300-400C

69039-11-8

7782-44-7

Film/Plasma Properties

Characteristic

Analysis

Diagnostic

Unknown

Four Terminal I-V

HP 4156A

Crystallinity, Crystal Structure, Grain Size, Atomic Structure

XRD, X-Ray Diffraction

Unknown

Band Gap

Optical Absorption

Unknown

Chemical Composition, Impurities

RBS, Rutherford Backscattering Spectrometry

Unknown

Chemical Composition, Impurities

XPS, X-ray Photoelectron Spectroscopy

Unknown

Chemical Composition, Impurities

ELS, EELS, Electron Energy Loss Spectroscopy

FEI Titan

Substrates

SiO2

Keywords

Resistance RAM

Notes

550



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