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Introducing Plasma ALD, LLC's first in-house product. |
An economical, compact inductively coupled plasma source. |
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Ideal for: |
- Plasma-Enhanced Atomic Layer Deposition
- Thin Film Etch
- Surface cleaning
- Surface modification
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Contact us for more information. |
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Where to buy Tert-Butylimido,Tris(diMEthylamino)Tantalum, Ta[N(CH3)2]3[=NC(CH3)3], TBTMET, TBTDMT CAS# 69039-11-8
Tert-Butylimido,Tris(diMEthylamino)Tantalum, Ta[N(CH3)2]3[=NC(CH3)3], TBTMET, TBTDMT CAS# 69039-11-8 is available from the following source(s):
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