Ta2O5 Plasma Enhanced Atomic Layer Deposition Film Publications

Your search for plasma enhanced atomic layer deposition publications discussing Ta2O5 films returned 28 record(s). If there are too many results, you may want to use the multi-factor search to narrow the results.

NumberTitle
1In Situ Control of Oxygen Vacancies in TaOx Thin Films via Plasma-Enhanced Atomic Layer Deposition for Resistive Switching Memory Applications
2Thermal and plasma enhanced atomic layer deposition ruthenium and electrical characterization as a metal electrode
3Dielectric properties investigation of a compound based on atomic layer deposited multi-layer structure
4Pt/Ta2O5/HfO2-x/Ti Resistive Switching Memory Competing with Multilevel NAND Flash
5Selective deposition of Ta2O5 by adding plasma etching super-cycles in plasma enhanced atomic layer deposition steps
6Optical emission spectroscopy as a tool for studying, optimizing, and monitoring plasma-assisted atomic layer deposition processes
7Trilayer Tunnel Selectors for Memristor Memory Cells
8Hydrogen radical enhanced atomic layer deposition of TaOx: saturation studies and methods for oxygen deficiency control
9Comparative Studies of Atomic Layer Deposition and Plasma-Enhanced Atomic Layer Deposition Ta2O5 and the Effects on Electrical Properties of In situ Nitridation
10Antireflection Coatings for Strongly Curved Glass Lenses by Atomic Layer Deposition
11Nanochemistry, nanostructure, and electrical properties of Ta2O5 film deposited by atomic layer deposition and plasma-enhanced atomic layer deposition
12Atomic layer deposition of Ta-based thin films: Reactions of alkylamide precursor with various reactants
13Low Temperature Plasma-Enhanced Atomic Layer Deposition of Metal Oxide Thin Films
14Topographical selective deposition: A comparison between plasma-enhanced atomic layer deposition/sputtering and plasma-enhanced atomic layer deposition/quasi-atomic layer etching approaches
15Atomic Layer Deposition of Ruthenium and Ruthenium-oxide Thin Films by Using a Ru(EtCp)2 Precursor and Oxygen Gas
16Atomic Layer Deposition: An Enabling Technology for Microelectronic Device Manufacturing
17Investigation of the impact of insulator material on the performance of dissimilar electrode metal-insulator-metal diodes
18Radical Enhanced Atomic Layer Deposition of Tantalum Oxide - Thesis Coverage
19Plasma-assisted atomic layer deposition of Ta2O5 from alkylamide precursor and remote O2 plasma
20Increment of the Dielectric Constant of Ta2O5 Thin Films by Retarding Interface Oxide Growth on Si Substrates
21Ion and Photon Surface Interaction during Remote Plasma ALD of Metal Oxides
22Comparative study on chemical stability of dielectric oxide films under HF wet and vapor etching for radiofrequency microelectromechanical system application
23Thermal and Plasma-Enhanced ALD of Ta and Ti Oxide Thin Films from Alkylamide Precursors
24Highly Uniform, Electroforming-Free, and Self-Rectifying Resistive Memory in the Pt/Ta2O5/HfO2-x/TiN Structure
25Low temperature Topographically Selective Deposition by Plasma Enhanced Atomic Layer Deposition with ion bombardment assistance
26Topographically selective deposition
27Conformality of remote plasma-enhanced atomic layer deposition processes: An experimental study
28Development of a multianalyte optical sol-gel biosensor for medical diagnostic