Ta2O5 Plasma Enhanced Atomic Layer Deposition Film Publications

Your search for plasma enhanced atomic layer deposition publications discussing Ta2O5 films returned 28 record(s). If there are too many results, you may want to use the multi-factor search to narrow the results.

NumberTitle
1Nanochemistry, nanostructure, and electrical properties of Ta2O5 film deposited by atomic layer deposition and plasma-enhanced atomic layer deposition
2Development of a multianalyte optical sol-gel biosensor for medical diagnostic
3Increment of the Dielectric Constant of Ta2O5 Thin Films by Retarding Interface Oxide Growth on Si Substrates
4Dielectric properties investigation of a compound based on atomic layer deposited multi-layer structure
5Comparative study on chemical stability of dielectric oxide films under HF wet and vapor etching for radiofrequency microelectromechanical system application
6Low temperature Topographically Selective Deposition by Plasma Enhanced Atomic Layer Deposition with ion bombardment assistance
7Radical Enhanced Atomic Layer Deposition of Tantalum Oxide - Thesis Coverage
8In Situ Control of Oxygen Vacancies in TaOx Thin Films via Plasma-Enhanced Atomic Layer Deposition for Resistive Switching Memory Applications
9Atomic Layer Deposition: An Enabling Technology for Microelectronic Device Manufacturing
10Comparative Studies of Atomic Layer Deposition and Plasma-Enhanced Atomic Layer Deposition Ta2O5 and the Effects on Electrical Properties of In situ Nitridation
11Topographically selective deposition
12Investigation of the impact of insulator material on the performance of dissimilar electrode metal-insulator-metal diodes
13Conformality of remote plasma-enhanced atomic layer deposition processes: An experimental study
14Trilayer Tunnel Selectors for Memristor Memory Cells
15Topographical selective deposition: A comparison between plasma-enhanced atomic layer deposition/sputtering and plasma-enhanced atomic layer deposition/quasi-atomic layer etching approaches
16Atomic Layer Deposition of Ruthenium and Ruthenium-oxide Thin Films by Using a Ru(EtCp)2 Precursor and Oxygen Gas
17Low Temperature Plasma-Enhanced Atomic Layer Deposition of Metal Oxide Thin Films
18Selective deposition of Ta2O5 by adding plasma etching super-cycles in plasma enhanced atomic layer deposition steps
19Atomic layer deposition of Ta-based thin films: Reactions of alkylamide precursor with various reactants
20Highly Uniform, Electroforming-Free, and Self-Rectifying Resistive Memory in the Pt/Ta2O5/HfO2-x/TiN Structure
21Ion and Photon Surface Interaction during Remote Plasma ALD of Metal Oxides
22Pt/Ta2O5/HfO2-x/Ti Resistive Switching Memory Competing with Multilevel NAND Flash
23Plasma-assisted atomic layer deposition of Ta2O5 from alkylamide precursor and remote O2 plasma
24Antireflection Coatings for Strongly Curved Glass Lenses by Atomic Layer Deposition
25Optical emission spectroscopy as a tool for studying, optimizing, and monitoring plasma-assisted atomic layer deposition processes
26Hydrogen radical enhanced atomic layer deposition of TaOx: saturation studies and methods for oxygen deficiency control
27Thermal and Plasma-Enhanced ALD of Ta and Ti Oxide Thin Films from Alkylamide Precursors
28Thermal and plasma enhanced atomic layer deposition ruthenium and electrical characterization as a metal electrode