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Characterization of thin Al2O3/SiO2 dielectric stack for CMOS transistors
Designing Multifunctional Cobalt Oxide Layers for Efficient and Stable Electrochemical Oxygen Evolution
Hierarchical Atomic Layer Deposited V2O5 on 3D Printed Nanocarbon Electrodes for High-Performance Aqueous Zinc-Ion Batteries
Piezoelectric Properties of Zinc Oxide Thin Films Grown by Plasma-Enhanced Atomic Layer Deposition
Experimental and numerical analysis of the effects of ion bombardment in silicon oxide (SiO2) plasma enhanced atomic layer deposition (PEALD) processes
Highly Uniform, Electroforming-Free, and Self-Rectifying Resistive Memory in the Pt/Ta2O5/HfO2-x/TiN Structure
Type:
Journal
Info:
Advanced Functional Materials, Volume 24, Issue 32, 2014, Pages 5086--5095
Date:
2014-05-26
Author Information
| Name | Institution |
|---|---|
| Jung Ho Yoon | Seoul National University |
| Seul Ji Song | Seoul National University |
| Il-Hyuk Yoo | Seoul National University |
| Jun Yeong Seok | Seoul National University |
| Kyung Jean Yoon | Seoul National University |
| Dae Eun Kwon | Seoul National University |
| Tae Hyung Park | Seoul National University |
| Cheol Seong Hwang | Seoul National University |
Films
Film/Plasma Properties
Substrates
Keywords
Notes
| 438 |