Publication Information

Title:
Plasma-assisted atomic layer deposition of Ta2O5 from alkylamide precursor and remote O2 plasma
Type:
Journal
Info:
Journal of Vacuum Science & Technology A 26, 472-480 (2008)
Date:
2008-03-11

Author Information

Name Institution
S. B. S. HeilEindhoven University of Technology
Fred RoozeboomEindhoven University of Technology
Mauritius C. M. (Richard) van de SandenEindhoven University of Technology
Erwin (W.M.M.) KesselsEindhoven University of Technology

Films

Plasma Ta2O5


Film/Plasma Properties

Characteristic: Thickness
Analysis: Ellipsometry

Characteristic: Optical Properties
Analysis: Ellipsometry

Characteristic: Refractive Index
Analysis: Ellipsometry

Characteristic: Extinction Coefficient
Analysis: Ellipsometry

Characteristic: Chemical Composition, Impurities
Analysis: RBS, Rutherford Backscattering Spectrometry

Characteristic: Density
Analysis: RBS, Rutherford Backscattering Spectrometry

Characteristic: Compositional Depth Profiling
Analysis: TOF-ERDA, Time-Of-Flight Elastic Recoil Detection Analysis

Characteristic: Crystallinity, Crystal Structure, Grain Size, Atomic Structure
Analysis: XRD, X-Ray Diffraction

Characteristic: Gas Phase Species
Analysis: QMS, Quadrupole Mass Spectrometer

Characteristic: Plasma Species
Analysis: OES, Optical Emission Spectroscopy

Characteristic: Deposition Kinetics, Reaction Mechanism
Analysis: Custom

Substrates

Si(100)

Keywords

Notes

1346