Fred Roozeboom Plasma Enhanced Atomic Layer Deposition Film Publications

Your search for plasma enhanced atomic layer deposition publications authored by Fred Roozeboom returned 27 record(s). If there are too many results, you may want to use the multi-factor search to narrow the results.

NumberTitle
1Industrially relevant Al2O3 deposition techniques for the surface passivation of Si solar cells
2Plasma-assisted atomic layer deposition of conformal Pt films in high aspect ratio trenches
3Area-Selective Atomic Layer Deposition of SiO2 Using Acetylacetone as a Chemoselective Inhibitor in an ABC-Type Cycle
4Crystallization Study by Transmission Electron Microscopy of SrTiO3 Thin Films Prepared by Plasma-Assisted ALD
5Anti-stiction coating for mechanically tunable photonic crystal devices
6Plasma-assisted atomic layer deposition of TiN monitored by in situ spectroscopic ellipsometry
7Atmospheric pressure plasma enhanced spatial ALD of silver
8Atmospheric plasma-enhanced spatial-ALD of InZnO for high mobility thin film transistors
9Impact of composition and crystallization behavior of atomic layer deposited strontium titanate films on the resistive switching of Pt/STO/TiN devices
10Plasma-assisted atomic layer deposition of Ta2O5 from alkylamide precursor and remote O2 plasma
11Encapsulation method for atom probe tomography analysis of nanoparticles
12Patterned deposition by plasma enhanced spatial atomic layer deposition
13Synthesis and in situ characterization of low-resistivity TaNx films by remote plasma atomic layer deposition
14Atomic layer deposition of Ru from CpRu(CO)2Et using O2 gas and O2 plasma
15Plasma-assisted atomic layer deposition of TiN films at low deposition temperature for high-aspect ratio applications
16Deposition of TiN and HfO2 in a commercial 200 mm remote plasma atomic layer deposition reactor
17Influence of stoichiometry on the performance of MIM capacitors from plasma-assisted ALD SrxTiyOz films
18Plasma-Enhanced ALD of TiO2 Using a Novel Cyclopentadienyl Alkylamido Precursor [Ti(CpMe)(NMe2)3] and O2 Plasma
19Plasma-Assisted Atomic Layer Deposition of SrTiO3: Stoichiometry and Crystallinity Studied by Spectroscopic Ellipsometry
20Plasma-assisted atomic layer deposition of TiN/Al2O3 stacks for metal-oxide-semiconductor capacitor applications
21Area-Selective Atomic Layer Deposition of In2O3:H Using a ยต-Plasma Printer for Local Area Activation
22Enhancing the Wettability of High Aspect-Ratio Through-Silicon Vias Lined With LPCVD Silicon Nitride or PE-ALD Titanium Nitride for Void-Free Bottom-Up Copper Electroplating
23Remote Plasma ALD of SrTiO3 Using Cyclopentadienlyl-Based Ti and Sr Precursors
24Infrared and optical emission spectroscopy study of atmospheric pressure plasma-enhanced spatial ALD of Al2O3
25Low-Temperature Deposition of TiN by Plasma-Assisted Atomic Layer Deposition
26Dielectric Properties of Thermal and Plasma-Assisted Atomic Layer Deposited Al2O3 Thin Films
27Atmospheric-Pressure Plasma-Enhanced Spatial ALD of SiO2 Studied by Gas-Phase Infrared and Optical Emission Spectroscopy