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Fred Roozeboom Plasma Enhanced Atomic Layer Deposition Film Publications

Your search for plasma enhanced atomic layer deposition publications authored by Fred Roozeboom returned 29 record(s).

NumberTitle
1Plasma-assisted atomic layer deposition of TiN films at low deposition temperature for high-aspect ratio applications
2Temperature study of atmospheric-pressure plasma-enhanced spatial ALD of Al2O3 using infrared and optical emission spectroscopy
3Remote Plasma ALD of SrTiO3 Using Cyclopentadienlyl-Based Ti and Sr Precursors
4Deposition of TiN and HfO2 in a commercial 200 mm remote plasma atomic layer deposition reactor
5Plasma and Thermal ALD of Al2O3 in a Commercial 200mm ALD Reactor
6Atomic layer deposition of Ru from CpRu(CO)2Et using O2 gas and O2 plasma
7Patterned deposition by plasma enhanced spatial atomic layer deposition
8Enhancing the Wettability of High Aspect-Ratio Through-Silicon Vias Lined With LPCVD Silicon Nitride or PE-ALD Titanium Nitride for Void-Free Bottom-Up Copper Electroplating
9Plasma-assisted atomic layer deposition of Ta2O5 from alkylamide precursor and remote O2 plasma
10Plasma-assisted atomic layer deposition of conformal Pt films in high aspect ratio trenches
11Impact of composition and crystallization behavior of atomic layer deposited strontium titanate films on the resistive switching of Pt/STO/TiN devices
12Plasma-Enhanced ALD of TiO2 Using a Novel Cyclopentadienyl Alkylamido Precursor [Ti(CpMe)(NMe2)3] and O2 Plasma
13Atmospheric plasma-enhanced spatial-ALD of InZnO for high mobility thin film transistors
14Industrially relevant Al2O3 deposition techniques for the surface passivation of Si solar cells
15Atmospheric pressure plasma enhanced spatial ALD of silver
16Area-Selective Atomic Layer Deposition of In2O3:H Using a ยต-Plasma Printer for Local Area Activation
17Infrared and optical emission spectroscopy study of atmospheric pressure plasma-enhanced spatial ALD of Al2O3
18Dielectric Properties of Thermal and Plasma-Assisted Atomic Layer Deposited Al2O3 Thin Films
19Plasma-assisted atomic layer deposition of TiN monitored by in situ spectroscopic ellipsometry
20Low-Temperature Deposition of TiN by Plasma-Assisted Atomic Layer Deposition
21Crystallization Study by Transmission Electron Microscopy of SrTiO3 Thin Films Prepared by Plasma-Assisted ALD
22Anti-stiction coating for mechanically tunable photonic crystal devices
23Area-Selective Atomic Layer Deposition of SiO2 Using Acetylacetone as a Chemoselective Inhibitor in an ABC-Type Cycle
24Plasma-assisted atomic layer deposition of TiN/Al2O3 stacks for metal-oxide-semiconductor capacitor applications
25Influence of stoichiometry on the performance of MIM capacitors from plasma-assisted ALD SrxTiyOz films
26Synthesis and in situ characterization of low-resistivity TaNx films by remote plasma atomic layer deposition
27Plasma-Assisted Atomic Layer Deposition of SrTiO3: Stoichiometry and Crystallinity Studied by Spectroscopic Ellipsometry
28Encapsulation method for atom probe tomography analysis of nanoparticles
29Atmospheric-Pressure Plasma-Enhanced Spatial ALD of SiO2 Studied by Gas-Phase Infrared and Optical Emission Spectroscopy