Publication Information

Title: Plasma-Enhanced ALD of TiO2 Using a Novel Cyclopentadienyl Alkylamido Precursor [Ti(CpMe)(NMe2)3] and O2 Plasma

Type: Conference Proceedings

Info: ECS Transactions, 33 (2) 385-393 (2010)

Date: 2010-07-28

DOI: http://dx.doi.org/10.1149/1.3485274

Author Information

Name

Institution

Eindhoven University of Technology

Eindhoven University of Technology

SAFC Hitech

Eindhoven University of Technology

Eindhoven University of Technology

Eindhoven University of Technology

Films

Plasma TiO2 using Unknown

Deposition Temperature Range = 25-350C

0-0-0

7782-44-7

Thermal TiO2 using Unknown

Deposition Temperature Range = 150-350C

0-0-0

10028-15-6

Film/Plasma Properties

Characteristic

Analysis

Diagnostic

Chemical Composition, Impurities

XPS, X-ray Photoelectron Spectroscopy

-

Chemical Composition, Impurities

RBS, Rutherford Backscattering Spectrometry

-

Density

RBS, Rutherford Backscattering Spectrometry

-

Morphology, Roughness, Topography

AFM, Atomic Force Microscopy

-

Crystallinity, Crystal Structure, Grain Size, Atomic Structure

XRD, X-Ray Diffraction

-

Thickness

Ellipsometry

-

Refractive Index

Ellipsometry

-

Chemical Composition, Impurities

TOF-ERDA, Time-Of-Flight Elastic Recoil Detection Analysis

-

Substrates

Keywords

Plasma vs Thermal Comparison

Notes

729



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