Plasma-Enhanced ALD of TiO2 Using a Novel Cyclopentadienyl Alkylamido Precursor [Ti(CpMe)(NMe2)3] and O2 Plasma

Type:
Conference Proceedings
Info:
ECS Transactions, 33 (2) 385-393 (2010)
Date:
2010-07-28
DOI:
http://dx.doi.org/10.1149/1.3485274

Author Information

Name Institution
Anitha SarkarEindhoven University of Technology
Stephen E. PottsEindhoven University of Technology
S. RushworthSAFC Hitech
Fred RoozeboomEindhoven University of Technology
Mauritius C. M. (Richard) van de SandenEindhoven University of Technology
Erwin (W.M.M.) KesselsEindhoven University of Technology

Films

Plasma TiO2

Hardware used: Unknown
Ti(CpMe)(NMe2)3, Tris(dimethylamido)methylcyclopentadienyl titanium
CAS#: 0-0-0
O2, Oxygen
CAS#: 7782-44-7
Deposition Temperature Range = 25-350C

Thermal TiO2

Hardware used: Unknown
Ti(CpMe)(NMe2)3, Tris(dimethylamido)methylcyclopentadienyl titanium
CAS#: 0-0-0
O3, Ozone
CAS#: 10028-15-6
Deposition Temperature Range = 150-350C

Film/Plasma Properties

Characteristic: Chemical Composition, Impurities
Analysis: XPS, X-ray Photoelectron Spectroscopy
Diagnostic: -

Characteristic: Chemical Composition, Impurities
Analysis: RBS, Rutherford Backscattering Spectrometry
Diagnostic: -

Characteristic: Density
Analysis: RBS, Rutherford Backscattering Spectrometry
Diagnostic: -

Characteristic: Morphology, Roughness, Topography
Analysis: AFM, Atomic Force Microscopy
Diagnostic: -

Characteristic: Crystallinity, Crystal Structure, Grain Size, Atomic Structure
Analysis: XRD, X-Ray Diffraction
Diagnostic: -

Characteristic: Thickness
Analysis: Ellipsometry
Diagnostic: -

Characteristic: Refractive Index
Analysis: Ellipsometry
Diagnostic: -

Characteristic: Chemical Composition, Impurities
Analysis: TOF-ERDA, Time-Of-Flight Elastic Recoil Detection Analysis
Diagnostic: -

Substrates

Notes

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