Publication Information

Title: Plasma-Enhanced ALD of TiO2 Using a Novel Cyclopentadienyl Alkylamido Precursor [Ti(CpMe)(NMe2)3] and O2 Plasma

Type: Conference Proceedings

Info: ECS Transactions, 33 (2) 385-393 (2010)

Date: 2010-07-28

DOI: http://dx.doi.org/10.1149/1.3485274

Author Information

Name

Institution

Eindhoven University of Technology

Eindhoven University of Technology

SAFC Hitech

Eindhoven University of Technology

Eindhoven University of Technology

Eindhoven University of Technology

Films

Plasma TiO2 using Unknown

Deposition Temperature Range = 25-350C

0-0-0

7782-44-7

Thermal TiO2 using Unknown

Deposition Temperature Range = 150-350C

0-0-0

10028-15-6

Film/Plasma Properties

Characteristic

Analysis

Diagnostic

Chemical Composition, Impurities

XPS, X-ray Photoelectron Spectroscopy

Unknown

Chemical Composition, Impurities

RBS, Rutherford Backscattering Spectrometry

Unknown

Density

RBS, Rutherford Backscattering Spectrometry

Unknown

Morphology, Roughness, Topography

AFM, Atomic Force Microscopy

Unknown

Crystallinity, Crystal Structure, Grain Size, Atomic Structure

XRD, X-Ray Diffraction

Unknown

Thickness

Ellipsometry

Unknown

Refractive Index

Ellipsometry

Unknown

Chemical Composition, Impurities

TOF-ERDA, Time-Of-Flight Elastic Recoil Detection Analysis

Unknown

Substrates

Keywords

Plasma vs Thermal Comparison

Notes

729



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