O3, Ozone, CAS# 10028-15-6

Plasma Enhanced Atomic Layer Deposition Film Publications

Your search for publications using this chemistry returned 49 record(s). If there are too many results, you may want to use the multi-factor search to narrow the results.

NumberTitle
1A comparison between HfO2/Al2O3 nano-laminates and ternary HfxAlyO compound as the dielectric material in InGaAs based metal-oxide-semiconductor (MOS) capacitors
2Alumina films as gas barrier layers grown by spatial atomic layer deposition with trimethylaluminum and different oxygen sources
3Breakdown and Protection of ALD Moisture Barrier Thin Films
4Electrical Characterization of Metal-Insulator-Semiconductor Capacitors Having Double-Layered Atomic-Layer-Deposited Al2O3 and ZnO for Transparent Thin Film Transistor Applications
5Improvements on Interface Reliability and Capacitance Dispersion of Fluorinated ALD-Al2O3 Gate Dielectrics by CF4 Plasma Treatment
6Influence of oxidant source on the property of atomic layer deposited Al2O3 on hydrogen-terminated Si substrate
7Influence of Surface Temperature on the Mechanism of Atomic Layer Deposition of Aluminum Oxide Using an Oxygen Plasma and Ozone
8Influence of the Oxidant on the Chemical and Field-Effect Passivation of Si by ALD Al2O3
9Integration of Atomic Layer Deposited Al2O3 Dielectrics with Graphene
10Surface Reaction Mechanisms during Ozone and Oxygen Plasma Assisted Atomic Layer Deposition of Aluminum Oxide
11Improvements on Interface Reliability and Capacitance Dispersion of Fluorinated ALD-Al2O3 Gate Dielectrics by CF4 Plasma Treatment
12Effects of Recessed-Gate Structure on AlGaN/GaN-on-SiC MIS-HEMTs with Thin AlOxNy MIS Gate
13Atomic layer deposition of B2O3/SiO2 thin films and their application in an efficient diffusion doping process
14Atomic layer deposition of B2O3/SiO2 thin films and their application in an efficient diffusion doping process
15The Sandwich Structure of Ga-Doped ZnO Thin Films Grown via H2O-, O2-, and O3-Based Atomic Layer Deposition
16Plasma enhanced atomic layer deposition of Ga2O3 thin films
17Film properties of low temperature HfO2 grown with H2O, O3, or remote O2-plasma
18Influence of oxygen source on the ferroelectric properties of ALD grown Hf1-xZrxO2 films
19Interaction of hydrogen with hafnium dioxide grown on silicon dioxide by the atomic layer deposition technique
20Pt/Ta2O5/HfO2-x/Ti Resistive Switching Memory Competing with Multilevel NAND Flash
21Resistive switching in HfO2-based atomic layer deposition grown metal-insulator-metal structures
22The Influence of Technology and Switching Parameters on Resistive Switching Behavior of Pt/HfO2/TiN MIM Structures
23Influence of oxygen source on the ferroelectric properties of ALD grown Hf1-xZrxO2 films
24Sub-0.5 nm Equivalent Oxide Thickness Scaling for Si-Doped Zr1-xHfxO2 Thin Film without Using Noble Metal Electrode
25Sub-0.5 nm Equivalent Oxide Thickness Scaling for Si-Doped Zr1-xHfxO2 Thin Film without Using Noble Metal Electrode
26Atomic Layer Deposition of La2O3 Thin Films by Using an Electron Cyclotron Resonance Plasma Source
27Lanthanum-Oxide Thin Films Deposited by Plasma-Enhanced Atomic Layer Deposition
28Deposition Of MnO Anode And MnO2 Cathode Thin Films By Plasma Enhanced Atomic Layer Deposition Using The Mn(thd)3 Precursor
29Manganese oxide films with controlled oxidation state for water splitting devices through a combination of atomic layer deposition and post-deposition annealing
30Process Control of Atomic Layer Deposition Molybdenum Oxide Nucleation and Sulfidation to Large-Area MoS2 Monolayers
31Compositional and electrical modulation of niobium oxide thin films deposited by plasma-enhanced atomic layer deposition
32Atomic layer deposition of B2O3/SiO2 thin films and their application in an efficient diffusion doping process
33Comparative study of ALD SiO2 thin films for optical applications
34Designing high performance precursors for atomic layer deposition of silicon oxide
35Mechanical, structural, and optical properties of PEALD metallic oxides for optical applications
36Normally-off AlGaN/GaN-on-Si metal-insulator-semiconductor heterojunction field-effect transistor with nitrogen-incorporated silicon oxide gate insulator
37Silicon dioxide deposition behavior via ALD using BTBAS with ozone or O2 plasma
38Thermal and plasma enhanced atomic layer deposition of SiO2 using commercial silicon precursors
39Normally-off AlGaN/GaN-on-Si metal-insulator-semiconductor heterojunction field-effect transistor with nitrogen-incorporated silicon oxide gate insulator
40Atmospheric pressure plasma enhanced spatial atomic layer deposition of SnOx as conductive gas diffusion barrier
41Atomic layer deposition of tin oxide using tetraethyltin to produce high-capacity Li-ion batteries
42Comparison of thermal, plasma-enhanced and layer by layer Ar plasma treatment atomic layer deposition of Tin oxide thin films
43Synthesis and Characterization of Tin Oxide By Atomic Layer Deposition for Solid-State Batteries
44Enhancement of the Electrical Properties of Ga-doped ZnO Thin Films on Polycarbonate Substrates by Using a TiO2 Buffer Layer
45In situ diagnostics for studying gas-surface reactions during thermal and plasma-assisted atomic layer deposition
46Low temperature temporal and spatial atomic layer deposition of TiO2 films
47Plasma enhanced atomic layer batch processing of aluminum doped titanium dioxide
48Plasma-Enhanced ALD of TiO2 Using a Novel Cyclopentadienyl Alkylamido Precursor [Ti(CpMe)(NMe2)3] and O2 Plasma
49Influence of oxygen source on the ferroelectric properties of ALD grown Hf1-xZrxO2 films