Surface Reaction Mechanisms during Ozone and Oxygen Plasma Assisted Atomic Layer Deposition of Aluminum Oxide

Type:
Journal
Info:
Langmuir, 2010, 26 (17), pp 13732-13735
Date:
2010-06-19

Author Information

Name Institution
Vikrant R. RaiColorado School of Mines
Vincent VandalonEindhoven University of Technology
Sumit AgarwalColorado School of Mines

Films

Plasma Al2O3


Thermal Al2O3


Film/Plasma Properties

Characteristic: Surface Reactions
Analysis: ATR-FTIR

Substrates

ZnSe
Al2O3

Keywords

Reaction Mechanism

Notes

717