Surface Reaction Mechanisms during Ozone and Oxygen Plasma Assisted Atomic Layer Deposition of Aluminum Oxide
Type:
Journal
Info:
Langmuir, 2010, 26 (17), pp 13732-13735
Date:
2010-06-19
Author Information
| Name | Institution |
|---|---|
| Vikrant R. Rai | Colorado School of Mines |
| Vincent Vandalon | Eindhoven University of Technology |
| Sumit Agarwal | Colorado School of Mines |
Films
Plasma Al2O3
Thermal Al2O3
Film/Plasma Properties
Characteristic: Surface Reactions
Analysis: ATR-FTIR
Substrates
| ZnSe |
| Al2O3 |
Notes
| 717 |