Publication Information

Title:
In situ diagnostics for studying gas-surface reactions during thermal and plasma-assisted atomic layer deposition
Type:
Journal
Info:
Journal of Vacuum Science & Technology A 30, 01A158 (2012)
Date:
2011-11-18

Author Information

Name Institution
Vikrant R. RaiColorado School of Mines
Sumit AgarwalColorado School of Mines

Films

Plasma TiO2


Thermal TiO2


Thermal TiO2

Hardware used: Custom


CAS#: 10028-15-6

Film/Plasma Properties

Characteristic: Gas Phase Species
Analysis: OES, Optical Emission Spectroscopy

Characteristic: Surface Reactions
Analysis: ATR-FTIR

Characteristic: Thickness
Analysis: Ellipsometry

Characteristic: Chemical Composition, Impurities
Analysis: FTIR, Fourier Transform InfraRed spectroscopy

Characteristic: Crystallinity, Crystal Structure, Grain Size, Atomic Structure
Analysis: XRD, X-Ray Diffraction

Substrates

Keywords

Plasma vs Thermal Comparison

Notes

651