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Publication Information

Title: In situ diagnostics for studying gas-surface reactions during thermal and plasma-assisted atomic layer deposition

Type: Journal

Info: Journal of Vacuum Science & Technology A 30, 01A158 (2012)

Date: 2011-11-18

DOI: http://dx.doi.org/10.1116/1.3670404

Author Information

Name

Institution

Colorado School of Mines

Colorado School of Mines

Films

Plasma TiO2 using Custom

Deposition Temperature Range N/A

546-68-9

7782-44-7

Thermal TiO2 using Custom

Deposition Temperature Range N/A

546-68-9

7732-18-5

Thermal TiO2 using Custom

Deposition Temperature Range N/A

546-68-9

10028-15-6

Film/Plasma Properties

Characteristic

Analysis

Diagnostic

Gas Phase Species

OES, Optical Emission Spectroscopy

Ocean Optics S2000

Surface Reactions

ATR-FTIR

Nicolet 6700

Thickness

Ellipsometry

J.A. Woollam M-44

Chemical Composition, Impurities

FTIR, Fourier Transform InfraRed spectroscopy

Nicolet 6700

Crystallinity, Crystal Structure, Grain Size, Atomic Structure

XRD, X-Ray Diffraction

Siemens Kristalloflex 810

Substrates

Keywords

Plasma vs Thermal Comparison

Notes

651


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