In situ diagnostics for studying gas-surface reactions during thermal and plasma-assisted atomic layer deposition

Type:
Journal
Info:
Journal of Vacuum Science & Technology A 30, 01A158 (2012)
Date:
2011-11-18
DOI:
http://dx.doi.org/10.1116/1.3670404

Author Information

Name Institution
Vikrant R. RaiColorado School of Mines
Sumit AgarwalColorado School of Mines

Films

Plasma TiO2

Hardware used: Custom
TTIP, titanium(IV) isopropoxide, Ti(O-i-Pr)4
CAS#: 546-68-9
Where to buy precursor
O2, Oxygen
CAS#: 7782-44-7
Deposition Temperature Range N/A

Thermal TiO2

Hardware used: Custom
TTIP, titanium(IV) isopropoxide, Ti(O-i-Pr)4
CAS#: 546-68-9
Where to buy precursor
H2O, Water
CAS#: 7732-18-5
Deposition Temperature Range N/A

Thermal TiO2

Hardware used: Custom
TTIP, titanium(IV) isopropoxide, Ti(O-i-Pr)4
CAS#: 546-68-9
Where to buy precursor
O3, Ozone
CAS#: 10028-15-6
Deposition Temperature Range N/A

Film/Plasma Properties

Characteristic: Gas Phase Species
Analysis: OES, Optical Emission Spectroscopy
Diagnostic: Ocean Optics S2000

Characteristic: Surface Reactions
Analysis: ATR-FTIR
Diagnostic: Nicolet 6700

Characteristic: Thickness
Analysis: Ellipsometry
Diagnostic: J.A. Woollam M-44

Characteristic: Chemical Composition, Impurities
Analysis: FTIR, Fourier Transform InfraRed spectroscopy
Diagnostic: Nicolet 6700

Characteristic: Crystallinity, Crystal Structure, Grain Size, Atomic Structure
Analysis: XRD, X-Ray Diffraction
Diagnostic: Siemens Kristalloflex 810

Substrates

Notes

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