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Publication Information

Title: Integration of Atomic Layer Deposited Al2O3 Dielectrics with Graphene

Type: Conference Proceedings

Info: Applied Physics of Condensed Matter (APCOM) 2015

Date: 2015-05-15

DOI: http://kf.elf.stuba.sk/~apcom/proceedings/pdf/169_brndiarova.pdf

Author Information

Name

Institution

Slovak Academy of Sciences

Slovak Academy of Sciences

Slovak Academy of Sciences

Slovak Academy of Sciences

Slovak Academy of Sciences

University of Tartu

University of Tartu

Films

Thermal Al2O3 using Beneq TFS-200

Deposition Temperature = 100C

75-24-1

7732-18-5

Thermal Al2O3 using Beneq TFS-200

Deposition Temperature = 100C

75-24-1

10028-15-6

Plasma Al2O3 using Beneq TFS-200

Deposition Temperature = 100C

75-24-1

7782-44-7

Film/Plasma Properties

Characteristic

Analysis

Diagnostic

Raman Spectra

Raman Spectroscopy

Alpha 300R Confocal Raman Microscope

Images

SEM, Scanning Electron Microscopy

Unknown

Thickness

XRR, X-Ray Reflectivity

Bruker D8 Discover

Unknown

EDS, EDX, Energy Dispersive X-ray Spectroscopy

JEOL JSM-7600F

Substrates

Graphene

Keywords

Notes

366


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