Beneq TFS-200 Plasma Enhanced Atomic Layer Deposition Film Publications

Your search for plasma enhanced atomic layer deposition publications using Beneq TFS-200 hardware returned 57 records. If there are too many results, you may want to use the multi-factor search to narrow the results.

1Analog/RF Study of Self-aligned In0.53Ga0.47As MOSFET with Scaled Gate Length
2Atomic Layer Deposition (ALD) grown thin films for ultra-fine pitch pixel detectors
3Atomic layer deposition of Al2O3 on GaSb using in situ hydrogen plasma exposure
4Atomic layer deposition of RuO2 thin films on SiO2 using Ru(EtCp)2 and O2 plasma
5Atomic Layer Deposition of Ultrathin Crystalline Epitaxial Films of V2O5
6Atomic-layer-deposited silver and dielectric nanostructures for plasmonic enhancement of Raman scattering from nanoscale ultrathin films
7Band alignment of atomic layer deposited TiO2/multilayer MoS2 interface determined by x-ray photoelectron spectroscopy
8Conformality of remote plasma-enhanced atomic layer deposition processes: An experimental study
9Degradation of the surface passivation of plasma-assisted ALD Al2O3 under damp-heat exposure
10Demonstration of c-Si Solar Cells With Gallium Oxide Surface Passivation and Laser-Doped Gallium p+ Regions
11Deposition of copper by plasma-enhanced atomic layer deposition using a novel N-Heterocyclic carbene precursor
12Effect of Thermal Annealing on La2O3 Films Grown by Plasma Enhanced Atomic Layer Deposition
13Electron irradiation induced amorphous SiO2 formation at metal oxide/Si interface at room temperature; electron beam writing on interfaces
14Electronic properties of atomic-layer-deposited high-k dielectrics on GaSb(001) with hydrogen plasma pretreatment
15Enhanced photocatalytic performance in atomic layer deposition grown TiO2 thin films via hydrogen plasma treatment
16Gas permeation barriers deposited by atmospheric pressure plasma enhanced atomic layer deposition
17Growing aluminum nitride films by Plasma-Enhanced Atomic Layer Deposition at low temperatures
18Growing c-axis oriented aluminum nitride films by Plasma-Enhanced Atomic Layer Deposition at low temperatures
19Growing oriented AlN films on sapphire substrates by plasma-enhanced atomic layer deposition
20Growth of aluminum nitride films by plasma-enhanced atomic layer deposition
21Impact of the firing step on Al2O3 passivation on p-type Czochralski Si wafers: Electrical and chemical approaches
22Impurity Gettering by Atomic-Layer-Deposited Aluminium Oxide Films on Silicon at Contact Firing Temperatures
23Influence of plasma parameters on the properties of ultrathin Al2O3 films prepared by plasma enhanced atomic layer deposition below 100C for moisture barrier applications
24Integration of Atomic Layer Deposited Al2O3 Dielectrics with Graphene
25Integration of plasmonic Ag nanoparticles as a back reflector in ultra-thin Cu(In,Ga)Se2 solar cells
26Investigation of field-effect passivation and interface state parameters at the Al2O3/Si interface
27Investigation of residual chlorine in TiO2 films grown by Atomic Layer Deposition
28Large-area plasmonic hot-spot arrays: sub-2 nm interparticle separations with plasma-enhanced atomic layer deposition of Ag on periodic arrays of Si nanopillars
29Low temperature temporal and spatial atomic layer deposition of TiO2 films
30Low-Temperature Plasma-Enhanced Atomic Layer Deposition of SiO2 Using Carbon Dioxide
31MANOS performance dependence on ALD Al2O3 oxidation source
32Modal properties of a strip-loaded horizontal slot waveguide
33MOS Capacitance Measurements for PEALD TiO2 Dielectric Films Grown under Different Conditions and the Impact of Al2O3 Partial-Monolayer Insertion
34Nitride passivation of the interface between high-k dielectrics and SiGe
35Optical properties and bandgap evolution of ALD HfSiOx films
36Optimization of the Silver Nanoparticles PEALD Process on the Surface of 1-D Titania Coatings
37Plasma enhanced atomic layer deposition of gallium oxide on crystalline silicon: demonstration of surface passivation and negative interfacial charge
38Plasma-Enhanced Atomic Layer Deposition of Silver Thin Films
39Plasma-Modified Atomic Layer Deposition
40Preparation of Lithium Containing Oxides by the Solid State Reaction of Atomic Layer Deposited Thin Films
41Prevention of spontaneous combustion of cellulose with a thin protective Al2O3 coating formed by atomic layer deposition
42Relationships among growth mechanism, structure and morphology of PEALD TiO2 films: the influence of O2 plasma power, precursor chemistry and plasma exposure mode
43Residual chlorine in TiO2 films grown at low temperatures by plasma enhanced atomic layer deposition
44Resistive switching in HfO2-based atomic layer deposition grown metal-insulator-metal structures
45Room-temperature plasma-enhanced atomic layer deposition of ZnO: Film growth dependence on the PEALD reactor configuration
46Ru Thin Film Formation Using Oxygen Plasma Enhanced ALD and Rapid Thermal Processing
47Self Assembled Metamaterials Formed via Plasma Enhanced ALD of Ag Thin Films
48Silicon Surface Passivation by Gallium Oxide Capped With Silicon Nitride
49Simple silicon solar cells featuring an a-Si:H enhanced rear MIS contact
50Spoof-like plasmonic behavior of plasma enhanced atomic layer deposition grown Ag thin films
51Surface-enhanced gallium arsenide photonic resonator with a quality factor of six million
52The Influence of Technology and Switching Parameters on Resistive Switching Behavior of Pt/HfO2/TiN MIM Structures
53The α and γ plasma modes in plasma-enhanced atomic layer deposition with O2-N2 capacitive discharges
54Thermal and plasma enhanced atomic layer deposition of SiO2 using commercial silicon precursors
55Tribological properties of thin films made by atomic layer deposition sliding against silicon
56Tunable Electrical Properties of Vanadium Oxide by Hydrogen-Plasma-Treated Atomic Layer Deposition
57Tuning the nanoscale morphology and optical properties of porous gold nanoparticles by surface passivation and annealing