Beneq TFS-200 Plasma Enhanced Atomic Layer Deposition Film Publications

Your search for plasma enhanced atomic layer deposition publications using Beneq TFS-200 hardware returned 67 records. If there are too many results, you may want to use the multi-factor search to narrow the results.

1Atomic layer deposition of RuO2 thin films on SiO2 using Ru(EtCp)2 and O2 plasma
2Nitride passivation of the interface between high-k dielectrics and SiGe
3Self Assembled Metamaterials Formed via Plasma Enhanced ALD of Ag Thin Films
4Ni80Fe20 nanotubes with optimized spintronic functionalities prepared by atomic layer deposition
5Residual chlorine in TiO2 films grown at low temperatures by plasma enhanced atomic layer deposition
6MOS Capacitance Measurements for PEALD TiO2 Dielectric Films Grown under Different Conditions and the Impact of Al2O3 Partial-Monolayer Insertion
7Enhanced photocatalytic performance in atomic layer deposition grown TiO2 thin films via hydrogen plasma treatment
8Prevention of spontaneous combustion of cellulose with a thin protective Al2O3 coating formed by atomic layer deposition
9Atomic-layer-deposited silver and dielectric nanostructures for plasmonic enhancement of Raman scattering from nanoscale ultrathin films
10Electron irradiation induced amorphous SiO2 formation at metal oxide/Si interface at room temperature; electron beam writing on interfaces
11Low temperature temporal and spatial atomic layer deposition of TiO2 films
12Spoof-like plasmonic behavior of plasma enhanced atomic layer deposition grown Ag thin films
13Large-Scale Deposition and Growth Mechanism of Silver Nanoparticles by Plasma-Enhanced Atomic Layer Deposition
14Effect of Plasma-Enhanced Atomic Layer Deposition on Oxygen Overabundance and Its Influence on the Morphological, Optical, Structural, and Mechanical Properties of Al-Doped TiO2 Coating
15Surface-enhanced gallium arsenide photonic resonator with a quality factor of six million
16Room-temperature plasma-enhanced atomic layer deposition of ZnO: Film growth dependence on the PEALD reactor configuration
17Influence of plasma parameters on the properties of ultrathin Al2O3 films prepared by plasma enhanced atomic layer deposition below 100C for moisture barrier applications
18Conformality of remote plasma-enhanced atomic layer deposition processes: An experimental study
19MANOS performance dependence on ALD Al2O3 oxidation source
20Growth of aluminum nitride films by plasma-enhanced atomic layer deposition
21Atomic layer deposition of Al2O3 on GaSb using in situ hydrogen plasma exposure
22Simple silicon solar cells featuring an a-Si:H enhanced rear MIS contact
23The Influence of Technology and Switching Parameters on Resistive Switching Behavior of Pt/HfO2/TiN MIM Structures
24Chemical, optical, and electrical characterization of Ga2O3 thin films grown by plasma-enhanced atomic layer deposition
25Integration of Atomic Layer Deposited Al2O3 Dielectrics with Graphene
26Optical properties and bandgap evolution of ALD HfSiOx films
27The α and γ plasma modes in plasma-enhanced atomic layer deposition with O2-N2 capacitive discharges
28Thermal and plasma enhanced atomic layer deposition of SiO2 using commercial silicon precursors
29A film-texture driven piezoelectricity of AlN thin films grown at low temperatures by plasma-enhanced atomic layer deposition
30Gas permeation barriers deposited by atmospheric pressure plasma enhanced atomic layer deposition
31Relationships among growth mechanism, structure and morphology of PEALD TiO2 films: the influence of O2 plasma power, precursor chemistry and plasma exposure mode
32Systematic Study of the SiOx Film with Different Stoichiometry by Plasma-Enhanced Atomic Layer Deposition and Its Application in SiOx/SiO2 Super-Lattice
33Modal properties of a strip-loaded horizontal slot waveguide
34Growing aluminum nitride films by Plasma-Enhanced Atomic Layer Deposition at low temperatures
35Plasma enhanced atomic layer deposition of gallium oxide on crystalline silicon: demonstration of surface passivation and negative interfacial charge
36Plasma-Modified Atomic Layer Deposition
37Preparation of Lithium Containing Oxides by the Solid State Reaction of Atomic Layer Deposited Thin Films
38Atomic Layer Deposition (ALD) grown thin films for ultra-fine pitch pixel detectors
39Tunable Electrical Properties of Vanadium Oxide by Hydrogen-Plasma-Treated Atomic Layer Deposition
40Investigation of field-effect passivation and interface state parameters at the Al2O3/Si interface
41Residual stress study of thin films deposited by atomic layer deposition
42Analog/RF Study of Self-aligned In0.53Ga0.47As MOSFET with Scaled Gate Length
43Effect of Thermal Annealing on La2O3 Films Grown by Plasma Enhanced Atomic Layer Deposition
44Deposition of copper by plasma-enhanced atomic layer deposition using a novel N-Heterocyclic carbene precursor
45Impurity Gettering by Atomic-Layer-Deposited Aluminium Oxide Films on Silicon at Contact Firing Temperatures
46Resistive switching in HfO2-based atomic layer deposition grown metal-insulator-metal structures
47Growing oriented AlN films on sapphire substrates by plasma-enhanced atomic layer deposition
48Tuning the nanoscale morphology and optical properties of porous gold nanoparticles by surface passivation and annealing
49Demonstration of c-Si Solar Cells With Gallium Oxide Surface Passivation and Laser-Doped Gallium p+ Regions
50Plasma-Enhanced Atomic Layer Deposition of Silver Thin Films
51Plasma-Enhanced Atomic Layer Deposition of Nickel Nanotubes with Low Resistivity and Coherent Magnetization Dynamics for 3D Spintronics
52Atomic Layer Deposition of Ultrathin Crystalline Epitaxial Films of V2O5
53Low-Temperature Plasma-Enhanced Atomic Layer Deposition of SiO2 Using Carbon Dioxide
54Optimization of the Silver Nanoparticles PEALD Process on the Surface of 1-D Titania Coatings
55Investigation of residual chlorine in TiO2 films grown by Atomic Layer Deposition
56Tribological properties of thin films made by atomic layer deposition sliding against silicon
57Growing c-axis oriented aluminum nitride films by Plasma-Enhanced Atomic Layer Deposition at low temperatures
58Electronic properties of atomic-layer-deposited high-k dielectrics on GaSb(001) with hydrogen plasma pretreatment
59Integration of plasmonic Ag nanoparticles as a back reflector in ultra-thin Cu(In,Ga)Se2 solar cells
60Silicon Surface Passivation by Gallium Oxide Capped With Silicon Nitride
61Degradation of the surface passivation of plasma-assisted ALD Al2O3 under damp-heat exposure
62Atomic scale surface modification of TiO2 3D nano-arrays: plasma enhanced atomic layer deposition of NiO for photocatalysis
63Ru Thin Film Formation Using Oxygen Plasma Enhanced ALD and Rapid Thermal Processing
64In Situ Hydrogen Plasma Exposure for Varying the Stoichiometry of Atomic Layer Deposited Niobium Oxide Films for Use in Neuromorphic Computing Applications
65Large-area plasmonic hot-spot arrays: sub-2 nm interparticle separations with plasma-enhanced atomic layer deposition of Ag on periodic arrays of Si nanopillars
66Band alignment of atomic layer deposited TiO2/multilayer MoS2 interface determined by x-ray photoelectron spectroscopy
67Impact of the firing step on Al2O3 passivation on p-type Czochralski Si wafers: Electrical and chemical approaches