Beneq TFS-200 Plasma Enhanced Atomic Layer Deposition Film Publications

Your search for plasma enhanced atomic layer deposition publications using Beneq TFS-200 hardware returned 64 records. If there are too many results, you may want to use the multi-factor search to narrow the results.

NumberTitle
1A film-texture driven piezoelectricity of AlN thin films grown at low temperatures by plasma-enhanced atomic layer deposition
2Analog/RF Study of Self-aligned In0.53Ga0.47As MOSFET with Scaled Gate Length
3Atomic Layer Deposition (ALD) grown thin films for ultra-fine pitch pixel detectors
4Atomic layer deposition of Al2O3 on GaSb using in situ hydrogen plasma exposure
5Atomic layer deposition of RuO2 thin films on SiO2 using Ru(EtCp)2 and O2 plasma
6Atomic Layer Deposition of Ultrathin Crystalline Epitaxial Films of V2O5
7Atomic scale surface modification of TiO2 3D nano-arrays: plasma enhanced atomic layer deposition of NiO for photocatalysis
8Atomic-layer-deposited silver and dielectric nanostructures for plasmonic enhancement of Raman scattering from nanoscale ultrathin films
9Band alignment of atomic layer deposited TiO2/multilayer MoS2 interface determined by x-ray photoelectron spectroscopy
10Chemical, optical, and electrical characterization of Ga2O3 thin films grown by plasma-enhanced atomic layer deposition
11Conformality of remote plasma-enhanced atomic layer deposition processes: An experimental study
12Degradation of the surface passivation of plasma-assisted ALD Al2O3 under damp-heat exposure
13Demonstration of c-Si Solar Cells With Gallium Oxide Surface Passivation and Laser-Doped Gallium p+ Regions
14Deposition of copper by plasma-enhanced atomic layer deposition using a novel N-Heterocyclic carbene precursor
15Effect of Plasma-Enhanced Atomic Layer Deposition on Oxygen Overabundance and Its Influence on the Morphological, Optical, Structural, and Mechanical Properties of Al-Doped TiO2 Coating
16Effect of Thermal Annealing on La2O3 Films Grown by Plasma Enhanced Atomic Layer Deposition
17Electron irradiation induced amorphous SiO2 formation at metal oxide/Si interface at room temperature; electron beam writing on interfaces
18Electronic properties of atomic-layer-deposited high-k dielectrics on GaSb(001) with hydrogen plasma pretreatment
19Enhanced photocatalytic performance in atomic layer deposition grown TiO2 thin films via hydrogen plasma treatment
20Gas permeation barriers deposited by atmospheric pressure plasma enhanced atomic layer deposition
21Growing aluminum nitride films by Plasma-Enhanced Atomic Layer Deposition at low temperatures
22Growing c-axis oriented aluminum nitride films by Plasma-Enhanced Atomic Layer Deposition at low temperatures
23Growing oriented AlN films on sapphire substrates by plasma-enhanced atomic layer deposition
24Growth of aluminum nitride films by plasma-enhanced atomic layer deposition
25Impact of the firing step on Al2O3 passivation on p-type Czochralski Si wafers: Electrical and chemical approaches
26Impurity Gettering by Atomic-Layer-Deposited Aluminium Oxide Films on Silicon at Contact Firing Temperatures
27Influence of plasma parameters on the properties of ultrathin Al2O3 films prepared by plasma enhanced atomic layer deposition below 100C for moisture barrier applications
28Integration of Atomic Layer Deposited Al2O3 Dielectrics with Graphene
29Integration of plasmonic Ag nanoparticles as a back reflector in ultra-thin Cu(In,Ga)Se2 solar cells
30Investigation of field-effect passivation and interface state parameters at the Al2O3/Si interface
31Investigation of residual chlorine in TiO2 films grown by Atomic Layer Deposition
32Large-area plasmonic hot-spot arrays: sub-2 nm interparticle separations with plasma-enhanced atomic layer deposition of Ag on periodic arrays of Si nanopillars
33Low temperature temporal and spatial atomic layer deposition of TiO2 films
34Low-Temperature Plasma-Enhanced Atomic Layer Deposition of SiO2 Using Carbon Dioxide
35MANOS performance dependence on ALD Al2O3 oxidation source
36Modal properties of a strip-loaded horizontal slot waveguide
37MOS Capacitance Measurements for PEALD TiO2 Dielectric Films Grown under Different Conditions and the Impact of Al2O3 Partial-Monolayer Insertion
38Ni80Fe20 nanotubes with optimized spintronic functionalities prepared by atomic layer deposition
39Nitride passivation of the interface between high-k dielectrics and SiGe
40Optical properties and bandgap evolution of ALD HfSiOx films
41Optimization of the Silver Nanoparticles PEALD Process on the Surface of 1-D Titania Coatings
42Plasma enhanced atomic layer deposition of gallium oxide on crystalline silicon: demonstration of surface passivation and negative interfacial charge
43Plasma-Enhanced Atomic Layer Deposition of Nickel Nanotubes with Low Resistivity and Coherent Magnetization Dynamics for 3D Spintronics
44Plasma-Enhanced Atomic Layer Deposition of Silver Thin Films
45Plasma-Modified Atomic Layer Deposition
46Preparation of Lithium Containing Oxides by the Solid State Reaction of Atomic Layer Deposited Thin Films
47Prevention of spontaneous combustion of cellulose with a thin protective Al2O3 coating formed by atomic layer deposition
48Relationships among growth mechanism, structure and morphology of PEALD TiO2 films: the influence of O2 plasma power, precursor chemistry and plasma exposure mode
49Residual chlorine in TiO2 films grown at low temperatures by plasma enhanced atomic layer deposition
50Resistive switching in HfO2-based atomic layer deposition grown metal-insulator-metal structures
51Room-temperature plasma-enhanced atomic layer deposition of ZnO: Film growth dependence on the PEALD reactor configuration
52Ru Thin Film Formation Using Oxygen Plasma Enhanced ALD and Rapid Thermal Processing
53Self Assembled Metamaterials Formed via Plasma Enhanced ALD of Ag Thin Films
54Silicon Surface Passivation by Gallium Oxide Capped With Silicon Nitride
55Simple silicon solar cells featuring an a-Si:H enhanced rear MIS contact
56Spoof-like plasmonic behavior of plasma enhanced atomic layer deposition grown Ag thin films
57Surface-enhanced gallium arsenide photonic resonator with a quality factor of six million
58Systematic Study of the SiOx Film with Different Stoichiometry by Plasma-Enhanced Atomic Layer Deposition and Its Application in SiOx/SiO2 Super-Lattice
59The Influence of Technology and Switching Parameters on Resistive Switching Behavior of Pt/HfO2/TiN MIM Structures
60The α and γ plasma modes in plasma-enhanced atomic layer deposition with O2-N2 capacitive discharges
61Thermal and plasma enhanced atomic layer deposition of SiO2 using commercial silicon precursors
62Tribological properties of thin films made by atomic layer deposition sliding against silicon
63Tunable Electrical Properties of Vanadium Oxide by Hydrogen-Plasma-Treated Atomic Layer Deposition
64Tuning the nanoscale morphology and optical properties of porous gold nanoparticles by surface passivation and annealing