Beneq TFS-200 Plasma Enhanced Atomic Layer Deposition Film Publications

Your search for plasma enhanced atomic layer deposition publications using Beneq TFS-200 hardware returned 67 records. If there are too many results, you may want to use the multi-factor search to narrow the results.

NumberTitle
1Relationships among growth mechanism, structure and morphology of PEALD TiO2 films: the influence of O2 plasma power, precursor chemistry and plasma exposure mode
2Gas permeation barriers deposited by atmospheric pressure plasma enhanced atomic layer deposition
3Integration of plasmonic Ag nanoparticles as a back reflector in ultra-thin Cu(In,Ga)Se2 solar cells
4Room-temperature plasma-enhanced atomic layer deposition of ZnO: Film growth dependence on the PEALD reactor configuration
5Atomic layer deposition of Al2O3 on GaSb using in situ hydrogen plasma exposure
6Large-Scale Deposition and Growth Mechanism of Silver Nanoparticles by Plasma-Enhanced Atomic Layer Deposition
7Conformality of remote plasma-enhanced atomic layer deposition processes: An experimental study
8Modal properties of a strip-loaded horizontal slot waveguide
9Impact of the firing step on Al2O3 passivation on p-type Czochralski Si wafers: Electrical and chemical approaches
10Chemical, optical, and electrical characterization of Ga2O3 thin films grown by plasma-enhanced atomic layer deposition
11Preparation of Lithium Containing Oxides by the Solid State Reaction of Atomic Layer Deposited Thin Films
12Large-area plasmonic hot-spot arrays: sub-2 nm interparticle separations with plasma-enhanced atomic layer deposition of Ag on periodic arrays of Si nanopillars
13Spoof-like plasmonic behavior of plasma enhanced atomic layer deposition grown Ag thin films
14Plasma enhanced atomic layer deposition of gallium oxide on crystalline silicon: demonstration of surface passivation and negative interfacial charge
15Impurity Gettering by Atomic-Layer-Deposited Aluminium Oxide Films on Silicon at Contact Firing Temperatures
16Degradation of the surface passivation of plasma-assisted ALD Al2O3 under damp-heat exposure
17Plasma-Modified Atomic Layer Deposition
18Integration of Atomic Layer Deposited Al2O3 Dielectrics with Graphene
19Growing aluminum nitride films by Plasma-Enhanced Atomic Layer Deposition at low temperatures
20Analog/RF Study of Self-aligned In0.53Ga0.47As MOSFET with Scaled Gate Length
21Low-Temperature Plasma-Enhanced Atomic Layer Deposition of SiO2 Using Carbon Dioxide
22Resistive switching in HfO2-based atomic layer deposition grown metal-insulator-metal structures
23Tunable Electrical Properties of Vanadium Oxide by Hydrogen-Plasma-Treated Atomic Layer Deposition
24Growing oriented AlN films on sapphire substrates by plasma-enhanced atomic layer deposition
25Deposition of copper by plasma-enhanced atomic layer deposition using a novel N-Heterocyclic carbene precursor
26Tuning the nanoscale morphology and optical properties of porous gold nanoparticles by surface passivation and annealing
27Thermal and plasma enhanced atomic layer deposition of SiO2 using commercial silicon precursors
28Atomic-layer-deposited silver and dielectric nanostructures for plasmonic enhancement of Raman scattering from nanoscale ultrathin films
29Atomic layer deposition of RuO2 thin films on SiO2 using Ru(EtCp)2 and O2 plasma
30Ru Thin Film Formation Using Oxygen Plasma Enhanced ALD and Rapid Thermal Processing
31Plasma-Enhanced Atomic Layer Deposition of Nickel Nanotubes with Low Resistivity and Coherent Magnetization Dynamics for 3D Spintronics
32Silicon Surface Passivation by Gallium Oxide Capped With Silicon Nitride
33Optimization of the Silver Nanoparticles PEALD Process on the Surface of 1-D Titania Coatings
34Growth of aluminum nitride films by plasma-enhanced atomic layer deposition
35Effect of Thermal Annealing on La2O3 Films Grown by Plasma Enhanced Atomic Layer Deposition
36Ni80Fe20 nanotubes with optimized spintronic functionalities prepared by atomic layer deposition
37Nitride passivation of the interface between high-k dielectrics and SiGe
38Influence of plasma parameters on the properties of ultrathin Al2O3 films prepared by plasma enhanced atomic layer deposition below 100C for moisture barrier applications
39Surface-enhanced gallium arsenide photonic resonator with a quality factor of six million
40Systematic Study of the SiOx Film with Different Stoichiometry by Plasma-Enhanced Atomic Layer Deposition and Its Application in SiOx/SiO2 Super-Lattice
41Growing c-axis oriented aluminum nitride films by Plasma-Enhanced Atomic Layer Deposition at low temperatures
42A film-texture driven piezoelectricity of AlN thin films grown at low temperatures by plasma-enhanced atomic layer deposition
43Prevention of spontaneous combustion of cellulose with a thin protective Al2O3 coating formed by atomic layer deposition
44Optical properties and bandgap evolution of ALD HfSiOx films
45Demonstration of c-Si Solar Cells With Gallium Oxide Surface Passivation and Laser-Doped Gallium p+ Regions
46Band alignment of atomic layer deposited TiO2/multilayer MoS2 interface determined by x-ray photoelectron spectroscopy
47MOS Capacitance Measurements for PEALD TiO2 Dielectric Films Grown under Different Conditions and the Impact of Al2O3 Partial-Monolayer Insertion
48Electronic properties of atomic-layer-deposited high-k dielectrics on GaSb(001) with hydrogen plasma pretreatment
49Electron irradiation induced amorphous SiO2 formation at metal oxide/Si interface at room temperature; electron beam writing on interfaces
50Investigation of field-effect passivation and interface state parameters at the Al2O3/Si interface
51In Situ Hydrogen Plasma Exposure for Varying the Stoichiometry of Atomic Layer Deposited Niobium Oxide Films for Use in Neuromorphic Computing Applications
52Residual stress study of thin films deposited by atomic layer deposition
53Atomic Layer Deposition (ALD) grown thin films for ultra-fine pitch pixel detectors
54Effect of Plasma-Enhanced Atomic Layer Deposition on Oxygen Overabundance and Its Influence on the Morphological, Optical, Structural, and Mechanical Properties of Al-Doped TiO2 Coating
55Atomic scale surface modification of TiO2 3D nano-arrays: plasma enhanced atomic layer deposition of NiO for photocatalysis
56The α and γ plasma modes in plasma-enhanced atomic layer deposition with O2-N2 capacitive discharges
57Simple silicon solar cells featuring an a-Si:H enhanced rear MIS contact
58Atomic Layer Deposition of Ultrathin Crystalline Epitaxial Films of V2O5
59Residual chlorine in TiO2 films grown at low temperatures by plasma enhanced atomic layer deposition
60Self Assembled Metamaterials Formed via Plasma Enhanced ALD of Ag Thin Films
61Tribological properties of thin films made by atomic layer deposition sliding against silicon
62Plasma-Enhanced Atomic Layer Deposition of Silver Thin Films
63The Influence of Technology and Switching Parameters on Resistive Switching Behavior of Pt/HfO2/TiN MIM Structures
64MANOS performance dependence on ALD Al2O3 oxidation source
65Investigation of residual chlorine in TiO2 films grown by Atomic Layer Deposition
66Low temperature temporal and spatial atomic layer deposition of TiO2 films
67Enhanced photocatalytic performance in atomic layer deposition grown TiO2 thin films via hydrogen plasma treatment