| 1 | Analog/RF Study of Self-aligned In0.53Ga0.47As MOSFET with Scaled Gate Length |
| 2 | Silicon Surface Passivation by Gallium Oxide Capped With Silicon Nitride |
| 3 | Effect of Thermal Annealing on La2O3 Films Grown by Plasma Enhanced Atomic Layer Deposition |
| 4 | Deposition of copper by plasma-enhanced atomic layer deposition using a novel N-Heterocyclic carbene precursor |
| 5 | Atomic Layer Deposition (ALD) grown thin films for ultra-fine pitch pixel detectors |
| 6 | Impact of the firing step on Al2O3 passivation on p-type Czochralski Si wafers: Electrical and chemical approaches |
| 7 | Growing oriented AlN films on sapphire substrates by plasma-enhanced atomic layer deposition |
| 8 | Impurity Gettering by Atomic-Layer-Deposited Aluminium Oxide Films on Silicon at Contact Firing Temperatures |
| 9 | Effect of Plasma-Enhanced Atomic Layer Deposition on Oxygen Overabundance and Its Influence on the Morphological, Optical, Structural, and Mechanical Properties of Al-Doped TiO2 Coating |
| 10 | Integration of plasmonic Ag nanoparticles as a back reflector in ultra-thin Cu(In,Ga)Se2 solar cells |
| 11 | MOS Capacitance Measurements for PEALD TiO2 Dielectric Films Grown under Different Conditions and the Impact of Al2O3 Partial-Monolayer Insertion |
| 12 | Demonstration of c-Si Solar Cells With Gallium Oxide Surface Passivation and Laser-Doped Gallium p+ Regions |
| 13 | Modal properties of a strip-loaded horizontal slot waveguide |
| 14 | Ru Thin Film Formation Using Oxygen Plasma Enhanced ALD and Rapid Thermal Processing |
| 15 | Integration of Atomic Layer Deposited Al2O3 Dielectrics with Graphene |
| 16 | Systematic Study of the SiOx Film with Different Stoichiometry by Plasma-Enhanced Atomic Layer Deposition and Its Application in SiOx/SiO2 Super-Lattice |
| 17 | Thermal and plasma enhanced atomic layer deposition of SiO2 using commercial silicon precursors |
| 18 | Self Assembled Metamaterials Formed via Plasma Enhanced ALD of Ag Thin Films |
| 19 | Low-Temperature Plasma-Enhanced Atomic Layer Deposition of SiO2 Using Carbon Dioxide |
| 20 | The Influence of Technology and Switching Parameters on Resistive Switching Behavior of Pt/HfO2/TiN MIM Structures |
| 21 | Degradation of the surface passivation of plasma-assisted ALD Al2O3 under damp-heat exposure |
| 22 | Investigation of field-effect passivation and interface state parameters at the Al2O3/Si interface |
| 23 | Enhanced photocatalytic performance in atomic layer deposition grown TiO2 thin films via hydrogen plasma treatment |
| 24 | Chemical, optical, and electrical characterization of Ga2O3 thin films grown by plasma-enhanced atomic layer deposition |
| 25 | Atomic-layer-deposited silver and dielectric nanostructures for plasmonic enhancement of Raman scattering from nanoscale ultrathin films |
| 26 | Surface-enhanced gallium arsenide photonic resonator with a quality factor of six million |
| 27 | Atomic layer deposition of Al2O3 on GaSb using in situ hydrogen plasma exposure |
| 28 | In Situ Hydrogen Plasma Exposure for Varying the Stoichiometry of Atomic Layer Deposited Niobium Oxide Films for Use in Neuromorphic Computing Applications |
| 29 | Tuning the nanoscale morphology and optical properties of porous gold nanoparticles by surface passivation and annealing |
| 30 | The α and γ plasma modes in plasma-enhanced atomic layer deposition with O2-N2 capacitive discharges |
| 31 | Preparation of Lithium Containing Oxides by the Solid State Reaction of Atomic Layer Deposited Thin Films |
| 32 | Spoof-like plasmonic behavior of plasma enhanced atomic layer deposition grown Ag thin films |
| 33 | Room-temperature plasma-enhanced atomic layer deposition of ZnO: Film growth dependence on the PEALD reactor configuration |
| 34 | Growing aluminum nitride films by Plasma-Enhanced Atomic Layer Deposition at low temperatures |
| 35 | A film-texture driven piezoelectricity of AlN thin films grown at low temperatures by plasma-enhanced atomic layer deposition |
| 36 | Thermomechanical properties of aluminum oxide thin films made by atomic layer deposition |
| 37 | Electron irradiation induced amorphous SiO2 formation at metal oxide/Si interface at room temperature; electron beam writing on interfaces |
| 38 | Growth of aluminum nitride films by plasma-enhanced atomic layer deposition |
| 39 | Atomic Layer Deposition of Ultrathin Crystalline Epitaxial Films of V2O5 |
| 40 | Residual chlorine in TiO2 films grown at low temperatures by plasma enhanced atomic layer deposition |
| 41 | Atomic scale surface modification of TiO2 3D nano-arrays: plasma enhanced atomic layer deposition of NiO for photocatalysis |
| 42 | Plasma-Enhanced Atomic Layer Deposition of Nickel Nanotubes with Low Resistivity and Coherent Magnetization Dynamics for 3D Spintronics |
| 43 | Atomic layer deposition of RuO2 thin films on SiO2 using Ru(EtCp)2 and O2 plasma |
| 44 | Optimization of the Silver Nanoparticles PEALD Process on the Surface of 1-D Titania Coatings |
| 45 | Large-area plasmonic hot-spot arrays: sub-2 nm interparticle separations with plasma-enhanced atomic layer deposition of Ag on periodic arrays of Si nanopillars |
| 46 | Plasma enhanced atomic layer deposition of gallium oxide on crystalline silicon: demonstration of surface passivation and negative interfacial charge |
| 47 | Ni80Fe20 nanotubes with optimized spintronic functionalities prepared by atomic layer deposition |
| 48 | Prevention of spontaneous combustion of cellulose with a thin protective Al2O3 coating formed by atomic layer deposition |
| 49 | ALD and PEALD deposition of HfO2 and its effects on the nature of oxygen vacancies |
| 50 | Optical properties and bandgap evolution of ALD HfSiOx films |
| 51 | Tribological properties of thin films made by atomic layer deposition sliding against silicon |
| 52 | Electronic properties of atomic-layer-deposited high-k dielectrics on GaSb(001) with hydrogen plasma pretreatment |
| 53 | Plasma-Enhanced Atomic Layer Deposition of Silver Thin Films |
| 54 | Nitride passivation of the interface between high-k dielectrics and SiGe |
| 55 | Conformality of remote plasma-enhanced atomic layer deposition processes: An experimental study |
| 56 | Relationships among growth mechanism, structure and morphology of PEALD TiO2 films: the influence of O2 plasma power, precursor chemistry and plasma exposure mode |
| 57 | Resistive switching in HfO2-based atomic layer deposition grown metal-insulator-metal structures |
| 58 | Large-Scale Deposition and Growth Mechanism of Silver Nanoparticles by Plasma-Enhanced Atomic Layer Deposition |
| 59 | Tunable Electrical Properties of Vanadium Oxide by Hydrogen-Plasma-Treated Atomic Layer Deposition |
| 60 | Influence of plasma parameters on the properties of ultrathin Al2O3 films prepared by plasma enhanced atomic layer deposition below 100C for moisture barrier applications |
| 61 | Low temperature temporal and spatial atomic layer deposition of TiO2 films |
| 62 | Plasma-Modified Atomic Layer Deposition |
| 63 | Simple silicon solar cells featuring an a-Si:H enhanced rear MIS contact |
| 64 | Gas permeation barriers deposited by atmospheric pressure plasma enhanced atomic layer deposition |
| 65 | Growing c-axis oriented aluminum nitride films by Plasma-Enhanced Atomic Layer Deposition at low temperatures |
| 66 | MANOS performance dependence on ALD Al2O3 oxidation source |
| 67 | Residual stress study of thin films deposited by atomic layer deposition |
| 68 | Investigation of residual chlorine in TiO2 films grown by Atomic Layer Deposition |
| 69 | Band alignment of atomic layer deposited TiO2/multilayer MoS2 interface determined by x-ray photoelectron spectroscopy |
