Beneq TFS-200 Plasma Enhanced Atomic Layer Deposition Film Publications

Your search for plasma enhanced atomic layer deposition publications using Beneq TFS-200 hardware returned 69 records. If there are too many results, you may want to use the multi-factor search to narrow the results.

NumberTitle
1Investigation of residual chlorine in TiO2 films grown by Atomic Layer Deposition
2Large-Scale Deposition and Growth Mechanism of Silver Nanoparticles by Plasma-Enhanced Atomic Layer Deposition
3Analog/RF Study of Self-aligned In0.53Ga0.47As MOSFET with Scaled Gate Length
4Plasma enhanced atomic layer deposition of gallium oxide on crystalline silicon: demonstration of surface passivation and negative interfacial charge
5Optimization of the Silver Nanoparticles PEALD Process on the Surface of 1-D Titania Coatings
6Systematic Study of the SiOx Film with Different Stoichiometry by Plasma-Enhanced Atomic Layer Deposition and Its Application in SiOx/SiO2 Super-Lattice
7Band alignment of atomic layer deposited TiO2/multilayer MoS2 interface determined by x-ray photoelectron spectroscopy
8Electronic properties of atomic-layer-deposited high-k dielectrics on GaSb(001) with hydrogen plasma pretreatment
9Spoof-like plasmonic behavior of plasma enhanced atomic layer deposition grown Ag thin films
10Low-Temperature Plasma-Enhanced Atomic Layer Deposition of SiO2 Using Carbon Dioxide
11Silicon Surface Passivation by Gallium Oxide Capped With Silicon Nitride
12Atomic layer deposition of Al2O3 on GaSb using in situ hydrogen plasma exposure
13Low temperature temporal and spatial atomic layer deposition of TiO2 films
14Integration of plasmonic Ag nanoparticles as a back reflector in ultra-thin Cu(In,Ga)Se2 solar cells
15Residual chlorine in TiO2 films grown at low temperatures by plasma enhanced atomic layer deposition
16Impact of the firing step on Al2O3 passivation on p-type Czochralski Si wafers: Electrical and chemical approaches
17Gas permeation barriers deposited by atmospheric pressure plasma enhanced atomic layer deposition
18Tunable Electrical Properties of Vanadium Oxide by Hydrogen-Plasma-Treated Atomic Layer Deposition
19Impurity Gettering by Atomic-Layer-Deposited Aluminium Oxide Films on Silicon at Contact Firing Temperatures
20Resistive switching in HfO2-based atomic layer deposition grown metal-insulator-metal structures
21MANOS performance dependence on ALD Al2O3 oxidation source
22Optical properties and bandgap evolution of ALD HfSiOx films
23Thermomechanical properties of aluminum oxide thin films made by atomic layer deposition
24Nitride passivation of the interface between high-k dielectrics and SiGe
25Investigation of field-effect passivation and interface state parameters at the Al2O3/Si interface
26Growing c-axis oriented aluminum nitride films by Plasma-Enhanced Atomic Layer Deposition at low temperatures
27Growing oriented AlN films on sapphire substrates by plasma-enhanced atomic layer deposition
28Relationships among growth mechanism, structure and morphology of PEALD TiO2 films: the influence of O2 plasma power, precursor chemistry and plasma exposure mode
29Residual stress study of thin films deposited by atomic layer deposition
30Preparation of Lithium Containing Oxides by the Solid State Reaction of Atomic Layer Deposited Thin Films
31Growing aluminum nitride films by Plasma-Enhanced Atomic Layer Deposition at low temperatures
32Tuning the nanoscale morphology and optical properties of porous gold nanoparticles by surface passivation and annealing
33Effect of Thermal Annealing on La2O3 Films Grown by Plasma Enhanced Atomic Layer Deposition
34Plasma-Enhanced Atomic Layer Deposition of Silver Thin Films
35Prevention of spontaneous combustion of cellulose with a thin protective Al2O3 coating formed by atomic layer deposition
36Chemical, optical, and electrical characterization of Ga2O3 thin films grown by plasma-enhanced atomic layer deposition
37Atomic scale surface modification of TiO2 3D nano-arrays: plasma enhanced atomic layer deposition of NiO for photocatalysis
38Effect of Plasma-Enhanced Atomic Layer Deposition on Oxygen Overabundance and Its Influence on the Morphological, Optical, Structural, and Mechanical Properties of Al-Doped TiO2 Coating
39Atomic Layer Deposition (ALD) grown thin films for ultra-fine pitch pixel detectors
40Degradation of the surface passivation of plasma-assisted ALD Al2O3 under damp-heat exposure
41Ru Thin Film Formation Using Oxygen Plasma Enhanced ALD and Rapid Thermal Processing
42Electron irradiation induced amorphous SiO2 formation at metal oxide/Si interface at room temperature; electron beam writing on interfaces
43In Situ Hydrogen Plasma Exposure for Varying the Stoichiometry of Atomic Layer Deposited Niobium Oxide Films for Use in Neuromorphic Computing Applications
44Growth of aluminum nitride films by plasma-enhanced atomic layer deposition
45Influence of plasma parameters on the properties of ultrathin Al2O3 films prepared by plasma enhanced atomic layer deposition below 100C for moisture barrier applications
46Enhanced photocatalytic performance in atomic layer deposition grown TiO2 thin films via hydrogen plasma treatment
47Thermal and plasma enhanced atomic layer deposition of SiO2 using commercial silicon precursors
48Plasma-Modified Atomic Layer Deposition
49Self Assembled Metamaterials Formed via Plasma Enhanced ALD of Ag Thin Films
50Integration of Atomic Layer Deposited Al2O3 Dielectrics with Graphene
51Plasma-Enhanced Atomic Layer Deposition of Nickel Nanotubes with Low Resistivity and Coherent Magnetization Dynamics for 3D Spintronics
52Room-temperature plasma-enhanced atomic layer deposition of ZnO: Film growth dependence on the PEALD reactor configuration
53A film-texture driven piezoelectricity of AlN thin films grown at low temperatures by plasma-enhanced atomic layer deposition
54Conformality of remote plasma-enhanced atomic layer deposition processes: An experimental study
55Demonstration of c-Si Solar Cells With Gallium Oxide Surface Passivation and Laser-Doped Gallium p+ Regions
56Deposition of copper by plasma-enhanced atomic layer deposition using a novel N-Heterocyclic carbene precursor
57MOS Capacitance Measurements for PEALD TiO2 Dielectric Films Grown under Different Conditions and the Impact of Al2O3 Partial-Monolayer Insertion
58ALD and PEALD deposition of HfO2 and its effects on the nature of oxygen vacancies
59Atomic-layer-deposited silver and dielectric nanostructures for plasmonic enhancement of Raman scattering from nanoscale ultrathin films
60Tribological properties of thin films made by atomic layer deposition sliding against silicon
61Simple silicon solar cells featuring an a-Si:H enhanced rear MIS contact
62The Influence of Technology and Switching Parameters on Resistive Switching Behavior of Pt/HfO2/TiN MIM Structures
63Atomic Layer Deposition of Ultrathin Crystalline Epitaxial Films of V2O5
64Large-area plasmonic hot-spot arrays: sub-2 nm interparticle separations with plasma-enhanced atomic layer deposition of Ag on periodic arrays of Si nanopillars
65Ni80Fe20 nanotubes with optimized spintronic functionalities prepared by atomic layer deposition
66The α and γ plasma modes in plasma-enhanced atomic layer deposition with O2-N2 capacitive discharges
67Modal properties of a strip-loaded horizontal slot waveguide
68Surface-enhanced gallium arsenide photonic resonator with a quality factor of six million
69Atomic layer deposition of RuO2 thin films on SiO2 using Ru(EtCp)2 and O2 plasma