Publication Information

Title:
Influence of plasma parameters on the properties of ultrathin Al2O3 films prepared by plasma enhanced atomic layer deposition below 100C for moisture barrier applications
Type:
Journal
Info:
Japanese Journal of Applied Physics 57, 125502 (2018)
Date:
2018-09-15

Author Information

Name Institution
Zhen ZhuBeneq Oy
Perttu SippolaAalto University
Harri LipsanenAalto University
Hele SavinAalto University
Saoussen MerdesBeneq Oy

Films

Plasma Al2O3


Film/Plasma Properties

Characteristic: Thickness
Analysis: Ellipsometry

Characteristic: Thickness
Analysis: XRR, X-Ray Reflectivity

Characteristic: Chemical Composition, Impurities
Analysis: ATR-FTIR

Characteristic: Water Vapor Transmission Rate (WVTR)
Analysis: Water Vapor Transmission Rate (WVTR)

Substrates

Si(100)
PEN, Polyethylene Napthalate

Keywords

Diffusion Barrier

Notes

1290