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Influence of plasma parameters on the properties of ultrathin Al2O3 films prepared by plasma enhanced atomic layer deposition below 100C for moisture barrier applications
Type:
Journal
Info:
Japanese Journal of Applied Physics 57, 125502 (2018)
Date:
2018-09-15
Author Information
| Name | Institution |
|---|---|
| Zhen Zhu | Beneq Oy |
| Perttu Sippola | Aalto University |
| Harri Lipsanen | Aalto University |
| Hele Savin | Aalto University |
| Saoussen Merdes | Beneq Oy |
Films
Plasma Al2O3
Film/Plasma Properties
Characteristic: Thickness
Analysis: Ellipsometry
Characteristic: Thickness
Analysis: XRR, X-Ray Reflectivity
Characteristic: Chemical Composition, Impurities
Analysis: ATR-FTIR
Characteristic: Water Vapor Transmission Rate (WVTR)
Analysis: Water Vapor Transmission Rate (WVTR)
Substrates
| Si(100) |
| PEN, Polyethylene Napthalate |
Notes
| 1290 |