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Characterization of thin Al2O3/SiO2 dielectric stack for CMOS transistors
Designing Multifunctional Cobalt Oxide Layers for Efficient and Stable Electrochemical Oxygen Evolution
Hierarchical Atomic Layer Deposited V2O5 on 3D Printed Nanocarbon Electrodes for High-Performance Aqueous Zinc-Ion Batteries
Piezoelectric Properties of Zinc Oxide Thin Films Grown by Plasma-Enhanced Atomic Layer Deposition
Experimental and numerical analysis of the effects of ion bombardment in silicon oxide (SiO2) plasma enhanced atomic layer deposition (PEALD) processes
Investigation of field-effect passivation and interface state parameters at the Al2O3/Si interface
Type:
Journal
Info:
27th European Photovoltaic Solar Energy Conference and Exhibition
Date:
2012-09-24
Author Information
| Name | Institution |
|---|---|
| Wensheng Liang | The Australian National University |
| Klaus J. Weber | The Australian National University |
| Dongchul Suh | The Australian National University |
| Yongling Ren | The Australian National University |
Films
Plasma Al2O3
Film/Plasma Properties
Characteristic: Surface Recombination Velocity
Analysis: Corona Charge
Characteristic: Lifetime
Analysis: Lifetime Testing
Characteristic: Capacitance
Analysis: C-V, Capacitance-Voltage Measurements
Characteristic: Interface Trap Density
Analysis: C-V, Capacitance-Voltage Measurements
Characteristic: Flat Band Voltage Shift
Analysis: C-V, Capacitance-Voltage Measurements
Substrates
| Si(100) |
Keywords
| Solar |
Notes
| 1369 |