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An economical, compact inductively coupled plasma source.

Ideal for:
  • Plasma-Enhanced Atomic Layer Deposition
  • Thin Film Etch
  • Surface cleaning
  • Surface modification

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Dongchul Suh Plasma Enhanced Atomic Layer Deposition Film Publications

Your search for plasma enhanced atomic layer deposition publications authored by Dongchul Suh returned 2 record(s). If there are too many results, you may want to use the multi-factor search to narrow the results.

NumberTitle
1Degradation of the surface passivation of plasma-assisted ALD Al2O3 under damp-heat exposure
2Investigation of field-effect passivation and interface state parameters at the Al2O3/Si interface