Atomic scale surface modification of TiO2 3D nano-arrays: plasma enhanced atomic layer deposition of NiO for photocatalysis
Type:
Journal
Info:
Mater. Adv., 2020, DOI: 10.1039/D0MA00666A
Date:
2020-10-03
Author Information
| Name | Institution |
|---|---|
| Jerome W. F. Innocent | University of Bath |
| Mari Napari | University of Cambridge |
| Andrew L. Johnson | University of Bath |
| Thom R. Harris-Lee | University of Bath |
| Miriam Regue | Imperial College London |
| Timo Sajavaara | University of Jyväskylä |
| Judith L. MacManus-Driscoll | University of Cambridge |
| Frank Marken | University of Bath |
| Feras Alkhalil | PragmatIC Printing LLC |
Films
Plasma NiOx
Film/Plasma Properties
Characteristic: Thickness
Analysis: Ellipsometry
Characteristic: Crystallinity, Crystal Structure, Grain Size, Atomic Structure
Analysis: XRD, X-Ray Diffraction
Characteristic: Density
Analysis: XRR, X-Ray Reflectivity
Characteristic: Chemical Composition, Impurities
Analysis: TOF-ERDA, Time-Of-Flight Elastic Recoil Detection Analysis
Characteristic: Chemical Composition, Impurities
Analysis: XPS, X-ray Photoelectron Spectroscopy
Characteristic: Raman Spectra
Analysis: Raman Spectroscopy
Characteristic: Morphology, Roughness, Topography
Analysis: AFM, Atomic Force Microscopy
Characteristic: Band Gap
Analysis: UV-VIS Spectroscopy
Characteristic: Uniformity
Analysis: SEM, Scanning Electron Microscopy
Substrates
| SiO2 |
| TiO2 |
Notes
| 1518 |