Timo Sajavaara Plasma Enhanced Atomic Layer Deposition Film Publications

Your search for plasma enhanced atomic layer deposition publications authored by Timo Sajavaara returned 19 record(s). If there are too many results, you may want to use the multi-factor search to narrow the results.

NumberTitle
1Influence of plasma chemistry on impurity incorporation in AlN prepared by plasma enhanced atomic layer deposition
2Ti Alloyed α-Ga2O3: Route towards Wide Band Gap Engineering
3Radical-Enhanced Atomic Layer Deposition of Metallic Copper Thin Films - Thesis Coverage
4The α and γ plasma modes in plasma-enhanced atomic layer deposition with O2-N2 capacitive discharges
5Tribological properties of thin films made by atomic layer deposition sliding against silicon
6Structural and chemical analysis of annealed plasma-enhanced atomic layer deposition aluminum nitride films
7Room-temperature plasma-enhanced atomic layer deposition of ZnO: Film growth dependence on the PEALD reactor configuration
8A liquid alkoxide precursor for the atomic layer deposition of aluminum oxide films
9Atomic scale surface modification of TiO2 3D nano-arrays: plasma enhanced atomic layer deposition of NiO for photocatalysis
10Comparison of mechanical properties and composition of magnetron sputter and plasma enhanced atomic layer deposition aluminum nitride films
11Properties of AlN grown by plasma enhanced atomic layer deposition
12Atomic layer deposition of AlN from AlCl3 using NH3 and Ar/NH3 plasma
13Thermomechanical properties of aluminum oxide thin films made by atomic layer deposition
14Thermal and plasma enhanced atomic layer deposition of SiO2 using commercial silicon precursors
15Plasma-Enhanced Atomic Layer Deposition of Silver Thin Films
16Antiferromagnetism and p-type conductivity of nonstoichiometric nickel oxide thin films
17Aluminum tri-isopropoxide as an alternative precursor for atomic layer deposition of aluminum oxide thin films
18Plasma etch characteristics of aluminum nitride mask layers grown by low-temperature plasma enhanced atomic layer deposition in SF6 based plasmas
19Blistering mechanisms of atomic-layer-deposited AlN and Al2O3 films