Timo Sajavaara Plasma Enhanced Atomic Layer Deposition Film Publications

Your search for plasma enhanced atomic layer deposition publications authored by Timo Sajavaara returned 15 record(s). If there are too many results, you may want to use the multi-factor search to narrow the results.

NumberTitle
1A liquid alkoxide precursor for the atomic layer deposition of aluminum oxide films
2Antiferromagnetism and p-type conductivity of nonstoichiometric nickel oxide thin films
3Atomic layer deposition of AlN from AlCl3 using NH3 and Ar/NH3 plasma
4Blistering mechanisms of atomic-layer-deposited AlN and Al2O3 films
5Comparison of mechanical properties and composition of magnetron sputter and plasma enhanced atomic layer deposition aluminum nitride films
6Influence of plasma chemistry on impurity incorporation in AlN prepared by plasma enhanced atomic layer deposition
7Plasma etch characteristics of aluminum nitride mask layers grown by low-temperature plasma enhanced atomic layer deposition in SF6 based plasmas
8Plasma-Enhanced Atomic Layer Deposition of Silver Thin Films
9Properties of AlN grown by plasma enhanced atomic layer deposition
10Radical-Enhanced Atomic Layer Deposition of Metallic Copper Thin Films - Thesis Coverage
11Room-temperature plasma-enhanced atomic layer deposition of ZnO: Film growth dependence on the PEALD reactor configuration
12Structural and chemical analysis of annealed plasma-enhanced atomic layer deposition aluminum nitride films
13The α and γ plasma modes in plasma-enhanced atomic layer deposition with O2-N2 capacitive discharges
14Thermal and plasma enhanced atomic layer deposition of SiO2 using commercial silicon precursors
15Tribological properties of thin films made by atomic layer deposition sliding against silicon