Timo Sajavaara Plasma Enhanced Atomic Layer Deposition Film Publications

Your search for plasma enhanced atomic layer deposition publications authored by Timo Sajavaara returned 18 record(s). If there are too many results, you may want to use the multi-factor search to narrow the results.

NumberTitle
1A liquid alkoxide precursor for the atomic layer deposition of aluminum oxide films
2Plasma etch characteristics of aluminum nitride mask layers grown by low-temperature plasma enhanced atomic layer deposition in SF6 based plasmas
3Aluminum tri-isopropoxide as an alternative precursor for atomic layer deposition of aluminum oxide thin films
4Blistering mechanisms of atomic-layer-deposited AlN and Al2O3 films
5The α and γ plasma modes in plasma-enhanced atomic layer deposition with O2-N2 capacitive discharges
6Plasma-Enhanced Atomic Layer Deposition of Silver Thin Films
7Influence of plasma chemistry on impurity incorporation in AlN prepared by plasma enhanced atomic layer deposition
8Tribological properties of thin films made by atomic layer deposition sliding against silicon
9Structural and chemical analysis of annealed plasma-enhanced atomic layer deposition aluminum nitride films
10Atomic scale surface modification of TiO2 3D nano-arrays: plasma enhanced atomic layer deposition of NiO for photocatalysis
11Radical-Enhanced Atomic Layer Deposition of Metallic Copper Thin Films - Thesis Coverage
12Antiferromagnetism and p-type conductivity of nonstoichiometric nickel oxide thin films
13Ti Alloyed α-Ga2O3: Route towards Wide Band Gap Engineering
14Room-temperature plasma-enhanced atomic layer deposition of ZnO: Film growth dependence on the PEALD reactor configuration
15Comparison of mechanical properties and composition of magnetron sputter and plasma enhanced atomic layer deposition aluminum nitride films
16Atomic layer deposition of AlN from AlCl3 using NH3 and Ar/NH3 plasma
17Thermal and plasma enhanced atomic layer deposition of SiO2 using commercial silicon precursors
18Properties of AlN grown by plasma enhanced atomic layer deposition