Antiferromagnetism and p-type conductivity of nonstoichiometric nickel oxide thin films
Type:
Journal
Info:
InfoMat. 2020;1-6.
Date:
2019-11-28
Author Information
| Name | Institution |
|---|---|
| Mari Napari | University of Cambridge |
| Zhigang Xiao | Alabama A&M University |
| Tahmida N. Huq | University of Cambridge |
| Kim Kisslinger | Brookhaven National Laboratory |
| Tuhin Maity | University of Cambridge |
| Sam Chance | Alabama A&M University |
| Samuel Banks | Alabama A&M University |
| Daisy Gomersall | University of Cambridge |
| Kham M. Niang | University of Cambridge |
| Armin Barthel | University of Cambridge |
| Juliet E. Thompson | University of Cambridge |
| Sami Kinnunen | University of Jyväskylä |
| Kai Arstila | University of Jyväskylä |
| Timo Sajavaara | University of Jyväskylä |
| Robert L. Z. Hoye | University of Cambridge |
| Andrew J. Flewitt | University of Cambridge |
| Judith L. MacManus-Driscoll | University of Cambridge |
Films
Plasma NiOx
Film/Plasma Properties
Characteristic: Crystallinity, Crystal Structure, Grain Size, Atomic Structure
Analysis: XRD, X-Ray Diffraction
Characteristic: Density
Analysis: XRR, X-Ray Reflectivity
Characteristic: Morphology, Roughness, Topography
Analysis: AFM, Atomic Force Microscopy
Characteristic: Microstructure
Analysis: HIM, Helium Ion Microscopy
Characteristic: Chemical Composition, Impurities
Analysis: XPS, X-ray Photoelectron Spectroscopy
Characteristic: Compositional Depth Profiling
Analysis: TOF-ERDA, Time-Of-Flight Elastic Recoil Detection Analysis
Characteristic: Resistivity, Sheet Resistance
Analysis: van der Pauw sheet resistance
Characteristic: Carrier Concentration
Analysis: van der Pauw sheet resistance
Characteristic: Mobility
Analysis: van der Pauw sheet resistance
Characteristic: Thermal Activation Energy
Analysis: Two-point Probe
Characteristic: Magnetic Properties
Analysis: Magnetization
Substrates
| Silicon |
| SiO2 |
| BSG, BoroSilicate Glass |
Notes
| 1455 |