Publication Information

Title:
Antiferromagnetism and p-type conductivity of nonstoichiometric nickel oxide thin films
Type:
Journal
Info:
InfoMat. 2020;1-6.
Date:
2019-11-28

Author Information

Name Institution
Mari NapariUniversity of Cambridge
Zhigang XiaoAlabama A&M University
Tahmida N. HuqUniversity of Cambridge
Kim KisslingerBrookhaven National Laboratory
Tuhin MaityUniversity of Cambridge
Sam ChanceAlabama A&M University
Samuel BanksAlabama A&M University
Daisy GomersallUniversity of Cambridge
Kham M. NiangUniversity of Cambridge
Armin BarthelUniversity of Cambridge
Juliet E. ThompsonUniversity of Cambridge
Sami KinnunenUniversity of Jyväskylä
Kai ArstilaUniversity of Jyväskylä
Timo SajavaaraUniversity of Jyväskylä
Robert L. Z. HoyeUniversity of Cambridge
Andrew J. FlewittUniversity of Cambridge
Judith L. MacManus-DriscollUniversity of Cambridge

Films

Plasma NiOx


Film/Plasma Properties

Characteristic: Crystallinity, Crystal Structure, Grain Size, Atomic Structure
Analysis: XRD, X-Ray Diffraction

Characteristic: Density
Analysis: XRR, X-Ray Reflectivity

Characteristic: Morphology, Roughness, Topography
Analysis: AFM, Atomic Force Microscopy

Characteristic: Microstructure
Analysis: HIM, Helium Ion Microscopy

Characteristic: Chemical Composition, Impurities
Analysis: XPS, X-ray Photoelectron Spectroscopy

Characteristic: Compositional Depth Profiling
Analysis: TOF-ERDA, Time-Of-Flight Elastic Recoil Detection Analysis

Characteristic: Resistivity, Sheet Resistance
Analysis: van der Pauw sheet resistance

Characteristic: Carrier Concentration
Analysis: van der Pauw sheet resistance

Characteristic: Mobility
Analysis: van der Pauw sheet resistance

Characteristic: Thermal Activation Energy
Analysis: Two-point Probe

Characteristic: Magnetic Properties
Analysis: Magnetization

Substrates

Silicon
SiO2
BSG, BoroSilicate Glass

Keywords

Notes

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