Custom Direct Plasma Plasma Enhanced Atomic Layer Deposition Film Publications

Your search for plasma enhanced atomic layer deposition publications using Custom Direct Plasma hardware returned 46 records. If there are too many results, you may want to use the multi-factor search to narrow the results.

NumberTitle
1A Chemical Reaction Path Design for the Atomic Layer Deposition of Tantalum Nitride Thin Films
2A study on film thickness control of vertical flow showerhead reactor for RF plasma deposition
3An Analysis of the Deposition Mechanisms involved during Self-Limiting Growth of Aluminum Oxide by Pulsed PECVD
4Antioxidation properties of Ti0.83Al0.17N prepared using plasma-enhanced atomic layer deposition
5Atomic layer deposited HfO2/HfSixOyNz stacked gate dielectrics for metal-oxide-semiconductor structures
6Atomic layer deposition of aluminum thin films using an alternating supply of trimethylaluminum and a hydrogen plasma
7Atomic Layer Deposition of Nickel by the Reduction of Preformed Nickel Oxide
8Challenges in atomic layer deposition of carbon-containing silicon-based dielectrics
9Characteristics of Al2O3 Thin Films Deposited Using Dimethylaluminum Isopropoxide and Trimethylaluminum Precursors by the Plasma-Enhanced Atomic-Layer Deposition Method
10Characteristics of an Al2O3 Thin Film Deposited by a Plasma Enhanced Atomic Layer Deposition Method Using N2O Plasma
11Characteristics of HfO2 thin films deposited by plasma-enhanced atomic layer deposition using O2 plasma and N2O plasma
12Characteristics of HfO2 thin films grown by plasma atomic layer deposition
13Chemical Reaction Mechanism in the Atomic Layer Deposition of TaCxNy Films Using tert-Butylimidotris(diethylamido)tantalum
14Comparison between ZnO films grown by plasma-assisted atomic layer deposition using H2O plasma and O2 plasma as oxidant
15Composition, structure, and electrical characteristics of HfO2 gate dielectrics grown using the remote- and direct-plasma atomic layer deposition methods
16Effect of DC Bias on the Plasma Properties in Remote Plasma Atomic Layer Deposition and Its Application to HfO2 Thin Films
17Effect of Plasma on Characteristics of Zirconium Oxide Films Deposited by Plasma-Enhanced Atomic Layer Deposition
18Electrical Characterization of Metal-Insulator-Semiconductor Capacitors Having Double-Layered Atomic-Layer-Deposited Al2O3 and ZnO for Transparent Thin Film Transistor Applications
19Enhancement of the TiO2 Thin-Film Dielectric Constant Through Pretreatment of Ir Substrate
20Formation of aluminum nitride thin films as gate dielectrics on Si(100)
21Formation of Tantalum Carbide and Nitride Phases in Atomic Layer Deposition Using Hydrogen Plasma and tert-Butylimidotris( diethylamido)-tantalum (TBTDET), and its Effect on Material Properties
22Growth of aluminum nitride thin films prepared by plasma-enhanced atomic layer deposition
23High-Quality Low-Temperature Silicon Oxide by Plasma-Enhanced Atomic Layer Deposition Using a Metal-Organic Silicon Precursor and Oxygen Radical
24Improved stability of electrical properties of nitrogen-added Al2O3 films grown by PEALD as gate dielectric
25Increment of the Dielectric Constant of Ta2O5 Thin Films by Retarding Interface Oxide Growth on Si Substrates
26Influence of argon plasma on the deposition of Al2O3 film onto the PET surfaces by atomic layer deposition
27Influence of magnetic field on the reaction mechanisms of plasma-assisted atomic layer deposition of Al2O3
28Influence of Working Pressure on the Al2O3 Film Properties in Plasma-Enhanced Atomic Layer Deposition
29Investigating the TiN film quality and growth behavior for plasma-enhanced atomic layer deposition using TiCl4 and N2/H2/Ar radicals
30Investigation of a Two-Layer Gate Insulator Using Plasma-Enhanced ALD for Ultralow Temperature Poly-Si TFTs
31Low temperature SiOx thin film deposited by plasma enhanced atomic layer deposition for thin film encapsulation applications
32Low Voltage Switching Characteristics of 60 nm Thick SrBi2Ta2O9 Thin Films Deposited by Plasma-Enhanced ALD
33PEALD of Zirconium Oxide Using Tetrakis(ethylmethylamino)zirconium and Oxygen
34Plasma-Assisted ALD of an Al2O3 Permeation Barrier Layer on Plastic
35Plasma-Enhanced Atomic Layer Deposition of Ruthenium Thin Films
36Plasma-Enhanced Atomic Layer Deposition of Semiconductor Grade ZnO Using Dimethyl Zinc
37Plasma-Enhanced Atomic Layer Deposition of SrTa2O6 Thin Films Using Sr[Ta(OC2H5)5(OC2H4OCH3)]2 as Precursor
38Plasma-Enhanced Atomic Layer Deposition of Tantalum Nitrides Using Hydrogen Radicals as a Reducing Agent
39Plasma-Enhanced Atomic-Layer Deposition of a HfO2 Gate Dielectric
40Preparation of TiN films by plasma assisted atomic layer deposition for copper metallization
41Properties of Plasma-Enhanced Atomic Layer Deposition-Grown Tantalum Carbonitride Thin Films
42Remote Plasma-Enhanced Atomic-Layer Deposition of TiN by Using TDMAT with a NH3 Plasma
43Self-assembled monolayers as a defect sealant of Al2O3 barrier layers grown by atomic layer deposition
44Self-limiting deposition of semiconducting ZnO by pulsed plasma-enhanced chemical vapor deposition
45Stabilization of Al2O3 gate oxide on plastic substrate for low temperature poly-silicon by in situ plasma treatment
46WNx Film Prepared by Atomic Layer Deposition using F-Free BTBMW and NH3 Plasma Radical for ULSI Applications


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