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Custom Direct Plasma Plasma Enhanced Atomic Layer Deposition Film Publications

Your search for plasma enhanced atomic layer deposition publications using Custom Direct Plasma hardware returned 24 records. If there are too many results, you may want to use the multi-factor search to narrow the results.

NumberTitle
1A study on film thickness control of vertical flow showerhead reactor for RF plasma deposition
2An Analysis of the Deposition Mechanisms involved during Self-Limiting Growth of Aluminum Oxide by Pulsed PECVD
3Atomic layer deposition of aluminum thin films using an alternating supply of trimethylaluminum and a hydrogen plasma
4Challenges in atomic layer deposition of carbon-containing silicon-based dielectrics
5Characteristics of Al2O3 Thin Films Deposited Using Dimethylaluminum Isopropoxide and Trimethylaluminum Precursors by the Plasma-Enhanced Atomic-Layer Deposition Method
6Characteristics of an Al2O3 Thin Film Deposited by a Plasma Enhanced Atomic Layer Deposition Method Using N2O Plasma
7Chemical Reaction Mechanism in the Atomic Layer Deposition of TaCxNy Films Using tert-Butylimidotris(diethylamido)tantalum
8Comparison between ZnO films grown by plasma-assisted atomic layer deposition using H2O plasma and O2 plasma as oxidant
9Effect of DC Bias on the Plasma Properties in Remote Plasma Atomic Layer Deposition and Its Application to HfO2 Thin Films
10Electrical Characterization of Metal-Insulator-Semiconductor Capacitors Having Double-Layered Atomic-Layer-Deposited Al2O3 and ZnO for Transparent Thin Film Transistor Applications
11Formation of Tantalum Carbide and Nitride Phases in Atomic Layer Deposition Using Hydrogen Plasma and tert-Butylimidotris( diethylamido)-tantalum (TBTDET), and its Effect on Material Properties
12High-Quality Low-Temperature Silicon Oxide by Plasma-Enhanced Atomic Layer Deposition Using a Metal-Organic Silicon Precursor and Oxygen Radical
13Improved stability of electrical properties of nitrogen-added Al2O3 films grown by PEALD as gate dielectric
14Influence of argon plasma on the deposition of Al2O3 film onto the PET surfaces by atomic layer deposition
15Influence of magnetic field on the reaction mechanisms of plasma-assisted atomic layer deposition of Al2O3
16Influence of Working Pressure on the Al2O3 Film Properties in Plasma-Enhanced Atomic Layer Deposition
17Investigating the TiN film quality and growth behavior for plasma-enhanced atomic layer deposition using TiCl4 and N2/H2/Ar radicals
18Low temperature SiOx thin film deposited by plasma enhanced atomic layer deposition for thin film encapsulation applications
19Plasma-Assisted ALD of an Al2O3 Permeation Barrier Layer on Plastic
20Plasma-Enhanced Atomic Layer Deposition of Semiconductor Grade ZnO Using Dimethyl Zinc
21Properties of Plasma-Enhanced Atomic Layer Deposition-Grown Tantalum Carbonitride Thin Films
22Self-assembled monolayers as a defect sealant of Al2O3 barrier layers grown by atomic layer deposition
23Self-limiting deposition of semiconducting ZnO by pulsed plasma-enhanced chemical vapor deposition
24Stabilization of Al2O3 gate oxide on plastic substrate for low temperature poly-silicon by in situ plasma treatment


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