Publication Information

Title:
Improvement of Morphological Stability of PEALD-Iridium Thin Films by Adopting Two-Step Annealing Process
Type:
Journal
Info:
Electrochemical and Solid-State Letters, 11 (11) H303-H305 (2008)
Date:
2008-07-16

Author Information

Name Institution
Sung-Wook KimKorea Advanced Institute of Science and Technology
Se-Hun KwonKorea Advanced Institute of Science and Technology
Seong-Jun JeongKorea Advanced Institute of Science and Technology
Jin-Seong ParkSamsung SDI Center Research and Development
Sang-Won KangKorea Advanced Institute of Science and Technology

Films


Film/Plasma Properties

Characteristic: Thickness
Analysis: SEM, Scanning Electron Microscopy

Characteristic: Microstructure
Analysis: TEM, Transmission Electron Microscope

Characteristic: Crystallinity, Crystal Structure, Grain Size, Atomic Structure
Analysis: Electron Diffraction

Characteristic: Resistivity, Sheet Resistance
Analysis: Four-point Probe

Characteristic: Crystallinity, Crystal Structure, Grain Size, Atomic Structure
Analysis: XRD, X-Ray Diffraction

Characteristic: Density
Analysis: XRR, X-Ray Reflectivity

Characteristic: Morphology, Roughness, Topography
Analysis: AFM, Atomic Force Microscopy

Characteristic: Chemical Composition, Impurities
Analysis: AES, Auger Electron Spectroscopy

Substrates

TiN

Keywords

Notes

1341