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Improvement of Morphological Stability of PEALD-Iridium Thin Films by Adopting Two-Step Annealing Process
Type:
Journal
Info:
Electrochemical and Solid-State Letters, 11 (11) H303-H305 (2008)
Date:
2008-07-16
Author Information
| Name | Institution |
|---|---|
| Sung-Wook Kim | Korea Advanced Institute of Science and Technology |
| Se-Hun Kwon | Korea Advanced Institute of Science and Technology |
| Seong-Jun Jeong | Korea Advanced Institute of Science and Technology |
| Jin-Seong Park | Samsung SDI Center Research and Development |
| Sang-Won Kang | Korea Advanced Institute of Science and Technology |
Films
Plasma Ir
Film/Plasma Properties
Characteristic: Thickness
Analysis: SEM, Scanning Electron Microscopy
Characteristic: Microstructure
Analysis: TEM, Transmission Electron Microscope
Characteristic: Crystallinity, Crystal Structure, Grain Size, Atomic Structure
Analysis: Electron Diffraction
Characteristic: Resistivity, Sheet Resistance
Analysis: Four-point Probe
Characteristic: Crystallinity, Crystal Structure, Grain Size, Atomic Structure
Analysis: XRD, X-Ray Diffraction
Characteristic: Density
Analysis: XRR, X-Ray Reflectivity
Characteristic: Morphology, Roughness, Topography
Analysis: AFM, Atomic Force Microscopy
Characteristic: Chemical Composition, Impurities
Analysis: AES, Auger Electron Spectroscopy
Substrates
| TiN |
Notes
| 1341 |