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Sang-Won Kang Plasma Enhanced Atomic Layer Deposition Film Publications

Your search for plasma enhanced atomic layer deposition publications authored by Sang-Won Kang returned 27 record(s).

NumberTitle
1A Chemical Reaction Path Design for the Atomic Layer Deposition of Tantalum Nitride Thin Films
2Plasma-Enhanced Atomic Layer Deposition of Ta-N Thin Films
3Study on the characteristics of aluminum thin films prepared by atomic layer deposition
4Interface effect on dielectric constant of HfO2/Al2O3 nanolaminate films deposited by plasma-enhanced atomic layer deposition
5TiO2/Al2O3/TiO2 Nanolaminated Thin Films for DRAM Capacitor Deposited by Plasma-Enhanced Atomic Layer Deposition
6Plasma-Enhanced ALD of Titanium-Silicon-Nitride Using TiCl4 , SiH4, and N2/H2/Ar Plasma
7Plasma-Enhanced Atomic Layer Deposition of TaN Thin Films Using Tantalum-Pentafluoride and N2/H2/Ar Plasma
8Atomic layer deposition of aluminum thin films using an alternating supply of trimethylaluminum and a hydrogen plasma
9Plasma-Enhanced Atomic Layer Deposition of Tantalum Nitrides Using Hydrogen Radicals as a Reducing Agent
10Plasma-Enhanced Atomic Layer Deposition of Ruthenium Thin Films
11Ti-Al-N Thin Films Prepared by the Combination of Metallorganic Plasma-Enhanced Atomic Layer Deposition of Al and TiN
12Improvement of Morphological Stability of PEALD-Iridium Thin Films by Adopting Two-Step Annealing Process
13Increment of the Dielectric Constant of Ta2O5 Thin Films by Retarding Interface Oxide Growth on Si Substrates
14Initial Stages of Ruthenium Film Growth in Plasma-Enhanced Atomic Layer Deposition
15Enhanced Dielectric Properties of SrTiO3 Films with a SrRuO3 Seed by Plasma-Enhanced Atomic Layer Deposition
16Plasma-Enhanced Atomic Layer Deposition of Ru-TiN Thin Films for Copper Diffusion Barrier Metals
17PEALD of a Ruthenium Adhesion Layer for Copper Interconnects
18Controlling the composition of Ti1-xAlxN thin films by modifying the number of TiN and AlN subcycles in atomic layer deposition
19Antioxidation properties of Ti0.83Al0.17N prepared using plasma-enhanced atomic layer deposition
20Growth mechanism and diffusion barrier property of plasma-enhanced atomic layer deposition Ti-Si-N thin films
21Increment of dielectric properties of SrTiO3 thin films by SrO interlayer on Ru bottom electrodes
22Growth of aluminum nitride thin films prepared by plasma-enhanced atomic layer deposition
23Improvement of Copper Diffusion Barrier Properties of Tantalum Nitride Films by Incorporating Ruthenium Using PEALD
24Effect of Sr-Ruthenate Seed Layer on Dielectric Properties of SrTiO3 Thin Films Prepared by Plasma-Enhanced Atomic Layer Deposition
25Enhancement of the TiO2 Thin-Film Dielectric Constant Through Pretreatment of Ir Substrate
26Atomic Layer Deposition of Nickel by the Reduction of Preformed Nickel Oxide
27Interfacial Layer Properties of HfO2 Films Formed by Plasma-Enhanced Atomic Layer Deposition on Silicon