Name

Institution

Pan Kwi Park

Korea Advanced Institute of Science and Technology

Eun-Soo Cha

Korea Advanced Institute of Science and Technology

Sang-Won Kang

Korea Advanced Institute of Science and Technology

Plasma HfO₂ using Unknown

Deposition Temperature = 250C

TEMAH, Tetrakis[(EthylMethyl)Amido]Hafnium, [(EtMe)N]₄Hf

352535-01-4

Where to buy precursor

Oxygen, O₂

7782-44-7

Plasma Al₂O₃ using Unknown

Deposition Temperature = 250C

TMA, Trimethyl Aluminum, Trimethylalane, Trimethylaluminium, Aluminium Trimethyl, Aluminum Trimethanide, Al(CH₃)₃, AlMe₃, Al₂(CH₃)₆, Al₂Me₆

75-24-1

Oxygen, O₂

7782-44-7

Characteristic

Analysis

Diagnostic

Thickness

TEM, Transmission Electron Microscope

Unknown

Crystallinity, Crystal Structure, Grain Size, Atomic Structure

XRD, X-Ray Diffraction

Unknown

Chemical Binding

XPS, X-ray Photoelectron Spectroscopy

Unknown

Dielectric Constant, Permittivity

C-V, Capacitance-Voltage Measurements

Keithley 590 CV Analyzer

Si(100)

Nanolaminate

Dielectric Thin Films

Dielectric Constant

Ozone

Thin Film

Aluminum Compounds

700C high T RTA

Forming gas anneal

HF dip and DI rinse.

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