Title: Interface effect on dielectric constant of HfO2/Al2O3 nanolaminate films deposited by plasma-enhanced atomic layer deposition
Type: Journal
Info: APPLIED PHYSICS LETTERS 90, 232906 (2007)
Date: 2007-06-05
DOI: http://dx.doi.org/10.1063/1.2746416
Name
Institution
Korea Advanced Institute of Science and Technology
Korea Advanced Institute of Science and Technology
Korea Advanced Institute of Science and Technology
Characteristic
Analysis
Diagnostic
Thickness
TEM, Transmission Electron Microscope
Unknown
Crystallinity, Crystal Structure, Grain Size, Atomic Structure
XRD, X-Ray Diffraction
Unknown
Chemical Binding
XPS, X-ray Photoelectron Spectroscopy
Unknown
Dielectric Constant, Permittivity
C-V, Capacitance-Voltage Measurements
Keithley 590 CV Analyzer
Si(100)
Nanolaminate
Dielectric Thin Films
Dielectric Constant
Ozone
Thin Film
Aluminum Compounds
700C high T RTA
Forming gas anneal
HF dip and DI rinse.
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