Search 1531 plasma ALD publications by:
Search 1531 plasma ALD publications by:
Publication Information
Title:
Interface effect on dielectric constant of HfO2/Al2O3 nanolaminate films deposited by plasma-enhanced atomic layer deposition
Type:
Journal
Info:
APPLIED PHYSICS LETTERS 90, 232906 (2007)
Date:
2007-06-05
Author Information
Name | Institution |
---|---|
Pan Kwi Park | Korea Advanced Institute of Science and Technology |
Eun-Soo Cha | Korea Advanced Institute of Science and Technology |
Sang-Won Kang | Korea Advanced Institute of Science and Technology |
Films
Film/Plasma Properties
Characteristic: Thickness
Analysis: TEM, Transmission Electron Microscope
Characteristic: Crystallinity, Crystal Structure, Grain Size, Atomic Structure
Analysis: XRD, X-Ray Diffraction
Characteristic: Chemical Binding
Analysis: XPS, X-ray Photoelectron Spectroscopy
Characteristic: Dielectric Constant, Permittivity
Analysis: C-V, Capacitance-Voltage Measurements
Substrates
Si(100) |
Keywords
Nanolaminate |
Dielectric Thin Films |
Dielectric Constant |
Ozone |
Thin Film |
Aluminum Compounds |
Notes
700C high T RTA |
Forming gas anneal |
HF dip and DI rinse. |
39 |
Popular Precursors
Top Authors
Erwin (W.M.M.) Kessels |
Hyeongtag Jeon |
Hyungjun Kim |
Mauritius C. M. (Richard) van de Sanden |
Christophe Detavernier |