Search 1636 plasma ALD publications by:
TEMAHf, tetrakis(ethylmethylamido) Hafnium, hafnium ethylmethylamide, (EtMeN)4Hf, CAS# 352535-01-4
Where to buy
|3||Strem Chemicals, Inc.||🇺🇸||Tetrakis(ethylmethylamino)hafnium, 99% (99.99+%-Hf, <0.15% Zr)|
|5||Strem Chemicals, Inc.||🇺🇸||Tetrakis(ethylmethylamino)hafnium, 99% (99.99+%-Hf, <0.15% Zr), contained in 50 ml cylinder for CVD/ALD|
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Plasma Enhanced Atomic Layer Deposition Film Publications
Your search for publications using this chemistry returned 78 record(s). If there are too many results, you may want to use the multi-factor search to narrow the results.