TEMAHf, tetrakis(ethylmethylamido) Hafnium, hafnium ethylmethylamide, (EtMeN)4Hf, CAS# 352535-01-4

Where to buy

NumberVendorRegionLink
1DOCK/CHEMICALSπŸ‡©πŸ‡ͺTetrakis(ethylmethylamido)hafnium
2GelestπŸ‡ΊπŸ‡ΈHafnium Tetrakis(Ethylmethylamide)
3Pegasus ChemicalsπŸ‡¬πŸ‡§Tetrakis(ethylmethylamido)hafnium(IV)
4Strem Chemicals, Inc.πŸ‡ΊπŸ‡ΈTetrakis(ethylmethylamino)hafnium, 99% (99.99+%-Hf, <0.15% Zr), contained in 50 ml cylinder for CVD/ALD
5EreztechπŸ‡ΊπŸ‡ΈTetrakis(ethylmethylamino) hafnium
6Strem Chemicals, Inc.πŸ‡ΊπŸ‡ΈTetrakis(ethylmethylamino)hafnium, 99% (99.99+%-Hf, <0.15% Zr)

www.plasma-ald.com does not endorse any chemical suppliers. These links are provided for the benefit of our users. If a link goes bad, let us know.

If you would like your company's precursor products listed, or your existing listing changed or removed, send me an email.


Plasma Enhanced Atomic Layer Deposition Film Publications

Your search for publications using this chemistry returned 84 record(s). If there are too many results, you may want to use the multi-factor search to narrow the results.

NumberTitle
1Interaction of hydrogen with hafnium dioxide grown on silicon dioxide by the atomic layer deposition technique
2Comparison of the Deposition Characteristics and Electrical Properties for La2O3, HfO2 and LHO Films
3Interface effect on dielectric constant of HfO2/Al2O3 nanolaminate films deposited by plasma-enhanced atomic layer deposition
4The Influence of Technology and Switching Parameters on Resistive Switching Behavior of Pt/HfO2/TiN MIM Structures
5The influence of surface preparation on low temperature HfO2 ALD on InGaAs (001) and (110) surfaces
6Interfacial, Electrical, and Band Alignment Characteristics of HfO2/Ge Stacks with In Situ-Formed SiO2 Interlayer by Plasma-Enhanced Atomic Layer Deposition
7Micro-Raman Spectroscopy for Monitoring of Deposition Quality of High-k Stack Protective Layer onto Nanowire FET Chips for Highly Sensitive miRNA Detection
8Ion and Photon Surface Interaction during Remote Plasma ALD of Metal Oxides
9Breakdown and Protection of ALD Moisture Barrier Thin Films
10Optical properties and bandgap evolution of ALD HfSiOx films
11Ferroelectricity of HfxZr1-xO2 thin films fabricated by 300Β°C low temperature process with plasma-enhanced atomic layer deposition
12Back-End, CMOS-Compatible Ferroelectric Field-Effect Transistor for Synaptic Weights
13The effect of atomic layer deposition temperature on switching properties of HfOx resistive RAM devices
14Characteristics of Thin Hf-Silicate Gate Dielectrics after Remote N2 and N2O Plasma Post-Treatments
15Distribution and coverage of 40 nm gold nano-particles on aluminum and hafnium oxide using electrophoretic method and fabricated MOS structures
16Optical properties and bandgap evolution of ALD HfSiOx films
17Conformality of remote plasma-enhanced atomic layer deposition processes: An experimental study
18Infrared study on room-temperature atomic layer deposition of HfO2 using tetrakis(ethylmethylamino)hafnium and remote plasma-excited oxidizing agents
19HfO2/SiO2 anti-reflection films for UV lasers via plasma-enhanced atomic layer deposition
20Sub-10-nm ferroelectric Gd-doped HfO2 layers
21Improvement in electrical characteristics of HfO2 gate dielectrics treated by remote NH3 plasma
22Effect of Nitrogen Incorporation in HfO2 Films Deposited by Plasma-Enhanced Atomic Layer Deposition
23Effects of rapid thermal annealing on the properties of HfO2/La2O3 nanolaminate films deposited by plasma enhanced atomic layer deposition
24Ultrasensitive Detection of 2,4-Dinitrophenol Using Nanowire Biosensor
25Pt Nanocrystals Embedded in Remote Plasma Atomic-Layer-Deposited HfO2 for Nonvolatile Memory Devices
26Low temperature growth of high-k Hf-La oxides by remote-plasma atomic layer deposition: Morphology, stoichiometry, and dielectric properties
27Comparison of chemical stability and corrosion resistance of group IV metal oxide films formed by thermal and plasma-enhanced atomic layer deposition
28Plasma Enhanced Atomic Layer Deposition Passivated HfO2/AlN/In0.53Ga0.47As MOSCAPs With Sub-Nanometer Equivalent Oxide Thickness and Low Interface Trap Density
29Deposition of TiN and HfO2 in a commercial 200 mm remote plasma atomic layer deposition reactor
30Effect of cycling on ultra-thin HfZrO4, ferroelectric synaptic weights
31Surface Passivation of Silicon Using HfO2 Thin Films Deposited by Remote Plasma Atomic Layer Deposition System
32Excellent resistive switching properties of atomic layer-deposited Al2O3/HfO2/Al2O3 trilayer structures for non-volatile memory applications
33Resistive switching in HfO2-based atomic layer deposition grown metal-insulator-metal structures
34Back-End, CMOS-Compatible Ferroelectric Field-Effect Transistor for Synaptic Weights
35Hot Carrier Filtering in Solution Processed Heterostructures: A Paradigm for Improving Thermoelectric Efficiency
36Plasma-Assisted Atomic Layer Deposition of Conductive Hafnium Nitride Using Tetrakis(ethylmethylamino)hafnium for CMOS Gate Electrode Applications
37Properties of HfLaO MOS capacitor deposited on SOI with plasma enhanced atomic layer deposition
38Properties of HfAlO film deposited by plasma enhanced atomic layer deposition
39A comparison between remote plasma-enhanced and thermal ALD of Hafnium-nitride thin films
40Band alignment of zinc oxide as a channel layer in a gate stack structure grown by plasma enhanced atomic layer deposition
41The Formation of an Almost Full Atomic Monolayer via Surface Modification by N2O-Plasma in Atomic Layer Deposition of ZrO2 Thin Films
42Improvement in electrical characteristics of HfO2 gate dielectrics treated by remote NH3 plasma
43Nonhomogeneous spatial distribution of filamentary leakage current paths in circular area Pt/HfO2/Pt capacitors
44Structural and electrical analysis of the atomic layer deposition of HfO2/n-In0.53Ga0.47As capacitors with and without an Al2O3 interface control layer
45Low Dit HfO2/Al2O3/In0.53Ga0.47As gate stack achieved with plasma-enhanced atomic layer deposition
46Effect of hydrogen participation on the improvement in electrical characteristics of HfO2 gate dielectrics by post-deposition remote N2 , N2/H2, and NH3 plasma treatments
47In situ dry cleaning of Si wafer using OF2/NH3 remote plasma with low global warming potential
48Microstructure and electrical properties of thin HfO2 deposited by plasma-enhanced atomic layer deposition
49Investigation of the impact of insulator material on the performance of dissimilar electrode metal-insulator-metal diodes
50Plasma assisted atomic layer deposited hafnium oxide films for silicon surface passivation
51Trapped charge densities in Al2O3-based silicon surface passivation layers
52Sub-0.5 nm Equivalent Oxide Thickness Scaling for Si-Doped Zr1-xHfxO2 Thin Film without Using Noble Metal Electrode
53Correlation between ferroelectricity and ferroelectric orthorhombic phase of HfxZr1-xO2 thin films using synchrotron x-ray analysis
54On the Control of the Fixed Charge Densities in Al2O3 Based Silicon Surface Passivation Schemes
55Characteristics of Thin Hf-Silicate Gate Dielectrics after Remote N2 and N2O Plasma Post-Treatments
56Influence of plasma-based in-situ surface cleaning procedures on HfO2/In0.53Ga0.47As gate stack properties
57Ferroelectric properties of full plasma-enhanced ALD TiN/La:HfO2/TiN stacks
58Characteristics of high-k dielectric ECR-ALD lanthanum hafnium oxide (LHO) films
59Room-Temperature Atomic Layer Deposition of HfO2 By Using Remote Plasma Source
60Simulation and Fabrication of HfO2 Thin Films Passivating Si from a Numerical Computer and Remote Plasma ALD
61Low-temperature plasma-enhanced atomic layer deposition of HfO2/Al2O3 nanolaminate structure on Si
62Interface engineering of ALD HfO2-based RRAM with Ar plasma treatment for reliable and uniform switching behaviors
63Synaptic Plasticity and Learning Behaviors Mimicked in Single Inorganic Synapses of Pt/HfOx/ZnOx/TiN Memristive System
64Total-dose radiation response and and post-irradiation annealing response of Hafnium capacitors
65An improvement of HfO2/Ge interface by in situ remote N2 plasma pretreatment for Ge MOS devices
66Optimization of Plasma Enhanced Atomic Layer Deposition Processes for Oxides, Nitrides and Metals in the Oxford Instruments FlexAL Reactor
67Pt/Ta2O5/HfO2-x/Ti Resistive Switching Memory Competing with Multilevel NAND Flash
68Film properties of low temperature HfO2 grown with H2O, O3, or remote O2-plasma
69Effect of NH3 plasma passivation on the electrical characteristics of a nanolaminated ALD HfAlO on InGaAs MOS capacitor
70Sub-0.5 nm Equivalent Oxide Thickness Scaling for Si-Doped Zr1-xHfxO2 Thin Film without Using Noble Metal Electrode
71Interfacial and electrical properties of Al2O3/HfO2 bilayer deposited by atomic layer deposition on GeON passivated germanium surface
72Dielectric properties investigation of a compound based on atomic layer deposited multi-layer structure
73Low temperature growth of high-k Hf-La oxides by remote-plasma atomic layer deposition: Morphology, stoichiometry, and dielectric properties
74Comparison of the Deposition Characteristics and Electrical Properties for La2O3, HfO2 and LHO Films
75Symmetrical Al2O3-based passivation layers for p- and n-type silicon
76Properties of HfAlO film deposited by plasma enhanced atomic layer deposition
77Bipolar Resistive Switching Characteristics of HfO2/TiO2/HfO2 Trilayer-Structure RRAM Devices on Pt and TiN-Coated Substrates Fabricated by Atomic Layer Deposition
78Structural and Electrical Analysis of Thin Interface Control Layers of MgO or Al2O3 Deposited by Atomic Layer Deposition and Incorporated at the high-k/III-V Interface of MO2/InxGa1-xAs (M = Hf|Zr, x = 0|0.53) Gate Stacks
79Surface band bending and band alignment of plasma enhanced atomic layer deposited dielectrics on Ga- and N-face gallium nitride
80Effect of DC Bias on the Plasma Properties in Remote Plasma Atomic Layer Deposition and Its Application to HfO2 Thin Films
81Interfacial Layer Properties of HfO2 Films Formed by Plasma-Enhanced Atomic Layer Deposition on Silicon
82Reaction mechanism of room temperature HfO2 atomic layer deposition using remote plasma excited water and oxygen
83Enhanced interfacial reaction of precursor and low temperature substrate in HfO2 atomic layer deposition with highly Ar diluted O2 plasma
84Interfaces Formed by ALD Metal Oxide Growth on Metal Layers