TEMAHf, tetrakis(ethylmethylamido) Hafnium, hafnium ethylmethylamide, (EtMeN)4Hf, CAS# 352535-01-4

Where to buy

NumberVendorRegionLink
1Pegasus Chemicals🇬🇧Tetrakis(ethylmethylamido)hafnium(IV)
2DOCK/CHEMICALS🇩🇪Tetrakis(ethylmethylamido)hafnium
3Strem Chemicals, Inc.🇺🇸Tetrakis(ethylmethylamino)hafnium, 99% (99.99+%-Hf, <0.15% Zr)
4Ereztech🇺🇸Tetrakis(ethylmethylamino) hafnium
5Strem Chemicals, Inc.🇺🇸Tetrakis(ethylmethylamino)hafnium, 99% (99.99+%-Hf, <0.15% Zr), contained in 50 ml cylinder for CVD/ALD
6Gelest🇺🇸Hafnium Tetrakis(Ethylmethylamide)

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Plasma Enhanced Atomic Layer Deposition Film Publications

Your search for publications using this chemistry returned 84 record(s). If there are too many results, you may want to use the multi-factor search to narrow the results.

NumberTitle
1The effect of atomic layer deposition temperature on switching properties of HfOx resistive RAM devices
2Ferroelectricity of HfxZr1-xO2 thin films fabricated by 300°C low temperature process with plasma-enhanced atomic layer deposition
3Properties of HfAlO film deposited by plasma enhanced atomic layer deposition
4Resistive switching in HfO2-based atomic layer deposition grown metal-insulator-metal structures
5Effect of hydrogen participation on the improvement in electrical characteristics of HfO2 gate dielectrics by post-deposition remote N2 , N2/H2, and NH3 plasma treatments
6Microstructure and electrical properties of thin HfO2 deposited by plasma-enhanced atomic layer deposition
7Plasma-Assisted Atomic Layer Deposition of Conductive Hafnium Nitride Using Tetrakis(ethylmethylamino)hafnium for CMOS Gate Electrode Applications
8Sub-0.5 nm Equivalent Oxide Thickness Scaling for Si-Doped Zr1-xHfxO2 Thin Film without Using Noble Metal Electrode
9The influence of surface preparation on low temperature HfO2 ALD on InGaAs (001) and (110) surfaces
10Ion and Photon Surface Interaction during Remote Plasma ALD of Metal Oxides
11Investigation of the impact of insulator material on the performance of dissimilar electrode metal-insulator-metal diodes
12Properties of HfLaO MOS capacitor deposited on SOI with plasma enhanced atomic layer deposition
13Enhanced interfacial reaction of precursor and low temperature substrate in HfO2 atomic layer deposition with highly Ar diluted O2 plasma
14An improvement of HfO2/Ge interface by in situ remote N2 plasma pretreatment for Ge MOS devices
15Correlation between ferroelectricity and ferroelectric orthorhombic phase of HfxZr1-xO2 thin films using synchrotron x-ray analysis
16A comparison between remote plasma-enhanced and thermal ALD of Hafnium-nitride thin films
17Low temperature growth of high-k Hf-La oxides by remote-plasma atomic layer deposition: Morphology, stoichiometry, and dielectric properties
18The Influence of Technology and Switching Parameters on Resistive Switching Behavior of Pt/HfO2/TiN MIM Structures
19Effects of rapid thermal annealing on the properties of HfO2/La2O3 nanolaminate films deposited by plasma enhanced atomic layer deposition
20Bipolar Resistive Switching Characteristics of HfO2/TiO2/HfO2 Trilayer-Structure RRAM Devices on Pt and TiN-Coated Substrates Fabricated by Atomic Layer Deposition
21Effect of Nitrogen Incorporation in HfO2 Films Deposited by Plasma-Enhanced Atomic Layer Deposition
22Pt Nanocrystals Embedded in Remote Plasma Atomic-Layer-Deposited HfO2 for Nonvolatile Memory Devices
23Infrared study on room-temperature atomic layer deposition of HfO2 using tetrakis(ethylmethylamino)hafnium and remote plasma-excited oxidizing agents
24Symmetrical Al2O3-based passivation layers for p- and n-type silicon
25Comparison of chemical stability and corrosion resistance of group IV metal oxide films formed by thermal and plasma-enhanced atomic layer deposition
26Characteristics of Thin Hf-Silicate Gate Dielectrics after Remote N2 and N2O Plasma Post-Treatments
27Effect of NH3 plasma passivation on the electrical characteristics of a nanolaminated ALD HfAlO on InGaAs MOS capacitor
28Nonhomogeneous spatial distribution of filamentary leakage current paths in circular area Pt/HfO2/Pt capacitors
29Surface band bending and band alignment of plasma enhanced atomic layer deposited dielectrics on Ga- and N-face gallium nitride
30Characteristics of Thin Hf-Silicate Gate Dielectrics after Remote N2 and N2O Plasma Post-Treatments
31Interaction of hydrogen with hafnium dioxide grown on silicon dioxide by the atomic layer deposition technique
32Dielectric properties investigation of a compound based on atomic layer deposited multi-layer structure
33Sub-0.5 nm Equivalent Oxide Thickness Scaling for Si-Doped Zr1-xHfxO2 Thin Film without Using Noble Metal Electrode
34Back-End, CMOS-Compatible Ferroelectric Field-Effect Transistor for Synaptic Weights
35In situ dry cleaning of Si wafer using OF2/NH3 remote plasma with low global warming potential
36Total-dose radiation response and and post-irradiation annealing response of Hafnium capacitors
37Micro-Raman Spectroscopy for Monitoring of Deposition Quality of High-k Stack Protective Layer onto Nanowire FET Chips for Highly Sensitive miRNA Detection
38Synaptic Plasticity and Learning Behaviors Mimicked in Single Inorganic Synapses of Pt/HfOx/ZnOx/TiN Memristive System
39Structural and electrical analysis of the atomic layer deposition of HfO2/n-In0.53Ga0.47As capacitors with and without an Al2O3 interface control layer
40Characteristics of high-k dielectric ECR-ALD lanthanum hafnium oxide (LHO) films
41Conformality of remote plasma-enhanced atomic layer deposition processes: An experimental study
42Low-temperature plasma-enhanced atomic layer deposition of HfO2/Al2O3 nanolaminate structure on Si
43Band alignment of zinc oxide as a channel layer in a gate stack structure grown by plasma enhanced atomic layer deposition
44Interfaces Formed by ALD Metal Oxide Growth on Metal Layers
45Simulation and Fabrication of HfO2 Thin Films Passivating Si from a Numerical Computer and Remote Plasma ALD
46On the Control of the Fixed Charge Densities in Al2O3 Based Silicon Surface Passivation Schemes
47Influence of plasma-based in-situ surface cleaning procedures on HfO2/In0.53Ga0.47As gate stack properties
48Pt/Ta2O5/HfO2-x/Ti Resistive Switching Memory Competing with Multilevel NAND Flash
49Ultrasensitive Detection of 2,4-Dinitrophenol Using Nanowire Biosensor
50Effect of DC Bias on the Plasma Properties in Remote Plasma Atomic Layer Deposition and Its Application to HfO2 Thin Films
51Low Dit HfO2/Al2O3/In0.53Ga0.47As gate stack achieved with plasma-enhanced atomic layer deposition
52Deposition of TiN and HfO2 in a commercial 200 mm remote plasma atomic layer deposition reactor
53Structural and Electrical Analysis of Thin Interface Control Layers of MgO or Al2O3 Deposited by Atomic Layer Deposition and Incorporated at the high-k/III-V Interface of MO2/InxGa1-xAs (M = Hf|Zr, x = 0|0.53) Gate Stacks
54Interfacial, Electrical, and Band Alignment Characteristics of HfO2/Ge Stacks with In Situ-Formed SiO2 Interlayer by Plasma-Enhanced Atomic Layer Deposition
55Plasma Enhanced Atomic Layer Deposition Passivated HfO2/AlN/In0.53Ga0.47As MOSCAPs With Sub-Nanometer Equivalent Oxide Thickness and Low Interface Trap Density
56Low temperature growth of high-k Hf-La oxides by remote-plasma atomic layer deposition: Morphology, stoichiometry, and dielectric properties
57Interfacial and electrical properties of Al2O3/HfO2 bilayer deposited by atomic layer deposition on GeON passivated germanium surface
58Film properties of low temperature HfO2 grown with H2O, O3, or remote O2-plasma
59The Formation of an Almost Full Atomic Monolayer via Surface Modification by N2O-Plasma in Atomic Layer Deposition of ZrO2 Thin Films
60Back-End, CMOS-Compatible Ferroelectric Field-Effect Transistor for Synaptic Weights
61Interface effect on dielectric constant of HfO2/Al2O3 nanolaminate films deposited by plasma-enhanced atomic layer deposition
62Improvement in electrical characteristics of HfO2 gate dielectrics treated by remote NH3 plasma
63Properties of HfAlO film deposited by plasma enhanced atomic layer deposition
64Sub-10-nm ferroelectric Gd-doped HfO2 layers
65Comparison of the Deposition Characteristics and Electrical Properties for La2O3, HfO2 and LHO Films
66Breakdown and Protection of ALD Moisture Barrier Thin Films
67Interfacial Layer Properties of HfO2 Films Formed by Plasma-Enhanced Atomic Layer Deposition on Silicon
68Room-Temperature Atomic Layer Deposition of HfO2 By Using Remote Plasma Source
69Distribution and coverage of 40 nm gold nano-particles on aluminum and hafnium oxide using electrophoretic method and fabricated MOS structures
70Excellent resistive switching properties of atomic layer-deposited Al2O3/HfO2/Al2O3 trilayer structures for non-volatile memory applications
71Effect of cycling on ultra-thin HfZrO4, ferroelectric synaptic weights
72Plasma assisted atomic layer deposited hafnium oxide films for silicon surface passivation
73Surface Passivation of Silicon Using HfO2 Thin Films Deposited by Remote Plasma Atomic Layer Deposition System
74Interface engineering of ALD HfO2-based RRAM with Ar plasma treatment for reliable and uniform switching behaviors
75Reaction mechanism of room temperature HfO2 atomic layer deposition using remote plasma excited water and oxygen
76Ferroelectric properties of full plasma-enhanced ALD TiN/La:HfO2/TiN stacks
77Trapped charge densities in Al2O3-based silicon surface passivation layers
78HfO2/SiO2 anti-reflection films for UV lasers via plasma-enhanced atomic layer deposition
79Improvement in electrical characteristics of HfO2 gate dielectrics treated by remote NH3 plasma
80Optimization of Plasma Enhanced Atomic Layer Deposition Processes for Oxides, Nitrides and Metals in the Oxford Instruments FlexAL Reactor
81Comparison of the Deposition Characteristics and Electrical Properties for La2O3, HfO2 and LHO Films
82Hot Carrier Filtering in Solution Processed Heterostructures: A Paradigm for Improving Thermoelectric Efficiency
83Optical properties and bandgap evolution of ALD HfSiOx films
84Optical properties and bandgap evolution of ALD HfSiOx films