Effects of rapid thermal annealing on the properties of HfO2/La2O3 nanolaminate films deposited by plasma enhanced atomic layer deposition

Type:
Journal
Info:
J. Vac. Sci. Technol. A 33(1), Jan/Feb 2015
Date:
2014-10-22

Author Information

Name Institution
Duo CaoChinese Academy of Sciences

Films

Plasma HfO2


Plasma La2O3


Film/Plasma Properties

Substrates

Notes

208