Publication Information

Title: Effects of rapid thermal annealing on the properties of HfO2/La2O3 nanolaminate films deposited by plasma enhanced atomic layer deposition

Type: Journal

Info: J. Vac. Sci. Technol. A 33(1), Jan/Feb 2015

Date: 2014-10-22

DOI: http://dx.doi.org/10.1116/1.4900935

Author Information

Name

Institution

Duo Cao

Chinese Academy of Sciences

Films

Plasma HfO2 using Unknown

Deposition Temperature = 200C

TEMAHf, (EtMeN)4Hf, [(C2H5)(CH3)N]4Hf, Tetrakis(EthylMethylAmido) Hafnium, Hafnium Ethylmethylamide

352535-01-4

Where to buy precursor

O2, Oxygen

7782-44-7

Plasma La2O3 using Unknown

Deposition Temperature = 200C

La[N(TMS)2]3, tris(bis[trimethylsilyl]amido) lanthanum

175923-07-6

Where to buy precursor

O2, Oxygen

7782-44-7

Film/Plasma Properties

Characteristic

Analysis

Diagnostic

Substrates

Keywords

Notes

208


Mark Sowa

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